WO2008050384A1

WO2008050384A1 - Hard laminated coating, tool covered with hard laminated coating, and method of forming coating

Info

Publication number: WO2008050384A1
Application number: PCT/JP2006/321053
Authority: WO
Inventors: Takaomi Toihara; Mei Wang; Masatoshi Sakurai
Original assignee: Osg Corporation
Priority date: 2006-10-23
Filing date: 2006-10-23
Publication date: 2008-05-02
Also published as: JPWO2008050384A1

Abstract

Hard laminated coating (20) provided on blade part (14) of end mill (10), as shown in Fig. 1, comprising a laminate of, alternately superimposed one upon another, first coatings (22) of MX(BaCbOcN1-a-b-c) and second coatings (24) of ZQ(BdCeOfN1-d-e-f). As the two metal elements MX and ZQ are different from each other, there can be obtained an abrasion resistance higher than when the same metal elements are contained. Further, as the first coatings (22) are formed with the use of MX alloy as the first target and the second coatings with the use of ZQ alloy as the second target, there can be obtained an abrasion resistance much higher than when the first coatings (22) and second coatings (24) are formed with the use of M, X, Z and Q elemental metals as the targets. Still further, as the lamination cycle (t) of first coatings (22) and second coatings (24) is within the range of 0.2 to 100 nm, there can be stably obtained an effect of enhancing of coating hardness (abrasion resistance) by reduction of coating film thickness while receiving the full benefit of properties of the coatings (22,24). Thus, comprehensive abrasion resistance enhancement can be attained through optimum exertion of coating hardness enhancing effects by alloying of two types of metal elements, reduction of coating film thickness and layer multiplication.

Description

Specification

Hard laminate coating, hard laminate coating tool, and method for forming coating

Technical field

[0001] The present invention relates to a hard laminated film, and more particularly to an improvement in a hard laminated film having excellent wear resistance in which a large number of two kinds of films having different compositions are alternately laminated.

Background art

[0002] As a wear-resistant hard coating on the surface of a predetermined member such as a tool base material such as high-speed tool steel or cemented carbide, a large number of alternating two types of first and second coatings with different compositions Various hard laminate coatings have been proposed. The hard laminated film described in Patent Documents 1 and 2 is an example. There are two types of elements such as IVa group, Va group, Via group metal elements in the periodic table of elements, or nitrides and carbides such as A1. The coating is repeatedly laminated with a lamination period of several nm to several hundred nm. That is, the hardness of the coating is improved by various means such as thinning and multilayering of the first coating and the second coating, and alloying of metal elements.

Patent Document 1: Japanese Patent Laid-Open No. 7-205361

Patent Document 2: Japanese Patent Laid-Open No. 2005-256081

Disclosure of the invention

Problems to be solved by the invention

[0003] However, the first and second coating layers of such a hard multilayer coating have an appropriate stacking period (film thickness), or the first coating and the second coating contain the same metal element. However, there was a case where the effect of improving the film hardness could not be sufficiently obtained. In addition, when the first and second coatings contain two types of metal elements, if those metal elements are evaporated from different targets, the alloy of the two types of metal elements will be used as the target. The hardness may be lower than that, and there is still room for improvement.

[0004] The present invention has been made in the background of the above circumstances, and the object of the present invention is to form metal elements in an alloy layer in a hard laminated film in which a large number of two kinds of films containing a metal element are alternately laminated. To improve the film hardness by thinning and multilayering more appropriately Thus, the wear resistance is further improved.

Means for solving the problem

[0005] In order to achieve such an object, the first invention is a hard material having excellent wear resistance in which a large number of two types of first coatings and second coatings having different compositions are laminated alternately on the surface of a predetermined member. (A) the first coating is MX (BCON), where M and X are abc 1 a- b-c

Two different metal elements selected from groups IVa, Va, Via, Al, Si, and Y in the periodic table of each element, a, b, c are atomic ratios, 0≤a ≤0.2, 0≤b≤0.3, 0≤c≤0.1) and formed by PVD method using MX alloy as the target, while (b) The coating is ZQ (BCON) [However, both Z and Q are def 1 d-e-1

Two different metal elements, d, e, and f, selected from groups IVa, Va, Via, Al, Si, and Y of the periodic table of the elements are different from M and X. 0≤d≤0.2, 0≤e≤0.3, 0≤f≤0.1), formed by PVD method using ZQ alloy as a target, and (C) The stacking period t, which combines the thickness of the first coating and the thickness of the second coating, is 0.2ηπ! It is characterized by being in the range of ~ lOOnm.

[0006] A second invention is the hard multilayer coating of the first invention, wherein the total thickness D of the hard multilayer coating in which the first coating and the second coating are repeatedly laminated at the lamination cycle t is 0.2. It is in the range of m to 10 m.

