JPWO2008050384A1 - Hard laminate coating, hard laminate coating tool, and method for forming coating - Google Patents

Abstract

As shown in FIG. 1, the hard laminated film 20 provided on the blade part 14 of the end mill 10 is composed of a first film 22 made of MX (BaCbOcN1-abc) and ZQ (BdCeOfN1-def). Since the two metal elements MX and ZQ are different from each other, the wear resistance superior to that of the case where the same metal element is contained. Is obtained. In addition, in order to form the first coating 22 using the MX alloy as the first target and to form the second coating using the ZQ alloy as the second target, the first coating 22 using a single metal of M, X, Z, and Q as a target, Compared with the case where the second coating 24 is formed, higher wear resistance is obtained. Furthermore, since the lamination period t of the first coating 22 and the second coating 24 is in the range of 0.2 nm to 100 nm, the coating hardness (abrasion resistance) due to thinning while enjoying the characteristics of both coatings 22 and 24. Can be stably obtained. As described above, the effect of improving the film hardness by alloying, thinning, and multilayering of two kinds of metal elements can be obtained more suitably, and the wear resistance is further improved comprehensively.

Description

  The present invention relates to a hard laminated film, and more particularly to improvement of a hard laminated film having excellent wear resistance in which a large number of two kinds of films having different compositions are alternately laminated.

Various wear layers of first and second coatings having different compositions, which are laminated on the surface of a predetermined member such as a tool base material such as high-speed tool steel or cemented carbide. Hard laminate coatings have been proposed. The hard laminated film described in Patent Documents 1 and 2 is an example, and there are two kinds of films made of a metal element of group IVa, Va, VIa in the periodic table of elements, or a nitride or carbide such as Al. The layers are repeatedly stacked with a stacking period of about several nm to several hundred nm. That is, the coating hardness and wear resistance are improved by various means such as thinning and multilayering of the first coating and the second coating, and alloying of metal elements.
JP-A-7-205361 Japanese Patent Laid-Open No. 2005-256081

  However, if the lamination period (film thickness) of the first and second hard film layers is not appropriate, or if the first film and the second film contain the same metal element, the film In some cases, the effect of improving the hardness could not be sufficiently obtained. In addition, when the first film and the second film contain two kinds of metal elements, if these metal elements are evaporated from different targets, it is compared with the case where the alloy of two kinds of metal elements is evaporated as a target. As a result, the hardness may be lowered, and there is still room for improvement.

  The present invention has been made in the background of the above circumstances, and its object is to form a metal element alloyed or thinned in a hard laminated film in which a large number of two kinds of films containing a metal element are alternately laminated. The effect of improving the hardness of the coating film due to the multi-layering is to be obtained more suitably and to further improve the wear resistance.

In order to achieve such an object, the first invention is a hard laminated film having excellent wear resistance in which a large number of two kinds of first and second films having different compositions are alternately laminated on the surface of a predetermined member. there are, (a) the first _{coating, MX (B a C b O} c N 1-abc) [However, IVa of the periodic table of M and X, respectively the elements, Va group, VIa group, Al, Two different metal elements selected from Si and Y, a, b, and c are atomic ratios of 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, and 0 ≦ c ≦ 0.1, respectively. is constituted by a range], while being formed by a PVD method MX alloy as a target, (b) the second _{coating, ZQ (B d C e O} f N 1-def) [where, Z and Q Are different from M and X, respectively, and are selected from groups IVa, Va, VIa, Al, Si, and Y of the periodic table of elements. The two different metal elements, d, e, and f, are atomic ratios, and are comprised of 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, and 0 ≦ f ≦ 0.1. , And formed by the PVD method using a ZQ alloy as a target, and (c) the stacking period t of the thickness of the first coating and the thickness of the second coating is in the range of 0.2 nm to 100 nm. It is characterized by that.

  According to a second invention, in the hard laminated film of the first invention, the total film thickness D of the hard laminated film in which the first film and the second film are repeatedly laminated at the lamination period t is in the range of 0.2 μm to 10 μm. It is characterized by being within.

  A third invention is characterized in that in the hard laminated film of the first invention or the second invention, the component compositions of the BCON in the first film and the second film are equal to each other.

  4th invention is related with the hard laminated film coating tool, The surface is coat | covered with the hard laminated film in any one of 1st invention-3rd invention, It is characterized by the above-mentioned.

  The fifth invention is a film forming method for forming the hard laminated film of the third invention on a predetermined member by the PVD method, and (a) holding the member on the outer peripheral portion in the processing container and holding one center line (B) a first target made of the MX alloy and a second target made of the ZQ alloy, which are arranged around the turntable and spaced apart from each other in the circumferential direction; c) a film forming apparatus having a reaction gas supply device that supplies a predetermined reaction gas determined according to the component composition of the BCON into the processing container, and (d) the rotary table is the one center By continuously rotating the member around the line in one direction, the member can be passed periodically in front of the first target and the second target alternately, while the reaction gas is supplied into the processing container. Both the MX alloy and the ZQ alloy are evaporated from the first target and the second target, respectively, so that the MX alloy and the ZQ alloy react with the reaction gas, respectively, and the member is in front of the first target. The first coating is formed on the surface of the member when passing through the surface, and the second coating is formed on the surface of the member when passing in front of the second target, so that the surface of the member is formed. The first film and the second film are alternately and continuously laminated.

  A sixth invention is the film forming method of the fifth invention, wherein a plurality of the first targets are arranged at equiangular intervals around the rotary table, and the second target is the same as the first target. It is characterized in that the first coating and the second coating are laminated on the surface of the member a plurality of periods by one rotation of the rotary table.

