CN206481488U - A kind of novel microwave plasma processing apparatus - Google Patents
A kind of novel microwave plasma processing apparatus Download PDFInfo
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- CN206481488U CN206481488U CN201720164441.4U CN201720164441U CN206481488U CN 206481488 U CN206481488 U CN 206481488U CN 201720164441 U CN201720164441 U CN 201720164441U CN 206481488 U CN206481488 U CN 206481488U
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- Prior art keywords
- reative cell
- microwave plasma
- quartz ampoule
- rectangular waveguide
- processing apparatus
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Abstract
The utility model discloses a kind of novel microwave plasma processing apparatus, it is made up of quartz ampoule and microwave cavity and microwave source, quartz ampoule passes through the broadside face of rectangular waveguide microwave cavity, one end connection microwave source of rectangular waveguide, the other end of rectangular waveguide is short board, upper and lower ends through the quartz ampoule in the broadside face of rectangular waveguide respectively have one section of metal tube to be connected with rectangular waveguide, there is the first intake interface one end of quartz ampoule, it is connected with working gas air-channel system, the port for stretching into the quartz ampoule of reative cell puts in rotation drum container.The utility model produces plasma using quartz tube type microwave plasma source, it is input in fixed reative cell, a going barrel is placed in reative cell, pending powder, chopped fiber or particle are placed in the container of going barrel, a kind of microwave plasma processing apparatus is constituted.This device is used, the functionalizations such as surface etch, purification, grafting, deposition can be carried out to powder, chopped fiber, particle etc..
Description
Technical field
The utility model is related to a kind of novel microwave plasma processing apparatus.
Background technology
The material of the forms such as powder, chopped fiber, particle is typically the enhancing component of composite.To make composite have more
High intensity, will carry out surface cleaning, activation or functionalization to powder, chopped fiber, particle of enhancing component etc., make enhancing
There is more preferable adhesive property between component and matrix component.Powder, chopped fiber, particle are used as certain functional material sometimes in itself,
Its surface also needs to carry out functionalization.
The content of the invention
Technical problem to be solved in the utility model, which is to provide one kind, to carry out surface to powder, chopped fiber, particle etc.
The novel microwave plasma processing apparatus of the functionalizations such as etching, purification, grafting, deposition.
The utility model is achieved through the following technical solutions：A kind of novel microwave plasma processing apparatus, by
Quartz ampoule and microwave cavity and microwave source composition, quartz ampoule pass through the broadside face of rectangular waveguide microwave cavity, and one end of rectangular waveguide connects
Microwave source is connect, the other end of rectangular waveguide is short board, and the distance of short board to quartz ampoule is λ g/4, through the width of rectangular waveguide
The upper and lower ends of the quartz ampoule in side face respectively have one section of metal tube to be connected with rectangular waveguide, and there is the first air inlet connecting one end of quartz ampoule
Mouthful, it is connected with working gas air-channel system, the other end of quartz ampoule stretches into the upper surface of reative cell and with sealing flange and O shapes
Going barrel is installed on cushion rubber and cylindrical cavity vacuum chamber formation bonding in vacuum, the bottom flange of reative cell, formed very with reative cell
Lost motion is tightly connected, and the port for stretching into the quartz ampoule of reative cell puts in rotation drum container, and reative cell bottom passes through reative cell bottom
Blind flange is sealed, and going barrel is passed through in reative cell bottom blind flange to reative cell, and is locked by fastening bolt.
It is used as preferred technical scheme, the laterally attached vacuum system of the reative cell.
As preferred technical scheme, the vacuum system include vacuum gauge, cyclone separator, filter, coarse adjustment and
Fine tuning choke valve, vent valve, then connect vavuum pump blocks vent valve, corresponding vacuum line, is most followed by vavuum pump, reaction
The another of room is laterally equipped with observation window.
As preferred technical scheme, bell shape container that the going barrel is made up of transparent medium, vacuum dynamic seal rotation
Rotating shaft and bearing, reative cell bottom blind flange, rotary shaft container base and belt pulley set are into bell shape container, which is used, installs pressing plate
Load with studs on vacuum dynamic seal rotary shaft container base, bearing is arranged on the blind flange of reative cell bottom.