[0007] A third invention is characterized in that in the hard laminated film of the first invention or the second invention, the component compositions of the BCON in the first film and the second film are equal to each other.

[0008] The fourth invention relates to a hard laminated coating-coated tool, characterized in that the surface is coated with the hard laminated coating of any of the first to third inventions.

[0009] A fifth invention is a film forming method for forming the hard laminated film of the third invention on a predetermined member by a PVD method, and (a) holding the member on an outer peripheral portion in the processing vessel. A rotary table that is driven to rotate around a center line; and (b) a first target made of the MX alloy and a ZQ alloy cover, etc. that are spaced apart from each other in the circumferential direction around the rotary table. A film forming apparatus comprising: a second target comprising: (c) a reaction gas supply device configured to supply a predetermined reaction gas determined according to the component composition of the BCON into the processing container. d) Continuous rotation of the rotary table in one direction around the center line By doing so, the member is periodically passed in front of the first target and the second target, while the reactive gas is supplied into the processing vessel, and the first target and the second target are supplied. (2) When the MX alloy and the ZQ alloy are evaporated from the target, the MX alloy and the ZQ alloy react with the reaction gas, respectively, and when the member passes in front of the first target, the member. The first coating is formed on the surface of the member, and when passing through the front of the second target, the second coating is formed on the surface of the member, whereby the first coating and the second coating are formed on the surface of the member. It is characterized by alternately and continuously laminating.

[0010] A sixth invention is the film forming method of the fifth invention, wherein a plurality of the first targets are arranged at equiangular intervals around the rotary table, and the second target is the first target. The same number of targets as the target are disposed around the rotary table at equal angular intervals, and the first coating and the second coating are laminated on the surface of the member a plurality of periods by one rotation of the rotary table. And

The invention's effect

[0011] The hard laminated coating of the first invention includes a first coating composed of MX (B C O N), and a b c 1 a— b-c

2 d e f 1 d— e ~ f

Since the types of metal elements MX and ZQ are different from each other, superior wear resistance is obtained compared to the case where the same metal elements are contained. In addition, the first film is formed using MX alloy as the target, and the second film is formed using ZQ alloy as the target. Therefore, the first film and the second film are formed using M, X, Z, and Q as single metal targets. Compared to the case, higher wear resistance can be obtained. Furthermore, since the laminating period t of the first and second films is in the range of 0.2 nm to 100 nm, the film hardness (wear resistance) is improved by the thin film while enjoying the characteristics of both films. Can be obtained stably. In other words, according to the hard laminated film of the first invention, the effect of improving the film hardness by alloying, thinning, and multilayering of two kinds of metal elements can be obtained more suitably, and overall wear resistance is improved. The property is further improved.

[0012] In the hard laminated film-coated tool of the fourth invention coated with the hard laminated film, and the film-forming method of the fifth and sixth inventions for forming a hard laminated film having the same BCON component composition, The effect similar to the above is acquired substantially. In the fifth invention and the sixth invention, By continuously rotating the member around one center line by the rolling table, the first coating and the second coating are alternately and continuously laminated, so that a hard laminated coating can be efficiently formed in a short time. In particular, in the sixth invention, a plurality of first targets and second targets are arranged around the turntable, and a plurality of cycles of the first coat and the second coat can be laminated by one turn of the turntable. Therefore, it is possible to obtain higher efficiency, and there is no possibility that the coating film is damaged by vibration or the like due to a high-speed rotating shaft that does not need to increase the rotation speed of the rotary table in order to reduce the film thickness of each coating film.

[0013] In the second invention, since the total film thickness D of the hard laminated film is in the range of 0.2 m to 10 m, excellent wear resistance can be obtained while suppressing peeling of the film. In the third invention, since the BCON component compositions of the first film and the second film are equal to each other, it is not necessary to switch the reaction gas for each film, for example, by using the film forming method of the fifth invention in a short time. A hard laminated film can be formed efficiently.

Brief Description of Drawings

FIG. 1 is a view showing an end mill to which the present invention is applied, in which (a) is a front view seen from a direction perpendicular to the shaft center, and (b) is a surface of a blade portion provided with a hard laminated film. It is sectional drawing of a part.

FIG. 2 is a diagram for explaining an example of an arc ion plating apparatus that can suitably form the hard multilayer coating of FIG. 1 by the PVD method, where (a) is a schematic configuration diagram, and (b) is a rotary table and target. It is a top view which shows these positional relationships.

FIG. 3 is a diagram for explaining a specific example of the hard multilayer coating of the present invention, comparing the difference in wear resistance between the case where the alloy target is formed and the case where the single metal target is used. FIG.

圆 4] A diagram for explaining a specific example of the hard laminated film of the present invention, comparing the difference in wear resistance when the metal elements of the first film and the second film are all different from each other and containing the same metal element. FIG.