Hard multilayer coating of the first invention is constituted by _{MX (B a C b O c} N 1-abc) a first coat which is constituted _{by, ZQ (B d C e O} f N 1-def) Since the two metal elements MX and ZQ are different from each other, excellent wear resistance is obtained as compared with the case where the second metal film contains the same metal element. It is done. In addition, since the first film is formed using the MX alloy as a target and the second film is formed using the ZQ alloy as a target, the first film and the second film are formed using a single metal of M, X, Z, and Q as a target. Compared to the case, higher wear resistance can be obtained. Furthermore, since the lamination period t of the first film and the second film is in the range of 0.2 nm to 100 nm, the effect of improving the film hardness (wear resistance) by thinning is stable while enjoying the characteristics of both films. Is obtained. That is, according to the hard laminated film of the first invention, the effect of improving the film hardness by alloying, thinning, and multilayering of two kinds of metal elements can be obtained more suitably, and comprehensively wear resistant. The property is further improved.

  In the hard laminated film-coated tool of the fourth invention coated with the hard laminated film, and in the fifth and sixth inventions for forming a hard laminated film having the same BCON component composition, the film forming method of the invention is substantially as described above. Similar effects can be obtained. In the fifth and sixth inventions, the first coating and the second coating are alternately and continuously laminated by rotating the member continuously around one center line by the rotary table, so that the hard laminated coating is efficiently efficiently in a short time. Can be formed. In particular, in the sixth invention, a plurality of first targets and a plurality of second targets are arranged around the turntable, and the first coat and the second coat can be laminated in a plurality of cycles by one turn of the turntable, so that it is higher. In addition to efficiency, it is not necessary to increase the rotation speed of the rotary table in order to reduce the film thickness of each film, and there is no possibility that the film will be damaged by vibration or the like due to high-speed rotation.

  In the 2nd invention, since the total film thickness D of a hard laminated film exists in the range of 0.2 micrometer-10 micrometers, the outstanding abrasion resistance is obtained, suppressing peeling of a film. In the third invention, since the BCON component compositions of the first film and the second film are equal to each other, there is no need to switch the reaction gas for each film. For example, by using the film forming method of the fifth invention, the efficiency is reduced in a short time. A hard laminated film can be formed well.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the end mill to which this invention was applied, (a) is the front view seen from the direction orthogonal to an axial center, (b) is sectional drawing of the surface part of the blade part provided with the hard laminated film. It is a figure explaining an example of the arc ion plating apparatus which can form the hard laminated film of FIG. 1 suitably by PVD method, (a) is a schematic block diagram, (b) is a top view which shows the positional relationship of a rotary table and a target. It is. It is a figure explaining the specific example of the hard laminated film of this invention, and is the figure which compared and showed the difference in wear resistance at the time of forming using an alloy target, and a single metal target. The figure explaining the specific example of the hard laminated film of this invention, and the figure which showed the difference in abrasion resistance in the case where the same metal element is included when the metal elements of the first film and the second film are all different It is. It is a figure explaining the specific example of the hard laminated film of this invention, and the abrasion resistance by whether the lamination period t which is the total film thickness of a 1st film and a 2nd film exists in the range of 0.2 nm-100 nm. It is the figure which showed the difference compared. It is a figure explaining the specific example of the hard laminated film of this invention, and is the figure which compared and showed the difference in abrasion resistance by whether the total film thickness D exists in the range of 0.2 micrometer-10 micrometers. It is a figure explaining the specific example of the hard laminated film of this invention, and the difference in abrasion resistance by whether the atomic ratios a to c and d to f of BCON in the first film and the second film are within a predetermined range, respectively. It is the figure shown in comparison. It is a figure explaining another specific example of the hard laminated film of this invention, and is the figure which showed collectively the flank wear width at the time of cutting according to predetermined processing conditions. It is a figure explaining another specific example of the hard laminated film of this invention, and is the figure which showed collectively the flank wear width at the time of cutting according to predetermined processing conditions.

Explanation of symbols

  10: End mill (hard laminate coating tool) 12: Tool base material (predetermined member) 20: Hard laminate coating 22: First coating 24: Second coating 30: Arc ion plating apparatus (film forming apparatus) 32: First 1 rotation table (rotation table) 38: chamber (processing vessel) 40: reaction gas supply device 48: first target 52: second target O: one center line

  INDUSTRIAL APPLICABILITY The present invention is suitably applied to hard multilayer coatings provided on the surface of various processing tools such as end mills, taps, and rotary cutting tools such as drills, non-rotating cutting tools such as cutting tools, and rolling tools. However, the present invention can also be applied to a hard laminated film provided on the surface of a member other than a processing tool such as a surface protective film of a semiconductor device or the like. As a material of a member provided with a hard laminated film such as a tool base material, cemented carbide or high-speed tool steel is preferably used, but other metal materials may be used.

  As the PVD method (physical vapor deposition method) for forming the hard laminated film of the present invention, an arc ion plating method or a sputtering method is preferably used. The film thicknesses of the first coating and the second coating can be appropriately set depending on the amount of input power to the target, the rotation speed of the rotary table, and the like.

  The atomic ratio of MX in the first coating and the atomic ratio of ZQ in the second coating may be 1: 1, 3: 1, 1: 3, etc., and can be set as appropriate according to the type of metal element, required characteristics, and the like. BCON contains at least N (nitrogen) of 0.6 or more with 1 as a whole, 0.2 or less for B (boron), 0.3 or less for C (carbon), and 0.1 for O (oxygen). Each of them can be contained below, and only N (nitrogen) may be used.

  In the third invention, the component compositions of BCON in the first film and the second film are the same, that is, the atomic ratios a = d, b = e, and c = f. They are not necessarily the same, and can be set separately. In addition to BCON, inevitable impurity elements and other elements that do not affect properties may be included.

  If the stacking period t, which is the sum of the thickness of the first coating and the thickness of the second coating, is less than 0.2 nm, the characteristics inherent to the coating (hardness, heat resistance, oxidation resistance, lubricity, etc.) are sufficiently obtained. If it is thicker than 100 nm, the effect of improving the film hardness by thinning may not be obtained sufficiently, so it is necessary to set the thickness within the range of 0.2 nm to 100 nm. In consideration of variations (errors), it is desirable to form a range of 0.5 nm to 50 nm as a nerai value. In addition, since the film thickness of each film varies for each film or partially, the stacking period t may be such that the average film thickness is within the above range.

