JPS64877B2 - - Google Patents
Info
- Publication number
- JPS64877B2 JPS64877B2 JP11034283A JP11034283A JPS64877B2 JP S64877 B2 JPS64877 B2 JP S64877B2 JP 11034283 A JP11034283 A JP 11034283A JP 11034283 A JP11034283 A JP 11034283A JP S64877 B2 JPS64877 B2 JP S64877B2
- Authority
- JP
- Japan
- Prior art keywords
- mold
- film
- manufacturing
- sprayed
- diaphragm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 239000000919 ceramic Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 238000007750 plasma spraying Methods 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052580 B4C Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- 239000012670 alkaline solution Substances 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 229910052582 BN Inorganic materials 0.000 claims 1
- 238000007654 immersion Methods 0.000 claims 1
- 229910001220 stainless steel Inorganic materials 0.000 claims 1
- 239000010935 stainless steel Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 9
- 238000007751 thermal spraying Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R7/00—Diaphragms for electromechanical transducers; Cones
- H04R7/02—Diaphragms for electromechanical transducers; Cones characterised by the construction
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
- Coating By Spraying Or Casting (AREA)
- ing And Chemical Polishing (AREA)
Description
【発明の詳細な説明】
本発明はスピーカ用振動板の製造方法に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a diaphragm for a speaker.
スピーカ用振動板としては、高い弾性を有し、
かつ軽量で適当な内部損失を有することが望まれ
る。そこで最近、比弾性率が高く、適当な内部損
失を持つ振動板として、プラズマ溶射によりアル
ミナ（Al2O3）、炭化ホウ素（B4C）等のセラミツ
クスを型に付着させて振動板を製造する方法が提
案されている。 As a speaker diaphragm, it has high elasticity,
In addition, it is desired to be lightweight and have an appropriate internal loss. Recently, diaphragms with high specific elastic modulus and appropriate internal loss have been manufactured by attaching ceramics such as alumina (Al 2 O 3 ) and boron carbide (B 4 C) to molds by plasma spraying. A method has been proposed.
第１図は従来の振動板の製造方法の一例を示す
断面図、第２図Ａ，Ｂはその各工程を示す一部の
断面図である。図において、１はプラズマ溶射装
置で、電極１ａおよびノズル１ｂを有し、混合ガ
ス１ｃを導入してプラズマ炎１ｄを発生するよう
になつている。２はプラズマ炎１ｄ中に投入され
る溶射物質、３は基板、４はこの基板に取付けら
れた型、５はこの型に形成された溶射膜、６はこ
の溶射膜によつて形成された振動板である。 FIG. 1 is a sectional view showing an example of a conventional method for manufacturing a diaphragm, and FIGS. 2A and 2B are partial sectional views showing each process. In the figure, reference numeral 1 denotes a plasma spraying apparatus, which has an electrode 1a and a nozzle 1b, and is adapted to introduce a mixed gas 1c to generate a plasma flame 1d. 2 is the sprayed material thrown into the plasma flame 1d, 3 is the substrate, 4 is the mold attached to this substrate, 5 is the sprayed film formed on this mold, and 6 is the vibration formed by this sprayed film. It is a board.
振動板の製造方法は、まず第１図に示すよう
に、一般的なプラズマ溶射装置１において、電極
１ａとノズル１ｂの間に、窒素あるいはアルゴン
ガス中に適当量の水素ガスを混合した混合ガス１
ｃを導入し、その間に電力を印加すると、混合ガ
ス１ｃは電離され、プラズマ炎１ｄが発生する。
プラズマ炎１ｄは20000℃以上の温度にも達して
おり、このプラズマ炎１ｄ中に溶射物質２たとえ
ば粉末状のセラミツクスを投入すると、容易に溶
融する。このプラズマ炎１ｄの流速は約3000ｍ／
secにもなるので、溶射物質２は高速で所望振動
板形状を有する型４に衝突して、付着堆積し、溶
射膜５を形成する。このように形成されたセラミ
ツクスの溶射膜５は、工具鋼、チタン等の硬い金
属あるいはセラミツクスで作られた型４の表面が
滑らかに加工されている場合は、第２図Ａに示す
状態から容易に離型でき、第２図Ｂに示すように
セラミツクス単体からなる振動板６が得られる。 The method for manufacturing the diaphragm is as shown in FIG. 1. First, in a general plasma spraying apparatus 1, a mixed gas of nitrogen or argon gas mixed with an appropriate amount of hydrogen gas is placed between the electrode 1a and the nozzle 1b. 1
When the gas mixture 1c is introduced and electric power is applied during that time, the mixed gas 1c is ionized and a plasma flame 1d is generated.
