JPWO2008133076A1 - 酸洗用水溶液およびその製造方法ならびに資源回収方法 - Google Patents
酸洗用水溶液およびその製造方法ならびに資源回収方法 Download PDFInfo
- Publication number
- JPWO2008133076A1 JPWO2008133076A1 JP2008553024A JP2008553024A JPWO2008133076A1 JP WO2008133076 A1 JPWO2008133076 A1 JP WO2008133076A1 JP 2008553024 A JP2008553024 A JP 2008553024A JP 2008553024 A JP2008553024 A JP 2008553024A JP WO2008133076 A1 JPWO2008133076 A1 JP WO2008133076A1
- Authority
- JP
- Japan
- Prior art keywords
- aqueous solution
- pickling
- titanium
- potassium
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007864 aqueous solution Substances 0.000 title claims abstract description 184
- 238000005554 pickling Methods 0.000 title claims abstract description 168
- 238000000034 method Methods 0.000 title claims description 77
- 238000004519 manufacturing process Methods 0.000 title claims description 36
- 238000011084 recovery Methods 0.000 title description 34
- 239000010936 titanium Substances 0.000 claims abstract description 113
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 102
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 98
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 93
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 43
- 239000002253 acid Substances 0.000 claims abstract description 40
- 229910001413 alkali metal ion Inorganic materials 0.000 claims abstract description 18
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 190
- -1 hexafluorosilicate ions Chemical class 0.000 claims description 100
- 239000002244 precipitate Substances 0.000 claims description 56
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 40
- 229910017604 nitric acid Inorganic materials 0.000 claims description 40
- 150000002500 ions Chemical class 0.000 claims description 31
- 239000002994 raw material Substances 0.000 claims description 19
- 238000011282 treatment Methods 0.000 claims description 17
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 13
- 238000000909 electrodialysis Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 8
- 238000005342 ion exchange Methods 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 claims description 7
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 5
- 238000005406 washing Methods 0.000 claims description 4
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 3
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 claims description 3
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 52
- 239000010703 silicon Substances 0.000 abstract description 47
- 229910052710 silicon Inorganic materials 0.000 abstract description 45
- 239000002699 waste material Substances 0.000 abstract description 30
- 239000007788 liquid Substances 0.000 abstract description 27
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 24
- 150000004761 hexafluorosilicates Chemical class 0.000 abstract description 19
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 17
- 238000005530 etching Methods 0.000 abstract description 13
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 abstract description 13
- 229910001069 Ti alloy Inorganic materials 0.000 abstract description 11
