KR970000511Y1 - Coating apparatus for chemical vapor deposition - Google Patents
Coating apparatus for chemical vapor deposition Download PDFInfo
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- KR970000511Y1 KR970000511Y1 KR2019940022833U KR19940022833U KR970000511Y1 KR 970000511 Y1 KR970000511 Y1 KR 970000511Y1 KR 2019940022833 U KR2019940022833 U KR 2019940022833U KR 19940022833 U KR19940022833 U KR 19940022833U KR 970000511 Y1 KR970000511 Y1 KR 970000511Y1
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- chemical vapor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/4558—Perforated rings
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
내용 없음.No content.
Description
제1도는 종래의 장치를 나타낸 종단면도.1 is a longitudinal sectional view showing a conventional device.
제2도는 본 고안을 나타낸 종단면도.Figure 2 is a longitudinal cross-sectional view showing the present invention.
제3도는 본 고안의 요부를 나타낸 사시도.Figure 3 is a perspective view showing the main part of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
1 : 본체 2 : 챔버1: body 2: chamber
5 : 지지대 11 : 배기구5: support 11: exhaust port
13 : 외부링 13a : 가스배출구13 outer ring 13a gas outlet
14 : 격판 14a : 가스통로14: plate 14a: gas passage
15 : 반응실 16 : 가스공급실15: reaction chamber 16: gas supply chamber
17 : 가스분출기 18 : 가스예열실17 gas ejector 18 gas preheating chamber
18a : 격벽18a: bulkhead
본 고안은 화학증착법(CVD : Chemical Vapor Deposition)을 이용하는 코팅장치에 관한 것으로써, 좀더 구체적으로는 그 구조를 개선하여 금형이나, 내마모부품등 대형소결체를 용이하고 균일하게 코팅할 수 있도록 한것이다.The present invention relates to a coating apparatus using a chemical vapor deposition (CVD), and more specifically, to improve the structure to easily and uniformly coat large sintered bodies such as molds and wear-resistant parts. .
일반적으로 각종 공구나 금형, 내마모부품등은 내마모성을 향상시킬 목적으로 화학증착법에 의해 표면을 코팅하게 되는데, 이때 사용되는 코팅물질로는 내마모성이 우수한 탄화물, 질화물, 탄질화물, 산화물등이 주로 이용되고 있다.In general, various tools, molds, and wear parts are coated on the surface by chemical vapor deposition for the purpose of improving wear resistance. At this time, abrasion resistance carbide, nitride, carbonitride, oxide, etc. are mainly used. It is becoming.
첨부도면 제1도는 종래의 장치를 나타낸 종단면도로써, 인써트(Insert)와 같은 절삭공구의 소형소결체를 코팅할때 주로 사용된다.1 is a longitudinal cross-sectional view showing a conventional apparatus, and is mainly used when coating a compact sintered body of a cutting tool such as an insert.
그 구조를 살펴보면, 본체(1)내에 챔버(2)가 설치되어 있고 상기 챔버의 내부에 설치된 지지대(5)의 상부에는 다수개의 격판(3)이 외부링(4)으로 지지되게 설치도어 반응실(6)을 구비하고 있으며 상기 격판의 중심부에는 주입관(7)이 삽입된 가스분배관(8)이 고정되어 있다.Looking at the structure, the chamber (2) is installed in the main body 1, the plurality of diaphragms (3) on the upper portion of the support (5) installed in the interior of the chamber is installed in the door door reaction chamber (6), the gas distribution pipe (8) into which the injection pipe (7) is inserted is fixed to the center of the diaphragm.
상기 가스분배관(8)과 외부링(4)의 외주면에는 가스통로(8a)(4a)가 각각 형성되어 있고 본체(1)의 내부에은 격판에 얹혀진 제품(9)을 가열시키기 위한 발열체(10)가 내장되어 있으며 본체(1)의 바닥면에는 반응이 완료된 가스를 외부로 배출시키기 위한 배기구(11)가 형성되어 있다.Gas passages 8a and 4a are formed on the outer circumferential surfaces of the gas distribution pipe 8 and the outer ring 4, respectively, and a heating element 10 for heating the product 9 mounted on the diaphragm inside the main body 1; ) Is built in, and an exhaust port 11 is formed at the bottom of the main body 1 for discharging the completed gas to the outside.
미설명부호 (12)는 공정 진행시의 챔버내의 온도를 측정하기 위한 열전대이다.Reference numeral 12 is a thermocouple for measuring the temperature in the chamber during the process.