The plasma flame 1d reaches a temperature of 20,000° C. or more, and when a thermal spray material 2, such as powdered ceramics, is introduced into the plasma flame 1d, it easily melts. The flow velocity of this plasma flame 1d is approximately 3000 m/
sec, the sprayed material 2 collides at high speed with the mold 4 having the desired diaphragm shape, adheres and deposits, and forms the sprayed film 5. The ceramic sprayed film 5 formed in this way can be easily removed from the state shown in FIG. The mold can be released quickly, and a diaphragm 6 made of ceramic alone is obtained as shown in FIG. 2B.
ところで上記所望形状を有する型４はかなり高
価であるため、何回も繰り返えし使用できること
が望ましい。しかし溶射法においては、高温にな
つた溶射物質２を高速で型４に衝突させて膜を形
成しているため、従来の方法では型４の表面は
徐々に荒され、また金属の型４では酸化等により
表面状態の変化を生じる。その結果、溶射膜５は
型４の凹凸部に食い込み、型４からの溶射膜５の
離型性が悪くなり、離型の際、溶射膜５に割れが
発生したり、あるいは全く離型できなくなること
がある。そして使用回数が増え、表面が粗くなる
と、この傾向は次第に強くなり、通常は２〜３回
で使用できなくなる。さらに最初の溶射において
は、型４の表面がきわめて平滑であるため、溶射
物質２が表面で滑つてしまい、付着効率が悪い。
このように、従来の方法においては、型４の使用
できる寿命が短く、かつ溶射効率も一定に制御し
にくいという欠点があつた。 By the way, since the mold 4 having the desired shape is quite expensive, it is desirable that it can be used repeatedly. However, in the thermal spraying method, the heated spray material 2 collides with the mold 4 at high speed to form a film, so in the conventional method, the surface of the mold 4 is gradually roughened, and the metal mold 4 is Changes in surface condition occur due to oxidation, etc. As a result, the sprayed film 5 bites into the uneven parts of the mold 4, and the releasability of the sprayed film 5 from the mold 4 deteriorates, causing cracks to occur in the sprayed film 5 during mold release, or failure to release the mold at all. It may disappear. As the number of uses increases and the surface becomes rough, this tendency gradually becomes stronger, and usually it becomes unusable after 2 to 3 times. Furthermore, in the initial thermal spraying, since the surface of the mold 4 is extremely smooth, the thermal spraying material 2 slips on the surface, resulting in poor adhesion efficiency.
As described above, the conventional method has disadvantages in that the usable life of the mold 4 is short and it is difficult to control the thermal spraying efficiency to a constant level.
この発明は上記のような従来のものの欠点を除
去するためになされたもので、型の表面に酸ある
いはアルカリで溶解できる軟質の金属膜を形成
し、その上にセラミツクスを溶射して振動板とな
る溶射膜を形成し、その後に上記金属膜を溶解し
て離型することにより、型を何回も繰り返えし使
用できるとともに、溶射膜の付着効率が高く、安
価に振動板を製造することができるスピーカ用振
動板の製造方法を提供することを目的としてい
る。 This invention was made to eliminate the above-mentioned drawbacks of the conventional products.A soft metal film that can be dissolved in acid or alkali is formed on the surface of the mold, and ceramics are sprayed on top of it to form a diaphragm. By forming a sprayed film, and then melting the metal film and releasing the mold, the mold can be used many times, the adhesion efficiency of the sprayed film is high, and the diaphragm is manufactured at low cost. It is an object of the present invention to provide a method for manufacturing a speaker diaphragm that can be used.
以下、本発明を一実施例に従つて説明する。第
３図Ａ，Ｂ，Ｃはそれぞれこの発明の一実施例に
よる製造方法の各工程を示す一部の断面図であ
る。図において、７は基板３に取付けられる複合
型で、型４と同様の型７ａおよびその表面に付着
された離型膜７ｂからなる。 Hereinafter, the present invention will be explained according to one embodiment. FIGS. 3A, 3B, and 3C are partial sectional views showing each step of a manufacturing method according to an embodiment of the present invention. In the figure, reference numeral 7 denotes a composite mold attached to the substrate 3, which consists of a mold 7a similar to mold 4 and a mold release film 7b attached to its surface.
