JPWO2009037776A1 - Hard laminate coating, hard laminate coating tool, and method for forming coating - Google Patents

Abstract

As shown in FIG. 1, the hard laminated film 20 provided on the blade portion 14 of the end mill 10 includes a first film 22 made of AlxCr1-x-yYy (BaCbOcN1-abc) and M (BdCeOfN1-def). ), And a plurality of second coatings 24 are alternately laminated with a lamination period t in the range of 0.2 nm to 100 nm. According to such a hard laminated coating 20, the coating hardness is However, it becomes very hard, for example, about 3000 to 3500 at HV0.025, and excellent wear resistance (durability) can be obtained even when cutting a hard material such as SKD11 (60HRC).

Description

  The present invention relates to a hard laminated film, and more particularly to improvement of a hard laminated film having excellent wear resistance in which a large number of two kinds of films having different compositions are alternately laminated.

Various wear layers of first and second coatings having different compositions, which are laminated on the surface of a predetermined member such as a tool base material such as high-speed tool steel or cemented carbide. Hard laminate coatings have been proposed. The hard laminated film described in Patent Documents 1 and 2 is an example, and there are two kinds of films made of a metal element of group IVa, Va, VIa in the periodic table of elements, or a nitride or carbide such as Al. The layers are repeatedly stacked with a stacking period of about several nm to several hundred nm. That is, the coating hardness and wear resistance are improved by various means such as thinning and multilayering of the first coating and the second coating, and alloying of metal elements.
JP-A-7-205361 Japanese Patent Laid-Open No. 2005-256081

  However, even in such a hard laminated film, it is difficult to obtain a very hard film having a film hardness of, for example, about 3,000 at HV 0.025, and a hard laminated film that cuts a hard material such as hardened steel. In the case of a coated tool, there is still room for improvement, such as a sufficiently satisfactory wear resistance (durability) cannot be obtained.

  The present invention has been made against the background of the above circumstances, and the object of the present invention is to further improve the hardness of a hard laminated film in which a large number of two kinds of films containing metal elements are alternately laminated. An object is to obtain excellent wear resistance for the material.

In order to achieve such an object, the first invention is a hard laminated film having excellent wear resistance in which a large number of two kinds of first and second films having different compositions are alternately laminated on the surface of a predetermined member. there are, (a) the first _{coating, (Al x Cr 1-xy} Y y) (B a C b O c N 1-abc) [where, x, y, a, b , c respectively atomic ratios In the range of 0.3 ≦ x ≦ 0.8, 0 <y ≦ 0.10, 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0.1] The second film is formed by PVD method using Al _x Cr _1-xy Y _y as a target, while (b) the second film is M (B _{d CeO f} N _1-def ) [where M is In the periodic table of elements, a single element metal selected from groups IVa, Va, VIa, Al, Si, and Y or an alloy composed of two or more metal elements, d, e, and f are atomic ratios, respectively. And 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, 0 ≦ f ≦ 0.1], and formed by PVD method using M as a target, and (c) The lamination period t, which is the sum of the thickness of the first coating and the thickness of the second coating, is in the range of 0.2 nm to 100 nm.

  According to a second invention, in the hard laminated film of the first invention, the total film thickness D of the hard laminated film in which the first film and the second film are repeatedly laminated at the lamination period t is in the range of 0.2 μm to 10 μm. It is characterized by being within.

  A third invention is characterized in that in the hard laminated film of the first invention or the second invention, the component compositions of the BCON in the first film and the second film are equal to each other.

  4th invention is related with the hard laminated film coating tool, The surface is coat | covered with the hard laminated film in any one of 1st invention-3rd invention, It is characterized by the above-mentioned.

5th invention is a film formation method which forms the hard laminated film as described in 3rd invention in a predetermined member by PVD method, Comprising: (a) Holding the said member in the outer peripheral part in a predetermined processing container A rotary table that is driven to rotate around one center line; and (b) a first target composed of the Al _x Cr _1-xy Y _y and spaced apart from each other in the circumferential direction around the rotary table and the M And (c) a reaction gas supply device that supplies a predetermined reaction gas determined in accordance with the component composition of the BCON into the processing container. ) By continuously rotating the rotary table in one direction around the one center line, the member can be periodically passed in front of the first target and the second target while the reaction gas is passed through the reaction gas. Inside the processing container Supplies, by evaporating each of the Al _x Cr _1-xy Y _y and the M from the first target and the second target, and the Al _x Cr _1-xy Y each said reaction gas _y and M When the member passes in front of the first target, the first film is formed on the surface of the member, and when the member passes in front of the second target, the second film is formed on the surface of the member. Thus, the first coating and the second coating are alternately and continuously laminated on the surface of the member.

Hard multilayer coating of the first _{invention, (Al x Cr 1-xy} Y y) and the first coating are composed of _{(B a C b O c N} 1-abc), M (B d C e O f N _1-def ) and a plurality of second coatings alternately laminated at a lamination period t in the range of 0.2 nm to 100 nm. According to such a hard laminated coating, A very hard material having a hardness of, for example, HV 0.025 and about 3000 to 3500 is obtained. As a result, excellent wear resistance (durability) can be obtained even in a hard laminated film-coated tool that performs cutting on a hard material such as hardened steel.