  Either the first coating or the second coating may be formed on the surface of the member (tool base material or the like) first, and it is desirable to provide the one having excellent adhesion according to the composition of the coating first. However, it can be formed without any particular limitation. In addition, the first film and the second film are laminated as a pair, but the total number of layers can be an odd number, and when the first film is formed first, the uppermost layer is also the first film, When the second film is formed first, the uppermost layer may also be the second film. In addition, it is also possible to interpose another hard film between the hard laminated film of this invention and the member surface, and to provide another film in the uppermost layer as needed. Even when the hard laminated film is composed of only the first film and the second film, the lowermost layer or the uppermost layer in contact with the surface of the tool base material is regarded as a film different from the laminated film, and these films are formed. It is also possible to increase or decrease the thickness regardless of the stacking period t.

  The total film thickness D of the hard laminated film varies depending on the object (member) on which the film is provided and the required characteristics. For example, when receiving a relatively large impact load such as a rotary cutting tool, 10 μm or less is desirable, and 0.2 μm or more is desirable for ensuring sufficient wear resistance. In the case where the impact load such as a sliding member is hardly received, the total film thickness D can be larger than 10 μm, for example, about 20 μm.

  In the fifth aspect of the invention, the member is held on the outer peripheral portion of the rotary table that is rotated around one center line, and the rotary table is continuously rotated in one direction, so that the rotary table is disposed at a fixed position around the rotary table. The members are alternately and periodically passed in front of the first target and the second target, and the first film and the second film are alternately and continuously laminated. The rotary table may be intermittently rotated while being stopped in the vicinity of the target, or the first target and the second target may be moved relative to a member held at a fixed position. The film forming method can be employed. In addition, when the BCON component composition of the first coating and the second coating is different, the reaction gas is switched or the target to be evaporated is switched for each of the first coating and the second coating. It is also possible to laminate them separately and intermittently.

  In the fifth aspect of the invention, the rotary table is continuously rotated in one direction, and it is desirable to drive the rotary table at a constant speed for ease of control, but it corresponds to the arrangement positions of the first target and the second target. Thus, the rotational speed can be periodically increased or decreased.

  The rotary table may hold a member directly in a constant posture on the outer peripheral portion thereof, but has a second rotary table that rotates around a second center line different from the one center line. If the film is formed while the member is held by the rotary table 2 and continuously rotated around the second center line, the film can be uniformly formed on the outer peripheral surface of the member. For example, when the member is a tool base material of a rotary cutting tool, the tool base material is attached to the second rotary table in a posture in which the axis center of the tool base material is concentric or parallel to the second center line. It is desirable to form the coating while continuously rotating the tool base material around the center line. For example, the second rotary table is arranged in a posture in which the second center line is parallel to the one center line, but can be arranged in a posture orthogonal to the one center line. Is possible.

  In the sixth aspect of the invention, for example, a total of two first targets and two second targets are arranged at 90 ° intervals around one center line of the rotary table, but three or more can also be arranged. In addition, the plurality of first targets and the second target are respectively arranged at equal angular intervals, but the interval between the first target and the second target is not necessarily equal angular intervals, and the rotation direction of the rotary table In this case, the interval from the first target to the second target may be different from the interval from the second target to the next first target.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a view for explaining an end mill 10 which is an example of a hard laminated coating-coated tool according to the present invention. FIG. 1 (a) is a front view seen from a direction perpendicular to the axis, and is made of cemented carbide. The tool base 12 is integrally provided with a shank and a blade 14. The blade portion 14 is provided with an outer peripheral blade 16 and a bottom blade 18 as cutting blades, and is driven to rotate by the outer peripheral blade 16 and the bottom blade 18 by being rotated around the axis, A hard laminated film 20 is coated on the surface of the blade portion 14. The shaded area in FIG. 1 (a) represents the hard laminated film 20, and FIG. 1 (b) is a cross-sectional view of the surface portion of the blade portion 14 coated with the hard laminated film 20. The end mill 10 is a rotary cutting tool, and the tool base material 12 corresponds to a predetermined member on which the hard multilayer coating 20 is provided.

As is clear from FIG. 1 (b), the hard laminated film 20 is obtained by alternately laminating a large number of first films 22 and second films 24 on the surface of the tool base material 12. The first coating 22 is _{selected, MX (B a C b O} c N 1-abc) [However, IVa of the periodic table of M and X, respectively the elements, Va group, VIa group, Al, Si, and from Y The two different metal elements, a, b, and c, are atomic ratios and are within the range of 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0.1] It is, second coat _{24, ZQ (B d C e O} f N 1-def) [However, IVa of the periodic table of Z and Q respectively the both M, with different and X elements, Va Group, VIa group, two different metal elements selected from Al, Si, and Y, d, e, and f are atomic ratios of 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, 0 ≦ f ≦ 0.1]. Further, the lamination period t of the thickness of the first coating 22 and the thickness of the second coating 24 is in the range of 0.2 nm to 100 nm, and the total thickness D of the hard laminated coating 20 is 0.2 μm to 10 μm. Within range. Note that the number of stacks in which the stacking period t is one layer is appropriately determined according to the stacking period t and the total film thickness D, and is, for example, in the range of 10 to 1000 layers.

  The atomic ratio of MX in the first coating 22 and the atomic ratio of ZQ in the second coating 24 may be 1: 1, 3: 1, 1: 3, etc., and are set appropriately according to the type of metal element, required characteristics, etc. Is done. BCON contains at least N (nitrogen) of 0.6 or more with 1 as a whole, 0.2 or less for B (boron), 0.3 or less for C (carbon), and 0.1 for O (oxygen). Each of them can be contained below, and only N (nitrogen) may be used. In addition, the BCON component composition in the first coating 22 and the second coating 24 may be the same, that is, the atomic ratios a = d, b = e, and c = f, but may be set separately. In addition to BCON, unavoidable impurity elements and other elements that do not affect properties may be included.