이러한 종래의 장치는 챔버(2)내의 격판(3) 상부에 코팅하고자 하는 제품(9)을 올려 놓은 다음 반응실(6)을 챔버(2)로 밀폐시키고 원하는 조성으로 혼합된 가스를 주입관(7)으로 주입하면 주입된 가스는 반응실(6)의 상단으로 올라간 다음 다시 주입관(7)과 가스분배관(8) 사이의 공간을 통해 하방으로 내려오면서 가스분배관(8)에 형성된 가스통로(8a)를 통해 제품(9)인 소결체가 놓여 있는 각 격판(3)의 상부로 골고루 공급된다.Such a conventional apparatus places a product 9 to be coated on the diaphragm 3 in the chamber 2 and then seals the reaction chamber 6 with the chamber 2 and injects a gas mixed with a desired composition into an injection tube ( 7) When injected into the gas is injected into the upper end of the reaction chamber (6) and then down again through the space between the injection pipe 7 and the gas distribution pipe 8, the gas cylinder formed in the gas distribution pipe (8) Through the furnace 8a, the sintered body, which is the product 9, is evenly supplied to the top of each diaphragm 3 on which it is placed.
이때 코팅될 제품(9)은 발열체(10)의 발열에 의해 미리 800-1200℃ 범위로 가열된 상태이며, 이러한 상태에서 반응기체인 가스가 각 격판(3)으로 유입되어 제품에 도달하면 제품의 표면에서 화학반응을 일으키게 되므로 제품의 표면이 코팅된다.At this time, the product to be coated 9 is heated in the range of 800-1200 ° C. in advance by the heating of the heating element 10. In this state, when the gas, which is a reactive gas, flows into each of the diaphragms 3 and reaches the product, the surface of the product The surface of the product is coated because it causes a chemical reaction at.
그후, 반응이 완료된 가스는 외부링(4)의 가스통로(4a)를 통해 반응실(6)을 빠져 나온 다음 배기구(12)를 거쳐 외부의 진공펌프(도시는 생략함)에 의해 챔버(2)의 밖으로 배출된다.After completion of the reaction, the gas exits the reaction chamber 6 through the gas passage 4a of the outer ring 4 and then through the exhaust port 12 by an external vacuum pump (not shown). Vented out).
그러나 이러한 종래의 구조에서는 반응실(6)의 내부 중심에 주입관(7)과 가스분해관(8)이 설치되므로 인해 반응실(6)의 반지름이상의 크기를 가진 제품은 코팅할 수 없게 되는 문제점이 있었다.However, in this conventional structure, since the injection tube 7 and the gas cracking tube 8 are installed in the inner center of the reaction chamber 6, the product having a size larger than the radius of the reaction chamber 6 cannot be coated. There was this.
본 고안은 종래의 이와 같은 문제점을 해결하기 위해 안출한 것으로써, 가스의 공급구조를 개선하여 비교적 크기가 큰 금형이나 내마모성부품을 코팅할 수 있도록 하는데 그 목적이 있다.The present invention has been made to solve such a problem in the prior art, the object of the present invention is to improve the gas supply structure to coat a relatively large mold or wear-resistant parts.
상기 목적을 달성하기 위한 본체(1)의 형태에 따르면, 챔버와 통하여지게 본체의 하부에 배기구를 형성하여 상기 배기구를 통해 반응이 완료된 가스를 외부로 배출시키도록 된 것에 있어서, 상측으로 가스배출구를 가진 외부링을 지지대에 설치하고 상기 외부링의 하부에는 가스통로가 형성된 격판을 설치하여 반응실과 가스공급실이 구비되도록 하며 상기 가스공급실의 내부에는 반응실내부로 가스를 공급하는 가스분출기를 설치하여서 된 화학증착 코팅장치가 제공된다.According to the form of the main body 1 for achieving the above object, the exhaust port is formed in the lower part of the main body through the chamber to discharge the gas which has completed the reaction through the exhaust port to the outside. The outer ring is installed on the support, and the lower part of the outer ring is provided with a gas passage formed diaphragm so that the reaction chamber and the gas supply chamber are provided, and the gas supply chamber is provided with a gas ejector for supplying gas into the reaction chamber. Deposition coating apparatus is provided.
이하, 본 고안을 일 실시예로 도시한 첨부된 도면 제2도 및 제3도를 참고로 하여 다욱 상세히 설명하면 다음과 같다.Hereinafter, the present invention will be described in detail with reference to FIGS. 2 and 3 of the accompanying drawings showing an embodiment of the present invention.