  In the hard laminated film coated tool of the fourth invention coated with the hard laminated film, and the film forming method of the fifth invention for forming a hard laminated film having the same BCON component composition, substantially the same functions and effects as described above. Is obtained. In the fifth aspect of the invention, the first coating and the second coating are alternately and continuously laminated by continuously rotating the member around one center line by the rotary table, so that the hard laminated coating can be efficiently formed in a short time. Can do.

  In the 2nd invention, since the total film thickness D of a hard laminated film exists in the range of 0.2 micrometer-10 micrometers, the outstanding abrasion resistance is obtained, suppressing peeling of a film. In the third invention, since the BCON component compositions of the first film and the second film are equal to each other, there is no need to switch the reaction gas for each film. For example, by using the film forming method of the fifth invention, A hard laminated film can be formed efficiently.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the end mill to which this invention was applied, (a) is the front view seen from the direction orthogonal to an axial center, (b) is sectional drawing of the surface part of the blade part provided with the hard laminated film. It is a figure explaining an example of the arc ion plating apparatus which can form the hard laminated film of FIG. 1 suitably by PVD method, (a) is a schematic block diagram, (b) is a top view which shows the positional relationship of a rotary table and a target. It is. It is a figure which shows the result of having investigated the specific example of the hard laminated film of this invention, and flank wear width (wear resistance) by cutting on predetermined process conditions. Results of investigation of flank wear width (wear resistance) by performing cutting under the same processing conditions as in FIG. 3 for the comparative example in which the atomic ratio and lamination period of the first coating and the second coating are different from the present invention. FIG.

Explanation of symbols

  10: End mill (hard laminated coating coated tool) 12: Tool base material (predetermined member) 20: Hard laminated coating 22: First coating 24: Second coating 30: Arc ion plating apparatus (film forming apparatus) 32: First 1 rotation table (rotation table) 38: chamber (processing vessel) 40: reaction gas supply device 48: first target 52: second target O: one center line

  INDUSTRIAL APPLICABILITY The present invention is suitably applied to hard laminated coatings provided on the surface of various processing tools such as rotating tools such as end mills, taps, and drills, non-rotating cutting tools such as cutting tools, and rolling tools. However, the present invention can also be applied to a hard laminated film provided on the surface of a member other than a processing tool such as a surface protective film of a semiconductor device or the like. As a material of a member provided with a hard laminated film such as a tool base material, cemented carbide or high-speed tool steel is preferably used, but other metal materials may be used.

  As the PVD method (physical vapor deposition method) for forming the hard laminated film of the present invention, an arc ion plating method or a sputtering method is preferably used. The film thicknesses of the first coating and the second coating can be appropriately set depending on the amount of input power to the target, the rotation speed of the rotary table, and the like.

The atomic ratio x, y of Al _x Cr _1-xy Y _y in the first coating can be appropriately set in accordance with required characteristics and the like within the range of 0.3 ≦ x ≦ 0.8 and 0 <y ≦ 0.10. . M of the second coating is, for example, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, or a metal composed of one element in Al, Si, Y, or two or more metals An alloy composed of elements, such as TiAl, TiSi, TiCr, TiY, TiZr, TiV, TiAlCr, TiAlY, AlCr, AlSi, CrV, and CrN. The atomic ratio of these alloys is appropriately set, and in the case of an alloy of two kinds of metal elements, for example, about 0.5. The second film has a composition different from that of the first film, and M or an alloy or metal other than AlCrY is employed.

  BCON in the first coating and the second coating is 1 as a whole and contains at least N (nitrogen) of 0.4 or more, B (boron) is 0.2 or less, C (carbon) is 0.3 or less, O (Oxygen) can be contained at 0.1 or less, and only N (nitrogen) may be contained.

  In the third invention, the component compositions of BCON in the first film and the second film are the same, that is, the atomic ratios a = d, b = e, and c = f. They are not necessarily the same, and can be set separately. In addition to BCON, inevitable impurity elements and other elements that do not affect properties may be included.

  If the stacking period t, which is the sum of the thickness of the first coating and the thickness of the second coating, is less than 0.2 nm, the characteristics inherent to the coating (hardness, heat resistance, oxidation resistance, lubricity, etc.) are sufficiently obtained. If it is thicker than 100 nm, the effect of improving the film hardness by thinning may not be obtained sufficiently, so it is necessary to set the thickness within the range of 0.2 nm to 100 nm. In consideration of variations (errors), it is desirable to form a range of 0.5 nm to 50 nm as a nerai value. In addition, since the film thickness of each film varies for each film or partially, the stacking period t may be such that the average film thickness is within the above range.

  Either the first coating or the second coating may be formed on the surface of the member (tool base material or the like) first, and it is desirable to provide the one having excellent adhesion according to the composition of the coating first. However, it can be formed without any particular limitation. In addition, the first film and the second film are laminated as a pair, but the total number of layers can be an odd number, and when the first film is formed first, the uppermost layer is also the first film, When the second film is formed first, the uppermost layer may also be the second film. In addition, it is also possible to interpose another hard film between the hard laminated film of this invention and the member surface, and to provide another film in the uppermost layer as needed. Even when the hard laminated film is composed of only the first film and the second film, the lowermost layer or the uppermost layer in contact with the surface of the tool base material is regarded as a film different from the laminated film, and these films are formed. It is also possible to increase or decrease the thickness regardless of the stacking period t.

