JPWO2005029142A1 - Silver mirror and manufacturing method thereof - Google Patents

Silver mirror and manufacturing method thereof Download PDF

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JPWO2005029142A1
JPWO2005029142A1 JP2005513995A JP2005513995A JPWO2005029142A1 JP WO2005029142 A1 JPWO2005029142 A1 JP WO2005029142A1 JP 2005513995 A JP2005513995 A JP 2005513995A JP 2005513995 A JP2005513995 A JP 2005513995A JP WO2005029142 A1 JPWO2005029142 A1 JP WO2005029142A1
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film
silver
aluminum oxide
silver mirror
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JP4351678B2 (en
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寺田 佳之
佳之 寺田
明夫 落合
明夫 落合
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Murakami Corp
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/08Mirrors
    • G02B5/0816Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/085Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
    • G02B5/0858Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising a single metallic layer with one or more dielectric layers

Abstract

本発明は、環境に有害な物質を使用せず、より単純な膜構成で、高温高湿環境下での実用的な耐久性に優れ、しかも可視領域で98%以上の分光反射率を有する銀鏡を提供することを課題とする。 本発明は、例えば図1に示すように、基体1上に少なくとも反射膜として銀膜3が形成されてなる銀鏡において、前記銀膜3の両面に直接酸化アルミニウムを主体とする膜2、4が形成された構造を有することを特徴とする。また、前記銀膜3の両面側に形成された酸化アルミニウムを主体とする膜2、4が、いずれも膜密度がバルク比0.95以上(好ましくはバルク比0.97以上)の膜であることを特徴とする。The present invention is a silver mirror that does not use environmentally harmful substances, has a simpler film structure, has excellent practical durability in a high-temperature and high-humidity environment, and has a spectral reflectance of 98% or more in the visible region. It is an issue to provide. In the present invention, for example, as shown in FIG. 1, in a silver mirror in which a silver film 3 is formed at least as a reflection film on a substrate 1, films 2, 4 mainly composed of aluminum oxide are directly formed on both surfaces of the silver film 3. It has the structure formed. Further, the films 2 and 4 mainly composed of aluminum oxide formed on both sides of the silver film 3 are films having a film density of 0.95 or more (preferably bulk ratio of 0.97 or more). It is characterized by that.

Description

本発明は、銀鏡およびその製造方法等に関する。  The present invention relates to a silver mirror and a manufacturing method thereof.

銀鏡は反射率が高く分光反射特性がフラットであるという特性を有するが、耐腐食性に問題があるので実用化が基本的に難しい。
特に、高温高湿環境下での耐久性が要求される液晶プロジェクター等の内部部品として使用される銀鏡の場合、実用的な耐久性があると考えられるものは数える程度しかない。
液晶プロジェクター等の内部部品として使用される銀鏡として実用的な耐久性があり使用実績があるものとして、バルツェルス社の特開平6−313803号公報(特許文献1)に記載の銀鏡が知られている。この銀鏡は、銀層の上下に直接又は他の層を介してZnSなどの誘電体材料層を設けて高温高湿環境下での実用的な耐久性を向上させている。具体的な膜構成は、例えば、基材/ZnS/Ag/遮蔽層(MgF、Y等)/ZnSかあるいはさらに他の層を介在させた構成である。
しかしながら、特開平6−313803号公報(特許文献1)に記載の銀鏡は、銀鏡としての高反射率は維持しているものの、銀膜とZnS膜との間に好ましくない反応が起こらないようにするため遮蔽層(中間層)を必要としているので、膜構造が複雑であるという問題がある。また、ZnSのような環境に有害な物質を使用しなければならない点が難点である。さらに、ZnSの使用は、装置の老朽化を早め、排気ポンプに対する負荷が大きく(排気ポンプの寿命が短い)、ZnS使うと専用装置になるので他の成膜に使用できない(Sは亜硫酸ガス等の有毒なイオウ化合物を発生するため)、といった問題がある。
液晶プロジェクター等の光学機器の内部部品として使用される銀鏡として実用的な耐久性があると考えられるものとして、特開平5−127004号公報(特許文献2)記載の銀鏡が挙げられる。具体的な膜構成は、基板/下地層/Cr膜/Ag膜/Cr膜/保護層である。
しかしながら、特開平5−127004号公報(特許文献2)記載の銀鏡は、クロム膜の影響で分光反射率が低下し銀鏡の最大の利点である高反射率が損なわれるという致命的な問題がある。また、膜構造が非常に複雑であるという問題がある。さらに、クロムは環境に有害な物質(Cr単体は無害であるが有害物質である6価クロムに変化する)であるという問題がある。
本発明は上述した背景の下になされたものであり、環境に有害な物質を使用せず、より単純な膜構成で、高温高湿環境下での実用的な耐久性に優れ、しかも銀鏡としての高反射率を特開平6−313803号公報に記載の銀鏡と同等以上に維持できる銀鏡の提供を目的とする。
Silver mirrors have the characteristic that the reflectance is high and the spectral reflection characteristics are flat, but they are basically difficult to put into practical use due to the problem of corrosion resistance.
In particular, in the case of a silver mirror used as an internal part of a liquid crystal projector or the like that is required to be durable in a high temperature and high humidity environment, there are only a few that are considered to have practical durability.
As a silver mirror used as an internal part of a liquid crystal projector or the like, a silver mirror described in Japanese Patent Application Laid-Open No. 6-313803 (Patent Document 1) by Bartz is known as a practical and durable product. . In this silver mirror, a dielectric material layer such as ZnS is provided directly above and below the silver layer or via another layer to improve practical durability in a high temperature and high humidity environment. A specific film configuration is, for example, a configuration in which a base material / ZnS / Ag / shielding layer (MgF, Y 2 O 3 etc.) / ZnS or another layer is interposed.
