JPS649621A - Surface treatment of semiconductor substrate - Google Patents

Surface treatment of semiconductor substrate

Info

Publication number
JPS649621A
JPS649621A JP16458087A JP16458087A JPS649621A JP S649621 A JPS649621 A JP S649621A JP 16458087 A JP16458087 A JP 16458087A JP 16458087 A JP16458087 A JP 16458087A JP S649621 A JPS649621 A JP S649621A
Authority
JP
Japan
Prior art keywords
oxide film
semiconductor substrate
silicon wafer
covered
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16458087A
Other languages
English (en)
Inventor
Rinji Sugino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16458087A priority Critical patent/JPS649621A/ja
Publication of JPS649621A publication Critical patent/JPS649621A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP16458087A 1987-07-01 1987-07-01 Surface treatment of semiconductor substrate Pending JPS649621A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16458087A JPS649621A (en) 1987-07-01 1987-07-01 Surface treatment of semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16458087A JPS649621A (en) 1987-07-01 1987-07-01 Surface treatment of semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS649621A true JPS649621A (en) 1989-01-12

Family

ID=15795872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16458087A Pending JPS649621A (en) 1987-07-01 1987-07-01 Surface treatment of semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS649621A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998050948A1 (en) * 1997-05-02 1998-11-12 Memc Electronic Materials, Inc. Method for etching silicon wafer
CN103119671A (zh) * 2010-09-22 2013-05-22 大金工业株式会社 膜电容器用膜和膜电容器

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6242530A (ja) * 1985-08-20 1987-02-24 Fujitsu Ltd 半導体装置の製造方法
JPS62139335A (ja) * 1985-12-13 1987-06-23 Nec Corp 表面清浄化方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6242530A (ja) * 1985-08-20 1987-02-24 Fujitsu Ltd 半導体装置の製造方法
JPS62139335A (ja) * 1985-12-13 1987-06-23 Nec Corp 表面清浄化方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998050948A1 (en) * 1997-05-02 1998-11-12 Memc Electronic Materials, Inc. Method for etching silicon wafer
CN103119671A (zh) * 2010-09-22 2013-05-22 大金工业株式会社 膜电容器用膜和膜电容器

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