  The total film thickness D of the hard laminated film varies depending on the object (member) on which the film is provided and the required characteristics. For example, when receiving a relatively large impact load such as a rotary cutting tool, 10 μm or less is desirable, and 0.2 μm or more is desirable for ensuring sufficient wear resistance. In the case where the impact load such as a sliding member is hardly received, the total film thickness D can be larger than 10 μm, for example, about 20 μm.

  In the fifth aspect of the invention, the member is held on the outer peripheral portion of the rotary table that is rotated around one center line, and the rotary table is continuously rotated in one direction, so that the rotary table is disposed at a fixed position around the rotary table. The members are alternately and periodically passed in front of the first target and the second target, and the first film and the second film are alternately and continuously stacked. However, other film forming methods may be employed. . For example, the rotary table may be intermittently rotated while being stopped in the vicinity of the target, the first target and the second target may be moved with respect to a member held at a fixed position, etc. Various embodiments are possible. In addition, when the BCON component composition of the first coating and the second coating is different, the reaction gas is switched or the target to be evaporated is switched for each of the first coating and the second coating. It is also possible to laminate them separately and intermittently.

  In the fifth aspect of the invention, the rotary table is continuously rotated in one direction, and it is desirable to drive the rotary table at a constant speed for ease of control, but it corresponds to the arrangement positions of the first target and the second target. Thus, the rotational speed can be periodically increased or decreased.

  The rotary table may hold a member directly in a constant posture on the outer peripheral portion thereof, but has a second rotary table that rotates around a second center line different from the one center line. If the film is formed while the member is held by the rotary table 2 and continuously rotated around the second center line, the film can be uniformly formed on the outer peripheral surface of the member. For example, when the member is a tool base material of a rotary cutting tool, the tool base material is attached to the second rotary table in a posture in which the axis center of the tool base material is concentric or parallel to the second center line. It is desirable to form the coating while continuously rotating the tool base material around the center line. For example, the second rotary table is arranged in a posture in which the second center line is parallel to the one center line, but can be arranged in a posture orthogonal to the one center line. Is possible.

  Further, the first target and the second target are disposed one by one at a symmetric position with respect to one center line of the rotary table, for example, but may be disposed at a position shifted from the symmetric position, or one center. Various modes are possible, for example, two lines can be alternately arranged around the line at intervals of 90 °, or three or more can be arranged.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a view for explaining an end mill 10 which is an example of a hard laminated coating-coated tool according to the present invention. FIG. 1 (a) is a front view seen from a direction perpendicular to the axis, and is made of cemented carbide. The tool base 12 is integrally provided with a shank and a blade 14. The blade portion 14 is provided with an outer peripheral blade 16 and a bottom blade 18 as cutting blades, and is driven to rotate by the outer peripheral blade 16 and the bottom blade 18 by being rotated around the axis, A hard laminated film 20 is coated on the surface of the blade portion 14. The shaded area in FIG. 1 (a) represents the hard laminated film 20, and FIG. 1 (b) is a cross-sectional view of the surface portion of the blade portion 14 coated with the hard laminated film 20. The end mill 10 is a rotary cutting tool, and the tool base material 12 corresponds to a predetermined member on which the hard multilayer coating 20 is provided.

As is clear from FIG. 1 (b), the hard laminated film 20 is obtained by alternately laminating a large number of first films 22 and second films 24 on the surface of the tool base material 12. The first coating 22 is made of Al _x Cr _1-xy Y _y (B _{a Cb} O _c N _1-abc ) [where x, y, a, b, c are atomic ratios, and 0.3 ≦ x ≦ 0.8, 0 <y ≦ 0.10, 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0.1], and the second coating 24 _{is, M (B d C e O} f N 1-def) [where, M is a group IVa of the periodic table of the elements, Va group, VIa group, Al, Si, and a single element of a metal selected from Y Or an alloy composed of two or more kinds of metal elements, d, e, and f are atomic ratios within the range of 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, and 0 ≦ f ≦ 0.1. Configured. Further, the lamination period t of the thickness of the first coating 22 and the thickness of the second coating 24 is in the range of 0.2 nm to 100 nm, and the total thickness D of the hard laminated coating 20 is 0.2 μm to 10 μm. Within range. Note that the number of stacks in which the stacking period t is one layer is appropriately determined according to the stacking period t and the total film thickness D, and is, for example, in the range of 10 to 1000 layers.

The atomic ratio x, y of Al _x Cr _1-xy Y _y in the first coating film 22 is appropriately in the range of 0.3 ≦ x ≦ 0.8 and 0 <y ≦ 0.10 depending on the required characteristics and the like. Is set. M of the second coating 24 is, for example, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, or a metal composed of one kind of element such as Al, Si, Y, or two or more kinds. For example, TiAl, TiSi, TiCr, TiY, TiZr, TiV, TiAlCr, TiAlY, AlCr, AlSi, CrV, CrN or the like is used as the alloy. The atomic ratio of these alloys is appropriately set, and in the case of an alloy of two kinds of metal elements, for example, about 0.5. The second coating 24 has a composition different from that of the first coating 22, and an alloy or metal other than AlCrY is adopted as M. The test products No. 1, No. 6, No. 11, No. 15, and No. 24 in the example of FIG. 3 are cases where M of the second coating 24 is a metal composed of a single element, and other test products No. 2 to No. 5, No. 7 to No. 10, and No. 12 -No14 and No16-No23 are cases where M of the second coating 24 is an alloy composed of two or more kinds of metal elements.