However, the silver mirror described in JP-A-6-313803 (patent document 1) maintains high reflectivity as a silver mirror, but does not cause an undesirable reaction between the silver film and the ZnS film. Therefore, since a shielding layer (intermediate layer) is required, there is a problem that the film structure is complicated. In addition, it is difficult to use environmentally harmful substances such as ZnS. Furthermore, the use of ZnS accelerates the aging of the apparatus, the load on the exhaust pump is large (the exhaust pump has a short life), and if ZnS is used, it becomes a dedicated apparatus and cannot be used for other film formation (S is sulfurous acid gas, etc.) Of toxic sulfur compounds).
A silver mirror described in Japanese Patent Application Laid-Open No. 5-127004 (Patent Document 2) can be cited as a silver mirror used as an internal part of an optical apparatus such as a liquid crystal projector. A specific film configuration is substrate / underlayer / Cr film / Ag film / Cr film / protective layer.
However, the silver mirror described in JP-A-5-127004 (Patent Document 2) has a fatal problem that the spectral reflectance is lowered due to the influence of the chromium film and the high reflectance, which is the greatest advantage of the silver mirror, is impaired. . There is also a problem that the film structure is very complicated. Furthermore, chromium has a problem that it is a harmful substance to the environment (Cr alone is harmless but changes to hexavalent chromium which is a harmful substance).
The present invention has been made under the background described above, does not use environmentally harmful substances, has a simpler film structure, is excellent in practical durability under a high temperature and high humidity environment, and is used as a silver mirror. An object of the present invention is to provide a silver mirror capable of maintaining the high reflectance of the silver mirror as high as or higher than that of the silver mirror described in JP-A-6-313803.

本発明の請求項1記載の発明は、基体上に少なくとも反射膜として銀膜が形成されてなる銀鏡において、前記銀膜の両面に直接酸化アルミニウムを主体とする膜が形成された構造を有し、前記銀膜の両面側に形成された酸化アルミニウムを主体とする膜が、いずれも膜密度がバルク比0.95以上の膜であるすることを特徴とする。ここで膜密度がバルク比0.95以上の膜は、γ−アルミナ密度(ργ−Al2O3=3.99g/cm)の膜状態での見掛け比重(×0.95)が3.79g/cm以上の膜でもある。
本発明者らは、第1に、銀膜の両面側に形成された酸化アルミニウムを主体とする膜が、いずれも膜密度がバルク比0.95以上(好ましくはバルク比0.97以上)の膜とすることによって、高温高湿環境下での耐久性が要求される液晶プロジェクターやデジタルライトプロセッサー(DLP)等の内部部品として本発明の銀鏡が使用された場合であっても、実用上十分な耐熱性・耐湿性を有することを見い出した。しかも、本発明の銀鏡は、ZnSやCrなどの環境に有害な物質を使用せずに高温高湿環境下での実用上十分な耐熱性・耐湿性を実現できるものである。また、膜密度がバルク比0.95以上(好ましくはバルク比0.97以上)の酸化アルミニウムを主体とする膜の膜付着強度は、実用上十分な膜付着強度を有していることを見い出した。本発明では、具体的には、テープ剥離試験(JIS D0202)において、JIS1級、耐熱・耐湿試験後におけるテープ剥離試験において、JIS3級ともに、膜の剥がれのない膜付着強度を有していることが好ましい。
前記高温高湿環境下での実用上十分な耐熱性・耐湿性を実現できる理由は、通常の蒸着膜に比べ酸化アルミニウムを主体とする上記所定密度以上の緻密な膜を形成しているため耐湿性・耐熱性が向上するものと考えられる。従来の銀鏡では、銀膜の上層又は下層の一方に通常の蒸着法によってAl膜を形成することは知られているが、銀膜の上層又は下層の一方に形成しても本発明の効果は得られず、通常の蒸着法によって銀膜の両面にAl膜を形成したとしても本発明の効果は得られない。さらに、従来のAl層を有する銀鏡では、カメラ、複写機、プリンタ、望遠鏡等の比較的低温で使用される用途しか意図していない(液晶プロジェクターやDLP等の用途を意図して開発されていない)ので、通常の蒸着法によるAlである程度の耐熱性・耐湿性等を実現できれば十分であったという背景がある。
本発明者らは、第2に、銀膜の両面に直接酸化アルミニウムを主体とする上記所定密度以上の緻密な膜が形成された構造を有すること、即ち銀膜が酸化アルミニウムを主体とする上記所定密度以上の緻密な膜でサンドイッチされた構造とすることによって、例えば200℃の高温下に長時間(例えば24時間)おかれた場合であっても、熱によってAgが凝集して(集まって)ピンホールができ、反射率が低下することを抑制・防止できることを見い出した。この理由は明らかではないが、銀膜の上層及び/又は下層を他の層と置き換えると熱によってAgが凝集してピンホールが発生することから、本発明による酸化アルミニウムを主体とする所定密度以上の緻密な膜と銀膜との親和性が良く、銀膜の上層及び下層に形成された2つの酸化アルミニウムを主体とする所定密度以上の緻密な膜の相乗効果によって、熱によるAgの凝集を抑制・防止する作用が発揮されるものと考えられる。なお、通常の蒸着法によって銀膜の両面にAl膜を形成したとしてもかかる効果は得られない。
