JPWO2011027830A1 - 光電変換装置、光検出装置、及び光検出方法 - Google Patents
光電変換装置、光検出装置、及び光検出方法 Download PDFInfo
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 122
- 238000000034 method Methods 0.000 title claims description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 128
- 239000002184 metal Substances 0.000 claims abstract description 128
- 239000000758 substrate Substances 0.000 claims abstract description 127
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 40
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 29
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 26
- 238000001514 detection method Methods 0.000 claims abstract description 13
- 239000013078 crystal Substances 0.000 claims abstract description 10
- 230000004888 barrier function Effects 0.000 claims abstract description 7
- 239000010409 thin film Substances 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 claims 5
- 239000012790 adhesive layer Substances 0.000 claims 2
- 239000004408 titanium dioxide Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 19
- 239000010931 gold Substances 0.000 description 15
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 12
- 229910052737 gold Inorganic materials 0.000 description 12
- 238000005259 measurement Methods 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 11
- 235000013980 iron oxide Nutrition 0.000 description 10
- 239000010419 fine particle Substances 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 239000000370 acceptor Substances 0.000 description 7
- 238000010894 electron beam technology Methods 0.000 description 7
- 230000005284 excitation Effects 0.000 description 7
- 230000001965 increasing effect Effects 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 239000002086 nanomaterial Substances 0.000 description 6
- 239000002105 nanoparticle Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000000635 electron micrograph Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- -1 potassium ferricyanide Chemical compound 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- 229910010413 TiO 2 Inorganic materials 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 4
- 230000001976 improved effect Effects 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 230000027756 respiratory electron transport chain Effects 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000001720 action spectrum Methods 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001939 inductive effect Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 239000001103 potassium chloride Substances 0.000 description 3
- 235000011164 potassium chloride Nutrition 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 240000002329 Inga feuillei Species 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 230000036541 health Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
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- 239000010955 niobium Substances 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
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- 239000000126 substance Substances 0.000 description 2
- 239000003115 supporting electrolyte Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000012327 Ruthenium complex Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- GPRSOIDYHMXAGW-UHFFFAOYSA-N cyclopenta-1,3-diene cyclopentanecarboxylic acid iron Chemical compound [CH-]1[CH-][CH-][C-]([CH-]1)C(=O)O.[CH-]1C=CC=C1.[Fe] GPRSOIDYHMXAGW-UHFFFAOYSA-N 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- AXZAYXJCENRGIM-UHFFFAOYSA-J dipotassium;tetrabromoplatinum(2-) Chemical compound [K+].[K+].[Br-].[Br-].[Br-].[Br-].[Pt+2] AXZAYXJCENRGIM-UHFFFAOYSA-J 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010946 fine silver Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000004005 microsphere Substances 0.000 description 1
- 239000002071 nanotube Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 231100000289 photo-effect Toxicity 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 238000007146 photocatalysis Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910001487 potassium perchlorate Inorganic materials 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
- H01G9/2031—Light-sensitive devices comprising an oxide semiconductor electrode comprising titanium oxide, e.g. TiO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2022—Light-sensitive devices characterized by he counter electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/47—Schottky barrier electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Photovoltaic Devices (AREA)
- Hybrid Cells (AREA)
Abstract
Description