  FIG. 2 is a diagram for explaining an arc ion plating apparatus 30 that is preferably used for forming the hard laminated film 20, wherein (a) is a schematic configuration diagram (schematic diagram) and is a cross-sectional view taken along line AA in (b). (B) is a plan view. The arc ion plating apparatus 30 includes a first rotary table 32 that is substantially horizontal, a rotary drive device 33 that rotationally drives the first rotary table 32 around a substantially vertical center line O, and an outer peripheral portion of the first rotary table 32. 2 (four in FIG. 2 (b)) and a second tool holder 12 holding the tool base material 12 on which a large number of workpieces, that is, the cutting edges 16 and 18 before coating the hard laminated coating 20, are formed. A predetermined reaction gas is supplied to the rotary table 34, a bias power source 36 for applying a negative bias voltage to the tool base material 12, a chamber 38 as a processing container in which the tool base material 12 and the like are accommodated, and a chamber 38. A reaction gas supply device 40, an exhaust device 42 that exhausts the gas in the chamber 38 with a vacuum pump or the like to reduce the pressure, a first arc power source 44, a second arc power source 46 and the like are provided. The arc ion plating apparatus 30 corresponds to a film forming apparatus. In FIG. 2B, the tool base material 12 attached to the second rotary table 34 is omitted.

  The second turntable 34 is disposed in parallel with the first turntable 32 and is rotated around its own center line (second center line) parallel to one center line O of the first turn table 32. In addition, the plurality of tool base materials 12 are held in a vertical posture in which the axis is parallel to the second center line and the blade portion 14 faces upward. Therefore, the plurality of tool base materials 12 are rotationally driven around one center line O by the first rotary table 32 while being rotationally driven around the center line (second center line) of the second rotary table 34. Become. Around the center of the first turntable 32, the first target 48 and the second target 52 are alternately arranged at 90 ° intervals around one center line O, and the first turntable 32 is continuously rotated. The tool base material 12 is passed through the second rotary table 34 alternately in front of the first target 48 and the second target 52 alternately. In the present embodiment, two first targets 48 and two second targets 52 are arranged around the center line O at intervals of 180 °. The plurality of second rotary tables 34 are configured to be independently driven to rotate by, for example, a unique rotary drive device, but mechanically rotate in conjunction with the rotation of the first rotary table 32 by a gear mechanism or the like. It can also be driven.

The reaction gas supply device 40 includes a tank of nitrogen gas (N ₂ ), hydrocarbon gas (CH ₄ , C ₂ H _2, etc.), oxygen gas (O ₂ ), etc. Depending on the composition of the coating 24, for example, in the case of nitride, only nitrogen gas is supplied, and in the case of carbonitride, nitrogen gas and hydrocarbon gas are supplied according to the atomic ratios a to f. In the case of forming other compounds such as oxynitride and boronitride, a predetermined reaction gas may be supplied in the same manner.

The two first targets 48 arranged symmetrically with respect to the one center line O are both made of MX alloy, which is a constituent material of the first coating film 22. Each of the two second targets 52 arranged at symmetrical positions with O interposed therebetween is made of a ZQ alloy that is a constituent material of the second coating 24. The first arc power supply 44 evaporates the MX alloy from the first target 48 by passing a predetermined arc current between the first target 48 as a cathode and the anode 50 to cause arc discharge. The evaporated MX alloy becomes positive (+) metal ions and adheres to the tool base material 12 to which a negative (−) bias voltage is applied. At that time, it reacts with supplied reaction gas, the _{MX (B a C b O c} N 1-abc) first coat 22 made of is formed. The second arc power supply 46 evaporates the ZQ alloy from the second target 52 by passing a predetermined arc current between the anode 54 and the anode 54 using the second target 52 as a cathode. The evaporated ZQ alloy becomes positive (+) metal ions and adheres to the tool base 12 to which a negative (−) bias voltage is applied. At that time, it reacts with supplied reaction gas, the _{ZQ (B d C e O f} N 1-def) second film 24 made of is formed.

  When the hard laminated film 20 is formed on the surface of the blade portion 14 of the tool base material 12 using such an arc ion plating apparatus 30, the inside of the chamber 38 is evacuated by the exhaust apparatus 42 in advance with a predetermined pressure ( For example, a predetermined reaction gas is supplied from the reaction gas supply device 40 so as to be maintained at 1.33 Pa to 3.99 Pa, and a predetermined bias voltage (for example, −50 V to −−) is applied to the tool base material 12 by the bias power source 36. About 150V) is applied. In addition, the tool base material 12 is rotated at a constant speed in one direction around the center line O while the second turn table 34 is driven to rotate around the center line. At the same time, while rotating around the second center line, the first target 48 and the front of the second target 52 are alternately and periodically passed.

On the other hand, for example, when the component compositions of BCON in the first coating 22 and the second coating 24 are equal to each other, that is, when the atomic ratios a = d, b = e, and c = f, A predetermined reactive gas is supplied from the reactive gas supply device 40, and at the same time, an arc current is supplied from the first arc power supply 44 to evaporate the first target 48. 2 The target 52 is evaporated. As a result, the evaporated metals of the targets 48 and 52 react with the reaction gas, respectively, to form the first coating 22 and the second coating 24, and are attached to the surface of the tool base material 12. More specifically, when the tool substrate 12 passes in front of the first target 48, the _{MX (B a C b O c} N 1-abc) first coating 22 the surface of the tool substrate 12 consisting of brought attached, when passing in front of the second target 52, a second coating 24 comprising a _{ZQ (B d C e O f} N 1-def) is from being deposited on the surface of the tool substrate 12. As a result, the first coating 22 and the second coating 24 are alternately and continuously laminated on the surface of the tool base material 12 to form the hard laminated coating 20. In the present embodiment, since the first target 48 and the second target 52 are alternately disposed around the first turntable 32, the first coating 22 and the first target 22 are rotated by one turn of the first turntable 32. Two coatings 24 are laminated in two cycles. The current value of the arc current of each arc power supply 44, 46 is determined according to the film thickness of the first coating 22 and the second coating 24, and the rotation speed of the first rotary table 32 is determined by the first coating 22 and the second coating. It is determined according to the stacking period t in which the film thicknesses of 24 are combined. Such a hard laminated film 20 can be automatically formed by a control device including a computer.