本発明の請求項2記載の発明は、請求項1記載の発明において、前記銀膜の両面側に形成された酸化アルミニウムを主体とする膜が、いずれももスパッタリング法、RF蒸着法、イオンプレーティング法、イオンビームアシスト蒸着法(Ion Beam Assisted Deposition)、クラスターイオンビーム(Ionized Cluster Beam)蒸着法、又は、プラズマイオンビーム蒸着法によって形成された膜であることを特徴とする。
本発明者らは、銀膜の両面側に形成された酸化アルミニウムを主体とする膜が、いずれも上記方法によって形成された膜とすることによって、膜密度がバルク比0.95以上(更にはバルク比0.97以上)の酸化アルミニウムを主体とする膜が得られ、高温高湿環境下での耐久性が要求される液晶プロジェクターやDLP等の内部部品として本発明の銀鏡が使用された場合であっても、実用上十分な耐熱性・耐湿性を有することを見い出した。しかも、上記方法によって形成された膜は、実用上十分な膜付着強度を実現できる。
本発明において、上記方法によって形成された酸化アルミニウムを主体とする膜は、通常の蒸着膜に比べ、緻密度が高く、膜密度がバルク比0.95以上(更にはバルク比0.97以上)の酸化アルミニウムを主体とする膜を得ることができ、耐湿性が高く、酸素等の透過性が低く、耐熱性が高く、屈折率が高く、密度が高く、光学特性(透過率・反射率)が良好で、膜質が良好である。
本発明の請求項3記載の発明は、上記本発明において、前記銀膜の両面側に形成された酸化アルミニウムを主体とする膜の双方又はいずれか一方が、アルミニウム、酸素、窒素を含む膜であることを特徴とする。
本発明者らは、銀膜の両面側に形成された酸化アルミニウムを主体とする膜の双方又はいずれか一方が、アルミニウム、酸素、窒素を含む膜とすることによって、高温高湿環境下での耐久性が要求される液晶プロジェクターやDLP等の内部部品として本発明の銀鏡が使用された場合であっても、実用上十分な耐熱性・耐湿性を有することを見い出した。しかも、このアルミニウム、酸素、窒素を含む酸化アルミニウムを主体とする膜は、実用上十分な膜付着強度を実現できる。
本発明の請求項4記載の発明は、上記請求項1〜3記載の銀鏡において、基体とは反対側の酸化アルミニウムを主体とする膜上に、分光反射率を向上させるための層を設けたことを特徴とする。
請求項1〜3記載の発明では、上層側(基体とは反対側)の酸化アルミニウムを主体とする膜により短波長側(400nm付近)の分光反射率は低下するが、請求項4記載の発明では、分光反射率を向上させるための層によって分光反射率の低下を抑えることでき、したがって優れた短波長側の分光反射率を実現できる。
具体的には、短波長側の分光反射率は、上層側の酸化アルミニウムを主体とする膜と、その上に成膜するSiOなどの低屈折率物質膜(L)と、TiO、Ta、Nbなどの高屈折率物質膜(H)との各膜厚を調整することで調整できる(図1参照)。L,Hの順番はどちらが先でもよいが、酸化アルミニウムを主体とする膜/L/Hの順番の方が分光反射率は優れる。酸化アルミニウムを主体とする膜/H/Lの順番の場合は分光反射率は多少低下するが、物理的な膜強度は向上する。一番単純な構成の場合、酸化アルミニウムを主体とする膜/Hだけでも高い分光反射率(高反射率)を実現できる。L/Hを2度3度繰り返し積層すことによりさらに高反射鏡とすることができる。
酸化アルミニウムを主体とする膜/L/Hの順番の場合、可視光域で平均98%以上の分光反射率を実現でき、銀鏡としての高反射率を特開平6−313803号公報に記載の銀鏡と同等以上に維持できる(請求項5)。
なお、本発明において、下層側の酸化アルミニウムを主体とする膜は、密着性向上や基板ガラスから溶出するアルカリの進入を防ぐ役割も果たす。
本発明の請求項6記載の発明は、上記請求項1〜5のいずれか1項に記載の銀鏡において、前記銀鏡が、液晶プロジェクターやDLP等の光学機器の内部部品として使用される銀鏡であることを特徴とする。
請求項6記載の発明は、本発明の銀鏡が、液晶プロジェクターやDLPの内部部品として使用される銀鏡として特に適しこの用途における膜構成の単純化を初めて実現したものであるため規定したものである。なお、本発明の銀鏡は、高温高湿環境下での実用上十分な耐熱性・耐湿性を要求される他の光学製品の用途にも特に適する。本発明の銀鏡は、高温高湿環境下での実用上十分な耐熱性・耐湿性を有する結果として、それほど過酷な環境下で使用されることのない他の光学製品や光学機器の用途にも使用することができ、この場合従来に比べ耐久性や信頼性を飛躍的に向上させることが可能である。
本発明の請求項7記載の発明は、上記請求項1〜6のいずれか1項に記載の銀鏡の製造方法であって、銀鏡を構成する全ての膜を大気中に開放することなく連続成膜し、かつ、銀膜の両面側に形成する酸化アルミニウムを主体とする膜は、いずれもスパッタリング法、RF蒸着法、イオンプレーティング法、イオンビームアシスト蒸着法(Ion Beam Assisted Deposition)、クラスターイオンビーム(Ionized Cluster Beam)蒸着法、又は、プラズマイオンビーム蒸着法によって形成することを特徴とする銀鏡の製造方法である。
請求項7記載の発明のように、大気開放なしに、銀鏡を構成する全ての膜を1つの蒸着装置で連続成膜することによって、上述した本発明に特徴的な効果の発現に有利である共に、欠陥が少なく、高反射率で高品質の銀鏡を製造できる。また、酸化アルミニウムを主体とする膜/銀膜/酸化アルミニウムを主体とする膜をこの順で積層した層と、この層の上に形成される分光反射率を向上させるための層(例えばSiOやTiOなど)との応力バランスを実現できるので、膜同士の密着性が良好である。
なお、連続成膜に際し、酸化アルミニウムを主体とする膜/銀膜/酸化アルミニウムを主体とする膜の成膜が終了するまでの間は、基板加熱をしないことが好ましい。加熱しながら銀膜を成膜すると、(1)銀膜が凝集してピンホールが発生すること、(2)銀膜が黄変すること、(3)生産性が低くなること、などの問題があるため、これらの問題を回避するためである。なお、酸化アルミニウムを主体とする膜/銀膜/酸化アルミニウムを主体とする膜の成膜が終了した後に、加熱を行うと密着性が良くなるので好ましい。
本発明の請求項8記載の発明は、上記請求項1〜6のいずれか1項に記載の銀鏡の製造方法であって、酸化アルミニウムを主体とする膜/銀膜/酸化アルミニウムを主体とする膜の成膜後に、分光反射率を向上させる熱処理を行うことを特徴とする銀鏡の製造方法である。
請求項8記載の発明のように、酸化アルミニウムを主体とする膜/銀膜/酸化アルミニウムを主体とする膜の成膜後に、分光反射率を向上させる熱処理を行うことによって、熱処理を行わない場合に比べ分光反射率を向上させることができる。この熱処理は、具体的には50〜250℃(好ましくは70〜200℃)で、1〜120時間(好ましくは20〜72時間)である。この熱処理は、耐熱性試験の温度条件や耐湿性・耐腐蝕性試験の温度条件を前記範囲内とすることによって、耐熱性試験や耐湿性・耐腐蝕性試験と同時に分光反射率を向上させる熱処理を行うことができ効率的である。
上記各本発明においては、図1に示すように、基体1/酸化アルミニウムを主体とする膜2/銀膜3/酸化アルミニウムを主体とする膜4/分光反射率を向上させるための層5からなる銀表面鏡を構成することができる。各層の膜厚は、酸化アルミニウムを主体とする膜2が100〜300オングストローム、銀膜3が1000〜1200オングストローム、酸化アルミニウムを主体とする膜4が10〜500オングストローム、の範囲とすることが好ましい。分光反射率や耐久性を向上させるためである。
上記各本発明において、酸化アルミニウムを主体とする膜としては、酸化アルミニウム(Al)の他、酸窒化アルミニウム(AlO)などのアルミニウム、酸素、窒素を含む膜や、これらに水素等を含む膜が挙げられる。
上記各本発明においては、銀膜の両面に直接酸化アルミニウムを主体とする膜を形成することが好ましい。これは、酸化アルミニウムを主体とする膜は銀膜との相性が良いため密着性が良いからであり、また膜構成を最も単純化できるからである。もちろん、銀膜の両面側に他の層を介して酸化アルミニウムを主体とする膜を形成しても、銀膜の両面側から膜密度がバルク比0.95以上(好ましくはバルク比0.97以上)の緻密な酸化アルミニウムを主体とする膜で挟まれているので、高温高湿環境下での実用上十分な耐熱性・耐湿性を得ることが可能である。