振動板の製造方法は、まず第１図に示す従来と
同様の一般的なプラズマ溶射装置１を用いて溶射
を行う。この場合、第３図Ａに示すように所望の
形状（図においてはドーム形状）に加工されたチ
タン製の型７ａの表面に、メツキにより銅の離型
膜７ｂを形成した複合型７を使用し、その表面
に、プラズマ溶射装置１から溶射物質２として炭
化ホウ素（B4C）粉末を溶射し、第３図Ｂに示す
ように溶射膜５を形成する。その後、溶射膜５と
複合型７の一体物を適度の濃度に稀釈した硝酸液
に浸すと、硝酸液は溶射膜５が付着していない部
分および溶射膜５内に存在する気孔を通つて徐々
に浸入し、離型膜７ｂとしてメツキした銅膜のみ
を溶解して離型し、第３図Ｃに示すように、B4C
単体からなる振動板６を得ることができる。 In the method for manufacturing the diaphragm, first, thermal spraying is performed using a general plasma spraying apparatus 1 similar to the conventional one shown in FIG. In this case, as shown in FIG. 3A, a composite mold 7 is used in which a copper mold release film 7b is formed by plating on the surface of a titanium mold 7a that has been processed into a desired shape (a dome shape in the figure). Then, boron carbide (B 4 C) powder is sprayed as a spraying substance 2 from a plasma spraying device 1 onto the surface to form a sprayed film 5 as shown in FIG. 3B. After that, when the integral body of the sprayed film 5 and the composite mold 7 is immersed in a nitric acid solution diluted to an appropriate concentration, the nitric acid solution gradually passes through the parts to which the sprayed film 5 is not attached and the pores present in the sprayed film 5. As shown in FIG. 3C, B 4 C
A single diaphragm 6 can be obtained.
このような方法によれば、溶射されたB4C粉
は、離型膜７ｂ上に付着して、型７ａには直接に
衝突しないため、型７ａの表面を荒すことは極め
て少なく、また振動板６は離型膜７ｂを化学的に
溶解することにより、型７ａから離型されるた
め、離型は完全に行われ、かつ離型の際の振動板
６の割れ等はほとんどなくなる。そして型７ａの
表面の荒れが極めて少ないため、再び表面に離型
膜７ｂをメツキすると、型７ａは繰り返えし何回
も使用できる。さらに離型膜７ｂとしてメツキし
た銅は軟質の金属であるため、溶射されたB4Cは
この離型膜７ｂに食い込み、衝突したB4Cのほと
んどを付着させることができる。 According to this method, the thermally sprayed B 4 C powder adheres to the mold release film 7b and does not directly collide with the mold 7a, so it is extremely unlikely to roughen the surface of the mold 7a, and it also prevents vibrations. Since the plate 6 is released from the mold 7a by chemically dissolving the mold release film 7b, the mold release is completed completely and there is almost no cracking of the diaphragm 6 during mold release. Since the surface of the mold 7a has very little roughness, the mold 7a can be used repeatedly by plating the surface with the mold release film 7b again. Furthermore, since the copper plated as the mold release film 7b is a soft metal, the thermally sprayed B 4 C can bite into the mold release film 7b, allowing most of the collided B 4 C to adhere.
離型膜７ｂの厚さが極端に薄いと、溶射時の熱
や衝撃力により剥離し、型の表面部が荒れて離型
性が悪くなる。一方、厚すぎる場合は、メツキ工
程および溶解工程に時間がかかるため望ましくな
い。発明者らの実験によれば、0.1〜10μ程度が望
ましいという結果が得られている。また離型膜７
ｂを溶解する硝酸の濃度、液温等は溶解状況に影
響を与える。あまり溶解を急激に行うと、化学反
応による熱やガスにより振動板６が損傷すること
があり、溶解速度はできるだけ小さくすることが
望ましい。 If the thickness of the mold release film 7b is extremely thin, it will peel off due to the heat and impact force during thermal spraying, and the surface of the mold will become rough, resulting in poor mold release properties. On the other hand, if it is too thick, it is undesirable because the plating process and melting process take time. According to experiments conducted by the inventors, it has been found that a thickness of approximately 0.1 to 10 μm is desirable. Also, the release film 7
The concentration of nitric acid that dissolves b, the temperature of the liquid, etc. affect the state of dissolution. If the dissolution is performed too rapidly, the diaphragm 6 may be damaged by the heat and gas caused by the chemical reaction, so it is desirable to keep the dissolution rate as low as possible.