- 239000000377 silicon dioxide Substances 0.000 abstract description 11
- 239000004408 titanium dioxide Substances 0.000 abstract description 11
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract description 6
- SBEQWOXEGHQIMW-UHFFFAOYSA-N silicon Chemical compound [Si].[Si] SBEQWOXEGHQIMW-UHFFFAOYSA-N 0.000 abstract description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 93
- 239000000243 solution Substances 0.000 description 85
- 238000012360 testing method Methods 0.000 description 59
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 55
- 239000011698 potassium fluoride Substances 0.000 description 48
- 235000003270 potassium fluoride Nutrition 0.000 description 45
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 39
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 35
- 229910001414 potassium ion Inorganic materials 0.000 description 34
- RXCBCUJUGULOGC-UHFFFAOYSA-H dipotassium;tetrafluorotitanium;difluoride Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Ti+4] RXCBCUJUGULOGC-UHFFFAOYSA-H 0.000 description 31
- 238000006243 chemical reaction Methods 0.000 description 28
- 229910052783 alkali metal Inorganic materials 0.000 description 23
- 150000001340 alkali metals Chemical class 0.000 description 23
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 22
- 239000011591 potassium Substances 0.000 description 22
- 229910052700 potassium Inorganic materials 0.000 description 22
- 229910004298 SiO 2 Inorganic materials 0.000 description 20
- 238000004090 dissolution Methods 0.000 description 20
- 239000000203 mixture Substances 0.000 description 19
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 14
- 235000011114 ammonium hydroxide Nutrition 0.000 description 14
- 239000010935 stainless steel Substances 0.000 description 14
- 229910001220 stainless steel Inorganic materials 0.000 description 14
- 239000007789 gas Substances 0.000 description 13
- 229910010413 TiO 2 Inorganic materials 0.000 description 12
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 12
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 11
- 229910001634 calcium fluoride Inorganic materials 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 10
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 9
- 239000003570 air Substances 0.000 description 9
- 238000001914 filtration Methods 0.000 description 9
- 239000011737 fluorine Substances 0.000 description 9
- 229910052731 fluorine Inorganic materials 0.000 description 9
- YOYLLRBMGQRFTN-SMCOLXIQSA-N norbuprenorphine Chemical compound C([C@@H](NCC1)[C@]23CC[C@]4([C@H](C3)C(C)(O)C(C)(C)C)OC)C3=CC=C(O)C5=C3[C@@]21[C@H]4O5 YOYLLRBMGQRFTN-SMCOLXIQSA-N 0.000 description 9
- 239000012488 sample solution Substances 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 6
- 239000003011 anion exchange membrane Substances 0.000 description 6
- 239000003957 anion exchange resin Substances 0.000 description 6
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 6
- 238000005341 cation exchange Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 239000000706 filtrate Substances 0.000 description 6