上記各本発明において、銀膜としては、Ag膜の他、Ag膜に本発明の趣旨を損なわぬ範囲で他成分を含んだ膜や、Ag膜に本発明の趣旨を損なわぬ範囲で不純物を含んだ膜が挙げられる。例えば、銀膜として、Agに微量のパラジウム(Pd)、タンタル(Ta)、Nd(ネオジム)等の金属を混ぜた合金や、あるいはAg膜上にPd,Ta,Nd膜やAgPd,AgTa,AgNd合金膜を薄くコートしたものを使用でき、高温高湿環境下での耐熱性や耐湿性等のさらなる向上や、信頼性のさらなる向上を図ることが可能であるので好ましい。Agに微量のPd,Ta,Ndを混ぜる場合、本発明では既に銀膜の両面側に酸化アルミニウムを主体とする上記所定密度以上の緻密な膜が形成されており高温高湿環境下での実用上十分な耐久性を有しているので、Pd,Ta,Ndの量が極微量であってもさらなる信頼性の向上を図ることが可能である。Ag膜上にPd,Ta,Nd膜やAgPd,AgTa,AgNd合金膜を薄くコートする場合も同様である。
上記各本発明において、基体としては、光学製品に利用される基体や基板が含まれる。
The invention according to claim 1 of the present invention is a silver mirror in which a silver film is formed at least as a reflective film on a substrate, and has a structure in which films mainly composed of aluminum oxide are directly formed on both surfaces of the silver film. The films mainly composed of aluminum oxide formed on both sides of the silver film are films having a film density of 0.95 or more in bulk ratio. Here, a film having a bulk density of 0.95 or more has an apparent specific gravity (× 0.95) of 3.79 g / in the film state of γ- alumina density (ρ γ-Al 2 O 3 = 3.99 g / cm 3 ). It is also a film of cm 3 or more.
First, the inventors of the present invention have a film density of 0.95 or more (preferably a bulk ratio of 0.97 or more) in any film mainly composed of aluminum oxide formed on both sides of the silver film. Even if the silver mirror of the present invention is used as an internal part of a liquid crystal projector or digital light processor (DLP) that requires durability in a high-temperature and high-humidity environment, it is practically sufficient. Has been found to have excellent heat resistance and moisture resistance. Moreover, the silver mirror of the present invention can realize practically sufficient heat resistance and moisture resistance in a high-temperature and high-humidity environment without using substances harmful to the environment such as ZnS and Cr. Further, it has been found that the film adhesion strength of a film mainly composed of aluminum oxide having a bulk density of 0.95 or more (preferably a bulk ratio of 0.97 or more) has a practically sufficient film adhesion strength. It was. In the present invention, specifically, in the tape peeling test (JIS D0202), both the JIS grade 1 and the tape peeling test after the heat and humidity resistance test have film adhesion strength without film peeling. Is preferred.
The reason why it is possible to realize practically sufficient heat resistance and moisture resistance under the high temperature and high humidity environment is that the dense film having the above-mentioned predetermined density or more mainly composed of aluminum oxide is formed compared to a normal vapor deposition film. It is thought that the property and heat resistance are improved. In a conventional silver mirror, it is known that an Al 2 O 3 film is formed on one of an upper layer and a lower layer of a silver film by a normal vapor deposition method. The effect of the present invention cannot be obtained even if Al 2 O 3 films are formed on both sides of the silver film by a normal vapor deposition method. Furthermore, conventional silver mirrors with Al 2 O 3 layers are only intended for use at relatively low temperatures, such as cameras, copiers, printers, telescopes, etc. (Developed for use in liquid crystal projectors, DLP, etc.) Therefore, it is sufficient that a certain degree of heat resistance, moisture resistance, etc. can be realized with Al 2 O 3 by a normal vapor deposition method.