As preferred technical scheme, the vacuum dynamic seal rotary shaft of the going barrel and the quartz ampoule for producing plasma
Central shaft is consistent, and vacuum dynamic seal rotary shaft, by belt transmission, makes the going barrel concomitant rotation of loading by motor.
As preferred technical scheme, whole microwave plasma source is tilted and is installed on a support, the rotation of going barrel
Rotating shaft and horizontal plane are tangible at an angle, and the angle is between 30 ° to 60 °, whole microwave plasma source is pacified by device
Dress plate is installed on support.
As preferred technical scheme, the support is equidistantly to offer more than one tune on adjustable support, support
Knothole, whole microwave plasma source is tilted by regulating bolt and is installed on support, and is installed in corresponding adjustment hole, is made
Obtain between microwave plasma source and horizontal plane in 30 ° to 60 ° angles.
The beneficial effects of the utility model are：The utility model produces plasma using quartz tube type microwave plasma source
Body, is input in fixed reative cell, and a going barrel is placed in reative cell, places pending in the container of going barrel
Powder, chopped fiber or particle, constitute a kind of microwave plasma processing apparatus.Use this device, can to powder, chopped fiber,
Grain etc. carries out the functionalizations such as surface etch, purification, grafting, deposition.
Brief description of the drawings
, below will be to embodiment in order to illustrate more clearly of the utility model embodiment or technical scheme of the prior art
Or the accompanying drawing used required in description of the prior art is briefly described, it should be apparent that, drawings in the following description are only
It is some embodiments of the present utility model, for those of ordinary skill in the art, is not paying the premise of creative work
Under, other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1 is overall structure diagram of the present utility model；
Fig. 2 is the structural representation of microwave plasma source of the present utility model；
Fig. 3 is the structural representation of going barrel.
Embodiment
All features disclosed in this specification, or disclosed all methods or during the step of, except mutually exclusive
Feature and/or step beyond, can combine in any way.
Any feature disclosed in this specification (including any accessory claim, summary and accompanying drawing), except non-specifically is chatted
State, can alternative features equivalent by other or with similar purpose replaced.I.e., unless specifically stated otherwise, each feature
It is an example in a series of equivalent or similar characteristics.
The quartz tube type microwave plasma source of the present apparatus is made up of quartz ampoule 1 and microwave cavity 2 and microwave source 3, quartz ampoule 1
Through the H faces of microwave rectangular waveguide 4.(frequency is 2.45GHz to one end connection microwave source 3 of rectangular waveguide 4, including microwave occurs
Device, impedance matching box still adds circulator and water load and directional coupler etc. whenever necessary).The other end of rectangular waveguide 4
For short board, the distance of short board to quartz ampoule is λ g/4 (λ g are the waveguide wavelength of rectangular waveguide).
Upper and lower ends through the quartz ampoule 1 in the H faces of rectangular waveguide 4 respectively have one section of metal tube to be connected with rectangular waveguide,
To prevent microwave leakage during work from causing the infringement to human body and environment.There is the first intake interface 5 one end of quartz ampoule 1, with
Working gas air-channel system (including gas bomb and gas, flow controller, stop valve, gas pipeline etc.) is connected.
The surface treatment of powder, chopped fiber, particle etc. needs specific working gas and participates in reacting gas (this of reaction
In be referred to as working gas).Usually using Ar gas or O2 gas, sometimes using N2 gas, H2 gas, ammonia or air etc..When there is special need
Liquid monomer may be used when wanting, at this moment needs in the liquid monomer of heating to be passed through with carrier gas (usually using Ar gas), will
Liquid monomer molecule brings the first intake interface into.
The other end of quartz ampoule 1 stretches into the upper surface of reative cell 6 (usually using cylindrical cavity vacuum chamber) and uses Sealing Method
Blue and O shapes cushion rubber 17 and cylindrical cavity vacuum chamber formation bonding in vacuum.
Going barrel 7 is installed on the bottom flange of reative cell 6, is connected with reative cell formation vacuum dynamic seal.Stretch into reative cell
The port of quartz ampoule put in rotation drum container.