  The BCON of both coatings 22, 24 includes at least N (nitrogen) of 0.4 or more as a whole, B (boron) is 0.2 or less, C (carbon) is 0.3 or less, O (oxygen) ) Is 0.1 or less, each of which can be contained, and only N (nitrogen) may be used. Further, the component compositions of BCON in the first coating 22 and the second coating 24 may be the same, that is, the atomic ratios a = d, b = e, and c = f, but can also be set separately. In addition to BCON, unavoidable impurity elements and other elements that do not affect properties may be included. The test products No1 to No9 and No21 in the example of FIG. 3 are cases in which the BCON component compositions of both coatings 22 and 24 are equal to each other.

  FIG. 2 is a diagram for explaining an arc ion plating apparatus 30 that is preferably used for forming the hard laminated film 20, wherein (a) is a schematic configuration diagram (schematic diagram) and is a cross-sectional view taken along line AA in (b). (B) is a plan view. The arc ion plating apparatus 30 includes a first rotary table 32 that is substantially horizontal, a rotary drive device 33 that rotationally drives the first rotary table 32 around a substantially vertical center line O, and an outer peripheral portion of the first rotary table 32. 2 (four in FIG. 2 (b)) and a second tool holder 12 holding the tool base material 12 on which a large number of workpieces, that is, the cutting edges 16 and 18 before coating the hard laminated coating 20, are formed. A predetermined reaction gas is supplied to the rotary table 34, a bias power source 36 for applying a negative bias voltage to the tool base material 12, a chamber 38 as a processing container in which the tool base material 12 and the like are accommodated, and a chamber 38. A reaction gas supply device 40, an exhaust device 42 that exhausts the gas in the chamber 38 with a vacuum pump or the like to reduce the pressure, a first arc power source 44, a second arc power source 46, and the like are provided. The arc ion plating apparatus 30 corresponds to a film forming apparatus. In FIG. 2B, the tool base material 12 attached to the second rotary table 34 is omitted.

  The second turntable 34 is disposed in parallel with the first turntable 32 and is rotated around its own center line (second center line) parallel to one center line O of the first turn table 32. In addition, the plurality of tool base materials 12 are held in a vertical posture in which the axis is parallel to the second center line and the blade portion 14 faces upward. Therefore, the plurality of tool base materials 12 are rotationally driven around one center line O by the first rotary table 32 while being rotationally driven around the center line (second center line) of the second rotary table 34. Become. Around the first turntable 32, the first target 48 and the second target 52 are disposed at fixed positions at two positions symmetrical with respect to the one center line O, respectively. Due to the rotation, the tool base material 12 is alternately and periodically passed in front of the first target 48 and the second target 52 together with the second rotary table 34. The plurality of second rotary tables 34 are configured to be independently driven to rotate by, for example, a unique rotary drive device, but mechanically rotate in conjunction with the rotation of the first rotary table 32 by a gear mechanism or the like. It can also be driven.

The reaction gas supply device 40 includes a tank of nitrogen gas (N ₂ ), hydrocarbon gas (CH ₄ , C ₂ H _2, etc.), oxygen gas (O ₂ ), etc. Depending on the composition of the coating 24, for example, in the case of nitride, only nitrogen gas is supplied, and in the case of carbonitride, nitrogen gas and hydrocarbon gas are supplied according to the atomic ratios a to f. In the case of forming other compounds such as oxynitride and boronitride, a predetermined reaction gas may be supplied in the same manner.

The first target 48 is made of an Al _x Cr _1-xy Y _y alloy that is a constituent material of the first coating 22, while the second target 52 is a single material that is a constituent material of the second coating 24. It is composed of elemental M metal or M alloy. The first arc power supply 44 applies an arc current between the first target 48 as a cathode and the anode 50 to cause arc discharge, thereby causing Al _x Cr _1-xy Y from the first target 48. _{The y} alloy is evaporated, and the evaporated Al _x Cr _1-xy Y _y alloy becomes positive (+) metal ions and adheres to the tool base 12 to which a negative (−) bias voltage is applied. At that time, it reacts with supplied reaction gas, the _{Al x Cr 1-xy Y y} (B a C b O c N 1-abc) first coat 22 made of is formed. The second arc power source 46 evaporates M metal or M alloy from the second target 52 by passing a predetermined arc current between the anode 54 and the anode 54 using the second target 52 as a cathode. Thus, the evaporated M metal or M alloy becomes positive (+) metal ions and adheres to the tool base material 12 to which a negative (−) bias voltage is applied. At that time, it reacts with supplied reaction gas, the _{M (B d C e O f} N 1-def) second film 24 made of is formed.

  When the hard laminated film 20 is formed on the surface of the blade portion 14 of the tool base material 12 using such an arc ion plating apparatus 30, the inside of the chamber 38 is evacuated by the exhaust apparatus 42 in advance with a predetermined pressure ( For example, a predetermined reaction gas is supplied from the reaction gas supply device 40 so as to be maintained at 1.33 Pa to 3.99 Pa, and a predetermined bias voltage (for example, −50 V to −−) is applied to the tool base material 12 by the bias power source 36. About 150V) is applied. In addition, the tool base material 12 is rotated at a constant speed in one direction around the center line O while the second turn table 34 is driven to rotate around the center line. At the same time, while rotating around the second center line, the first target 48 and the front of the second target 52 are alternately and periodically passed.

