JPS649222A - Highly conductive poly-2,5-thienylenevinylene composition - Google Patents
Highly conductive poly-2,5-thienylenevinylene compositionInfo
- Publication number
- JPS649222A JPS649222A JP30786386A JP30786386A JPS649222A JP S649222 A JPS649222 A JP S649222A JP 30786386 A JP30786386 A JP 30786386A JP 30786386 A JP30786386 A JP 30786386A JP S649222 A JPS649222 A JP S649222A
- Authority
- JP
- Japan
- Prior art keywords
- thienylenevinylene
- alkoxy group
- poly
- dopant
- elimination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000003545 alkoxy group Chemical group 0.000 abstract 3
- 229920000642 polymer Polymers 0.000 abstract 3
- 239000002019 doping agent Substances 0.000 abstract 2
- 230000008030 elimination Effects 0.000 abstract 2
- 238000003379 elimination reaction Methods 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- 239000002243 precursor Substances 0.000 abstract 2
- PUAQLLVFLMYYJJ-UHFFFAOYSA-N 2-aminopropiophenone Chemical compound CC(N)C(=O)C1=CC=CC=C1 PUAQLLVFLMYYJJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000002841 Lewis acid Substances 0.000 abstract 1
- 229910052783 alkali metal Inorganic materials 0.000 abstract 1
- 150000001340 alkali metals Chemical class 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 239000002305 electric material Substances 0.000 abstract 1
- 239000012776 electronic material Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 150000007517 lewis acids Chemical class 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
Landscapes
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30786386A JPS649222A (en) | 1986-09-18 | 1986-12-25 | Highly conductive poly-2,5-thienylenevinylene composition |
US07/013,628 US5053166A (en) | 1986-02-18 | 1987-02-11 | Hetero-arylene vinylene polymer and highly conductive composition thereof |
DE3743443A DE3743443C2 (enrdf_load_stackoverflow) | 1986-09-18 | 1987-02-12 | |
DE19873704411 DE3704411A1 (de) | 1986-02-18 | 1987-02-12 | Gereckter poly(heteroarylenvinylen)-formling, bei seiner herstellung verwendetes vorlaeufer-polymer, verfahren zu seiner herstellung und diesen enthaltende hochleitfaehige masse |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21797086 | 1986-09-18 | ||
JP30786386A JPS649222A (en) | 1986-09-18 | 1986-12-25 | Highly conductive poly-2,5-thienylenevinylene composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS649222A true JPS649222A (en) | 1989-01-12 |
JPH048446B2 JPH048446B2 (enrdf_load_stackoverflow) | 1992-02-17 |
Family
ID=26522320
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30786386A Granted JPS649222A (en) | 1986-02-18 | 1986-12-25 | Highly conductive poly-2,5-thienylenevinylene composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS649222A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5622784A (en) * | 1986-01-21 | 1997-04-22 | Seiko Epson Corporation | Synthetic resin ophthalmic lens having an inorganic coating |
US5759643A (en) * | 1987-01-16 | 1998-06-02 | Seiko Epson Corporation | Polarizing plate and method of production |
US5783299A (en) * | 1986-01-21 | 1998-07-21 | Seiko Epson Corporation | Polarizer plate with anti-stain layer |
US6942924B2 (en) | 2001-10-31 | 2005-09-13 | Chemat Technology, Inc. | Radiation-curable anti-reflective coating system |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61148231A (ja) * | 1984-11-17 | 1986-07-05 | ザ ブリテイツシユ ペトロリユ−ム コムパニ− ピ−エルシ− | 新規導電性ポリマ− |
-
1986
- 1986-12-25 JP JP30786386A patent/JPS649222A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61148231A (ja) * | 1984-11-17 | 1986-07-05 | ザ ブリテイツシユ ペトロリユ−ム コムパニ− ピ−エルシ− | 新規導電性ポリマ− |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5622784A (en) * | 1986-01-21 | 1997-04-22 | Seiko Epson Corporation | Synthetic resin ophthalmic lens having an inorganic coating |
US5783299A (en) * | 1986-01-21 | 1998-07-21 | Seiko Epson Corporation | Polarizer plate with anti-stain layer |
US5759643A (en) * | 1987-01-16 | 1998-06-02 | Seiko Epson Corporation | Polarizing plate and method of production |
US6942924B2 (en) | 2001-10-31 | 2005-09-13 | Chemat Technology, Inc. | Radiation-curable anti-reflective coating system |
Also Published As
Publication number | Publication date |
---|---|
JPH048446B2 (enrdf_load_stackoverflow) | 1992-02-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |