JPS6488550A - Photomask - Google Patents

Photomask

Info

Publication number
JPS6488550A
JPS6488550A JP24665487A JP24665487A JPS6488550A JP S6488550 A JPS6488550 A JP S6488550A JP 24665487 A JP24665487 A JP 24665487A JP 24665487 A JP24665487 A JP 24665487A JP S6488550 A JPS6488550 A JP S6488550A
Authority
JP
Japan
Prior art keywords
light shielding
shielding films
films
mask substrate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24665487A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0544016B2 (enrdf_load_stackoverflow
Inventor
Kenji Ota
Junji Hirokane
Kazuo Ban
Michinobu Saegusa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP24665487A priority Critical patent/JPS6488550A/ja
Priority to CA000578870A priority patent/CA1315023C/en
Priority to DE3856089T priority patent/DE3856089T2/de
Priority to EP93202205A priority patent/EP0574092B1/en
Priority to EP88309089A priority patent/EP0310412B1/en
Priority to DE3889053T priority patent/DE3889053T2/de
Publication of JPS6488550A publication Critical patent/JPS6488550A/ja
Priority to US07/631,277 priority patent/US5260150A/en
Priority to CA000616373A priority patent/CA1322685C/en
Publication of JPH0544016B2 publication Critical patent/JPH0544016B2/ja
Priority to US08/102,229 priority patent/US5403683A/en
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP24665487A 1987-09-30 1987-09-30 Photomask Granted JPS6488550A (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP24665487A JPS6488550A (en) 1987-09-30 1987-09-30 Photomask
CA000578870A CA1315023C (en) 1987-09-30 1988-09-29 Photo-mask
DE3889053T DE3889053T2 (de) 1987-09-30 1988-09-30 Photomasken.
EP93202205A EP0574092B1 (en) 1987-09-30 1988-09-30 Photo-masks
EP88309089A EP0310412B1 (en) 1987-09-30 1988-09-30 Improvements in photo-masks
DE3856089T DE3856089T2 (de) 1987-09-30 1988-09-30 Fotomasken
US07/631,277 US5260150A (en) 1987-09-30 1990-12-20 Photo-mask with light shielding film buried in substrate
CA000616373A CA1322685C (en) 1987-09-30 1992-05-07 Photo-mask
US08/102,229 US5403683A (en) 1987-09-30 1993-08-05 Photo-mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24665487A JPS6488550A (en) 1987-09-30 1987-09-30 Photomask

Publications (2)

Publication Number Publication Date
JPS6488550A true JPS6488550A (en) 1989-04-03
JPH0544016B2 JPH0544016B2 (enrdf_load_stackoverflow) 1993-07-05

Family

ID=17151633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24665487A Granted JPS6488550A (en) 1987-09-30 1987-09-30 Photomask

Country Status (1)

Country Link
JP (1) JPS6488550A (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03114845U (enrdf_load_stackoverflow) * 1990-03-07 1991-11-26
US6737198B2 (en) 1999-01-13 2004-05-18 Renesas Technology Corp. Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit
JP2007503621A (ja) * 2003-08-25 2007-02-22 トッパン、フォウタマスクス、インク フォトマスクおよびその光学的特性を保守する方法
KR100833029B1 (ko) * 2000-07-07 2008-05-27 가부시키가이샤 히타치세이사쿠쇼 포토마스크의 제조 방법 및 포토마스크
JP2008175999A (ja) * 2007-01-18 2008-07-31 Sk Electronics:Kk 表面に保護膜を形成したフォトマスク及びその製造方法
JP2008310092A (ja) * 2007-06-15 2008-12-25 Shin Etsu Chem Co Ltd フォトマスク
JP2016018187A (ja) * 2014-07-11 2016-02-01 株式会社ディスコ 露光マスクの製造方法
JP2016028442A (ja) * 2015-10-08 2016-02-25 大日本印刷株式会社 テンプレート
JP2017022417A (ja) * 2016-10-21 2017-01-26 大日本印刷株式会社 テンプレートの製造方法
CN109265013A (zh) * 2018-10-16 2019-01-25 彩虹（合肥）液晶玻璃有限公司 蚀刻装置及清洗设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023595A (enrdf_load_stackoverflow) * 1973-06-29 1975-03-13

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023595A (enrdf_load_stackoverflow) * 1973-06-29 1975-03-13

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03114845U (enrdf_load_stackoverflow) * 1990-03-07 1991-11-26
US6737198B2 (en) 1999-01-13 2004-05-18 Renesas Technology Corp. Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit
KR100833029B1 (ko) * 2000-07-07 2008-05-27 가부시키가이샤 히타치세이사쿠쇼 포토마스크의 제조 방법 및 포토마스크
JP2007503621A (ja) * 2003-08-25 2007-02-22 トッパン、フォウタマスクス、インク フォトマスクおよびその光学的特性を保守する方法
JP2008175999A (ja) * 2007-01-18 2008-07-31 Sk Electronics:Kk 表面に保護膜を形成したフォトマスク及びその製造方法
JP2008310092A (ja) * 2007-06-15 2008-12-25 Shin Etsu Chem Co Ltd フォトマスク
JP2016018187A (ja) * 2014-07-11 2016-02-01 株式会社ディスコ 露光マスクの製造方法
JP2016028442A (ja) * 2015-10-08 2016-02-25 大日本印刷株式会社 テンプレート
JP2017022417A (ja) * 2016-10-21 2017-01-26 大日本印刷株式会社 テンプレートの製造方法
CN109265013A (zh) * 2018-10-16 2019-01-25 彩虹（合肥）液晶玻璃有限公司 蚀刻装置及清洗设备

Also Published As

Publication number Publication date
JPH0544016B2 (enrdf_load_stackoverflow) 1993-07-05

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