첨부도면 제2도는 본 고안을 나타낸 종단면도이고 제3도는 본 고안의 요부를 나타낸 시시도로써, 본 고안은 지지대(5)에 상측으로 가스배출구(13a)가 형성된 외부링(13)이 설치되어 있고 상기 외부링(13)의 하부에는 무수히 많은 가스통로(14a)가 형성된 격판(14)이 설치되어 외부링의 내부를 반응실(15)과 가스공급실(16)로 구획하도록 되어 있다.2 is a longitudinal cross-sectional view of the present invention, and FIG. 3 is a view showing the main parts of the present invention. The present invention includes an outer ring 13 having a gas outlet 13a formed on the support 5 above. In the lower part of the outer ring 13, a diaphragm 14 having a myriad of gas passages 14a is provided to partition the inside of the outer ring into a reaction chamber 15 and a gas supply chamber 16.
상기 지지대(5)에 설치되는 외부링(13)은 일체화되게 형성하여도 되지만, 본 고안의 일 실시예와 같이 복수개로 분할 형성하여 코팅하는 제품의 크기에 따라 높이를 적절히 가변시키도록 할 수도 있다.The outer ring 13 installed on the support 5 may be integrally formed, but may be formed so as to vary the height according to the size of the product to be divided and formed into a plurality as in the embodiment of the present invention. .
이는 적은량의 가스를 투입하고도 효과적으로 코팅을 실시하여 가스의 소모량을 줄일 수 있도록 하기 위함이다.This is to reduce the consumption of gas by coating effectively even if a small amount of gas is added.
이를 위해 분할 형성되는 외부링(13)의 하부에 플랜지(13b)를 형성하고 상부는 원통형으로 구성하므로써 필요에 따라 원통형의 상부에 플랜지(13b)를 차례로 적층하여 결합하게 된다.To this end, the flange 13b is formed on the lower portion of the outer ring 13 to be divided and the upper portion is formed in a cylindrical shape, so that the flange 13b is sequentially stacked on the upper portion of the cylindrical shape, if necessary, to be coupled.
또한 최하방에서 2번째로 위치되는 외부링(13)에 형성된 플랜지(13b)의 절곡면에 격판(14)을 올려 놓아 지지하므로써 격판을 설치하기 위한 별도의 지지수단을 구비하지 않아도 되므로 가스공급실(16)의 크기에 따라 설계시 1번째 외부링의 높이를 적절히 설정하여야 된다.In addition, since the diaphragm 14 is placed on the bent surface of the flange 13b formed on the outer ring 13 positioned second from the bottom, it is not necessary to provide a separate supporting means for installing the diaphragm so that the gas supply chamber ( According to the size of 16), the height of the first outer ring should be set properly.
그리고 제품의 균일한 코팅을 위해 가스공급실(16) 내부에 위치되는 가스분출기(17)의 하방인 지지대(5)내에 가스예열실(18)이 구비되어 있는데, 가스의 예열효율을 증대시키도록 가스예열실내에 지그재그로 격벽(18a)을 형성한다.In addition, a gas preheating chamber 18 is provided in the support 5, which is below the gas ejector 17 positioned inside the gas supply chamber 16 for uniform coating of the product, so as to increase the preheating efficiency of the gas. A partition wall 18a is formed in a gas preheating chamber in a zigzag manner.
이는 공급되는 가스가 가스예열실의 내부를 지그재그로 순환하면서 주위의 열과 충분히 열교환함으로써 예열효율이 증대되도록 하기 위함이다.This is to ensure that the preheating efficiency is increased by circulating the inside of the gas preheating chamber in a zig-zag and sufficiently exchanging heat with the surrounding heat.
한편, 가스분출기(17)와 가스예열실(18)의 하부에 모터(도시는 생략함)를 설치하여 가스의 공급시 이들이 회전되도록 함으로써 반응실(15)내로의 가스공급이 더욱 균일해지도록 되어 있다.On the other hand, by installing a motor (not shown) in the lower part of the gas ejector 17 and the gas preheating chamber 18 so that they are rotated when the gas is supplied, the gas supply into the reaction chamber 15 becomes more uniform. It is.
이와 같이 구성된 본 고안의 작용, 효과를 설명하면 다음과 같다.Referring to the operation, effects of the present invention configured as described above are as follows.
먼저 코팅하고자 하는 제품(9a)의 크기에 따라 외부링(13)을 지지대(5)에 적절한 갯수로 결합한 다음 격판(14)의 상부에 코팅하고자 하는 제품(9a)을 넣는다.First, according to the size of the product 9a to be coated, the outer ring 13 is coupled to the support 5 in an appropriate number, and then the product 9a to be coated is put on the upper portion of the diaphragm 14.