On the other hand, for example, when the BCON component compositions in the first coating 22 and the second coating 24 are equal to each other, that is, in the case where the atomic ratios a = d, b = e, and c = f (the test product No. 1 in the example of FIG. 3). To No. 9 and No. 21), when a predetermined reaction gas is supplied from the reaction gas supply device 40 according to its component composition, and the first target 48 is evaporated by supplying an arc current from the first arc power supply 44. At the same time, an arc current is applied by the second arc power source 46 to evaporate the second target 52. As a result, the evaporated metals of the targets 48 and 52 react with the reaction gas, respectively, to form the first coating 22 and the second coating 24, and are attached to the surface of the tool base material 12. Specifically, tool substrate 12 as it passes in front of the first target _{48, Al x Cr 1-xy Y} y (B a C b O c N 1-abc) first coat 22 made of the attached to a surface of the tool substrate 12, when passing in front of the second target _{52, M (B d C e O} f N 1-def) second membrane 24 is the surface of the tool substrate 12 consisting of It is made to adhere to. As a result, the first coating 22 and the second coating 24 are alternately and continuously laminated on the surface of the tool base material 12 to form the hard laminated coating 20. In the present embodiment, since the first target 48 and the second target 52 are arranged one by one around the first turntable 32, the first coat 22 and the second coat are made by one rotation of the first turntable 32. 24 are stacked for one period. The current value of the arc current of each arc power supply 44, 46 is determined according to the film thickness of the first coating 22 and the second coating 24, and the rotation speed of the first rotary table 32 is determined by the first coating 22 and the second coating. It is determined according to the stacking period t in which the film thicknesses of 24 are combined. Such a hard laminated film 20 can be automatically formed by a control device including a computer.

  When the first arc power supply 44 and the second arc power supply 46 are simultaneously turned ON, the tool base material 12 in which the film forming process is started in the vicinity of the first target 48 is formed first from the first film 22. The tool base material 12 in which the coating forming process is started in the vicinity of the second target 52 is formed first from the second coating 24, but by delaying the OFF → ON switching of the second arc power source 46, The first base film 22 may be formed first with respect to the tool base material 12. Conversely, by delaying the switching of the first arc power supply 44 from OFF to ON, the second coating 24 can be formed first on all the tool base materials 12.

  Further, when the BCON component composition of the first coating 22 and the second coating 24 is different (the test products No10 to No20 and No22 to No24 in the example of FIG. 3), the first coating 22 and the second coating 24 are separately provided. It is necessary to form the first target 48 and the second target 52 by switching the reaction gas supplied from the reaction gas supply device 40, or turning on and off the first arc power supply 44 and the second arc power supply 46, respectively. It will be switched.

Next, the present invention product in which the tool base material 12 is made of a cemented carbide, has a diameter of 10 mm, and a 6-blade square end mill is provided with the hard laminated film 20, and the film composition and lamination period t of the films 22 and 24. A comparative product having a different diameter is prepared, and the results of cutting the flank wear width (mm) of the outer peripheral blade 16 after cutting 25 m after cutting under the following processing conditions will be described. 3 and 4 are diagrams showing the measurement results, and the flank wear width (mm) is an average value of the six outer peripheral blades 16. 3 and 4, the decimal numbers after the element symbol such as “Al” in the column of the first film and the second film are the atomic ratios x, y, and a to f. The allowable wear width here is 0.150 mm. In addition, since it is not always easy to measure the film hardness (HV 0.025), only a part of the laminated film was examined, and the measurement was omitted for those not described.
(Processing conditions)
-Work material type: SKD11 (60HRC)
・ Processing method: Side cutting (down cut)
・ Cutting speed: 150 m / min (4800 min ⁻¹ )
・ Feeding speed: 0.03mm / t (860mm / min)
・ Incision: aa = 10 mm, ar = 0.5 mm
・ Cutting fluid: Air blow ・ Used machine: Vertical machining center

  FIG. 3 is a product of the present invention, and the flank wear width is within an allowable range (0.150 mm). On the other hand, FIG. 4 is a comparative example in which the atomic ratio x, y or a to f of the first coating 22 and the second coating 24, or the lamination period t is outside the scope of the present invention (Claim 1). The columns with scattered points are items different from the present invention, and in all cases, the flank wear width exceeds the allowable range (0.150 mm), and sufficient wear resistance cannot be obtained.

Thus, hard multilayer coating 20 of the end mill 10 of this embodiment includes a first coat 22, which are composed of _{(Al x Cr 1-xy Y} y) (B a C b O c N 1-abc) , in which the second membrane 24 are composed of _{M (B d C e O f} N 1-def) were numerous stacked alternately in lamination period t in the range of 0.2 nm to 100 nm, the According to the hard laminated coating 20 as described above, the coating hardness is very hard, for example, about 3000 to 3500 at HV 0.025, and excellent resistance to cutting even when a hard material such as SKD11 (60HRC) is cut. Abrasion (durability) is obtained.

  Moreover, in this example, since the total film thickness D of the hard laminated film 20 is in the range of 0.2 μm to 10 μm, excellent wear resistance is obtained while suppressing the peeling of the hard laminated film 20.

  Also, in the example of FIG. 3, the test products No1 to No9 and No21 have the same BCON component composition of the first coating 22 and the second coating 24, so there is no need to switch the reaction gas for each coating. By using the arc ion plating apparatus 30 of 2, the hard laminated film 20 can be efficiently formed in a short time.