  When the first arc power supply 44 and the second arc power supply 46 are simultaneously turned ON, the tool base material 12 in which the film forming process is started in the vicinity of the first target 48 is formed first from the first film 22. The tool base material 12 in which the coating forming process is started in the vicinity of the second target 52 is formed first from the second coating 24, but by delaying the OFF → ON switching of the second arc power source 46, The first base film 22 may be formed first with respect to the tool base material 12. Conversely, by delaying the switching of the first arc power supply 44 from OFF to ON, the second coating 24 can be formed first on all the tool base materials 12.

  When the BCON component composition of the first coating 22 and the second coating 24 is different, the first coating 22 and the second coating 24 need to be formed separately, and the reactive gas supplied from the reactive gas supply device 40 Or the first arc power supply 44 and the second arc power supply 46 are turned on and off, respectively, to switch between the first target 48 and the second target 52.

Next, the present invention product in which the tool base material 12 is made of cemented carbide, the diameter is 10 mm, and the hard laminated coating 20 is provided on a 6-blade square end mill, and the target and coating composition at the time of coating formation, the lamination cycle t A comparative product having a different total film thickness D and the like is prepared, and the results of examining the flank wear width (mm) of the outer peripheral blade 16 after cutting 25 m by cutting under the following processing conditions will be described. The flank wear width (mm) is an average value of the six outer peripheral blades 16. The allowable wear width is 0.15 mm. In addition, since it is not always easy to measure the film hardness (HV 0.025), only a part of the laminated film was examined, and the measurement was omitted for those not described.
(Processing conditions)
-Work material type: SKD11 (60HRC)
・ Processing method: Side cutting (down cut)
・ Cutting speed: 150 m / min (4800 min ⁻¹ )
・ Feeding speed: 0.03mm / t (860mm / min)
・ Incision: aa = 10 mm, ar = 0.5 mm
・ Cutting fluid: Air blow ・ Used machine: Vertical machining center

  FIG. 3 shows the case where the hard multilayer coating 20 is formed using the alloy target, that is, the first target 48 made of MX alloy and the second target 52 made of ZQ alloy (product of the present invention), and M, X The first coating 22 and the second coating 24 are compared with the case where the hard coating 20 is provided by forming the first coating 22 and the second coating 24 using a single metal target of Z, Q. Both are nitrides having only nitrogen (N) in BCON.

  As apparent from FIG. 3, in the case of the upper four types of hard laminated coatings using the alloy target, the coating hardness (HV0.025) is 3000 or more and the flank wear width is also the allowable wear width (0 .15 mm or less). On the other hand, the lower four types of hard laminated coatings using a single metal target have a coating hardness (HV 0.025) of around 2000, a flank wear width of more than 0.3 mm, and an allowable wear width (0 .15 mm or less), and it can be seen that excellent film hardness and wear resistance can be obtained by using an alloy target.

  FIG. 4 is a comparison with the case where the first coating 22 and the second coating 24 have the same metal element, and the upper stage of each test article No 1 to 8 is the product of the present invention, that is, the metal elements M and X of the first coating 22. And the metal elements Z and Q of the second coating 24 do not overlap, and the lower stage of each test product No. 1 to 8 is a comparative product containing the same metal element. As is clear from FIG. 4, all the products of the present invention in the upper stage satisfy the allowable wear width (0.15 mm or less) in the flank wear width, but the lower stage containing the same metal element. Both products have a flank wear width exceeding 0.2 mm and do not satisfy the allowable wear width (0.15 mm or less), and by avoiding overlapping of the metal elements of the first coating 22 and the second coating 24 It can be seen that excellent wear resistance is obtained.

  FIG. 5 compares the difference in wear resistance depending on whether or not the lamination period t, which is the total film thickness of the first coating 22 and the second coating 24, is in the range of 0.2 nm to 100 nm. The upper stage of the products No. 1 to 11 is the product of the present invention, that is, the case where the stacking period t is in the range of 0.2 nm to 100 nm, and the lower stage of each test product No. 1 to 11 is the range of the stacking period t of 0.2 nm to 100 nm. It is a comparative product that is out of the range. As is clear from FIG. 5, all the products of the present invention in the upper stage satisfy the allowable wear width (0.15 mm or less) in the flank wear width, while the lamination period t is 0.2 nm to 100 nm. The lower comparison products out of the range all have flank wear widths exceeding 0.2 mm and do not satisfy the allowable wear width (0.15 mm or less), and the stacking period t is 0.2 nm to 100 nm. It turns out that the outstanding abrasion resistance is acquired by setting it as the range.

  FIG. 6 compares the difference in wear resistance depending on whether or not the total film thickness D of the hard multilayer coating 20 is in the range of 0.2 μm to 10 μm. Product (Claim 2), that is, the case where the total film thickness D is in the range of 0.2 μm to 10 μm. It is a comparative product. As is apparent from FIG. 6, the products of the present invention in the upper stage all satisfy the allowable wear width (0.15 mm or less) in the flank wear width, but the total film thickness D is 0.2 μm to 10 μm. In the lower comparative products that are out of the range, the flank wear width exceeds 0.2 mm, the allowable wear width (0.15 mm or less) is not satisfied, and the total film thickness D is 0.2 μm to It turns out that the outstanding abrasion resistance is acquired by setting it as the range of 10 micrometers.

  FIG. 7 is a comparison of the influence of wear resistance due to the difference in the atomic ratios a to c and d to f of BCON in the first coating 22 and the second coating 24. That is, 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0.1, 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, 0 ≦ f ≦ 0.1 In the test products No. 11 to 20, at least one of the BCON atomic ratios a to c and d to f is 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0. 1, 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, 0 ≦ f ≦ 0.1. As is clear from FIG. 7, the test product Nos. 1 to 10 of the present invention products all satisfy the allowable wear width (0.15 mm or less) while the test piece Nos. 11 to 20 have the flank wear width. In all the comparative products, the flank wear width exceeds 0.2 mm and does not satisfy the allowable wear width (0.15 mm or less), and the BCON atomic ratios a to c and df are 0 ≦ a ≦ 0. .2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0.1, 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, 0 ≦ f ≦ 0.1 It can be seen that excellent wear resistance can be obtained by setting the composition.