FIG. 5 is a diagram for explaining a specific example of the hard laminated film of the present invention, where the lamination period t, which is the total film thickness of the first film and the second film, is 0.2ηπ! FIG. 5 is a diagram showing a comparison of the difference in wear resistance depending on whether or not it is within the range of ~ lOOnm.

FIG. 6 is a diagram for explaining a specific example of the hard laminated film of the present invention, in which the total film thickness D is 0.2; ζ ΐη˜10 It is the figure which compared and showed the difference in abrasion resistance by whether the force is in the range of m.

FIG. 7 is a diagram for explaining a specific example of the hard laminated film of the present invention. It shows resistance depending on whether the atomic ratios a to c and d to f of the BCON in the first film and the second film are within a predetermined range, respectively. FIG. 6 is a diagram showing a comparison of wear differences.

FIG. 8 is a diagram for explaining still another specific example of the hard laminated film of the present invention, and also shows the flank wear width when cutting is performed according to predetermined processing conditions.

FIG. 9 is a view for explaining still another specific example of the hard laminated film of the present invention, and also shows the flank wear width when cutting is performed in accordance with predetermined processing conditions.

Explanation of symbols

[0015] 10: End mill (hard multi-layer coating tool) 12: Tool base material (predetermined member) 20: Hard multi-layer coating 22: First coating 24: Second coating 30: Arc ion plating device (coating device) ) 32: First rotary table (rotary table) 38: Chamber (processing vessel) 40: Reaction gas supply device 48: First target 52: Second target O: Center wire

BEST MODE FOR CARRYING OUT THE INVENTION

[0016] The present invention provides a hard layer coating provided on the surface of various processing tools such as a rotating cutting tool such as an end mill, a tap, and a drill, a non-rotating cutting tool such as a bite, or a rolling tool. Although preferably applied, the present invention can also be applied to a hard laminated coating provided on the surface of a member other than a processing tool such as a surface protective film of a semiconductor device or the like. Cemented carbide or high-speed tool steel is preferably used as the material of the member on which the hard multilayer coating is provided, such as a tool base material, but other metal materials may be used.

[0017] As the PVD method (physical vapor deposition method) for forming the hard laminated film of the present invention, an arc ion plating method or a sputtering method is preferably used. The film thicknesses of the first film and the second film can be appropriately set according to the amount of power input to the target, the rotation speed of the rotary table, and the like.

[0018] The atomic ratio of MX in the first coating and the atomic ratio of ZQ in the second coating are set appropriately according to the type of metal element, required characteristics, etc., which can be 1: 1, 3: 1, 1: 3, etc. it can. BCO N contains at least N (nitrogen) at least 0.6 as a whole, and 0.2 for B (boron). In the following, C (carbon) is 0.3 or less, 0 (oxygen) is 0.1 or less, and N (nitrogen) alone may be included.

[0019] In the third invention, the component composition of BCON in the first film and the second film is the same, that is, the atomic ratios a = d, b = e, and c = f. In carrying out the invention, it is not always necessary to set the same. In addition to BCON, it does not affect inevitable impurity elements and properties! な Other elements may be included! / ヽ.

[0020] If the lamination period t, which is the sum of the thickness of the first coating and the thickness of the second coating, is less than 0.2 nm, the original properties of the coating (hardness, heat resistance, oxidation resistance, lubricity, etc.) If it is thicker than lOOnm, the effect of improving the film hardness by thin film may not be obtained sufficiently, so it is necessary to set it within the range of 0.2nm to 100nm. And 0.5 ηπ! Considering the variation (error) in the film thickness! It is desirable to form a nerai value within a range of ˜50 nm. In addition, since the film thickness of each film varies from film to film or partially, the stack period t may be set so that the average film thickness is within the above range.

[0021] Either the first film or the second film may be formed first on the surface of a member (such as a tool base material). However, it is also possible to form without limitation. In addition, the first film and the second film are laminated as a pair, but the total number of layers can be an odd number, and when the first film is formed first, the uppermost layer is also the first film, When the second film is formed first, the uppermost layer may also be the second film. It is also possible to interpose another hard coating between the hard laminated coating of the present invention and the member surface, or to provide another coating on the uppermost layer as necessary. Even when the hard laminated film is composed of only the first and second films, the lowermost layer or the uppermost layer in contact with the surface of the tool base material is regarded as a film different from the laminated film. It is also possible to increase or decrease the film thickness regardless of the stacking period t.

[0022] The total film thickness D of the hard laminated coating varies depending on the object (member) on which the coating is to be applied and the required characteristics. For example, when a relatively large impact load such as a rotary cutting tool is applied, the coating is peeled off. 10 μm or less is desirable for suppression, and 0.2 μm or more is desirable for ensuring sufficient wear resistance. If the sliding member is hardly subjected to impact load, the total film thickness D should be 10 For example, it can be set to about 20 m, which may be larger than μm.