Secondly, the present inventors have a structure in which a dense film mainly composed of aluminum oxide is formed directly on both surfaces of the silver film, and the silver film is composed mainly of aluminum oxide. By adopting a structure in which a dense film having a predetermined density or more is sandwiched, Ag is aggregated (aggregated) by heat even when kept at a high temperature of 200 ° C. for a long time (for example, 24 hours). ) It was found that pinholes can be formed and the reflectance can be suppressed and prevented from decreasing. The reason for this is not clear, but if the upper layer and / or lower layer of the silver film is replaced with another layer, Ag aggregates due to heat and pinholes are generated. Aggregation of Ag due to heat is achieved by the synergistic effect of a dense film of a predetermined density or higher mainly composed of two aluminum oxides formed in the upper and lower layers of the silver film. It is considered that the effect of suppressing and preventing is exerted. In addition, even if an Al 2 O 3 film is formed on both sides of the silver film by a normal vapor deposition method, such an effect cannot be obtained.
According to a second aspect of the present invention, in the first aspect, the films mainly composed of aluminum oxide formed on both sides of the silver film are all formed by sputtering, RF vapor deposition, ion plating. It is a film formed by an ion beam deposition method, an ion beam assisted deposition method, a cluster ion beam deposition method, or a plasma ion beam deposition method.
The inventors of the present invention have made the film density of 0.95 or more (in addition, the bulk density is 0.95 or more by further forming all the films mainly composed of aluminum oxide on both sides of the silver film by the above method). When a film mainly composed of aluminum oxide with a bulk ratio of 0.97 or more is obtained, and the silver mirror of the present invention is used as an internal part of a liquid crystal projector or DLP that requires durability in a high temperature and high humidity environment Even so, it has been found that it has practically sufficient heat resistance and moisture resistance. In addition, the film formed by the above method can achieve practically sufficient film adhesion strength.
In the present invention, a film mainly composed of aluminum oxide formed by the above method has a higher density than a normal deposited film, and the film density is 0.95 or more in bulk ratio (more than 0.97 in bulk ratio). A film mainly composed of aluminum oxide can be obtained, has high moisture resistance, low oxygen permeability, high heat resistance, high refractive index, high density, and optical characteristics (transmittance / reflectance) The film quality is good.
According to a third aspect of the present invention, in the present invention, both or any one of the films mainly composed of aluminum oxide formed on both sides of the silver film is a film containing aluminum, oxygen, and nitrogen. It is characterized by being.
The inventors have made a film containing aluminum, oxygen, and nitrogen both or any one of the films mainly composed of aluminum oxide formed on both sides of the silver film, so that the film can be used in a high temperature and high humidity environment. It has been found that even when the silver mirror of the present invention is used as an internal component such as a liquid crystal projector or a DLP that requires durability, it has practically sufficient heat resistance and moisture resistance. Moreover, the film mainly composed of aluminum oxide containing aluminum, oxygen, and nitrogen can realize practically sufficient film adhesion strength.
According to a fourth aspect of the present invention, in the silver mirror according to the first to third aspects, a layer for improving spectral reflectance is provided on a film mainly composed of aluminum oxide opposite to the base. It is characterized by that.
In the first to third aspects of the invention, the spectral reflectance on the short wavelength side (around 400 nm) is lowered by the film mainly composed of aluminum oxide on the upper layer side (opposite side of the substrate). Then, the layer for improving the spectral reflectance can suppress a decrease in the spectral reflectance, and therefore, an excellent spectral reflectance on the short wavelength side can be realized.
Specifically, the spectral reflectance on the short wavelength side is determined by the film mainly composed of aluminum oxide on the upper layer side, the low refractive index material film (L) such as SiO 2 formed thereon, TiO 2 , Ta 2 O 5, can be adjusted by adjusting the respective film thickness of the high refractive index material layer, such as Nb 2 O 5 (H) (see Figure 1). Either the order of L and H may be first, but the order of film / L / H mainly composed of aluminum oxide is superior in spectral reflectance. In the case of the order of the film mainly composed of aluminum oxide / H / L, the spectral reflectance is somewhat lowered, but the physical film strength is improved. In the case of the simplest configuration, a high spectral reflectance (high reflectance) can be realized only with the film / H mainly composed of aluminum oxide. By repeatedly laminating L / H twice and three times, a further highly reflective mirror can be obtained.
In the case of the order of the film mainly composed of aluminum oxide / L / H, it is possible to realize an average spectral reflectance of 98% or more in the visible light region, and a high reflectance as a silver mirror is disclosed in JP-A-6-313803. Can be maintained at the same level or higher (Claim 5).
In the present invention, the film mainly composed of aluminum oxide on the lower layer side also plays a role of improving adhesion and preventing entry of alkali eluted from the substrate glass.
The invention according to claim 6 of the present invention is the silver mirror according to any one of claims 1 to 5, wherein the silver mirror is used as an internal part of an optical apparatus such as a liquid crystal projector or a DLP. It is characterized by that.
The invention described in claim 6 is specified because the silver mirror of the present invention is particularly suitable as a silver mirror used as an internal part of a liquid crystal projector or DLP, and is the first to realize the simplification of the film configuration in this application. . The silver mirror of the present invention is also particularly suitable for use in other optical products that require practically sufficient heat resistance and moisture resistance in a high temperature and high humidity environment. The silver mirror of the present invention has practically sufficient heat resistance and moisture resistance in a high temperature and high humidity environment, and as a result, it can be used for other optical products and optical devices that are not used in a severe environment. In this case, it is possible to dramatically improve the durability and reliability as compared with the conventional case.
The invention according to claim 7 of the present invention is the method for producing a silver mirror according to any one of claims 1 to 6, wherein all films constituting the silver mirror are continuously formed without being opened to the atmosphere. Films that are mainly formed of aluminum oxide on both sides of the silver film are all sputtering methods, RF vapor deposition methods, ion plating methods, ion beam assisted deposition methods, cluster ions, and the like. It is a manufacturing method of a silver mirror characterized by forming by a beam (Ionized Cluster Beam) vapor deposition method or a plasma ion beam vapor deposition method.