- 238000007654 immersion Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- AHLATJUETSFVIM-UHFFFAOYSA-M rubidium fluoride Chemical compound [F-].[Rb+] AHLATJUETSFVIM-UHFFFAOYSA-M 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 5
- 239000000920 calcium hydroxide Substances 0.000 description 5
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 238000004821 distillation Methods 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 5
- 239000007800 oxidant agent Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 229910052701 rubidium Inorganic materials 0.000 description 5
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- 238000002798 spectrophotometry method Methods 0.000 description 5
- 230000004580 weight loss Effects 0.000 description 5
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 4
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010494 dissociation reaction Methods 0.000 description 4
- 230000005593 dissociations Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 239000002436 steel type Substances 0.000 description 4
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 3
- QGHDLJAZIIFENW-UHFFFAOYSA-N 4-[1,1,1,3,3,3-hexafluoro-2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical group C1=C(CC=C)C(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C(CC=C)=C1 QGHDLJAZIIFENW-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000003456 ion exchange resin Substances 0.000 description 3
- 229920003303 ion-exchange polymer Polymers 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 239000004323 potassium nitrate Substances 0.000 description 3
- 235000010333 potassium nitrate Nutrition 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 229910017855 NH 4 F Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 229910001963 alkali metal nitrate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003411 electrode reaction Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000005098 hot rolling Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 239000002440 industrial waste Substances 0.000 description 2
- 229910001512 metal fluoride Inorganic materials 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- PWIGYBONXWGOQE-UHFFFAOYSA-N alizarin complexone Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(CN(CC(O)=O)CC(=O)O)C(O)=C2O PWIGYBONXWGOQE-UHFFFAOYSA-N 0.000 description 1
- 150000001339 alkali metal compounds Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000538 analytical sample Substances 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000005097 cold rolling Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- WSLQHGMJTGELSF-UHFFFAOYSA-L dipotassium;difluoride Chemical compound [F-].[F-].[K+].[K+] WSLQHGMJTGELSF-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 229940104869 fluorosilicate Drugs 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- DLAPQHBZCAAVPQ-UHFFFAOYSA-N iron;pentane-2,4-dione Chemical compound [Fe].CC(=O)CC(C)=O DLAPQHBZCAAVPQ-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- LXPCOISGJFXEJE-UHFFFAOYSA-N oxifentorex Chemical compound C=1C=CC=CC=1C[N+](C)([O-])C(C)CC1=CC=CC=C1 LXPCOISGJFXEJE-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 235000021110 pickles Nutrition 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 230000000192 social effect Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001256 steam distillation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/36—Regeneration of waste pickling liquors