[0023] In the fifth aspect of the invention, the member is held on the outer peripheral portion of the rotary table that is rotated around one center line, and the rotary table is continuously rotated in one direction, thereby fixing the circumferential position of the rotary table. The first and second targets disposed on the first and second targets are alternately and periodically passed, and the first and second coatings are alternately and continuously laminated. In carrying out the invention, the rotary table may be intermittently rotated while being stopped in the vicinity of the target, or the first target and the second target may be moved relative to a member held at a fixed position. Various film forming methods can be employed. Also, when the BCON component composition of the first and second coatings is different, the reaction gas is switched for each of the first and second coatings, and the target to be evaporated is switched to change the first and second coatings. It is also possible to laminate them separately and intermittently.

[0024] In the fifth invention, the rotary table is continuously rotated in one direction, and is preferably driven to rotate at a constant speed for ease of control, but the arrangement of the first target and the second target is preferable. The rotational speed can be periodically increased or decreased according to the installation position.

[0025] The rotary table may hold a member directly in a constant posture on the outer peripheral portion thereof, but has a second rotary table that rotates around a second center line different from the one center line. If the film is formed while the member is held by the second turntable and continuously rotated around the second center line, the film can be uniformly formed on the outer peripheral surface of the member. . For example, when the member is a tool base material of a rotary cutting tool, the tool base material is attached to the second rotary table in a posture where the axis of the tool base material is concentric or parallel to the second center line. It is desirable to form the coating while continuously rotating the tool base material around the center line. For example, the second rotary table is arranged in a posture in which the second center line is parallel to the one center line, but can be arranged in a posture orthogonal to the one center line. Is possible.

[0026] In the sixth invention, for example, a total of two first targets and second targets are alternately arranged at 90 ° intervals around one center line of the rotary table, but three or more are arranged in a staggered manner. You can also. The plurality of first targets and second targets are each equiangularly spaced. However, the interval between the first target and the second target is not necessarily an equiangular interval. The interval from the first target to the second target in the rotation direction of the rotary table and the second target are not necessarily required. The interval from the target to the next first target may be different.

Example

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

FIG. 1 is a view for explaining an end mill 10 which is an example of a hard laminated coating-coated tool according to the present invention. FIG. 1 (a) is a front view seen from a direction perpendicular to the axis and is made of cemented carbide. The tool base 12 is provided with a shank and a blade 14 on the body. The blade portion 14 is provided with an outer peripheral edge 16 and a bottom edge 18 as cutting edges, and is driven to rotate by the outer peripheral edge 16 and the bottom edge 18 when rotated around the axis. At the same time, the surface of the blade portion 14 is coated with a hard laminated film 20. The hatched portion in FIG. 1 (a) represents the hard laminate film 20, and FIG. 1 (b) is a cross-sectional view of the surface portion of the blade portion 14 coated with the hard laminate film 20. The end mill 10 is a rotary cutting tool, and the tool base material 12 corresponds to a predetermined member on which a hard laminated coating 20 is provided.

As is clear from the force in FIG. 1 (b), the hard laminated film 20 is obtained by alternately laminating a number of first films 22 and second films 24 on the surface of the tool base material 12. The first coating 22 is MX (B C a b

O N) (where M and X are groups IVa, Va, Via, c 1— a— b— c in the periodic table of the elements, respectively.

Two different metal elements selected from Al, Si, and Y, a, b, c are atomic ratios, 0≤a≤0. 2, 0≤b≤0. 3, 0≤c≤0. The second film 24 is composed of ZQ (BCON) (however, Z and Q are both different from M and X and defid -e -f

Two different metal elements selected from groups IVa, Va, Via, Al, Si, and Y, d, e, and f, respectively, are atomic ratios, 0≤d≤0. 2, 0≤e≤0. 3, 0 ≤f≤0. 1]. In addition, the stacking period t, which combines the thickness of the first coating 22 and the thickness of the second coating 24, is 0.2ηπ! Within the range of ~ lOOnm, the total film thickness D of the hard laminate coating 20 is within the range of 0.2111 to 10111. Note that the number of stacks in which the stacking period t is one layer is appropriately determined according to the stacking period t and the total film thickness D. For example, a range of 10 to 1000 layers is appropriate. [0029] The atomic ratio of MX in the first coating 22 and the atomic ratio of ZQ in the second coating 24 can be 1: 1, 3: 1, 1: 3, etc. Is set as appropriate. BCON contains at least N (nitrogen) at least 0.6 with 1 as a whole, B (boron) 0.2 or less, C (carbon) 0.3 or less, 0 (oxygen) 0.1 In the following, each can be contained, and only N (nitrogen) may be contained. Further, the BCON component composition in the first coating 22 and the second coating 24 may be the same, that is, the atomic ratios a = d, b = e, and c = f, but may be set separately. In addition to BCON, inevitable impurity elements and properties are not affected! ヽ Other elements may be included!

