JPS6487774A - Cvd device for raw material having high specific surface area - Google Patents
Cvd device for raw material having high specific surface areaInfo
- Publication number
- JPS6487774A JPS6487774A JP24408087A JP24408087A JPS6487774A JP S6487774 A JPS6487774 A JP S6487774A JP 24408087 A JP24408087 A JP 24408087A JP 24408087 A JP24408087 A JP 24408087A JP S6487774 A JPS6487774 A JP S6487774A
- Authority
- JP
- Japan
- Prior art keywords
- vessel
- reactive gas
- raw materials
- raw material
- surface area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To uniformize coating and to prevent the wasteful consumption of a reactive gas and the contamination of a device by constructing a device in such a manner that titled raw materials are agitated in a rotating vessel and a reactive gas flows only in the inside of the rotating vessel. CONSTITUTION:For example, the raw materials are introduced into the raw material vessel 1 made of a graphite cylinder which is connected at one end and the other end to reactive gas introducing port and discharge ports 6, 7, respectively. After the inside of the vessel 1 is evacuated to a vacuum atmosphere by a vacuum pump of a reactive gas supplying device 9, the vessel 1 is rotated around its axis by a rotational driving means 14. The vessel 1 is simultaneously heated by a heating means 12. The vacuum atmosphere is maintained in a hermetic vessel 8 enclosing the vessel 1 by an atmosphere regulator 11. The reactive gas is introduced in this state from the device 9 into the vessel 1 via the inlet 6 and the exhaust gas of reaction is discharged from the outlet 7, by which the reactive gas is deposited on the surface of the raw materials 8 and the uniform coating is executed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24408087A JPS6487774A (en) | 1987-09-30 | 1987-09-30 | Cvd device for raw material having high specific surface area |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24408087A JPS6487774A (en) | 1987-09-30 | 1987-09-30 | Cvd device for raw material having high specific surface area |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6487774A true JPS6487774A (en) | 1989-03-31 |
Family
ID=17113435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24408087A Pending JPS6487774A (en) | 1987-09-30 | 1987-09-30 | Cvd device for raw material having high specific surface area |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6487774A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002060943A (en) * | 2000-08-22 | 2002-02-28 | Tohoku Electric Power Co Inc | Method and device for coating high purity silicon |
| JPWO2006115242A1 (en) * | 2005-04-25 | 2008-12-18 | 株式会社ユーテック | Surface-treated fine particles, surface treatment apparatus, and fine particle surface treatment method |
-
1987
- 1987-09-30 JP JP24408087A patent/JPS6487774A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002060943A (en) * | 2000-08-22 | 2002-02-28 | Tohoku Electric Power Co Inc | Method and device for coating high purity silicon |
| JPWO2006115242A1 (en) * | 2005-04-25 | 2008-12-18 | 株式会社ユーテック | Surface-treated fine particles, surface treatment apparatus, and fine particle surface treatment method |
| JP2013176770A (en) * | 2005-04-25 | 2013-09-09 | Utec:Kk | Surface-fluorinated fine particle, surface fluorination apparatus, and method for producing surface-fluorinated fine particle |
| JP2014097502A (en) * | 2005-04-25 | 2014-05-29 | Yuutekku:Kk | Method for producing fine particle |
| JP5721923B2 (en) * | 2005-04-25 | 2015-05-20 | 株式会社ユーテック | Surface-treated fine particles, surface treatment apparatus, and fine particle surface treatment method |
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