  FIGS. 8 and 9 show the results of examining the flank wear width by performing cutting under the same processing conditions as described above for still another embodiment of the present invention. .15 mm or less).

Thus, hard multilayer coating 20 of the end mill 10 of this embodiment, MX and _{(B a C b O c N} 1-abc) first coating 22 that are composed _{of, ZQ (B d C e O} f N _1-def ) and the second coatings 24 are alternately stacked, and the two metal elements MX and ZQ are different from each other, and therefore include the same metal element. In comparison, excellent wear resistance is obtained. Further, in order to form the first film 22 using the MX alloy as the first target 48 and to form the second film using the ZQ alloy as the second target 52, the first film is formed using a single metal of M, X, Z, and Q as a target. 22 and higher abrasion resistance can be obtained as compared with the case where the second coating 24 is formed. Furthermore, since the lamination period t of the first coating 22 and the second coating 24 is in the range of 0.2 nm to 100 nm, the coating hardness (abrasion resistance) due to thinning while enjoying the characteristics of both coatings 22 and 24. Can be stably obtained. That is, according to the hard laminated film 20 of the present embodiment, the effect of improving the film hardness by alloying, thinning, and multilayering of two kinds of metal elements can be obtained more suitably, and comprehensively wear resistant. The property is further improved.

  Moreover, since the total film thickness D of the hard laminated film 20 is in the range of 0.2 μm to 10 μm in the present embodiment, excellent wear resistance can be obtained while suppressing the peeling of the hard laminated film 20.

  3 to FIG. 9, the other invention products excluding the test products No. 1 to 9 in FIG. 7 have the same BCON component composition in the first coating 22 and the second coating 24. There is no need to switch the reaction gas, and the hard laminated coating 20 can be efficiently formed in a short time by using the arc ion plating apparatus 30 of FIG.

  Further, according to the arc ion plating apparatus 30 of FIG. 2, the first coating 22 and the second coating 24 can be alternately and continuously laminated while continuously rotating the first rotary table 32 at a constant speed in one direction. The hard laminated film 20 can be efficiently formed in a short time. In particular, in this embodiment, two first targets 48 and two second targets 52 are disposed around the first turntable 32, and the first coating 22 and the second target are rotated by one turn of the first turntable 32. Since the coating film 24 can be laminated for two cycles, higher efficiency can be obtained, and it is not necessary to increase the rotation speed of the first rotary table 32 in order to reduce the film thickness of each coating film 22, 24. There is no risk that the coating will be damaged.

  Further, since the tool base 12 is driven to rotate about the center line parallel to the axis by the second rotary table 34, the first rotary table 32 passes the front of the first target 48 and the second target 52. The hard laminated coating 20 is uniformly formed on the outer peripheral surface of the base material 12, and excellent coating performance can be obtained stably.

  As mentioned above, although the Example of this invention was described in detail based on drawing, these are one Embodiment to the last, This invention is implemented in the aspect which added the various change and improvement based on the knowledge of those skilled in the art. be able to.

  The hard laminated coating of the present invention can suitably obtain the effect of improving the coating hardness by alloying, thinning and multilayering of two kinds of metal elements, and the wear resistance is further improved. It is suitably used as a hard coating.

[0001]
Technical field [0001]
The present invention relates to a hard laminated film, and more particularly to improvement of a hard laminated film having excellent wear resistance in which a large number of two kinds of films having different compositions are alternately laminated.
Background art [0002]
Various wear layers of first and second coatings having different compositions, which are laminated on the surface of a predetermined member such as a tool base material such as high-speed tool steel or cemented carbide. Hard laminate coatings have been proposed. The hard laminated film described in Patent Documents 1 and 2 is an example, and there are two kinds of films composed of a metal element of IVa group, Va group, VIa group of the periodic table of elements, or a nitride or carbide such as Al. The layers are repeatedly stacked with a stacking period of about several nm to several hundred nm. That is, the coating hardness and wear resistance are improved by various means such as thinning and multilayering of the first coating and the second coating, and alloying of metal elements.
Patent Document 1: Japanese Patent Laid-Open No. 7-205361 Patent Document 2: Japanese Patent Laid-Open No. 2005-256081 Problems to be Solved by the Invention [0003]
However, if the lamination period (film thickness) of the first and second hard film layers is not appropriate, or if the first film and the second film contain the same metal element, the film In some cases, the effect of improving the hardness could not be sufficiently obtained. In addition, when the first film and the second film contain two kinds of metal elements, if these metal elements are evaporated from different targets, it is compared with the case where the alloy of two kinds of metal elements is evaporated as a target. As a result, the hardness may be lowered, and there is still room for improvement.
[0004]
The present invention has been made in the background of the above circumstances, and its object is to form a metal element alloyed or thinned in a hard laminated film in which a large number of two kinds of films containing a metal element are alternately laminated. To improve the film hardness by multilayering more suitably