이와 같이 격판(14)의 상면에 제품을 넣을 때에는 제품에 의해 가스통로(14a)가 폐쇄되지 않도록 고려하여야 한다.As such, when the product is put on the upper surface of the diaphragm 14, it should be considered that the gas passage 14a is not closed by the product.
그후, 원하는 조성으로 혼합된 가스를 공급하면 공급된 가스는 가스예열실(18)내에 격벽(18a)에 의해 가스예열실내를 순환하면서 가열된 다음 가스분출기(17)로 분출되므로 분출된 가스는 가스공급실(16)을 구획하는 격판(14)의 가스통로(14a)를 통해 반응실(15)내로 공급된다.Then, when the gas mixed with the desired composition is supplied, the supplied gas is heated while circulating in the gas preheating chamber by the partition 18a in the gas preheating chamber 18 and then ejected to the gas ejector 17, so that the ejected gas is The gas supply chamber 16 is supplied into the reaction chamber 15 through the gas passage 14a of the diaphragm 14.
이때 공급되는 가스는 가스분출기(17)와 가스예열실(18)이 모터에 의해 회전되므로 반응실(15)내로 더욱 안정되게 공급된다.At this time, the gas supplied is more stably supplied into the reaction chamber 15 because the gas ejector 17 and the gas preheating chamber 18 are rotated by a motor.
이에 따라 반응실(15)내로 유입된 가스는 발열체(10)에 의해 가열된 제품의 표면에서 화학반응을 일으키게 되므로 제품의 표면이 코팅된다.Accordingly, the gas introduced into the reaction chamber 15 causes a chemical reaction on the surface of the product heated by the heating element 10, thereby coating the surface of the product.
이와 같이 제품의 표면과 화학반응을 일으키고 난 가스는 최상방의 외부링(13)에 형성된 가스배출구(13a)을 통해 반응실(15)의 외부로 빠져 나온 다음 배기구(11)를 통해 챔버(2)의 외부로 배출되므로 비교적 큰 제품의 코팅작업이 가능해지게 되는 것이다.As such, the gas that has caused the chemical reaction with the surface of the product exits to the outside of the reaction chamber 15 through the gas outlet 13a formed in the upper outer ring 13, and then through the exhaust port 11, the chamber 2 Since it is discharged to the outside of the relatively large product coating will be possible.
이상에서와 같이 본 고안은 반응실의 내부 중심에 가스분배관이 설치되지 않음으로 인해 대형제품의 코팅작업이 가능해지게 됨은 물론 가스분출기와 가스예열실을 회전시키면서 반응실내로 가스를 공급하므로 인해 반응실내에 가스를 균일하게 분포시킬 수 있게 되고, 이에 따라 균일한 코팅면을 얻을 수 있게 되는 효과를 갖는다.As described above, the present invention enables the coating work of a large product due to the absence of the gas distribution pipe in the inner center of the reaction chamber, as well as supplying the gas into the reaction chamber while rotating the gas ejector and the gas preheating chamber. It is possible to uniformly distribute the gas in the room, thereby having an effect of obtaining a uniform coating surface.
Claims (6)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940022833U KR970000511Y1 (en) | 1994-09-05 | 1994-09-05 | Coating apparatus for chemical vapor deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940022833U KR970000511Y1 (en) | 1994-09-05 | 1994-09-05 | Coating apparatus for chemical vapor deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR960011167U KR960011167U (en) | 1996-04-15 |
| KR970000511Y1 true KR970000511Y1 (en) | 1997-01-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019940022833U KR970000511Y1 (en) | 1994-09-05 | 1994-09-05 | Coating apparatus for chemical vapor deposition |
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| Country | Link |
|---|---|
| KR (1) | KR970000511Y1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101463659B1 (en) * | 2012-12-05 | 2014-11-24 | 성균관대학교산학협력단 | A method of coating a surface of an fine particles with silicon-carbon complex and an fine particles coated by the same |
-
1994
- 1994-09-05 KR KR2019940022833U patent/KR970000511Y1/en not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101463659B1 (en) * | 2012-12-05 | 2014-11-24 | 성균관대학교산학협력단 | A method of coating a surface of an fine particles with silicon-carbon complex and an fine particles coated by the same |
Also Published As
| Publication number | Publication date |
|---|---|
| KR960011167U (en) | 1996-04-15 |
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