JPWO2012105003A1 - 硬質積層被膜 - Google Patents
硬質積層被膜 Download PDFInfo
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- JPWO2012105003A1 JPWO2012105003A1 JP2012555622A JP2012555622A JPWO2012105003A1 JP WO2012105003 A1 JPWO2012105003 A1 JP WO2012105003A1 JP 2012555622 A JP2012555622 A JP 2012555622A JP 2012555622 A JP2012555622 A JP 2012555622A JP WO2012105003 A1 JPWO2012105003 A1 JP WO2012105003A1
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- 238000000576 coating method Methods 0.000 title claims abstract description 111
- 239000011248 coating agent Substances 0.000 title claims abstract description 103
- 150000004767 nitrides Chemical class 0.000 claims abstract description 41
- 239000000463 material Substances 0.000 claims abstract description 35
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims abstract description 21
- 239000000203 mixture Substances 0.000 claims description 13
- 229910045601 alloy Inorganic materials 0.000 abstract description 24
- 239000000956 alloy Substances 0.000 abstract description 24
- 238000003466 welding Methods 0.000 abstract description 14
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 abstract 1
- 229910033181 TiB2 Inorganic materials 0.000 abstract 1
- 238000005520 cutting process Methods 0.000 description 24
- 238000012360 testing method Methods 0.000 description 15
- 238000003475 lamination Methods 0.000 description 11
- 239000007789 gas Substances 0.000 description 8
- 238000007733 ion plating Methods 0.000 description 8
- 238000010030 laminating Methods 0.000 description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 7
- 229910052796 boron Inorganic materials 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000012495 reaction gas Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 5
- 229930195733 hydrocarbon Natural products 0.000 description 5
- 150000002430 hydrocarbons Chemical class 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 229910001069 Ti alloy Inorganic materials 0.000 description 3
- 229910001315 Tool steel Inorganic materials 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 229910001026 inconel Inorganic materials 0.000 description 3
- 239000005001 laminate film Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- -1 borides Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000010730 cutting oil Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910000816 inconels 718 Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/067—Borides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Drilling Tools (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
エンドミル:硬質積層被覆付の超硬合金製2枚刃エンドミル(φ6mm)
被削材:インコネル718(ニッケル基超硬合金の商標)
使用機械:立型マシニングセンタ
切削速度:29m/min
送り速度:0.02mm/刃
切込深さ:0.3mm
切削油:油性
12、62、84:工具母材
20:硬質積層被膜
22:第1被膜
24:第2被膜
60:ボールエンドミル(硬質積層被膜付切削工具)
70:タップ(硬質積層被膜付切削工具)
は、インコネルやチタン合金等の耐熱合金やそれを含む複合材を切削加工する場合でも、耐溶着性、耐摩耗性が十分に得られるようにする硬質積層被膜を提供することにある。
課題を解決するための手段
[0006]
本発明者は、以上の事情を背景として種々の検討を重ねた結果、Ti系の硬質積層被膜中にボロン元素Bを含有させると、高温硬さおよび耐溶着性は改善されるが、耐摩耗性や付着強度が十分に得られない一方で、Ti系の硬質積層被膜を構成する第1被膜および第2被膜の一方にボロン元素Bを含むAlCr合金の炭化物、窒化物、炭酸化物、窒酸化物、炭窒化物、炭酸窒化物を含有させると同時に、他方にボロン元素Bを含有させて、交互に積層すると、耐摩耗性および密着性(付着強度)において好適に改善されることを見い出した。本発明は斯かる知見に基づいて為されたものである。
[0007]