As described in the seventh aspect of the invention, by continuously forming all the films constituting the silver mirror with a single vapor deposition device without opening to the atmosphere, it is advantageous for manifesting the effects characteristic of the present invention described above. Both can produce high quality silver mirrors with few defects and high reflectivity. In addition, a layer in which a film mainly composed of aluminum oxide / a silver film / a film mainly composed of aluminum oxide is laminated in this order, and a layer (for example, SiO 2) formed on this layer for improving spectral reflectance. And TiO 2 etc.) can be realized, and the adhesion between the films is good.
In the continuous film formation, it is preferable not to heat the substrate until the film formation mainly of aluminum oxide / silver film / film mainly including aluminum oxide is completed. When a silver film is formed while heating, problems such as (1) aggregation of the silver film and generation of pinholes, (2) yellowing of the silver film, (3) low productivity, etc. This is to avoid these problems. Note that it is preferable to perform heating after the formation of the film mainly composed of aluminum oxide / silver film / film mainly composed of aluminum oxide because adhesion is improved.
Invention of Claim 8 of this invention is a manufacturing method of the silver mirror of any one of the said Claims 1-6, Comprising: The film | membrane which mainly has an aluminum oxide / silver film / aluminum oxide The silver mirror manufacturing method is characterized in that after film formation, heat treatment for improving spectral reflectance is performed.
When the heat treatment for improving the spectral reflectance is performed after the formation of the film mainly composed of aluminum oxide / silver film / the film mainly composed of aluminum oxide, as in the invention according to claim 8, the heat treatment is not performed Spectral reflectance can be improved compared to This heat treatment is specifically 50 to 250 ° C. (preferably 70 to 200 ° C.) and 1 to 120 hours (preferably 20 to 72 hours). This heat treatment is a heat treatment that improves the spectral reflectance at the same time as the heat resistance test, the moisture resistance / corrosion resistance test by setting the temperature conditions of the heat resistance test and the temperature conditions of the moisture resistance / corrosion resistance test within the above-mentioned ranges. Can be efficient.
In each of the present inventions, as shown in FIG. 1, the substrate 1 / film 2 mainly composed of aluminum oxide / silver film 3 / film 4 mainly composed of aluminum oxide / layer 5 for improving the spectral reflectance. A silver surface mirror can be constructed. The thickness of each layer is preferably in the range of 100 to 300 angstroms for the film 2 mainly composed of aluminum oxide, 1000 to 1200 angstroms for the silver film 3, and 10 to 500 angstroms for the film 4 mainly composed of aluminum oxide. . This is to improve spectral reflectance and durability.
In each of the present inventions, as a film mainly composed of aluminum oxide, in addition to aluminum oxide (Al 2 O 3 ), a film containing aluminum, such as aluminum oxynitride (AlO x N Y ), oxygen, and nitrogen, A film containing hydrogen or the like can be given.
In each of the present inventions described above, it is preferable to form a film mainly composed of aluminum oxide directly on both sides of the silver film. This is because the film mainly composed of aluminum oxide has good compatibility with the silver film and thus has good adhesion, and the film configuration can be most simplified. Of course, even if a film mainly composed of aluminum oxide is formed on both sides of the silver film via another layer, the film density is 0.95 or more from the both sides of the silver film (preferably the bulk ratio is 0.97). Therefore, it is possible to obtain practically sufficient heat resistance and moisture resistance in a high-temperature and high-humidity environment.
In each of the inventions described above, the silver film may contain impurities other than the Ag film, a film containing other components in the Ag film as long as the purpose of the invention is not impaired, and an Ag film in the range not impairing the purpose of the invention. Examples include membranes. For example, as a silver film, an alloy in which a small amount of metal such as palladium (Pd), tantalum (Ta), or Nd (neodymium) is mixed with Ag, or a Pd, Ta, Nd film, AgPd, AgTa, or AgNd on the Ag film. A thin coating of an alloy film can be used, which is preferable because it is possible to further improve heat resistance and moisture resistance in a high temperature and high humidity environment and further improve reliability. When a small amount of Pd, Ta, or Nd is mixed with Ag, in the present invention, a dense film having a predetermined density or more mainly composed of aluminum oxide is already formed on both sides of the silver film, so that it can be used in a high temperature and high humidity environment. Furthermore, since it has sufficient durability, it is possible to further improve the reliability even if the amounts of Pd, Ta, and Nd are extremely small. The same applies when a Pd, Ta, Nd film or an AgPd, AgTa, AgNd alloy film is thinly coated on the Ag film.
In each of the present inventions, the substrate includes a substrate and a substrate used for optical products.

図1は、本発明の銀鏡の一実施の形態を説明するための模式図である。
図2は、実施の形態で作製した銀鏡の分光反射率を示す図である。
FIG. 1 is a schematic diagram for explaining an embodiment of the silver mirror of the present invention.
FIG. 2 is a diagram showing the spectral reflectance of the silver mirror produced in the embodiment.