FIG. 2 is a diagram for explaining an arc ion plating apparatus 30 that is preferably used for forming the hard laminated film 20, and (a) is a schematic configuration diagram (schematic diagram) in (b). It is a figure corresponding to the A—A cross section, and (b) is a plan view. The arc ion plating device 30 includes a first rotary table 32 that is substantially horizontal, a rotary drive device 33 that rotates the first rotary table 32 around a substantially vertical center line O, and an outer peripheral portion of the first rotary table 32. A plurality of (four in FIG. 2 (b)) and a tool base 12 that holds the tool base 12 on which a large number of workpieces, that is, the cutting edges 16 and 18 before covering the hard laminated coating 20, are formed. (2) Rotary table 34, bias power source 36 for applying a negative bias voltage to the tool base material 12, chamber 38 as a processing container containing the tool base material 12, etc., and a predetermined reaction gas in the chamber 38 A reaction gas supply device 40 to be supplied, an exhaust device 42 for discharging the gas in the chamber 38 with a vacuum pump or the like to reduce the pressure, a first arc power source 44, a second arc power source 46, and the like are provided. The arc ion plating apparatus 30 corresponds to a film forming apparatus. In FIG. 2B, the tool base material 12 attached to the second rotary table 34 is omitted.

[0031] The second rotary table 34 is arranged in parallel with the first rotary table 32, and is around its own center line (second center line) parallel to one center line O of the first rotary table 32. And a plurality of tool base materials 12 are held in a vertical posture in which the axis is parallel to the second center line and the blade portion 14 faces upward. Therefore, the plurality of tool base materials 12 are rotated around the center line (second center line) of the second rotary table 34, and are rotated around the center line O by the first rotary table 32. become. Around the first rotary table 32, the first target 48 and the second target around one center line O. 52 are alternately fixed at 90 ° intervals, and the tool base 12 is moved together with the second rotary table 34 by the continuous rotation of the first rotary table 32. The target 52 can be passed alternately and periodically. In the present embodiment, the first target 48 and the second target 52 are arranged around the center line O at intervals of 180 °. The plurality of second rotary tables 34 are configured to be driven to rotate independently by, for example, a unique rotary drive device, but mechanically interlocked with the rotation of the first rotary table 32 by a gear mechanism or the like. It can also be driven to rotate.

[0032] The reaction gas supply device 40 includes nitrogen gas (N) and hydrocarbon gas (CH

2 4, C H, etc.),

2 2 Equipped with a tank of oxygen gas (O), etc., depending on the composition of the first coating 22 and the second coating 24,

2

For example, in the case of nitride, only nitrogen gas is supplied, and in the case of carbonitride, nitrogen gas and hydrocarbon gas are supplied according to the atomic ratios a to f. In the case of forming other compounds such as oxynitride and boron nitride, it is also possible to supply a predetermined reaction gas in the same manner.

[0033] Each of the two first targets 48 arranged in a symmetrical position with the one center line O in between is made of MX alloy which is a constituent material of the first coating 22, while the same The two second targets 52 arranged at symmetrical positions with the one center line O in between are both made of a ZQ alloy that is a constituent material of the second coating 24. The first arc power source 44 evaporates the MX alloy from the first target 48 by causing a predetermined arc current to flow between the anode 50 and the anode 50 using the first target 48 as a force sword. The evaporated MX alloy becomes positive (+) metal ions and adheres to the tool base 12 to which a negative (one) bias voltage is applied. At that time, the first coating 22 made of the MX (B C O N) is formed by reacting with the supplied reaction gas. In addition, the second arc power supply 46 has an upper a b c 1 a— b-c

The ZQ alloy is evaporated from the second target 52 by passing a predetermined arc current between the anode 54 and the second target 52 as a force sword and causing arc discharge. The evaporated ZQ alloy is positive (+ ) And adheres to the tool base 12 to which a negative (one) bias voltage is applied. At that time, it reacts with the supplied reaction gas, and the ZQ (B C d e

A second coating 24 made of O N) is formed.

f 1-d-e-f

[0034] Using such an arc ion plating apparatus 30, a table of the blade portion 14 of the tool base material 12 is provided. When the hard multilayer coating 20 is formed on the surface, the reactive gas supply device 40 is configured so that the inside of the chamber 38 is maintained at a predetermined pressure (for example, about 1.33 Pa to 3.99 Pa) while being evacuated by the exhaust device 42 in advance. A predetermined reaction gas is supplied from the power source, and a predetermined bias voltage (for example, about −50 V to −150 V) is applied to the tool base 12 by a bias power source 36. In addition, while rotating the second rotary table 34 around the center line, the first rotary table 32 is continuously rotated around the center line O in one direction at a constant speed, so that the tool base material 12 is moved to the second rotary table. While rotating around the second center line together with the bull 34, the first target 48 and the second target 52 are alternately passed periodically.