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/10—Other heavy metals
- C23G1/106—Other heavy metals refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Silicon Compounds (AREA)
- Treatment Of Water By Ion Exchange (AREA)
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
- Removal Of Specific Substances (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
H2TiF6+2KF→K2TiF6+2HF (1)式
H2SiF6+2KF→K2SiF6+2HF (2)式
H2TiF6+2KNO3→K2TiF6+2HNO3 (3)式
H2SiF6+2KNO3→K2SiF6+2HNO3 (4)式
2K++SiF6 2−→K2SiF6 (5)式
K2TiF6+4NH3+4H2O→Ti(OH)4+2KF+4NH4F (6)式
K2SiF6+4NH3+4H2O→SiO2・nH2O+2KF+4NH4F
+(2−n)H2O (7)式
Ti(OH)4→TiO2+2H2O (8)式
SiO2・nH2O→SiO2+nH2O (9)式
NH4F+KOH→KF+NH3+H2O (10)式
2NH4F+Ca(OH)2→CaF2+2NH3+2H2O (11)式
(工程A)必要に応じて、ふっ化水素を前記の水溶液に添加する工程:
(工程B)アルカリ金属イオンを前記の水溶液に添加する工程:および
(工程C)前記の工程AおよびBを行なうことにより生じた沈殿物を分離する工程。
(工程D)前記の工程Cにより沈殿物を分離した水溶液に、ヘキサフルオロけい酸イオンを添加する工程:および
(工程E)前記の工程Dにより生じた沈殿物を分離する工程。
(工程F)必要に応じて、ふっ化水素を前記の水溶液に添加する工程:
(工程G)アルカリ金属イオンを前記の水溶液に添加する工程:
(工程H)前記の水溶液中に含まれる3価のチタンのふっ化物を酸化して、4価のチタンのふっ化物に変える工程:および
(工程I)前記の工程F、GおよびHを行なうことにより生じた沈殿物を分離する工程。
(工程J)前記の工程Iにより沈殿物を分離した水溶液に、ヘキサフルオロけい酸イオンを添加する工程:および
(工程K)前記の工程Jにより生じた沈殿物を分離する工程。
(工程L)前記の(5)に記載の工程C、および/または前記の(6)に記載の工程E、および/または前記の(7)に記載の工程I、および/または前記の(8)に記載の工程Kにより分離した沈殿物にアンモニアを添加する工程:
(工程M)前記の工程Lにより生じた沈殿物を分離する工程:
(工程N)前記の工程Mにより分離した沈殿物を洗浄した後、加熱、焼成する工程:
(工程O)前記の工程Mにより沈殿物を分離した水溶液に、必要に応じて、アルカリ金属の水酸化物、および/またはアルカリ土類金属の水酸化物を添加した後、アンモニアを分離する工程:
(工程P)前記の工程Oにより生じた沈殿物を分離する工程:および
(工程Q)前記の工程O、または前記の工程OおよびPにより得られた水溶液を電気透析処理またはイオン交換処理する工程。
2 撹拌機
3 ヒーター
4 温度センサー
5 pHセンサー
6 冷却器
7 冷却水
8 留出液受槽
9 留出液
10 送入管
11 排出管
12 ガス送入管
13 ガス排出管
14−1〜3 バルブ
15 電解槽
16 陽極
17 陰極
18−1、2 陽イオン交換膜
19 陰イオン交換膜
20 直流電源
21 導線
22〜25 セル(小室)
26 イオン交換樹脂容器
27−1、2 多孔板
28 液送入管
29 液排出管
30 イオン交換樹脂
2H2O+2e→2OH−+H2 (12)式
このようにして、セル25中の水酸化カリウム水溶液の濃度は電気透析が進むにつれて高くなるので、適当な濃度に達したら、これをアンモニア蒸留処理のために再利用することができる。
2H2O→4H++O2+4e (13)式
KF+R+OH−→KOH+R+F− (14)式
H2O+R+F−→HF+R+OH− (15)式
H2SiF6→2H++SiF6 2− (16)式
(NH4)2SiF6→2NH4 ++SiF6 2− (17)式
これらの廃液中には、下記の(18)式や(19)式の反応によって、ガラスの主成分である二酸化けい素(SiO2)や金属けい素(Si)が溶解して生じたヘキサフルオロけい酸が含まれる。
SiO2+6HF→H2SiF6+2H2O (18)式
Si+6HF+2HNO3→H2SiF6+2HNO2+2H2O (19)式
。
これは、本発明例においては、添加したふっ化カリウムがヘキサフルオロチタン酸やヘキサフルオロけい酸と反応して、ふっ化水素酸を生成したためと推測される。
ためにも利用される可能性が大きい。
Claims (9)
- 容積1dm3中に、硝酸10〜600g、ふっ化水素酸1〜200gおよびアルカリ金属イオン0.02〜200gを含有し、さらに、ヘキサフルオロチタン酸イオン50g未満およびヘキサフルオロけい酸イオン50g未満の一方または双方を含有することを特徴とする酸洗用水溶液。
- 容積1dm3中に、ふっ化水素酸1〜200g、アルカリ金属イオン0.02〜200gおよびヘキサフルオロチタン酸イオン50g未満を含有し、さらに、ヘキサフルオロけい酸イオン50g未満を含有すること、または、ヘキサフルオロけい酸イオンを含有しないことを特徴とする酸洗用水溶液。
- 後記の請求項5または6に記載の方法で製造したことを特徴とする、請求項1に記載の酸洗用水溶液。
- 後記の請求項7または8に記載の方法で製造したことを特徴とする、請求項2に記載の酸洗用水溶液。
- 硝酸およびふっ化水素酸を含有し、さらに、チタンおよび/またはけい素のふっ化物を含有する水溶液を原料として、後記の工程A、BおよびCの一部または全部を行なうことを特徴とする酸洗用水溶液の製造方法:
(工程A)必要に応じて、ふっ化水素を前記の水溶液に添加する工程:
(工程B)アルカリ金属イオンを前記の水溶液に添加する工程:および