When working gas flows through the quartz ampoule in microwave rectangular waveguide, plasma is formed by microwave excitation at low pressure
Body, into the container of going barrel, is surface-treated to the powder being placed in container, chopped fiber, particle etc..Sometimes, ginseng is worked as
When being extremely easy in decomposition with the reacting gas of reaction, this reacting gas can not be inputted by the first intake interface 5, and lateral by reative cell
Second intake interface 8 of (can also be arranged on upper surface) is inputted, by gas pipeline and flow equalizing ring put in rotation drum container in
Output is sprayed around the port of quartz ampoule, surface treatment is participated in together with the plasma flowed out in quartz ampoule.
The laterally attached vacuum system of reative cell 6, including (connection vacuum meter detects the work gas of reative cell to vacuum gauge 9
Pressure), cyclone separator 10, filter 11, coarse adjustment 12 and fine tuning choke valve 13, vent valve 14, then connect blocking for vavuum pump
Vent valve 15, corresponding vacuum line, are most followed by vavuum pump 16.By the gas discharge outlet of vavuum pump 16 by the nothing extracted out in device
Evil gas discharges open air with discharge duct, or pernicious gas is discharged into exhaust processor progress harmless treatment.Reative cell it is another
One is laterally equipped with observation window 19, sees Fig. 1.
The going barrel of the present apparatus is made bell shape container 20, vacuum dynamic seal by the transparent medium such as quartz or heat resistant glass and revolved
Rotating shaft and bearing 21, reative cell bottom blind flange 18, rotary shaft container base 22 and belt pulley 23 are constituted.Media Containers are pacified
Fill pressing plate 24 and studs 25 loads on vacuum dynamic seal rotary shaft container base, dynamic sealing bearing is arranged on reative cell bottom
On blind flange 18, Fig. 2 is seen.
Powder, chopped fiber, particle etc., which load after container, easily integrally to load reative cell by going barrel, going barrel it is true
It is consistent with the quartz ampoule central shaft for producing plasma that lost motion seals rotary shaft.Rotary shaft is driven by motor by belt 30,
Make the going barrel concomitant rotation of loading.
As shown in figure 3, whole microwave plasma source 100 is tilted and is installed on a support 26, the rotary shaft of going barrel 7
Tangible at an angle with horizontal plane, the angle is between 30 ° to 60 °, whole microwave plasma source 0 passes through device installing plate
27 are installed on support 26, and support 26 is equidistantly to offer more than one adjustment hole 28 on adjustable support, support, whole micro-
Ripple plasma source is tilted by regulating bolt and is installed on support, and is installed in corresponding adjustment hole so that microwave etc. from
In 30 ° to 60 ° angles between daughter source and horizontal plane.
Load reative cell after powder, chopped fiber or particle load going barrel, then by going barrel, tighten going barrel (anti-
Answer room bottom blind flange) fastening bolt formation bonding in vacuum.
Vavuum pump is started, prevents from rotating powder in drum container, chopped fiber, particle with taking out by the governor valve control speed of exhaust
Gas air-flow is flown upward.It is evacuated to input service gas and the reacting gas of participation reaction after base vacuum.Driving motor 29 is started, makes rotation
Rotary drum is rotated.At this moment microwave source is opened, microwave plasma is inspired in quartz ampoule.
After the parameters such as adjustment work gas flow, pressure, microwave power reach technological requirement, powder, chopped fiber or
Grain is continuously stirred in rotation drum container, makes its surface and plasma (and the reacting gas inputted by intake interface 2) phase
Contact and obtain uniform treatment.
Can Real Time Observation processing procedure by observation window and transparent medium container.After processing to stipulated time, close in succession
Close after working gas, vavuum pump, microwave source, rotary electric machine, open vent valve, make to reach atmospheric pressure in reative cell, so that it may unload
Driving belt, backs out going barrel fastening bolt, from reative cell take out going barrel, and take out handle well powder, chopped fiber or
Grain.
It is described above, embodiment only of the present utility model, but protection domain of the present utility model do not limit to
In this, any change or replacement expected without creative work should all be covered within protection domain of the present utility model.