  Further, according to the arc ion plating apparatus 30 of FIG. 2, the first coating 22 and the second coating 24 can be alternately and continuously laminated while continuously rotating the first rotary table 32 at a constant speed in one direction. The hard laminated film 20 can be efficiently formed in a short time.

  Further, since the tool base 12 is driven to rotate about the center line parallel to the axis by the second rotary table 34, the first rotary table 32 passes the front of the first target 48 and the second target 52. The hard laminated coating 20 is uniformly formed on the outer peripheral surface of the base material 12, and excellent coating performance can be obtained stably.

  As mentioned above, although the Example of this invention was described in detail based on drawing, these are one embodiment to the last, and this invention is implemented in the aspect which added the various change and improvement based on the knowledge of those skilled in the art. be able to.

Hard multilayer coating of the present _{invention, (Al x Cr 1-xy} Y y) and the first coating are composed of _{(B a C b O c N} 1-abc), M (B d C e O f N _1-def ) is formed by alternately laminating a large number of the second coatings having a stacking period t in the range of 0.2 nm to 100 nm, and the coating hardness is 3000 to 3500 at HV0.025, for example. It becomes extremely hard and excellent wear resistance (durability) can be obtained, and it is suitably used as a hard laminated coating for a rotary cutting tool or the like for cutting hard materials such as hardened steel.

[0002]
[0005]
In order to achieve such an object, the first invention is a hard laminated film having excellent wear resistance in which a large number of two kinds of first and second films having different compositions are alternately laminated on the surface of a predetermined member. there, (a) the first _{coating, (Al x Cr 1-x} -y Y y) (B a C b O c N 1-a-b-c) [where, x, y, a, b , C are atomic ratios of 0.3 ≦ x ≦ 0.8, 0 <y ≦ 0.10, 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0.1 And (b) the second film is formed of M (B _d C _{e OfN 1} ) while being formed by the PVD method using the Al _x Cr _1-xy Y _y as a target. _-d-e-f) [where, M is a group IVa of the periodic table of the elements, Va group, VIa group, Al, Si, and single elemental metal or 2 species selected from Y Alloys other than AlCrY composed of the above metal elements, d, e, and f are atomic ratios within the range of 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, and 0 ≦ f ≦ 0.1. And is formed by the PVD method using M as a target, and (c) the stacking period t of the thickness of the first coating and the thickness of the second coating is in the range of 0.2 nm to 100 nm. It is characterized by being within.
The second invention is a hard laminated film excellent in wear resistance, in which a large number of two kinds of first films and second films having different compositions are alternately laminated on the surface of a predetermined member. 1 _{coating, (Al x Cr 1-x} -y Y y) (B a C b O c N 1-a-b-c) [where, x, y, a, b, c are respectively atomic ratios, 0.3 ≦ x ≦ 0.8, 0 <y ≦ 0.10, 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0.1] While the Al _x Cr _1-xy Y _y is used as a target and formed by the PVD method, (b) the second coating is M (B _d C _{e OfN 1-d-ef} ) [ Where M is a single element metal selected from groups IVa, Va, VIa, Al, and Si of the periodic table of elements or an alloy composed of two or more metal elements, d e and f are atomic ratios of 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, and 0 ≦ f ≦ 0.1, respectively, and are formed by PVD using M as a target. And (c) the stacking period t, which is the sum of the thickness of the first coating and the thickness of the second coating, is in the range of 0.2 nm to 100 nm.
[0006]
According to a third invention, in the hard laminated film of the first invention or the second invention, the total film thickness D of the hard laminated film in which the first film and the second film are repeatedly laminated at the lamination period t is 0.2 μm. It is in the range of 10 μm.
[0007]
A fourth invention is characterized in that in the hard laminated coating of any one of the first to third inventions, the component compositions of the BCON in the first coating and the second coating are equal to each other.
[0008]
5th invention is related with the hard laminated film coating tool, The surface is coat | covered with the hard laminated film in any one of 1st invention-4th invention, It is characterized by the above-mentioned.
[0009]
A sixth invention is a film forming method for forming the hard laminated film according to the fourth invention on a predetermined member by a PVD method, and (a) holding the member on the outer periphery in a predetermined processing container. A rotary table that is driven to rotate around one center line, and (b) a first target composed of the Al _x Cr _1-xy Y _y disposed around the rotary table and spaced apart from each other in the circumferential direction; Using a film forming apparatus comprising: a second target composed of M; and (c) a reaction gas supply device that supplies a predetermined reaction gas determined according to the component composition of the BCON into the processing container. (D) By continuously rotating the rotary table in one direction around the one center line, the member can be alternately passed periodically in front of the first target and the second target, The response gas is supplied into the processing chamber, each contact the _{Al x Cr 1-x-y} Y y from the first target and the second target

