JPS6487774A - Cvd device for raw material having high specific surface area - Google Patents

Cvd device for raw material having high specific surface area

Info

Publication number
JPS6487774A
JPS6487774A JP24408087A JP24408087A JPS6487774A JP S6487774 A JPS6487774 A JP S6487774A JP 24408087 A JP24408087 A JP 24408087A JP 24408087 A JP24408087 A JP 24408087A JP S6487774 A JPS6487774 A JP S6487774A
Authority
JP
Japan
Prior art keywords
vessel
reactive gas
raw materials
raw material
surface area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24408087A
Other languages
Japanese (ja)
Inventor
Tadashi Sasa
Hideto Yoshida
Takashi Onami
Yuji Sekiya
Takashi Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IHI Corp
Original Assignee
IHI Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IHI Corp filed Critical IHI Corp
Priority to JP24408087A priority Critical patent/JPS6487774A/en
Publication of JPS6487774A publication Critical patent/JPS6487774A/en
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To uniformize coating and to prevent the wasteful consumption of a reactive gas and the contamination of a device by constructing a device in such a manner that titled raw materials are agitated in a rotating vessel and a reactive gas flows only in the inside of the rotating vessel. CONSTITUTION:For example, the raw materials are introduced into the raw material vessel 1 made of a graphite cylinder which is connected at one end and the other end to reactive gas introducing port and discharge ports 6, 7, respectively. After the inside of the vessel 1 is evacuated to a vacuum atmosphere by a vacuum pump of a reactive gas supplying device 9, the vessel 1 is rotated around its axis by a rotational driving means 14. The vessel 1 is simultaneously heated by a heating means 12. The vacuum atmosphere is maintained in a hermetic vessel 8 enclosing the vessel 1 by an atmosphere regulator 11. The reactive gas is introduced in this state from the device 9 into the vessel 1 via the inlet 6 and the exhaust gas of reaction is discharged from the outlet 7, by which the reactive gas is deposited on the surface of the raw materials 8 and the uniform coating is executed.
JP24408087A 1987-09-30 1987-09-30 Cvd device for raw material having high specific surface area Pending JPS6487774A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24408087A JPS6487774A (en) 1987-09-30 1987-09-30 Cvd device for raw material having high specific surface area

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24408087A JPS6487774A (en) 1987-09-30 1987-09-30 Cvd device for raw material having high specific surface area

Publications (1)

Publication Number Publication Date
JPS6487774A true JPS6487774A (en) 1989-03-31

Family

ID=17113435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24408087A Pending JPS6487774A (en) 1987-09-30 1987-09-30 Cvd device for raw material having high specific surface area

Country Status (1)

Country Link
JP (1) JPS6487774A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002060943A (en) * 2000-08-22 2002-02-28 Tohoku Electric Power Co Inc Method and device for coating high purity silicon
JPWO2006115242A1 (en) * 2005-04-25 2008-12-18 株式会社ユーテック Surface-treated fine particles, surface treatment apparatus, and fine particle surface treatment method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002060943A (en) * 2000-08-22 2002-02-28 Tohoku Electric Power Co Inc Method and device for coating high purity silicon
JPWO2006115242A1 (en) * 2005-04-25 2008-12-18 株式会社ユーテック Surface-treated fine particles, surface treatment apparatus, and fine particle surface treatment method
JP2013176770A (en) * 2005-04-25 2013-09-09 Utec:Kk Surface-fluorinated fine particle, surface fluorination apparatus, and method for producing surface-fluorinated fine particle
JP2014097502A (en) * 2005-04-25 2014-05-29 Yuutekku:Kk Method for producing fine particle
JP5721923B2 (en) * 2005-04-25 2015-05-20 株式会社ユーテック Surface-treated fine particles, surface treatment apparatus, and fine particle surface treatment method

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