JPS649621B2 - - Google Patents
Info
- Publication number
- JPS649621B2 JPS649621B2 JP7050383A JP7050383A JPS649621B2 JP S649621 B2 JPS649621 B2 JP S649621B2 JP 7050383 A JP7050383 A JP 7050383A JP 7050383 A JP7050383 A JP 7050383A JP S649621 B2 JPS649621 B2 JP S649621B2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- photomask
- cleaning
- shower
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 12
- 239000003792 electrolyte Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 150000002430 hydrocarbons Chemical class 0.000 claims 1
- 238000009736 wetting Methods 0.000 claims 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 30
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 10
- 235000011114 ammonium hydroxide Nutrition 0.000 description 10
- 239000000428 dust Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 5
- BOSAWIQFTJIYIS-UHFFFAOYSA-N 1,1,1-trichloro-2,2,2-trifluoroethane Chemical compound FC(F)(F)C(Cl)(Cl)Cl BOSAWIQFTJIYIS-UHFFFAOYSA-N 0.000 description 4
- 230000003749 cleanliness Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000005611 electricity Effects 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- VHHHONWQHHHLTI-UHFFFAOYSA-N hexachloroethane Chemical compound ClC(Cl)(Cl)C(Cl)(Cl)Cl VHHHONWQHHHLTI-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58070503A JPS59195654A (ja) | 1983-04-21 | 1983-04-21 | ホトマスクの洗浄方法および洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58070503A JPS59195654A (ja) | 1983-04-21 | 1983-04-21 | ホトマスクの洗浄方法および洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59195654A JPS59195654A (ja) | 1984-11-06 |
| JPS649621B2 true JPS649621B2 (enrdf_load_stackoverflow) | 1989-02-17 |
Family
ID=13433393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58070503A Granted JPS59195654A (ja) | 1983-04-21 | 1983-04-21 | ホトマスクの洗浄方法および洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59195654A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6161685A (ja) * | 1984-08-31 | 1986-03-29 | 佐波 二三雄 | 機械部品等の洗浄方法 |
| JPH0320734A (ja) * | 1989-06-16 | 1991-01-29 | Matsushita Electron Corp | 洗浄装置 |
| JP2577867Y2 (ja) * | 1990-12-28 | 1998-08-06 | 東京瓦斯株式会社 | 浴槽洗浄用ノズル |
| JP2001192699A (ja) * | 2000-01-07 | 2001-07-17 | Minolta Co Ltd | 洗浄方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5712831A (en) * | 1980-06-06 | 1982-01-22 | Standard Oil Co | Carbonylation of olefin unsaturated compound |
| JPS57141614A (en) * | 1981-02-25 | 1982-09-02 | Canon Inc | Manufacture of electrooptical display device |
-
1983
- 1983-04-21 JP JP58070503A patent/JPS59195654A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59195654A (ja) | 1984-11-06 |
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