(工程C)前記の工程AおよびBを行なうことにより生じた沈殿物を分離する工程。 - さらに後記の工程DおよびEを行なうことを特徴とする請求項5に記載の酸洗用水溶液の製造方法:
(工程D)前記の工程Cにより沈殿物を分離した水溶液に、ヘキサフルオロけい酸イオンを添加する工程:および
(工程E)前記の工程Dにより生じた沈殿物を分離する工程。 - ふっ化水素酸およびチタンのふっ化物を含有する水溶液を原料とし、後記の工程F、G、HおよびIの一部または全部を行なうことを特徴とする酸洗用水溶液の製造方法:
(工程F)必要に応じて、ふっ化水素を前記の水溶液に添加する工程:
(工程G)アルカリ金属イオンを前記の水溶液に添加する工程:
(工程H)前記の水溶液中に含まれる3価のチタンのふっ化物を酸化して、4価のチタンのふっ化物に変える工程:および
(工程I)前記の工程F、GおよびHを行なうことにより生じた沈殿物を分離する工程。 - さらに後記の工程JおよびKを行なうことを特徴とする請求項7に記載の酸洗用水溶液の製造方法:
(工程J)前記の工程Iにより沈殿物を分離した水溶液に、ヘキサフルオロけい酸イオンを添加する工程:および
(工程K)前記の工程Jにより生じた沈殿物を分離する工程。 - 後記の工程L、M、N、O、PおよびQの一部または全部を行なうことを特徴とする、酸洗用水溶液の製造に伴う資源回収方法:
(工程L)請求項5に記載の工程C、および/または請求項6に記載の工程E、および/または請求項7に記載の工程I、および/または請求項8に記載の工程Kにより分離した沈殿物にアンモニアを添加する工程:
(工程M)前記の工程Lにより生じた沈殿物を分離する工程:
(工程N)前記の工程Mにより分離した沈殿物を洗浄した後、加熱、焼成する工程:
(工程O)前記の工程Mにより沈殿物を分離した水溶液に、必要に応じて、アルカリ金属の水酸化物、および/またはアルカリ土類金属の水酸化物を添加した後、アンモニアを分離する工程:
(工程P)前記の工程Oにより生じた沈殿物を分離する工程:および(工程Q)前記の工程O、または前記の工程OおよびPにより得られた水溶液を電気透析処理またはイオン交換処理する工程。
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007109049 | 2007-04-18 | ||
JP2007109049 | 2007-04-18 | ||
JP2007136251 | 2007-05-23 | ||
JP2007136251 | 2007-05-23 | ||
JP2007215464 | 2007-08-22 | ||
JP2007215464 | 2007-08-22 | ||
PCT/JP2008/057259 WO2008133076A1 (ja) | 2007-04-18 | 2008-04-14 | 酸洗用水溶液およびその製造方法ならびに資源回収方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP4363494B2 JP4363494B2 (ja) | 2009-11-11 |
JPWO2008133076A1 true JPWO2008133076A1 (ja) | 2010-09-09 |
JP4363494B6 JP4363494B6 (ja) | 2010-11-17 |
Family
ID=39925534
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008553024A Expired - Fee Related JP4363494B2 (ja) | 2007-04-18 | 2008-04-14 | 酸洗用水溶液およびその製造方法ならびに資源回収方法 |
JP2008553024D Active JP4595048B2 (ja) | 2007-04-18 | 2008-04-14 | 酸洗用水溶液およびその製造方法ならびに資源回収方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008553024D Active JP4595048B2 (ja) | 2007-04-18 | 2008-04-14 | 酸洗用水溶液およびその製造方法ならびに資源回収方法 |
Country Status (2)
Country | Link |
---|---|
JP (2) | JP4363494B2 (ja) |
WO (1) | WO2008133076A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI362367B (en) * | 2009-02-20 | 2012-04-21 | Kismart Corp | Electrodialysis method for purifying of silicate-containing potassium hydroxide etching solution |
FR2946364B1 (fr) * | 2009-06-05 | 2013-01-04 | Airbus France | Procede de regeneration d'une solution de decapage ou d'usinage chimique de titane |
JP5060607B2 (ja) * | 2009-10-01 | 2012-10-31 | リマテック株式会社 | 混酸廃液の処理方法 |
JP5770049B2 (ja) * | 2011-08-29 | 2015-08-26 | 株式会社アナック | フッ酸含有処理液の再生方法及び再生装置 |
CN114455776B (zh) * | 2021-12-21 | 2022-12-06 | 中煤科工集团杭州研究院有限公司 | 一种基于生物脱氮的不锈钢酸洗废水处理方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06116782A (ja) * | 1992-10-02 | 1994-04-26 | Nippon Alum Co Ltd | チタン材のめっき前処理方法 |
JPH08218185A (ja) * | 1995-02-10 | 1996-08-27 | Tanaka Kikinzoku Kogyo Kk | チタニウム及びチタニウム合金の白金めっき前処理用粗面化エッチング液並びに白金めっき前処理用粗面化エッチング方法 |
JP2002115083A (ja) * | 2000-07-31 | 2002-04-19 | Mitsubishi Chemicals Corp | エッチング液およびその製造方法ならびにエッチング方法および半導体装置の製造方法 |
JP2002121689A (ja) * | 2000-10-12 | 2002-04-26 | Kawasaki Steel Corp | ステンレス鋼用の酸洗液およびステンレス鋼の酸洗方法 |
JP2005052794A (ja) * | 2003-08-07 | 2005-03-03 | Shigeru Kitani | 水溶液の処理方法および装置 |