「Nakato, Y.; Shioji, M.; Tsubomura, H. “Photoeffects on the Potentials of Thin Metal-Films on a n-TiO2 CrystalWafer - The Mechanism of Semiconductor Photocatalysts.” Chem. Phys. Lett. 1982, 90, 453-456.」;
「Nakato, Y.; Tsubomura, H. “Structures and Functions of Thin Metal Layers on Semiconductor Electrodes.” J. Photochem. 1985, 29, 257-286.」
Claims (6)
- 単結晶酸化チタンを含む基板と、
前記基板の表面上に形成された金属薄膜である密着層と、
前記密着層の表面上に所定の間隔で所定方向に沿って配置された体積が1,000nm3以上3,000,000nm3以下の金属構造体と、
前記基板の表面上の前記金属構造体の配置領域に電解質溶液を収容する容器と、
前記基板の裏面に形成された導電層と、
前記容器内の前記電解質溶液に接触する対電極と、
を備え、
前記金属構造体は、前記密着層を介して前記基板に付着されており、
前記基板の金属構造体との界面には、ショットキーバリアが形成されており、
プラズモン共鳴現象によって赤外領域の光に対して光電変換を行う、
ことを特徴とする光電変換装置。 - 前記対電極は、前記基板の表面上の前記金属構造体に対向するように設けられた平板状の透明電極である、
ことを特徴とする請求項1記載の光電変換装置。 - 前記容器内の前記電解質溶液中に挿入された参照電極をさらに備える、
ことを特徴とする請求項1又は2記載の光電変換装置。 - 前記金属構造体は、前記表面上において第1の方向及び前記第1の方向に垂直な第2の方向に沿って、2次元的に配列されている、
ことを特徴とする請求項1〜3のいずれか1項に記載の光電変換装置。 - 請求項1記載の光電変換装置と、
前記導電層及び前記対電極に接続された電気計測器と、
を備えることを特徴とする光検出装置。 - 所定の間隔で所定方向に沿って体積が1,000nm3以上3,000,000nm3以下の金属構造体が、金属薄膜である密着層を介して付着されることにより配置された単結晶酸化チタンを含む基板の表面上に、電解質溶液を収容した状態で光を照射させるステップと、
前記電解質溶液に接触する対電極と、前記基板の裏面に形成された導電層との間に生成される光電流を検出するステップと、
を備え、
前記基板の金属構造体との界面には、ショットキーバリアが形成されており、
プラズモン共鳴現象によって赤外領域の光に対して光電変換を行う
ことを特徴とする光検出方法。
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JP2011529941A JP5585966B2 (ja) | 2009-09-07 | 2010-09-02 | 光電変換装置、光検出装置、及び光検出方法 |
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JP2010053093 | 2010-03-10 | ||
JP2010053093 | 2010-03-10 | ||
JP2011529941A JP5585966B2 (ja) | 2009-09-07 | 2010-09-02 | 光電変換装置、光検出装置、及び光検出方法 |
PCT/JP2010/065052 WO2011027830A1 (ja) | 2009-09-07 | 2010-09-02 | 光電変換装置、光検出装置、及び光検出方法 |
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JPWO2011027830A1 true JPWO2011027830A1 (ja) | 2013-02-04 |
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US (1) | US9240286B2 (ja) |
JP (1) | JP5585966B2 (ja) |
WO (1) | WO2011027830A1 (ja) |
Families Citing this family (18)
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JP2011115550A (ja) * | 2009-10-26 | 2011-06-16 | Olympus Corp | 血圧センサシステム |
JP6018774B2 (ja) * | 2011-03-31 | 2016-11-02 | 住友化学株式会社 | 金属系粒子集合体 |
JP5979932B2 (ja) * | 2011-03-31 | 2016-08-31 | 住友化学株式会社 | 有機エレクトロルミネッセンス素子 |
JP6085095B2 (ja) * | 2011-03-31 | 2017-02-22 | 住友化学株式会社 | 光学素子 |
JP6125758B2 (ja) * | 2011-03-31 | 2017-05-10 | 住友化学株式会社 | 光学素子 |
US9257662B2 (en) | 2011-10-03 | 2016-02-09 | Sumitomo Chemical Company, Limited | Quantum dot light-emitting device |
JP6373552B2 (ja) * | 2011-10-26 | 2018-08-15 | 住友化学株式会社 | 光電変換素子 |
JPWO2013146268A1 (ja) | 2012-03-27 | 2015-12-10 | 住友化学株式会社 | 無機層発光素子 |
JP6256902B2 (ja) * | 2012-09-06 | 2018-01-10 | 国立大学法人北海道大学 | 光電変換装置及び光電変換装置の製造方法 |
JP6018857B2 (ja) | 2012-09-18 | 2016-11-02 | 住友化学株式会社 | 金属系粒子集合体 |
JP6230039B2 (ja) * | 2013-03-05 | 2017-11-15 | 国立大学法人北海道大学 | 水素発生装置及び水素発生方法 |
JP2014192388A (ja) * | 2013-03-27 | 2014-10-06 | Equos Research Co Ltd | 光電変換素子用部材 |
JP2014192387A (ja) * | 2013-03-27 | 2014-10-06 | Equos Research Co Ltd | 光電変換素子用部材 |
ITCB20130004A1 (it) * | 2013-05-17 | 2014-11-18 | Lucia Nole | Soluzione fotovoltaica |
JP6366287B2 (ja) * | 2014-02-06 | 2018-08-01 | 国立大学法人北海道大学 | アンモニア発生装置及びアンモニア発生方法 |
WO2017130949A1 (ja) * | 2016-01-27 | 2017-08-03 | シャープ株式会社 | 波長変換基板、液晶素子、液晶モジュールおよび液晶表示装置 |
JP7084020B2 (ja) * | 2018-01-19 | 2022-06-14 | 国立大学法人電気通信大学 | 分光用デバイス、分光器、及び分光測定方法 |
JP7445234B2 (ja) * | 2019-02-20 | 2024-03-07 | 国立大学法人横浜国立大学 | 赤外線吸収体および赤外線吸収体を備えるガスセンサ |
Citations (5)
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JPH08264821A (ja) * | 1995-03-27 | 1996-10-11 | Agency Of Ind Science & Technol | 光電変換方法および光電変換素子 |
JPH10340742A (ja) * | 1997-06-05 | 1998-12-22 | Res Dev Corp Of Japan | 光応答電極および湿式太陽電池 |
JP2002231324A (ja) * | 2001-01-30 | 2002-08-16 | Sumitomo Metal Mining Co Ltd | 複合型太陽電池 |
JP2004103521A (ja) * | 2002-09-13 | 2004-04-02 | Sony Corp | 光電変換素子及びその製造方法、並びに光センサ及び太陽電池 |
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KR20030047567A (ko) * | 2001-12-11 | 2003-06-18 | 한국전자통신연구원 | 표면 플라즈몬 공명 센서 시스템 |
US7776425B2 (en) * | 2003-01-21 | 2010-08-17 | The Penn State Research Foundation | Nanoparticle coated nanostructured surfaces for detection, catalysis and device applications |
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JPH08264821A (ja) * | 1995-03-27 | 1996-10-11 | Agency Of Ind Science & Technol | 光電変換方法および光電変換素子 |
JPH10340742A (ja) * | 1997-06-05 | 1998-12-22 | Res Dev Corp Of Japan | 光応答電極および湿式太陽電池 |
JP2002231324A (ja) * | 2001-01-30 | 2002-08-16 | Sumitomo Metal Mining Co Ltd | 複合型太陽電池 |
JP2004103521A (ja) * | 2002-09-13 | 2004-04-02 | Sony Corp | 光電変換素子及びその製造方法、並びに光センサ及び太陽電池 |
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US20120325301A1 (en) | 2012-12-27 |
JP5585966B2 (ja) | 2014-09-10 |
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