On the other hand, for example, when the component yarns of BCON in the first coating 22 and the second coating 24 are equal to each other, that is, when the atomic ratios a = d, b = e, and c = f, the components Depending on the composition, a predetermined reactive gas is supplied from the reactive gas supply device 40 and an arc current is applied by the first arc power supply 44 to evaporate the first target 48 and at the same time the second arc power supply. The second target 52 is evaporated by supplying an arc current by 46. As a result, the evaporated metals of the targets 48 and 52 react with the reaction gas, respectively, to form the first coating 22 and the second coating 24, and are attached to the surface of the tool base material 12. Specifically, when the tool base material 12 passes in front of the first target 48, the first force that also has an MX (B C O N) force is obtained.

a b c 1 a— b-c

When the coating 22 is attached to the surface of the tool base 12 and passes in front of the second target 52, the second coating 24, which also has a ZQ (B C O N) force, is attached to the surface of the tool base 12.

d e f i d-e-1

It is. As a result, the first coating 22 and the second coating 24 are alternately and continuously laminated on the surface of the tool base material 12 to form the hard laminated coating 20. In this embodiment, since the first target 48 and the second target 52 are alternately arranged around the first rotating table 32, the first coating 22 and the second target 52 are rotated by one rotation of the first rotating table 32. The second coating 24 is stacked for two cycles. The current value of the arc current of each arc power source 44, 46 is determined according to the film thickness of the first coating 22 and the second coating 24, and the rotation speed of the first rotary table 32 is determined by the first coating 22 and the second coating. It is determined according to the stacking period t with the thickness of 24 combined. Such a hard laminated film 20 can be automatically formed by a control device including a computer.

[0036] When the first arc power supply 44 and the second arc power supply 46 are simultaneously turned ON, the tool base material 12 for which the coating forming process has started in the vicinity of the first target 48 is the first coating 22 or For the tool base material 12 that is formed first and the coating formation process is started in the vicinity of the second target 52, the force that is formed first from the second coating 24. By delaying the first coating 22, the first coating 22 can be formed first for all the tool base materials 12. Conversely, by delaying the switching of the first arc power supply 44 from OFF to ON, the second coating 24 can be formed first for all the tool base materials 12.

[0037] When the first coating 22 and the second coating 24 have different BCON component compositions, the first coating 22 and the second coating 24 need to be formed separately, and are supplied from the reaction gas supply device 40. The reaction gas to be used is switched, and the first arc power supply 44 and the second arc power supply 46 are turned on and off respectively to switch between the first target 48 and the second target 52.

[0038] Next, the product of the present invention in which the tool base material 12 is made of cemented carbide, has a diameter of 10 mm, and a 6-blade square end mill is provided with the hard laminated coating 20, and the target and coating composition during coating formation. A comparative product with different stacking cycle t, total film thickness D, etc. was prepared, and after cutting under the following processing conditions, the flank wear width (mm) of the outer peripheral edge 16 after 25 m cutting was investigated. explain. The flank wear width (mm) is an average value of the six peripheral blades 16. The allowable wear width is 0.15 mm. Since the film hardness (HV0.025) is not always easy to measure, only a part of the laminated film was examined, and the measurement was omitted for those not described. (Processing conditions)

• Cut type: SKD11 (60HRC)

, Machining method: Side cutting (down cut)

'Cutting speed: 150mZmin (4800min—

.Feeding speed: 0.03mm / t (860mm / min)

'Incision: aa = 10mm, ar = 0. 5mm

• Cutting fluid: Air blow

• Machine used: Vertical machining center

[0039] Fig. 3 shows the case where the hard multilayer coating 20 is formed using the alloy target, that is, the first target 48 with MX alloy force and the second target 52 with ZQ alloy force. Inventive product) and the case where the first coating 22 and the second coating 24 are formed using a single metal target of M, X, Z, and Q, and the hard laminated coating 20 is provided. The coating 22 and the second coating 24 are both nitrides containing only nitrogen (N) in BCON.

[0040] As is apparent from Fig. 3, in the case of the upper four types of hard laminated films using an alloy target, the film hardness (HVO. 025) is 3000 or more and the flank wear width is also acceptable. The wear width (0.15mm or less) is satisfied. On the other hand, the lower four types of hard laminated coatings using a single metal target have a coating hardness (HVO. 025) of around 2000 and a flank wear width of more than 0.3 mm. 0.1.15 mm or less), and it is possible to obtain excellent film hardness and wear resistance by using an alloy target.

