JPWO2014181890A1 - 有機螺旋構造体の製造方法、及びそれにより製造される有機螺旋構造体 - Google Patents
有機螺旋構造体の製造方法、及びそれにより製造される有機螺旋構造体 Download PDFInfo
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- JPWO2014181890A1 JPWO2014181890A1 JP2015515918A JP2015515918A JPWO2014181890A1 JP WO2014181890 A1 JPWO2014181890 A1 JP WO2014181890A1 JP 2015515918 A JP2015515918 A JP 2015515918A JP 2015515918 A JP2015515918 A JP 2015515918A JP WO2014181890 A1 JPWO2014181890 A1 JP WO2014181890A1
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- polymer
- helical structure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/02—Polyamines
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0096—Microscopes with photometer devices
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
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- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Analytical Chemistry (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
Claims (6)
- 光渦を、光異性化反応を示す高分子の表面に照射して、前記高分子の表面にナノスケールの螺旋構造を形成する、有機螺旋構造体の製造方法。
- 前記光異性化反応を示す高分子は、アゾ系ポリマー及びスピロピラン系ポリマーの少なくともいずれかである請求項1記載の有機螺旋構造体の製造方法。
- 前記ナノスケールの螺旋構造を形成するステップを繰り返し、前記ナノスケールの螺旋構造を、前記高分子の表面に二次元的に複数形成する、請求項1記載の有機螺旋構造体の製造方法。
- 前記光渦は、円偏光である請求項1記載の有機螺旋構造体の製造方法。
- 前記光渦の全角運動量Jは0でない請求項1記載の有機螺旋構造体の製造方法。
- 光異性化反応を示す高分子の表面に、ナノスケールの螺旋構造が形成された有機螺旋構造体。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2013100784 | 2013-05-10 | ||
JP2013100784 | 2013-05-10 | ||
PCT/JP2014/062634 WO2014181890A2 (ja) | 2013-05-10 | 2014-05-12 | 有機螺旋構造体の製造方法、及びそれにより製造される有機螺旋構造体 |
Publications (2)
Publication Number | Publication Date |
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JPWO2014181890A1 true JPWO2014181890A1 (ja) | 2017-02-23 |
JP6363069B2 JP6363069B2 (ja) | 2018-07-25 |
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JP2015515918A Active JP6363069B2 (ja) | 2013-05-10 | 2014-05-12 | 有機螺旋構造体の製造方法、及びそれにより製造される有機螺旋構造体 |
Country Status (3)
Country | Link |
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US (1) | US10099921B2 (ja) |
JP (1) | JP6363069B2 (ja) |
WO (1) | WO2014181890A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10603925B2 (en) * | 2015-10-06 | 2020-03-31 | Ricoh Company, Ltd. | Image-forming method, image-forming apparatus, laser irradiation printing ink, and method for manufacturing object with formed image |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2016136722A1 (ja) | 2015-02-25 | 2016-09-01 | 株式会社リコー | 光吸収材飛翔装置及び光吸収材飛翔方法、並びに、それを用いた応用 |
CN109310853A (zh) * | 2016-05-09 | 2019-02-05 | 新信心股份有限公司 | 激光加工方法以及微针的制造方法 |
WO2017199953A1 (ja) * | 2016-05-20 | 2017-11-23 | シャープ株式会社 | 液晶表示パネル、及び、液晶表示装置 |
JP6982817B2 (ja) * | 2016-08-31 | 2021-12-17 | 国立大学法人千葉大学 | キラルマイクロファイバーの製造方法及びこれにより製造されるキラルマイクロファイバー |
TWI651906B (zh) * | 2018-06-08 | 2019-02-21 | 國立中山大學 | 螺旋相位調制共振腔渦旋雷射光產生器及渦旋雷射光的產生方法 |
US20230408635A1 (en) * | 2018-07-16 | 2023-12-21 | Or-Ment Llc | Electromagnetic wave medical imaging system, device and methods |
CN110320672B (zh) * | 2019-07-08 | 2022-05-17 | 南京晶萃光学科技有限公司 | 一种太赫兹涡旋光产生器、制备方法及产生系统 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003039400A (ja) * | 2001-08-03 | 2003-02-13 | Toyota Central Res & Dev Lab Inc | 微細光加工方法、微細光加工品及び光記録媒体 |
JP2004294544A (ja) * | 2003-03-25 | 2004-10-21 | Japan Science & Technology Agency | 光学材料の光誘起表面レリーフ形成を用いた光集積導波路素子 |
WO2005088409A1 (ja) * | 2004-03-12 | 2005-09-22 | Japan Science And Technology Agency | 光導波路型ホログラフィックメモリ |
JP2010247230A (ja) * | 2009-03-27 | 2010-11-04 | Chiba Univ | レーザー加工方法、円偏光光渦レーザービームを用いたレーザー加工方法、針状体を有する部材の製造方法、および針状体を有する部材 |
WO2012169578A2 (ja) * | 2011-06-07 | 2012-12-13 | 国立大学法人 千葉大学 | 光渦レーザー発振方法及び光渦レーザー発振装置 |
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2014
- 2014-05-12 JP JP2015515918A patent/JP6363069B2/ja active Active
- 2014-05-12 WO PCT/JP2014/062634 patent/WO2014181890A2/ja active Application Filing
- 2014-05-12 US US14/890,161 patent/US10099921B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003039400A (ja) * | 2001-08-03 | 2003-02-13 | Toyota Central Res & Dev Lab Inc | 微細光加工方法、微細光加工品及び光記録媒体 |
JP2004294544A (ja) * | 2003-03-25 | 2004-10-21 | Japan Science & Technology Agency | 光学材料の光誘起表面レリーフ形成を用いた光集積導波路素子 |
WO2005088409A1 (ja) * | 2004-03-12 | 2005-09-22 | Japan Science And Technology Agency | 光導波路型ホログラフィックメモリ |
JP2010247230A (ja) * | 2009-03-27 | 2010-11-04 | Chiba Univ | レーザー加工方法、円偏光光渦レーザービームを用いたレーザー加工方法、針状体を有する部材の製造方法、および針状体を有する部材 |
WO2012169578A2 (ja) * | 2011-06-07 | 2012-12-13 | 国立大学法人 千葉大学 | 光渦レーザー発振方法及び光渦レーザー発振装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10603925B2 (en) * | 2015-10-06 | 2020-03-31 | Ricoh Company, Ltd. | Image-forming method, image-forming apparatus, laser irradiation printing ink, and method for manufacturing object with formed image |
Also Published As
Publication number | Publication date |
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WO2014181890A2 (ja) | 2014-11-13 |
WO2014181890A3 (ja) | 2014-12-31 |
US10099921B2 (en) | 2018-10-16 |
US20160107888A1 (en) | 2016-04-21 |
JP6363069B2 (ja) | 2018-07-25 |
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