以下、本発明の実施の形態について説明する。
(実施の形態1)
ガラスなどの基板上に、酸化アルミニウムを主体とする膜、Ag膜、酸化アルミニウムを主体とする膜、SiOからなる低屈折率物質膜(L)、TiOからなる高屈折率物質膜(H)をこの順番で蒸着により成膜した(図1参照)。その際、大気開放なしに、銀鏡を構成する全ての膜を1つの蒸着装置で連続成膜するとともに、Ag膜の両面側に形成する酸化アルミニウムを主体とする膜はいずれも少量のNガスを導入しイオンビームアシスト蒸着法によって形成した。この連続成膜に際し、基板加熱は行わなかった。各層の膜厚は、基板側から、酸化アルミニウムを主体とする膜:300オングストローム、Ag膜:1200オングストローム、酸化アルミニウムを主体とする膜:300オングストローム、SiOからなる低屈折率物質膜(L):270オングストローム、TiOからなる高屈折率物質膜(H):470オングストローム、とした。
上記で得られた銀鏡は、図2に示すように420nm〜800nmの領域で平均98%以上の分光反射率(入射角5°で測定)を有していた。
また、200℃、24時間で熱処理した後に、420nm〜800nmの領域で分光反射率の平均値の変化を調べたところ、分光反射率の平均値は0.5%向上しており(図2参照)、また耐熱性試験として、熱によってAgが凝集してピンホールが発生する現象も認められず、高い耐熱性が要求される液晶プロジェクターに使用される銀鏡として実用上十分な耐熱性を有していた。
また、70℃、湿度90%、72時間で分光反射率の平均値の変化を調べたところ、分光反射率の平均値はさらに0.5%向上しており(図2参照)、また耐湿性・耐腐蝕性試験として、高い耐熱性が要求される液晶プロジェクターに使用される銀鏡として実用上十分な耐湿性・耐腐蝕性を有していた。
また、テープ剥離試験(JIS D0202)を実施したところ、耐熱・耐湿試験前にJIS1級(碁盤目入れてテープ剥離試験実施)、耐熱・耐湿試験後にJIS3級(碁盤目入れないでテープ剥離試験実施)ともに、膜の剥がれはなく、実用上十分な密着性を有していた。 また、2H鉛筆による引っかき試験(JIS S6006)を実施したところ、膜の剥がれはなく、膜強度も実用上十分であった。
本発明の銀鏡において膜の剥がれが生じない理由は、酸化アルミニウムを主体とする膜/Ag膜/酸化アルミニウムを主体とする膜と、SiO及びTiOとの応力バランスが良好であるためと考えられる。なお、通常の蒸着法でAl膜/Ag膜/Al膜/SiO/TiOを成膜した場合、Al膜/Ag膜と、Al膜/SiO/TiOとの界面で剥離する。この理由は、Al膜はAg膜よりもSiO膜との密着性が強く、Ag膜は100MPa以上の圧縮応力を持っているため、この圧縮応力に耐えきれないAl膜がSiO/TiO膜と共に剥離するものと考えられる。
(実施の形態2)
実施の形態1の各膜をスパッタリング法で形成し、特に銀膜の両面側に形成された酸化アルミニウムを主体とする膜をいずれも反応性スパッタリング法で形成されたアルミニウム、酸素、窒素を含む膜としたこと以外は実施の形態1と同様にして銀鏡を作製した。
その結果、実施の形態1と同等以上の効果が得られることを確認した。
以上、本発明の特定の実施の形態を説明したが、本発明はこれらに限定されるものではない。
例えば、上記実施の形態において、酸化アルミニウムを主体とする膜、Ag膜、SiO膜、TiO膜の代わりに、上述した課題を解決するための手段の欄に記載した膜を用いることができる。膜厚についても適宜設計変更して実施できる。
なお、本発明の銀膜の両面側に酸化アルミニウムを主体とする膜が形成された構造は裏面鏡に利用することも可能である。
以上説明したように、本発明によれば、環境に有害な物質を使用せず、より単純な膜構成で、高温高湿環境下での実用的な耐久性に優れ、しかも銀鏡としての高反射率を特開平6−313803に記載の銀鏡と同等以上に維持できる(具体的には420nm〜800nmの領域で平均98%以上の分光反射率を有する)銀鏡を実現できる。
Embodiments of the present invention will be described below.
(Embodiment 1)
On a substrate such as glass, film mainly made of aluminum oxide, Ag film, film mainly made of aluminum oxide, the low refractive index material layer made of SiO 2 (L), a high refractive index material layer made of TiO 2 (H ) In this order by vapor deposition (see FIG. 1). At that time, all the films constituting the silver mirror are continuously formed by one vapor deposition device without opening to the atmosphere, and the films mainly composed of aluminum oxide formed on both sides of the Ag film are all small amounts of N 2 gas. Was formed by ion beam assisted deposition. During this continuous film formation, the substrate was not heated. The thickness of each layer is as follows. From the substrate side, a film mainly composed of aluminum oxide: 300 angstrom, an Ag film: 1200 angstrom, a film mainly composed of aluminum oxide: 300 angstrom, and a low refractive index material film (L) composed of SiO 2 : 270 angstrom, high refractive index material film made of TiO 2 (H): 470 angstrom.
The silver mirror obtained above had an average spectral reflectance of 98% or more (measured at an incident angle of 5 °) in the region of 420 nm to 800 nm as shown in FIG.
In addition, after the heat treatment at 200 ° C. for 24 hours, when the change in the average value of the spectral reflectance was examined in the region of 420 nm to 800 nm, the average value of the spectral reflectance was improved by 0.5% (see FIG. 2). ) In addition, as a heat resistance test, the phenomenon that Ag is aggregated by heat and pinholes are not observed, and the heat resistance is practically sufficient as a silver mirror used in a liquid crystal projector that requires high heat resistance. It was.
Further, when the change in the average value of the spectral reflectance was examined at 70 ° C., humidity of 90%, and 72 hours, the average value of the spectral reflectance was further improved by 0.5% (see FIG. 2), and the moisture resistance. -As a corrosion resistance test, it had practically sufficient moisture resistance and corrosion resistance as a silver mirror used in a liquid crystal projector requiring high heat resistance.
In addition, when a tape peel test (JIS D0202) was conducted, JIS class 1 (with a cross-cut and tape peel test) before the heat / humidity test, and JIS 3 class (with a cross-cut without a cross cut) In both cases, the film was not peeled off and had practically sufficient adhesion. Further, when a scratch test (JIS S6006) with a 2H pencil was performed, the film was not peeled off and the film strength was practically sufficient.