[0003]
And by evaporating M, the Al _x Cr _1-xy Y _y and M react with the reaction gas, respectively, and when the member passes in front of the first target, When the first coating is formed and passes in front of the second target, the second coating is formed on the surface of the member, whereby the first coating and the second coating are alternately continuously formed on the surface of the member. It is characterized by laminating.
Effects of the Invention [0010]
Hard multilayer coating of the first invention and the second _{invention, (Al x Cr 1-x} -y Y y) (B a C b O c N 1-a-b-c) first coating are composed of If _a second coating is configured by _{M (B d C e O f} N 1-d-e-f) were numerous stacked alternately in lamination period t in the range of 0.2nm~100nm Therefore, according to such a hard laminated film, a very hard film having a film hardness of, for example, HV 0.025 and about 3000 to 3500 can be obtained. As a result, excellent wear resistance (durability) can be obtained even in a hard laminated film-coated tool that performs cutting on a hard material such as hardened steel.
[0011]
In the hard laminated film-coated tool of the fifth invention coated with the hard laminated film and the film forming method of the sixth invention for forming a hard laminated film having the same BCON component composition, substantially the same effects as described above. Is obtained. In the sixth aspect of the invention, the first coating and the second coating are alternately and continuously laminated by continuously rotating the member around one center line by the rotary table, so that the hard laminated coating can be efficiently formed in a short time. Can do.
[0012]
In 3rd invention, since the total film thickness D of a hard laminated film exists in the range of 0.2 micrometer-10 micrometers, the outstanding abrasion resistance is obtained, suppressing peeling of a film. In the fourth invention, since the BCON component compositions of the first film and the second film are equal to each other, there is no need to switch the reaction gas for each film. For example, by using the film forming method of the sixth invention, A hard laminated film can be formed efficiently.
BRIEF DESCRIPTION OF THE DRAWINGS [0013]
FIG. 1 is a view showing an end mill to which the present invention is applied, where (a) is a front view seen from a direction perpendicular to the shaft center, and (b) is a cross-sectional view of a surface portion of a blade portion provided with a hard laminated coating. It is.
FIG. 2 is a diagram for explaining an example of an arc ion plating apparatus that can suitably form the hard laminated coating of FIG. 1 by the PVD method, wherein (a) is a schematic configuration diagram, and (b) is a rotary table and a table.

[0005]
The atomic ratio of such an alloy is appropriately set, and in the case of an alloy of two kinds of metal elements, for example, about 0.5. The second film has a composition different from that of the first film, and M or an alloy or metal other than AlCrY is employed.
[0018]
BCON in the first coating and the second coating is 1 as a whole and contains at least N (nitrogen) of 0.4 or more, B (boron) is 0.2 or less, C (carbon) is 0.3 or less, O (Oxygen) can be contained at 0.1 or less, and only N (nitrogen) may be contained.
[0019]
In the fourth invention, the component compositions of BCON in the first film and the second film are the same, that is, the atomic ratios a = d, b = e, and c = f. They are not necessarily the same, and can be set separately. In addition to BCON, inevitable impurity elements and other elements that do not affect properties may be included.
[0020]
If the stacking period t, which is the sum of the thickness of the first coating and the thickness of the second coating, is less than 0.2 nm, the characteristics inherent to the coating (hardness, heat resistance, oxidation resistance, lubricity, etc.) are sufficiently obtained. If it is thicker than 100 nm, the effect of improving the film hardness by thinning may not be obtained sufficiently, so it is necessary to set the thickness within the range of 0.2 nm to 100 nm. In consideration of variations (errors), it is desirable to form a range of 0.5 nm to 50 nm as a nerai value. In addition, since the film thickness of each film varies for each film or partially, the stacking period t may be such that the average film thickness is within the above range.
[0021]
Either the first coating or the second coating may be formed on the surface of the member (tool base material or the like) first, and it is desirable to provide the one having excellent adhesion according to the composition of the coating first. However, it can be formed without any particular limitation. In addition, the first film and the second film are laminated as a pair, but the total number of layers can be an odd number, and when the first film is formed first, the uppermost layer is also the first film, When the second film is formed first, the uppermost layer may also be the second film. In addition, it is also possible to interpose another hard film between the hard laminated film of this invention and the member surface, and to provide another film in the uppermost layer as needed. Even when the hard laminated film is composed of only the first film and the second film, the lowermost layer or the uppermost layer in contact with the surface of the tool base material is regarded as a film different from the laminated film, and these films are formed. It is also possible to increase or decrease the thickness regardless of the stacking period t.

[0006]
[0022]
The total film thickness D of the hard laminated film varies depending on the object (member) on which the film is provided and the required characteristics. For example, when receiving a relatively large impact load such as a rotary cutting tool, 10 μm or less is desirable, and 0.2 μm or more is desirable for ensuring sufficient wear resistance. In the case where the impact load such as a sliding member is hardly received, the total film thickness D can be larger than 10 μm, for example, about 20 μm.
[0023]
In the sixth aspect of the invention, the member is held on the outer peripheral portion of the rotary table that is rotated around one center line, and the rotary table is continuously rotated in one direction, so that the rotary table is disposed at a fixed position around the rotary table. The members are alternately and periodically passed in front of the first target and the second target, and the first film and the second film are alternately and continuously stacked. However, other film forming methods may be employed. . For example, the rotary table may be intermittently rotated while being stopped in the vicinity of the target, the first target and the second target may be moved with respect to a member held at a fixed position, etc. Various embodiments are possible. In addition, when the BCON component composition of the first coating and the second coating is different, the reaction gas is switched or the target to be evaporated is switched for each of the first coating and the second coating. It is also possible to laminate them separately and intermittently.
[0024]
In the sixth aspect of the invention, the rotary table is continuously rotated in one direction, and it is desirable to drive the rotary table at a constant speed for ease of control. However, it corresponds to the positions of the first target and the second target. Thus, the rotational speed can be periodically increased or decreased.
[0025]
The rotary table may hold a member directly in a constant posture on the outer peripheral portion thereof, but has a second rotary table that rotates around a second center line different from the one center line. If the film is formed while the member is held by the rotary table 2 and continuously rotated around the second center line, the film can be uniformly formed on the outer peripheral surface of the member. For example, when the member is a tool base material of a rotary cutting tool, the tool base material is attached to the second rotary table in a posture in which the axis center of the tool base material is concentric or parallel to the second center line. It is desirable to form the coating while continuously rotating the tool base material around the center line. For example, the second rotation table is disposed in a posture in which the second center line is parallel to the one center line, but may be disposed in a posture orthogonal to the one center line.