Therefore, protection domain of the present utility model should be determined by the scope of protection defined in the claims.
Claims (7)
1. a kind of novel microwave plasma processing apparatus, it is characterised in that：It is made up of quartz ampoule and microwave cavity and microwave source, stone
English pipe passes through the broadside face of rectangular waveguide microwave cavity, and one end of rectangular waveguide connects microwave source, and the other end of rectangular waveguide is short
Road plate, the distance of short board to quartz ampoule is λ g/4, and the upper and lower ends through the quartz ampoule in the broadside face of rectangular waveguide respectively have one
Section metal tube is connected with rectangular waveguide, and there is the first intake interface one end of quartz ampoule, is connected with working gas air-channel system,
The other end of quartz ampoule stretches into the upper surface of reative cell and forms vacuum with cylindrical cavity vacuum chamber with sealing flange and O shapes cushion rubber
Going barrel is installed on connection, the bottom flange of reative cell, is connected with reative cell formation vacuum dynamic seal, stretches into the quartz of reative cell
The port of pipe puts in rotation drum container, and reative cell bottom is sealed by reative cell bottom blind flange, and going barrel passes through reative cell bottom
In end flanges lid to reative cell, and locked by fastening bolt.
2. novel microwave plasma processing apparatus as claimed in claim 1, it is characterised in that：The lateral of the reative cell connects
Connect vacuum system.
3. novel microwave plasma processing apparatus as claimed in claim 2, it is characterised in that：The vacuum system includes true
Sky is regulated, cyclone separator, filter, coarse adjustment and fine tuning choke valve, vent valve, then connect vavuum pump block vent valve,
Corresponding vacuum line, is most followed by vavuum pump, and the another of reative cell is laterally equipped with observation window.
4. novel microwave plasma processing apparatus as claimed in claim 1, it is characterised in that：The going barrel is situated between by transparent
Bell shape container, vacuum dynamic seal rotary shaft and bearing that matter is made, reative cell bottom blind flange, rotary shaft container base and
Belt pulley set is into bell shape container is loaded on vacuum dynamic seal rotary shaft container base with installation pressing plate and studs, bearing
On the blind flange of reative cell bottom.
5. novel microwave plasma processing apparatus as claimed in claim 4, it is characterised in that：The vacuum moving of the going barrel
It is consistent with the quartz ampoule central shaft for producing plasma to seal rotary shaft, and vacuum dynamic seal rotary shaft is passed by motor by belt
It is dynamic, make the going barrel concomitant rotation of loading.
6. novel microwave plasma processing apparatus as claimed in claim 1, it is characterised in that：Whole microwave plasma source
Inclination is installed on a support, and the rotary shaft of going barrel and horizontal plane are tangible at an angle, the angle be 30 ° to 60 ° it
Between, whole microwave plasma source is installed on support by device installing plate.
7. novel microwave plasma processing apparatus as claimed in claim 6, it is characterised in that：The support is adjustable branch
More than one adjustment hole is equidistantly offered on frame, support, whole microwave plasma source is tilted by regulating bolt and is installed on
On support, and it is installed in corresponding adjustment hole so that in 30 ° to 60 ° angles between microwave plasma source and horizontal plane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720164441.4U CN206481488U (en) | 2017-02-23 | 2017-02-23 | A kind of novel microwave plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720164441.4U CN206481488U (en) | 2017-02-23 | 2017-02-23 | A kind of novel microwave plasma processing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206481488U true CN206481488U (en) | 2017-09-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720164441.4U Active CN206481488U (en) | 2017-02-23 | 2017-02-23 | A kind of novel microwave plasma processing apparatus |
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| Country | Link |
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| CN (1) | CN206481488U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107948895A (en) * | 2017-11-20 | 2018-04-20 | 成都溢杰科技有限公司 | Microwave plasma loudspeaker |
-
2017
- 2017-02-23 CN CN201720164441.4U patent/CN206481488U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107948895A (en) * | 2017-11-20 | 2018-04-20 | 成都溢杰科技有限公司 | Microwave plasma loudspeaker |
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