すなわち、第1発明は、(a)組成が相互に異なる2種類の第1被膜および第2被膜が母材の表面上に交互に複数積層された硬質積層被膜であって、(b)前記第1被膜は、(AlaCrbBc)の炭化物、窒化物、炭酸化物、窒酸化物、炭窒化物、または炭酸窒化物であり、(c)前記第2被膜はTiB2であり、(d)前記第1被膜における原子比a、b、cは、a=1−b−cという相互関係であって、0.2≦b≦0.7、0<c≦0.2であり、(e)前記第1被膜の膜厚は、0.1μm以上5.0μm以下であり、(f)前記第2被膜の膜厚は、0.1μm以上5.0μm以下であり、(g)前記硬質積層被膜の総膜厚は、0.2μm以上10.0μm以下であり、(h)前記硬質積層被膜の積層数は、2層以上100層以下であることを特徴とする。
[0008]
[0009]
発明の効果
[0010]
第1発明の硬質積層被膜によれば、(AlaCrbBc)の炭化物、窒化物、炭酸化物、窒酸化物、炭窒化物、または炭酸窒化物である第1被膜と、Ti
B2である第2被膜とが、母材の表面上に交互に積層されることにより硬質積層被膜が構成されており、その第1被膜における(AlaCrbBc)の原子比a、b、cは、a=1−b−cという相互関係にあって、0.2≦b≦0.7、0<c≦0.2であり、前記第1被膜の膜厚は、0.1μm以上5.0μm以下であり、前記第2被膜の膜厚は、0.1μm以上5.0μm以下であり、前記硬質積層被膜の総膜厚は、0.2μm以上10.0μm以下であり、その硬質積層被膜を構成する第1被膜および第2被膜の積層数は、2層以上100層以下であることから、耐摩耗性および耐溶着性において共に満足すべき特性が得られる。
[0011]
[0012]
[0013]
ここで、好適には、前記硬質積層被膜は、エンドミル、タップ、ドリルなどの回転切削工具の少なくとも刃部に適用される他、バイト等の非回転式の切削工具、或いは転造工具など、種々の加工工具の表面に設けられる硬質積層被膜に好適に適用され得るが、半導体装置等の表面保護膜など加工工具以外の部材の表面に設けられる硬質積層被膜にも適用できる。工具母材など硬質積層被膜が設けられる母材の材質としては、超硬合金や高速度工具鋼が好適に用いられるが、他の金属材料であっても良い。
[0014]
また、好適には、前記硬質積層被膜を形成するPVD法(物理蒸着法)としては、アークイオンプレーティング法やスパッタリング法が好適に用いられる。第1被膜および第2被膜の膜厚は、ターゲットに対する投入電力量や回転テーブルの回転速度等により適宜設定することができる。
[0015]
また、好適には、前記第1被膜における(AlaCrbBc)の原子比a、b、cは、a=1−b−cという関係を持ち、原子比bは0.2以上且つ0.7以下の値、原子比cは0より大きく且つ0.2以下の値であれば良く、金属元素の種類や要求特性等に応じて適宜設定できる。原子比bが0.2を下回ったり原子比cが0となったり、原子比bが0.7を上回ったり、原子比
Claims (3)
- 組成が相互に異なる2種類の第1被膜および第2被膜が母材の表面に交互に複数積層された硬質積層被膜であって、
前記第1被膜は、(AlaCrbBc)の炭化物、窒化物、炭酸化物、窒酸化物、炭窒化物,または炭酸窒化物であり、
前記第2被膜はTiB2 である
ことを特徴とする硬質積層被膜。 - 前記第1被膜における原子比a、b、cは、a=1−b−cであって、0.2≦b≦0.7、0<c≦0.2であり、
前記第1被膜の膜厚は、0.1μm以上5.0μm以下であり、
前記第2被膜の膜厚は、0.1μm以上5.0μm以下であり、
前記硬質積層被膜の総膜厚は、0.2μm以上10.0μm以下である
ことを特徴とする請求項1の硬質積層被膜。 - 前記硬質積層被膜の積層数は、2層以上100層以下であることを特徴とする請求項1または2の硬質積層被膜。
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PCT/JP2011/052069 WO2012105003A1 (ja) | 2011-02-01 | 2011-02-01 | 硬質積層被膜 |
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JPWO2012105003A1 true JPWO2012105003A1 (ja) | 2014-07-03 |
JP5651713B2 JP5651713B2 (ja) | 2015-01-14 |
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US (1) | US9109280B2 (ja) |
JP (1) | JP5651713B2 (ja) |
KR (1) | KR101544661B1 (ja) |
CN (1) | CN103339282A (ja) |
DE (1) | DE112011104813B4 (ja) |
WO (1) | WO2012105003A1 (ja) |
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JP5995076B2 (ja) * | 2012-10-24 | 2016-09-21 | 三菱マテリアル株式会社 | 高速断続切削加工で硬質被覆層がすぐれた耐チッピング性を発揮する表面被覆切削工具 |
JP6155204B2 (ja) * | 2014-02-21 | 2017-06-28 | 株式会社神戸製鋼所 | 硬質皮膜およびその形成方法 |
JP6577037B2 (ja) * | 2015-09-04 | 2019-09-18 | オーエスジー株式会社 | 硬質被膜および硬質被膜被覆部材 |
KR102519786B1 (ko) * | 2018-08-01 | 2023-04-10 | 오에스지 가부시키가이샤 | 경질 피막 및 경질 피막 피복 부재 |
CN113981369A (zh) * | 2021-10-28 | 2022-01-28 | 赣州澳克泰工具技术有限公司 | 多层涂层系统及其制备方法 |
CN114231934B (zh) * | 2022-02-21 | 2022-05-10 | 北京航天天美科技有限公司 | 纤维预成型体贮箱支架及其制备方法 |
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JP2003291007A (ja) * | 2002-04-02 | 2003-10-14 | Hitachi Tool Engineering Ltd | 硬質皮膜被覆工具 |
JP2008105106A (ja) * | 2006-10-23 | 2008-05-08 | Mitsubishi Materials Corp | 高速切削加工で硬質被覆層がすぐれた耐摩耗性を発揮する表面被覆切削工具 |
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DE112011104813T5 (de) | 2013-10-31 |
DE112011104813B4 (de) | 2017-02-23 |
KR101544661B1 (ko) | 2015-08-17 |
US9109280B2 (en) | 2015-08-18 |
US20130309469A1 (en) | 2013-11-21 |
WO2012105003A1 (ja) | 2012-08-09 |
JP5651713B2 (ja) | 2015-01-14 |
KR20130121171A (ko) | 2013-11-05 |
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