[0012]
. In addition, since it is not always easy to measure the film hardness (HV 0.025), only a part of the laminated film was examined, and the measurement was omitted for those not described.
(Processing conditions)
-Work material type: SKD11 (60HRC)
・ Processing method: Side cutting (down cut)
Cutting speed: 150 m / min (4800 min ⁻¹ )
・ Feeding speed: 0.03mm / t (860mm / min)
・ Incision: aa = 10 mm, ar = 0.5 mm
・ Cutting fluid: Air blow ・ Used machine: Vertical machining center [0040]
FIG. 3 is a product of the present invention, and the flank wear width is within an allowable range (0.150 mm). On the other hand, FIG. 4 shows a comparative example in which the atomic ratios x, y and a to f of the first coating 22 and the second coating 24, or the stacking period t is outside the scope of the present invention (Claims 1 and 2). Thus, the columns marked with dots are items different from the present invention, and in all cases, the flank wear width exceeds the allowable range (0.150 mm), and sufficient wear resistance cannot be obtained. In addition, since the 2nd film | membrane 24 contains Y, the test products No18 and No22 of FIG. 3 are invention products of Claim 1, but are not the invention products of Claim 2. FIG.
[0041]
Thus, hard multilayer coating 20 of the end mill 10 of this _embodiment, are composed of _{(Al x Cr 1-x-} y Y y) (B a C b O c N 1-a-b-c) in am with first coat _{22, M (B d C e} O f N 1-d-e-f) and the second membrane 24 are composed of is lamination period in the range of 0.2 nm to 100 nm t A large number of layers are alternately laminated. According to such a hard laminated film 20, the film hardness is very hard, for example, about 3000 to 3500 at HV 0.025, which is compared with a hard material such as SKD11 (60 HRC). Excellent wear resistance (durability) can be obtained even when cutting.
[0042]
Moreover, in this example, since the total film thickness D of the hard laminated film 20 is in the range of 0.2 μm to 10 μm, excellent wear resistance is obtained while suppressing the peeling of the hard laminated film 20.
[0043]
Also, in the example of FIG. 3, the test products No1 to No9 and No21 have the same BCON component composition of the first coating 22 and the second coating 24, so there is no need to switch the reaction gas for each coating. By using the arc ion plating apparatus 30 of 2, the hard laminated film 20 can be efficiently formed in a short time.

Claims (5)

Two types of first and second coatings having different compositions are hard laminated coatings excellent in wear resistance, in which a number of layers are alternately laminated on the surface of a predetermined member,
The first _{coating, (Al x Cr 1-xy} Y y) (B a C b O c N 1-abc) [where, x, y, a, b , c are respectively atomic ratios, 0.3 ≦ x ≦ 0.8, 0 <y ≦ 0.10, 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0.1], and the Al _x Cr While formed by PVD method using _1-xy Y _y as a target,
The second coating _{is, M (B d C e O} f N 1-def) [where single M is a Group IVa of the Periodic Table of the Elements, Va group, VIa group, selected Al, Si, and from Y One element metal or an alloy composed of two or more metal elements, d, e, and f are atomic ratios of 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, and 0 ≦ f ≦ 0.1, respectively. In the range], and is formed by PVD method using M as a target,
In addition, a hard laminated film characterized in that a lamination period t in which the film thickness of the first film and the film thickness of the second film are combined is in the range of 0.2 nm to 100 nm. 2. The total film thickness D of the hard laminated film in which the first film and the second film are repeatedly laminated at the lamination period t is in a range of 0.2 μm to 10 μm. Hard laminated film. The hard laminated film according to claim 1 or 2, wherein the BCON component compositions in the first film and the second film are equal to each other.   A hard multilayer coating-coated tool, the surface of which is coated with the hard multilayer coating according to any one of claims 1 to 3. A film forming method for forming the hard laminated film according to claim 3 on a predetermined member by a PVD method,
In a predetermined processing container, a rotary table that holds the member on the outer periphery and is driven to rotate around one center line;
A first target composed of the Al _x Cr _1-xy Y _y and a second target composed of the M, which are spaced apart from each other in the circumferential direction around the rotary table;
A reaction gas supply device for supplying a predetermined reaction gas determined according to the component composition of the BCON into the processing container;
And continuously rotating the rotary table in one direction around the one center line so that the member alternately and periodically passes in front of the first target and the second target. On the other hand, while supplying the reaction gas into the processing vessel, the Al _x Cr _1-xy Y _y and the M are evaporated from the first target and the second target, respectively, thereby the Al _x Cr _{1 -xy} Y _y and M react with the reaction gas, respectively, and when the member passes in front of the first target, the first film is formed on the surface of the member and passes in front of the second target. And forming the second coating on the surface of the member, whereby the first coating and the second coating are alternately and continuously laminated on the surface of the member. Forming method.

Images