The reason why film peeling does not occur in the silver mirror of the present invention is considered to be because the stress balance between the film mainly composed of aluminum oxide / the Ag film / the film mainly composed of aluminum oxide and SiO 2 and TiO 2 is good. It is done. When an Al 2 O 3 film / Ag film / Al 2 O 3 film / SiO 2 / TiO 2 film is formed by a normal vapor deposition method, an Al 2 O 3 film / Ag film and an Al 2 O 3 film / SiO 2 are formed. 2 / Peeling at the interface with TiO 2 . The reason for this is that the Al 2 O 3 film has higher adhesion to the SiO 2 film than the Ag film, and the Ag film has a compressive stress of 100 MPa or more, so that the Al 2 O 3 film cannot withstand this compressive stress. Is considered to peel off together with the SiO 2 / TiO 2 film.
(Embodiment 2)
Each film of Embodiment 1 is formed by sputtering, and in particular, a film mainly containing aluminum oxide formed on both sides of a silver film is formed by reactive sputtering, and contains aluminum, oxygen, and nitrogen. A silver mirror was produced in the same manner as in the first embodiment except that.
As a result, it was confirmed that an effect equal to or greater than that of the first embodiment was obtained.
Although specific embodiments of the present invention have been described above, the present invention is not limited to these.
For example, in the above embodiment, the film described in the column for solving the above-described problems can be used instead of the film mainly composed of aluminum oxide, the Ag film, the SiO 2 film, and the TiO 2 film. . Regarding the film thickness, the design can be changed as appropriate.
In addition, the structure in which the film mainly composed of aluminum oxide is formed on both sides of the silver film of the present invention can be used for a back mirror.
As described above, according to the present invention, a substance that is harmful to the environment is not used, a simpler film configuration, excellent practical durability in a high temperature and high humidity environment, and high reflection as a silver mirror. It is possible to realize a silver mirror capable of maintaining the rate equal to or higher than that of the silver mirror described in JP-A-6-313803 (specifically, having a spectral reflectance of 98% or more on average in the region of 420 nm to 800 nm).

Claims (8)

基体上に少なくとも反射膜として銀膜が形成されてなる銀鏡において、前記銀膜の両面側に酸化アルミニウムを主体とする膜が形成された構造を有し、
前記銀膜の両面側に形成された酸化アルミニウムを主体とする膜が、いずれも膜密度がバルク比0.95以上の膜であることを特徴とする銀鏡。
In a silver mirror in which a silver film is formed at least as a reflective film on a substrate, the silver film has a structure in which films mainly composed of aluminum oxide are formed on both sides of the silver film,
The silver mirror characterized in that all of the films mainly composed of aluminum oxide formed on both sides of the silver film are films having a film density of 0.95 or more in bulk ratio.
前記銀膜の両面側に形成された酸化アルミニウムを主体とする膜が、いずれもスパッタリング法、RF蒸着法、イオンプレーティング法、イオンビームアシスト蒸着法(Ion Beam Assisted Deposition)、クラスターイオンビーム(Ionized Cluster Beam)蒸着法、又は、プラズマイオンビーム蒸着法によって形成された膜であることを特徴とする請求項1に記載の銀鏡。All the films mainly composed of aluminum oxide formed on both sides of the silver film are sputtering, RF vapor deposition, ion plating, ion beam assisted deposition, and cluster ion beam (Ionized). The silver mirror according to claim 1, wherein the silver mirror is a film formed by a cluster beam deposition method or a plasma ion beam deposition method. 前記銀膜の両面側に形成された酸化アルミニウムを主体とする膜の双方又はいずれか一方が、アルミニウム、酸素、窒素を含む膜であることを特徴とする請求項1又は2に記載の銀鏡。The silver mirror according to claim 1 or 2, wherein both or one of the films mainly composed of aluminum oxide formed on both sides of the silver film is a film containing aluminum, oxygen, and nitrogen. 基体とは反対側の酸化アルミニウムを主体とする膜上に、分光反射率を向上させるための層を設けたことを特徴とする請求項1〜3のいずれかに記載の銀鏡。The silver mirror according to any one of claims 1 to 3, wherein a layer for improving spectral reflectance is provided on a film mainly composed of aluminum oxide on the side opposite to the substrate. 420nm〜800nmの領域で平均98%以上の分光反射率(入射角5°で測定)を有することを特徴とする請求項1〜4のいずれか1項に記載の銀鏡。5. The silver mirror according to claim 1, having an average spectral reflectance of 98% or more (measured at an incident angle of 5 °) in a region of 420 nm to 800 nm. 前記銀鏡が、光学機器の内部部品として使用される銀鏡であることを特徴とする請求項1〜5のいずれか1項に記載の銀鏡。The silver mirror according to claim 1, wherein the silver mirror is a silver mirror used as an internal part of an optical device. 請求項1〜6のいずれか1項に記載の銀鏡の製造方法であって、銀鏡を構成する全ての膜を大気中に開放することなく連続成膜し、かつ、銀膜の両面側に形成する酸化アルミニウムを主体とする膜は、いずれもスパッタリング法、RF蒸着法、イオンプレーティング法、イオンビームアシスト蒸着法(Ion Beam Assisted Deposition)、クラスターイオンビーム(Ionized Cluster Beam)蒸着法、又は、プラズマイオンビーム蒸着法によって形成することを特徴とする銀鏡の製造方法。It is a manufacturing method of the silver mirror of any one of Claims 1-6, Comprising: All the films | membranes which comprise a silver mirror are continuously formed into film | membrane without opening in air | atmosphere, and it forms on both surfaces of a silver film Any film mainly composed of aluminum oxide is formed by sputtering, RF vapor deposition, ion plating, ion beam assisted deposition, cluster ion beam vapor deposition, or plasma. A method for producing a silver mirror, which is formed by ion beam evaporation. 請求項1〜6のいずれか1項に記載の銀鏡の製造方法であって、酸化アルミニウムを主体とする膜/銀膜/酸化アルミニウムを主体とする膜の成膜後に、分光反射率を向上させる熱処理を行うことを特徴とする銀鏡の製造方法。It is a manufacturing method of the silver mirror of any one of Claims 1-6, Comprising: Spectral reflectance is improved after film-forming of the film | membrane which mainly has aluminum oxide / silver film / aluminum oxide. A method for producing a silver mirror, comprising performing a heat treatment.
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