なお前記実施例においては、型７ａの材質とし
てチタン、離型膜７ｂとして電気メツキによる銅
膜、溶解液として硝酸を用いたが、型７ａの材質
としてステンレスその他の金属、あるいはアルミ
ナ（Al2O3）、窒化ホウ素（BN）等のセラミツク
ス、離型膜７ｂとして銅以外にアルミニウム等の
軟質の金属が適用でき、また離型膜７ｂの形成は
電気メツキ以外に、無電解メツキ、蒸着、溶射等
によつても行える。さらに溶射物質２としては、
炭化ホウ素についてのみ記述したが、アルミナ
（Al2O3）等の他のセラミツクスを使用してもよ
い。また離型膜７ｂの溶解液は型７ａおよび離型
膜７ｂに適したものを使用することができ、例え
ば離型膜７ｂにアルミニウムを使用した場合は塩
酸を使用するのが望ましく、材質によつてはアル
カリ溶液でもよい。 In the above embodiment, titanium was used as the material for the mold 7a, a copper film was electroplated as the mold release film 7b, and nitric acid was used as the solution. 3 ), ceramics such as boron nitride (BN), and soft metals such as aluminum other than copper can be used as the mold release film 7b, and the mold release film 7b can be formed by electroless plating, vapor deposition, thermal spraying, etc. in addition to electroplating. It can also be done by Furthermore, as thermal spray material 2,
Although only boron carbide has been described, other ceramics such as alumina (Al 2 O 3 ) may also be used. Furthermore, a solution suitable for the mold 7a and the mold release film 7b can be used as the solution for the mold release film 7b. For example, when aluminum is used for the mold release film 7b, it is preferable to use hydrochloric acid, depending on the material. An alkaline solution may also be used.
以上述べたように、この発明によれば、所望の
形状を有する金属あるいはセラミツクスの型の表
面に軟質金属膜を形成し、その上にプラズマ溶射
によりセラミツクスの溶射膜を形成し、全体を離
型膜のみが溶解できる液に浸漬して離型し、セラ
ミツクス単体の振動板を得るように構成したの
で、型を繰り返えし何回も使用できるとともに、
セラミツクスの付着効率も上げることができ、従
来に比較して安価に振動板を製造できる効果があ
る。 As described above, according to the present invention, a soft metal film is formed on the surface of a metal or ceramic mold having a desired shape, a ceramic sprayed film is formed thereon by plasma spraying, and the entire mold is released. The structure is such that only the membrane can be immersed in a liquid that can be dissolved and released from the mold to obtain a single ceramic diaphragm, so the mold can be used over and over again.
It is also possible to increase the adhesion efficiency of ceramics, which has the effect of making it possible to manufacture diaphragms at a lower cost than in the past.
第１図は従来の製造方法を示す断面図、第２図
Ａ，Ｂはその各工程を示す一部の断面図、第３図
Ａ，Ｂ，Ｃはそれぞれ本発明の一実施例による製
造方法の各工程を示す一部の断面図である。
各図中、同一符号は同一または相当部分を示
し、１はプラズマ溶射装置、１ａは電極、１ｂは
ノズル、２は溶射物質、４は型、５は溶射膜、６
は振動板、７は複合型、７ａは型、７ｂは離型膜
である。
FIG. 1 is a sectional view showing a conventional manufacturing method, FIGS. 2A and B are partial sectional views showing each process, and FIGS. 3A, B, and C are each a manufacturing method according to an embodiment of the present invention. FIG. In each figure, the same reference numerals indicate the same or equivalent parts, 1 is a plasma spraying device, 1a is an electrode, 1b is a nozzle, 2 is a sprayed material, 4 is a mold, 5 is a sprayed film, 6
7 is a diaphragm, 7 is a composite mold, 7a is a mold, and 7b is a release film.