[0041] FIG. 4 is a comparison with the case where the first coating 22 and the second coating 24 have the same metal element. The upper part of each test article Nol to 8 is the product of the present invention, that is, the metal element of the first coating 22. This is a case where M and X do not overlap with the metal elements Z and Q of the second coating 24, and the lower part of each test article Nol to 8 is a comparative product containing the same metal element. As can be seen from Fig. 4, all the products of the present invention in the upper stage satisfy the allowable wear width (0.15 mm or less) in the flank wear width, but the lower stage containing the same metal element. All products have flank wear widths exceeding 0.2 mm and do not satisfy the allowable wear width (0.15 mm or less), and avoid overlapping of metal elements in the first coating 22 and the second coating 24. It can be seen that excellent wear resistance can be obtained.

FIG. 5 shows that the stacking period t, which is the total film thickness of the first film 22 and the second film 24, is 0.2ηπ! Comparison of differences in wear resistance depending on whether it is within the range of ˜1 OOnm. Each test product No 1˜: The upper part of L 1 is the product of the present invention, that is, the stacking period t is 0.2ηπ! This is a case in the range of ~ lOOnm, and each test product Nol ~: The lower part of L1 is a comparative product in which the lamination period t is out of the range of 0.2nm to 100nm. As is clear from FIG. 5, all the products of the present invention in the upper stage satisfy the allowable wear width (0.15 mm or less) in the flank wear width, but the stacking period t is 0.2 nm to 100 nm. In the lower comparison products that are out of range, the flank wear width exceeds 0.2 mm and does not satisfy the allowable wear width (0.15 mm or less), and the stacking cycle t is 0.2 ηπ! It can be seen that excellent wear resistance can be obtained by setting the content within the range of ~ lOOnm.

[0043] FIG. 6 shows whether or not the total film thickness D of the hard laminate film 20 is in the range of 0.2 m to 10 m. The upper part of each test product Nol to 8 is the product of the present invention (claim 2), that is, the total film thickness D is in the range of 0.2 m to 10 m. The lower part of each test product Nol to 8 is a comparative product in which the total film thickness D is out of the range of 0.2 / ζ πι to 10 / zm. As is clear from FIG. 6, all the products of the present invention in the upper stage satisfy the allowable wear width (0.15 mm or less) in the flank wear width, but the total film thickness D is 0.2 πι ~ The lower comparison products that are out of the range of 10 / ζ m have a flank wear width of more than 0.2 mm and do not satisfy the allowable wear width (0.15 mm or less). It can be seen that excellent wear resistance can be obtained by setting the value in the range of 0.2 / ζ πι to 10 / ζ m.

[0044] Fig. 7 compares the effects of wear resistance due to the difference in the atomic ratios a to c and d to f of BCON in the first coating 22 and the second coating 24. Invention, ie ¾0≤a≤0. 2, 0≤b≤0. 3, 0≤c≤0. 1, 0≤d≤0. 2, 0≤e≤0. 3, 0≤f≤0 The test samples Nol 1 to 20 satisfy at least one of the BCON atomic ratios a to c and d to f SO≤a≤0. 2, 0≤b≤0. 3, 0≤c≤0. 1, 0≤d≤0. 2, 0≤e≤0. 3, 0 ≤f≤0. As is apparent from Fig. 7, the test products Nol to l0 of the present invention products all satisfy the allowable wear width (0.15mm or less) in the flank wear width, whereas the test products Nol to l0 In all 20 comparative products, the flank wear width exceeds 0.2 mm and does not satisfy the allowable wear width (0.15 mm or less). BCON atomic ratio a to c, d to f force 0≤a ≤0. 2, 0≤b≤0. 3, 0≤c≤0. 1, 0≤d≤0. 2, 0≤e≤0. 3, 0≤f≤0. It can be seen that excellent wear resistance can be obtained by setting the component composition to.

FIG. 8 and FIG. 9 show the results of examining the flank wear width by performing cutting under the same processing conditions as described above for still another example of the present invention. The wear width (0.15mm or less) is satisfied.

As described above, the hard laminated film 20 of the end mill 10 of the present embodiment is composed of MX (BCON) ac 1 a-b-c, and is composed of the first film 22 and ZQ (BCON). Consists of second covered aef 1 d— e ~ f

Since the two metal elements MX and ZQ are different from each other, they have excellent wear resistance compared to the case of containing the same metal element! can get. Also, MX alloy is used as the first target 48 to form the first coating 22 and ZQ alloy Since the second film is formed as the second target 52, the wear resistance is higher than when the first film 22 and the second film 24 are formed using a single metal of M, X, Z, and Q as the target. Is obtained. Furthermore, since the lamination period t of the first coating 22 and the second coating 24 is in the range of 0.2 nm to 100 nm, the coating hardness (abrasion resistance) of the thin film is obtained while enjoying the characteristics of both coatings 22 and 24. ) Can be stably obtained. That is, according to the hard laminated film 20 of the present example, the effect of improving the film hardness by alloying, thinning, and multilayering of two kinds of metal elements can be obtained more suitably, and comprehensively withstanding resistance. Abrasion is further improved.

