JPS6490579A - Manufacture of semiconductor laser device - Google Patents

Manufacture of semiconductor laser device

Info

Publication number
JPS6490579A
JPS6490579A JP24844087A JP24844087A JPS6490579A JP S6490579 A JPS6490579 A JP S6490579A JP 24844087 A JP24844087 A JP 24844087A JP 24844087 A JP24844087 A JP 24844087A JP S6490579 A JPS6490579 A JP S6490579A
Authority
JP
Japan
Prior art keywords
layer
current block
clad
current
electrons
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24844087A
Other languages
Japanese (ja)
Inventor
Tomoko Kadowaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP24844087A priority Critical patent/JPS6490579A/en
Publication of JPS6490579A publication Critical patent/JPS6490579A/en
Pending legal-status Critical Current

Links

Landscapes

  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To prevent the decomposition of a crystal in a current block layer by equalizing a crystal material exposed from the surface of a wafer both in the bottom of a grooved opening section and the surface of the current block layer. CONSTITUTION:When positive voltage is applied to an As side electrode 9 and negative one to an N side electrode 10, currents flow through a second clad layer 5, an active layer 4, a first clad layer 3, a buffer layer 2 and a substrate 1 through a contact layer 8a and a Zn diffusion region 7, to which a trench is formed through solid-phase diffusion from the bottom of an opening section 60. Holes from the second clad layer 5 having forbidden band width larger than the layer 4 and a refractive index smaller than the layer 4 and electrons from the first clad layer 3 are injected respectively to the active layer 4 having forbidden band width smaller than the layer 3 and a refractive index larger than the layer 3, and emission by the recombination of electrons and holes is generated. Consequently, stimulated emission starts when a current level is increased sufficiently, and reaches to laser oscillation. That is, not only a transition layer by the changeover of a gas is not formed in a current path but also the surface of the first conductivity type current block layer 6 is not brought to an irregular state, thus stably acquiring a current constriction effect and excellent laser characteristics.
JP24844087A 1987-10-01 1987-10-01 Manufacture of semiconductor laser device Pending JPS6490579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24844087A JPS6490579A (en) 1987-10-01 1987-10-01 Manufacture of semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24844087A JPS6490579A (en) 1987-10-01 1987-10-01 Manufacture of semiconductor laser device

Publications (1)

Publication Number Publication Date
JPS6490579A true JPS6490579A (en) 1989-04-07

Family

ID=17178158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24844087A Pending JPS6490579A (en) 1987-10-01 1987-10-01 Manufacture of semiconductor laser device

Country Status (1)

Country Link
JP (1) JPS6490579A (en)

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