Claims (1)
その上にセラミツクスをプラズマ溶射法により溶
射して溶射膜を形成したのち、上記金属膜を溶解
させて離型し、セラミツクスからなる振動板を得
ることを特徴とするスピーカ用振動板の製造方
法。 ２ 型が金属またはセラミツクスからなることを
特徴とする特許請求の範囲第１項記載のスピーカ
用振動板の製造方法。 ３ 型がチタン、ステンレス、アルミナまたは窒
化ホウ素からなることを特徴とする特許請求の範
囲第１項記載のスピーカ用振動板の製造方法。 ４ 金属膜が銅またはアルミニウムからなること
を特徴とする特許請求の範囲第１項ないし第３項
のいずれかに記載のスピーカ用振動板の製造方
法。 ５ 溶射膜がアルミナまたは炭化ホウ素からなる
ことを特徴とする特許請求の範囲第１項ないし第
４項のいずれかに記載のスピーカ用振動板の製造
方法。 ６ 金属膜の溶解が酸またはアルカリ溶液中に浸
漬して行うものであることを特徴とする特許請求
の範囲第１項ないし第５項のいずれかに記載のス
ピーカ用振動板の製造方法。[Claims] 1. Forming a soft metal film on a mold of a desired shape,
A method for producing a diaphragm for a speaker, comprising: spraying ceramics thereon by a plasma spraying method to form a sprayed film, and then melting and releasing the metal film to obtain a diaphragm made of ceramics. 2. The method of manufacturing a speaker diaphragm according to claim 1, wherein the mold is made of metal or ceramics. 3. The method for manufacturing a speaker diaphragm according to claim 1, wherein the mold is made of titanium, stainless steel, alumina, or boron nitride. 4. The method for manufacturing a speaker diaphragm according to any one of claims 1 to 3, wherein the metal film is made of copper or aluminum. 5. The method for manufacturing a speaker diaphragm according to any one of claims 1 to 4, wherein the sprayed film is made of alumina or boron carbide. 6. The method for manufacturing a speaker diaphragm according to any one of claims 1 to 5, wherein the metal film is dissolved by immersion in an acid or alkaline solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11034283A JPS603299A (en) | 1983-06-20 | 1983-06-20 | Manufacture of diaphragm for speaker |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11034283A JPS603299A (en) | 1983-06-20 | 1983-06-20 | Manufacture of diaphragm for speaker |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS603299A JPS603299A (en) | 1985-01-09 |
| JPS64877B2 true JPS64877B2 (en) | 1989-01-09 |
Family
ID=14533319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11034283A Granted JPS603299A (en) | 1983-06-20 | 1983-06-20 | Manufacture of diaphragm for speaker |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS603299A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4617400A (en) * | 1985-09-11 | 1986-10-14 | Kawaken Fine Chemicals Co., Ltd. | Process for preparing cyclic urea derivatives |
| JPH0385100A (en) * | 1989-08-29 | 1991-04-10 | Kenwood Corp | Diaphragm for speaker and its manufacture |
| EP0992497B1 (en) | 1998-10-09 | 2003-12-17 | Mitsui Chemicals, Inc. | Manufactoring process for 1,3-Dialkyl-2-imidazolinones |
| US8057914B2 (en) | 2007-03-26 | 2011-11-15 | Howmedica Osteonics Corp. | Method for fabricating a medical component from a material having a high carbide phase and such medical component |
| US8920534B2 (en) | 2007-03-26 | 2014-12-30 | Howmedica Osteonics Corp. | Method for fabricating a biocompatible material having a high carbide phase and such material |
| US7771775B2 (en) * | 2007-03-26 | 2010-08-10 | Howmedica Osteonics Corp. | Method for fabricating a medical component from a material having a high carbide phase |
| KR101096548B1 (en) * | 2009-11-06 | 2011-12-20 | 주식회사 비에스이 | Mems microphone and manufacturing method of the same |
| JP5653776B2 (en) * | 2011-01-28 | 2015-01-14 | 独立行政法人産業技術総合研究所 | High performance speaker diaphragm and method for manufacturing speaker diaphragm |
-
1983
- 1983-06-20 JP JP11034283A patent/JPS603299A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS603299A (en) | 1985-01-09 |
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