[0002]
Thus, the wear resistance is further improved.
Means for Solving the Problems [0005]
In order to achieve such an object, the first invention is a hard laminated film having excellent wear resistance in which a large number of two kinds of first and second films having different compositions are alternately laminated on the surface of a predetermined member. And (a) the first coating is MX (B _a C _b O _c N _1-a-b-c ) (where M and X are IVa group, Va group, VIa in the periodic table of elements, respectively) Two different metal elements selected from the group, Al, Si, and Y, a, b, and c are atomic ratios of 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, and 0 ≦ c ≦, respectively. is constituted by a range of 0.1], while being formed by a PVD method MX alloy as a target, (b) the second _{coating, ZQ (B d C e O} f N 1-d-e- _f ) [wherein Z and Q are both different from M and X, and each of groups IVa and V in the periodic table of elements, Two different metal elements selected from Group a, Group VIa, Al, Si, and Y, d, e, and f are atomic ratios of 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, 0 ≦ f ≦ 0.1], formed by PVD method using ZQ alloy as a target, and (c) the thickness of the first coating and the thickness of the second coating are matched. The lamination period t is in the range of 0.2 nm to 100 nm.
[0006]
According to a second invention, in the hard laminated film of the first invention, the total film thickness D of the hard laminated film in which the first film and the second film are repeatedly laminated at the lamination period t is in the range of 0.2 μm to 10 μm. It is characterized by being within.
[0007]
A third invention is characterized in that in the hard laminated film of the first invention or the second invention, the component compositions of the BCON in the first film and the second film are equal to each other.
[0008]
4th invention is related with the hard laminated film coating tool, The surface is coat | covered with the hard laminated film in any one of 1st invention-3rd invention, It is characterized by the above-mentioned.
[0009]
The fifth invention relates to (a) MX (B _a C _b O _c N _1-a-b-c ) [wherein M and X are groups IVa, Va, VIa, Al, Two different metal elements selected from Si and Y, a, b, and c are atomic ratios of 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, and 0 ≦ c ≦ 0.1, respectively. a first coating are composed of in the _{range], (b) ZQ (B d} C e O f N 1-d-e-f) was prepared in which both the Z and Q the M, with different and X Each of the two different metal elements d, e, and f selected from groups IVa, Va, VIa, Al, Si, and Y in the periodic table of the elements is the original

[0003]
And a plurality of second coatings that are configured in a range of 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, and 0 ≦ f ≦ 0.1. And (c) the laminating period t of the thickness of the first coating and the thickness of the second coating is in the range of 0.2 nm to 100 nm, and the BCON in the first coating and the second coating. A film forming method for forming a hard laminated film having the same component composition and excellent wear resistance on a predetermined member by the PVD method, and (d) holding the member on the outer periphery in a predetermined processing container And (e) a first target made of MX alloy and a second target made of ZQ alloy, which are spaced apart from each other in the circumferential direction around the rotary table. (F) determined according to the component composition of the BCON (G) by continuously rotating the rotary table in one direction around the one center line using a film forming apparatus having a reaction gas supply apparatus that supplies the predetermined reaction gas to the processing container. The member is periodically passed in front of the first target and the second target, while the reaction gas is supplied into the processing container, and from the first target and the second target, respectively. By simultaneously evaporating the MX alloy and the ZQ alloy, the MX alloy and the ZQ alloy react with the reaction gas, respectively, and when the member passes in front of the first target, When one film is formed and passes in front of the second target, the second film is formed on the surface of the member. Characterized by continuously alternately stacked first and the film and a second coating on the surface.
[0010]
A sixth invention is the film forming method of the fifth invention, wherein a plurality of the first targets are arranged at equiangular intervals around the rotary table, and the second target is the same as the first target. It is characterized in that the first coating and the second coating are laminated on the surface of the member a plurality of periods by one rotation of the rotary table.
Effects of the Invention [0011]
Hard multilayer coating of the first _invention comprises a first coat which is constituted by _{MX (B a C b O c} N 1-a-b-c), ZQ (B d C e O f N 1-d- _ef ) and the second coating layer composed of the two layers are alternately stacked. Since the two metal elements MX and ZQ are different from each other, compared with the case where the same metal element is included. Excellent wear resistance. In addition, since the first film is formed using the MX alloy as a target and the second film is formed using the ZQ alloy as a target, the first film and the second film are formed using a single metal of M, X, Z, and Q as a target. Compared to the case, higher wear resistance can be obtained. Furthermore, since the lamination period t of the first film and the second film is in the range of 0.2 nm to 100 nm, the effect of improving the film hardness (wear resistance) by thinning is stable while enjoying the characteristics of both films. Is obtained. That is, according to the hard laminated film of the first invention, the effect of improving the film hardness by alloying, thinning, and multilayering of two kinds of metal elements can be obtained more suitably, and comprehensively wear resistant. The property is further improved.
[0012]
In the hard laminated film-coated tool of the fourth invention coated with the hard laminated film, and in the fifth and sixth inventions for forming a hard laminated film having the same BCON component composition, the film forming method of the invention is substantially as described above. Similar effects can be obtained. In the fifth and sixth inventions,

[0005]
It is the figure which compared and showed the difference in abrasion resistance by whether it is in the range of micrometer.
FIG. 7 is a diagram for explaining a specific example of the hard laminated coating of the present invention, and wear resistance depending on whether or not the atomic ratios a to c and df of BCON in the first coating and the second coating are within predetermined ranges, respectively. It is the figure which showed the difference in sex.
FIG. 8 is a view for explaining still another specific example of the hard laminated film of the present invention, and also shows the flank wear width when cutting is performed in accordance with predetermined processing conditions.
FIG. 9 is a view for explaining still another specific example of the hard laminated film of the present invention, and also shows a flank wear width when cutting is performed according to predetermined processing conditions.
Explanation of symbols [0015]
10: End mill (hard laminated coating coated tool) 12: Tool base material (predetermined member) 20: Hard laminated coating 22: First coating 24: Second coating 30: Arc ion plating apparatus (film forming apparatus) 32: First 1 rotation table (rotation table) 38: chamber (processing vessel) 40: reaction gas supply device 48: first target 52: second target O: one center line Best Mode for Carrying Out the Invention [0016]
INDUSTRIAL APPLICABILITY The present invention is suitably applied to hard multilayer coatings provided on the surface of various processing tools such as end mills, taps, and rotary cutting tools such as drills, non-rotating cutting tools such as cutting tools, and rolling tools. However, the present invention can also be applied to a hard laminated film provided on the surface of a member other than a processing tool such as a surface protective film of a semiconductor device or the like. As a material of a member provided with a hard laminated film such as a tool base material, cemented carbide or high-speed tool steel is preferably used, but other metal materials may be used.
[0017]
As the PVD method (physical vapor deposition method) for forming the hard laminated film of the present invention, an arc ion plating method or a sputtering method is preferably used. The film thicknesses of the first coating and the second coating can be appropriately set depending on the amount of input power to the target, the rotation speed of the rotary table, and the like.
[0018]
The atomic ratio of MX in the first coating and the atomic ratio of ZQ in the second coating may be 1: 1, 3: 1, 1: 3, etc., and can be set as appropriate according to the type of metal element, required characteristics, and the like. BCON contains at least N (nitrogen) of 0.4 or more with respect to 1 as a whole, and 0.2 for B (boron).