-
2008
- 2008-04-14 JP JP2008553024A patent/JP4363494B2/ja not_active Expired - Fee Related
- 2008-04-14 WO PCT/JP2008/057259 patent/WO2008133076A1/ja active Application Filing
- 2008-04-14 JP JP2008553024D patent/JP4595048B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06116782A (ja) * | 1992-10-02 | 1994-04-26 | Nippon Alum Co Ltd | チタン材のめっき前処理方法 |
JPH08218185A (ja) * | 1995-02-10 | 1996-08-27 | Tanaka Kikinzoku Kogyo Kk | チタニウム及びチタニウム合金の白金めっき前処理用粗面化エッチング液並びに白金めっき前処理用粗面化エッチング方法 |
JP2002115083A (ja) * | 2000-07-31 | 2002-04-19 | Mitsubishi Chemicals Corp | エッチング液およびその製造方法ならびにエッチング方法および半導体装置の製造方法 |
JP2002121689A (ja) * | 2000-10-12 | 2002-04-26 | Kawasaki Steel Corp | ステンレス鋼用の酸洗液およびステンレス鋼の酸洗方法 |
JP2005052794A (ja) * | 2003-08-07 | 2005-03-03 | Shigeru Kitani | 水溶液の処理方法および装置 |
Also Published As
Publication number | Publication date |
---|---|
JP4595048B2 (ja) | 2010-12-08 |
WO2008133076A9 (ja) | 2009-04-23 |
JP4363494B2 (ja) | 2009-11-11 |
WO2008133076A1 (ja) | 2008-11-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5392576B2 (ja) | けい素、チタンおよびふっ素の回収方法 | |
JP4595048B2 (ja) | 酸洗用水溶液およびその製造方法ならびに資源回収方法 | |
CS274470B2 (en) | Method of acids winning or recovery from their metals containing solutions | |
CN102828025A (zh) | 从石煤钒矿中提取v2o5的方法 | |
CN105385851A (zh) | 酸洗废液的处理方法 | |
CN102851506A (zh) | 废太阳能电池片退银回收方法 | |
JP4579682B2 (ja) | 金属酸洗い浴をリサイクルするための方法および装置 | |
JP2013249494A (ja) | 複合酸化物を経由する貴金属の回収方法および装置 | |
JP2016029007A (ja) | 酸洗い溶液から硝酸を回収するためのシステムおよび方法 | |
Nalivaiko et al. | Preparation of aluminum hydroxide during the synthesis of high purity alumina via aluminum anodic oxidation | |
JP4688399B2 (ja) | 鉄塩酸処理廃液から塩酸を回収する方法 | |
JP4843895B2 (ja) | 水溶液の処理方法および装置 | |
CN113582468A (zh) | 不锈钢酸洗废酸液处理系统及处理方法 | |
JP4292454B2 (ja) | 金属フッ化物を含有する水溶液の処理方法 | |
US4462911A (en) | Detoxification or decontamination of effluents and/or flue gases | |
RU2289638C1 (ru) | Способ регенерации отработанных травильных кислотных растворов, образующихся при обработке титановых сплавов | |
WO2005092786A1 (ja) | フッ化水素酸の精製法及び精製装置 | |
CN215667627U (zh) | 不锈钢酸洗废酸液处理系统 | |
JP2007131885A (ja) | 鋼材の酸洗方法及び鋼材酸洗液 | |
CN108408960B (zh) | 一种回收处理含铁的酸洗报废液的方法 | |
CN113046557A (zh) | 一种含锌含铁废盐酸综合回收利用方法 | |
JP3800122B2 (ja) | チタンのフッ化物イオンを含む水溶液中の不純物金属イオンの除去方法 | |
CN108178127A (zh) | 氢氟酸中砷的去除方法 | |
US3647686A (en) | Method of treating industrial waste water without contamination of the environment | |
JP2003230888A (ja) | 金属フッ化物を含有する水溶液の処理方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090804 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090810 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120828 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
CANC | Cancellation of a right after registration | ||
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120828 Year of fee payment: 3 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100523 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100706 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100716 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131001 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |