JPWO2014098200A1 - 基板ホルダ及びこれを用いた全面成膜基板の製造方法 - Google Patents

基板ホルダ及びこれを用いた全面成膜基板の製造方法 Download PDF

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Publication number
JPWO2014098200A1
JPWO2014098200A1 JP2014553214A JP2014553214A JPWO2014098200A1 JP WO2014098200 A1 JPWO2014098200 A1 JP WO2014098200A1 JP 2014553214 A JP2014553214 A JP 2014553214A JP 2014553214 A JP2014553214 A JP 2014553214A JP WO2014098200 A1 JPWO2014098200 A1 JP WO2014098200A1
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JP
Japan
Prior art keywords
substrate
main surface
holder
film
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014553214A
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English (en)
Japanese (ja)
Inventor
英明 宮澤
英明 宮澤
赤尾　安彦
安彦 赤尾
健輔 藤井
健輔 藤井
悟 高木
悟 高木
藤原　晃男
晃男 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of JPWO2014098200A1 publication Critical patent/JPWO2014098200A1/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00—Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • C03C27/06—Joining glass to glass by processes other than fusing
    • C03C27/10—Joining glass to glass by processes other than fusing with the aid of adhesive specially adapted for that purpose

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
JP2014553214A 2012-12-21 2013-12-19 基板ホルダ及びこれを用いた全面成膜基板の製造方法 Pending JPWO2014098200A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012280079 2012-12-21
JP2012280079 2012-12-21
PCT/JP2013/084152 WO2014098200A1 (ja) 2012-12-21 2013-12-19 基板ホルダ及びこれを用いた全面成膜基板の製造方法

Publications (1)

Publication Number Publication Date
JPWO2014098200A1 true JPWO2014098200A1 (ja) 2017-01-12

Family

ID=50978519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014553214A Pending JPWO2014098200A1 (ja) 2012-12-21 2013-12-19 基板ホルダ及びこれを用いた全面成膜基板の製造方法

Country Status (5)

Country Link
JP (1) JPWO2014098200A1 (zh)
KR (1) KR20150099714A (zh)
CN (1) CN104884669A (zh)
TW (1) TW201430160A (zh)
WO (1) WO2014098200A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6796760B2 (ja) * 2016-01-08 2020-12-09 株式会社昭和真空 成膜方法及び成膜装置
CN105734494B (zh) * 2016-04-12 2018-12-25 京东方科技集团股份有限公司 一种蒸镀载板及蒸镀装置
CN111433388B (zh) * 2017-12-14 2023-05-12 日本电气硝子株式会社 基板用保护具以及附膜基板的制造方法
JP7363373B2 (ja) * 2018-11-15 2023-10-18 日本電気硝子株式会社 成膜治具及び成膜方法
JP7159238B2 (ja) * 2020-03-13 2022-10-24 キヤノントッキ株式会社 基板キャリア、成膜装置、及び成膜方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI345285B (en) * 2006-10-06 2011-07-11 Ngk Insulators Ltd Substrate supporting member
JP2008266665A (ja) * 2007-04-16 2008-11-06 Canon Anelva Corp 成膜装置
JP2011018769A (ja) * 2009-07-09 2011-01-27 Shin Etsu Polymer Co Ltd 基板用のサイズ調整治具
JP5562597B2 (ja) * 2009-08-28 2014-07-30 荒川化学工業株式会社 支持体、ガラス基板積層体、支持体付き表示装置用パネル、および表示装置用パネルの製造方法
JP5748088B2 (ja) * 2010-03-25 2015-07-15 日本電気硝子株式会社 ガラス基板の製造方法
JP5760376B2 (ja) * 2010-10-22 2015-08-12 旭硝子株式会社 支持体、ガラス基板積層体、支持体付き表示装置用パネル、オルガノポリシロキサン組成物、および表示装置用パネルの製造方法

Also Published As

Publication number Publication date
TW201430160A (zh) 2014-08-01
WO2014098200A1 (ja) 2014-06-26
CN104884669A (zh) 2015-09-02
KR20150099714A (ko) 2015-09-01

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