[0009]
[0029]
The atomic ratio of MX in the first coating 22 and the atomic ratio of ZQ in the second coating 24 may be 1: 1, 3: 1, 1: 3, etc., and are set appropriately according to the type of metal element, required characteristics, etc. Is done. BCON contains at least N (nitrogen) of 0.4 or more with 1 as a whole, 0.2 or less for B (boron), 0.3 or less for C (carbon), and 0.1 for O (oxygen). Each of them can be contained below, and only N (nitrogen) may be used. In addition, the BCON component composition in the first coating 22 and the second coating 24 may be the same, that is, the atomic ratios a = d, b = e, and c = f, but may be set separately. In addition to BCON, unavoidable impurity elements and other elements that do not affect properties may be included.
[0030]
FIG. 2 is a view for explaining an arc ion plating apparatus 30 that is preferably used when forming the hard laminated film 20, wherein (a) is a schematic configuration diagram (schematic diagram) and is a cross-sectional view taken along line AA in (b). (B) is a plan view. The arc ion plating apparatus 30 includes a first rotary table 32 that is substantially horizontal, a rotary drive device 33 that rotationally drives the first rotary table 32 around a substantially vertical center line O, and an outer peripheral portion of the first rotary table 32. A plurality of (four in FIG. 2 (b)) and a second tool base 12 on which a plurality of workpieces, that is, the cutting edges 16, 18 and the like before coating the hard laminated film 20, are formed. A predetermined reaction gas is supplied to the rotary table 34, a bias power source 36 for applying a negative bias voltage to the tool base material 12, a chamber 38 as a processing container in which the tool base material 12 and the like are accommodated, and a chamber 38. A reaction gas supply device 40, an exhaust device 42 that exhausts the gas in the chamber 38 with a vacuum pump or the like to reduce the pressure, a first arc power source 44, a second arc power source 46, and the like are provided. The arc ion plating apparatus 30 corresponds to a film forming apparatus. In FIG. 2B, the tool base material 12 attached to the second rotary table 34 is omitted.
[0031]
The second turntable 34 is disposed in parallel with the first turntable 32 and is rotated around its own center line (second center line) parallel to one center line O of the first turn table 32. In addition, the plurality of tool base materials 12 are held in a vertical posture in which the axis is parallel to the second center line and the blade portion 14 faces upward. Therefore, the plurality of tool base materials 12 are rotationally driven around one center line O by the first rotary table 32 while being rotationally driven around the center line (second center line) of the second rotary table 34. Become. Around the first turntable 32, the first target 48 and the second target around one center line O are provided.

Claims (6)

Two types of first and second coatings having different compositions are hard laminated coatings excellent in wear resistance, in which a number of layers are alternately laminated on the surface of a predetermined member,
Wherein the first coating is _{selected, MX (B a C b O} c N 1-abc) [However, IVa of the periodic table of M and X, respectively the elements, Va group, VIa group, Al, Si, and from Y The two different metal elements, a, b, and c, are atomic ratios and are within the range of 0 ≦ a ≦ 0.2, 0 ≦ b ≦ 0.3, 0 ≦ c ≦ 0.1] While being formed by PVD method using MX alloy as a target,
The second _{coating, ZQ (B d C e O} f N 1-def) [However, IVa of the periodic table of Z and Q respectively the both M, with different and X elements, Va group, VIa group , Al, Si, and Y, two different metal elements, d, e, and f are atomic ratios of 0 ≦ d ≦ 0.2, 0 ≦ e ≦ 0.3, and 0 ≦ f ≦ 0, respectively. Within the range of .1] and formed by PVD method using ZQ alloy as a target,
In addition, a hard laminated film characterized in that a lamination period t in which the film thickness of the first film and the film thickness of the second film are combined is in the range of 0.2 nm to 100 nm. 2. The total film thickness D of the hard laminated film in which the first film and the second film are repeatedly laminated at the lamination period t is in a range of 0.2 μm to 10 μm. Hard laminated film. The hard laminated film according to claim 1 or 2, wherein the BCON component compositions in the first film and the second film are equal to each other. A hard multilayer coating-coated tool, the surface of which is coated with the hard multilayer coating according to any one of claims 1 to 3. A film forming method for forming the hard laminated film according to claim 3 on a predetermined member by a PVD method,
In the processing container, a rotary table that is driven to rotate around one center line while holding the member on the outer periphery,
A first target composed of the MX alloy and a second target composed of the ZQ alloy, which are arranged around the turntable and spaced apart from each other in the circumferential direction;
A reaction gas supply device for supplying a predetermined reaction gas determined according to the component composition of the BCON into the processing container;
And continuously rotating the rotary table in one direction around the one center line so that the member alternately and periodically passes in front of the first target and the second target. On the other hand, while supplying the reaction gas into the processing vessel and evaporating the MX alloy and the ZQ alloy from the first target and the second target, respectively, the MX alloy and the ZQ alloy are When the member passes through the front of the first target, the first film is formed on the surface of the member. When the member passes through the front of the second target, the first coating is formed on the surface of the member. By forming the second coating, the first coating and the second coating are alternately and continuously laminated on the surface of the member. . A plurality of the first targets are arranged at equal angular intervals around the rotary table, and the same number of the second targets as the first target are arranged at equal angular intervals around the rotary table. The film forming method according to claim 5, wherein a plurality of periods of the first film and the second film are laminated on the surface of the member by one rotation of the turntable.

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