[0047] Further, in this example, the total film thickness D of the hard multilayer coating 20 is 0.2π! Since it is within the range of ˜10 m, excellent wear resistance can be obtained while suppressing the peeling of the hard laminated film 20.

[0048] In addition, among the products of the present invention in Figs. 3 to 9, the other invention products excluding the test products No1 to 9 in Fig. 7 have the same BCON component composition in the first coating 22 and the second coating 24. By using the arc ion plating apparatus 30 of FIG. 2 that does not require switching of the reaction gas for each coating, the hard laminated coating 20 can be efficiently formed in a short time.

In addition, according to the arc ion plating apparatus 30 of FIG. 2, the first coating 22 and the second coating 24 are alternately and continuously rotated while the first rotary table 32 is continuously rotated in one direction at a constant speed. Since it can be laminated, the hard laminated film 20 can be efficiently formed in a short time. In particular, in this embodiment, two first targets 48 and two second targets 52 are arranged around the first rotary table 32, and the first coating 22 and the second target 52 are rotated by one rotation of the first rotary table 32. The coating 24 can be laminated for two cycles, so it is possible to obtain higher efficiency, and it is necessary to increase the rotation speed of the first rotary table 32 in order to reduce the film thickness of each film 22, 24. There is no risk of damage to the coating due to vibration or the like.

[0050] Further, while the tool base material 12 is driven to rotate about a center line parallel to the axis by the second rotary table 34, the first target 48 and the second target 52 are passed by the first rotary table 32. Therefore, the hard laminated film 20 is uniformly formed on the outer peripheral surface of the tool base material 12, and excellent film performance can be stably obtained.

As described above, the embodiments of the present invention have been described in detail with reference to the drawings. However, these are merely embodiments, and the present invention has been subjected to various modifications and improvements based on the knowledge of those skilled in the art. Can be implemented. Industrial applicability

The hard laminated film of the present invention can suitably obtain the effect of improving the film hardness by alloying, thinning, and multilayering of two kinds of metal elements, and the wear resistance is further improved. Suitable for use as a hard coating for cutting tools! Be beaten.

Claims

The scope of the claims

[1] A hard laminated film having excellent wear resistance, in which a plurality of first and second films having different compositions are alternately laminated on the surface of a predetermined member.

The first film is MX (B C O N), where M and X are elemental periods a b c 1 a—b-c

Two different metal elements selected from IVa group, Va group, Via group, Al, Si, and Y in the table, a, b, c are atomic ratios, 0≤a≤0.2, 0 ≤b≤0.3, 0≤c≤0.1) and formed by PVD method using MX alloy as a target, while the second coating is ZQ (BCON) (however, Z and Q are both different from M and X del 1-d-e-f

And two different metal elements selected from IVa group, Va group, Via group, Al, Si, and Y in the periodic table of the elements, d, e, and f, respectively, are atomic ratios, 0≤d ≤0.2, 0≤e ≤0.3, 0≤f≤0.1) and is formed by PVD method with ZQ alloy as the target.

In addition, the stacking period t of the thickness of the first coating and the thickness of the second coating is in the range of 0.2 nm to 10 Onm.

Hard laminate film characterized by the above.

[2] The total film thickness D of the hard laminated film in which the first film and the second film are repeatedly laminated at the lamination period t is in the range of 0.2 m to 10 m.

The hard laminated film according to claim 1, wherein:

[3] The component composition of BCON in the first coating and the second coating is equal to each other

The hard laminated film according to claim 1 or 2, wherein:

[4] A hard multilayer coating-coated tool characterized in that the surface is coated with the hard multilayer coating according to any one of claims 1 to 3.

[5] A film forming method for forming the hard laminated film according to claim 3 on a predetermined member by a PVD method,

In the processing vessel, a rotary table that holds the member on the outer peripheral portion and is driven to rotate around one center line;

From the MX alloy disposed circumferentially apart from each other around the rotary table A first target comprising and a second target comprising said ZQ alloy force;

A reaction gas supply device for supplying a predetermined reaction gas determined according to the component composition of the BCON into the processing container;

And continuously rotating the rotary table in one direction around the one center line, so that the member alternately and periodically precedes the first target and the second target. While being allowed to pass through, the reaction gas is supplied into the processing vessel, and the MX alloy and the ZQ alloy are evaporated from the first target and the second target, respectively. The first film is formed on the surface of the member when the member reacts with the reaction gas, and the member passes in front of the first target, and the member passes when the member passes in front of the second target. By forming the second coating on the surface of the member, the first coating and the second coating are alternately and continuously laminated on the surface of the member.

A film forming method characterized by the above.

A plurality of the first targets are arranged at equal angular intervals around the rotary table, and the same number of the second targets as the first target are arranged at equal angular intervals around the rotary table. The first coating and the second coating are laminated on the surface of the member a plurality of periods by one rotation of the turntable.

The film forming method according to claim 5, wherein: