JPS648621A - Resist coating apparatus - Google Patents
Resist coating apparatusInfo
- Publication number
- JPS648621A JPS648621A JP62163548A JP16354887A JPS648621A JP S648621 A JPS648621 A JP S648621A JP 62163548 A JP62163548 A JP 62163548A JP 16354887 A JP16354887 A JP 16354887A JP S648621 A JPS648621 A JP S648621A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- nozzle
- pot
- washing solution
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
- B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62163548A JPH0795514B2 (ja) | 1987-06-30 | 1987-06-30 | レジスト塗布装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62163548A JPH0795514B2 (ja) | 1987-06-30 | 1987-06-30 | レジスト塗布装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS648621A true JPS648621A (en) | 1989-01-12 |
JPH0795514B2 JPH0795514B2 (ja) | 1995-10-11 |
Family
ID=15775989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62163548A Expired - Lifetime JPH0795514B2 (ja) | 1987-06-30 | 1987-06-30 | レジスト塗布装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0795514B2 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5134962A (en) * | 1989-09-29 | 1992-08-04 | Hitachi, Ltd. | Spin coating apparatus |
US6210481B1 (en) * | 1998-05-19 | 2001-04-03 | Tokyo Electron Limited | Apparatus and method of cleaning nozzle and apparatus of processing substrate |
JP2007317706A (ja) * | 2006-05-23 | 2007-12-06 | Tokyo Electron Ltd | ノズル洗浄装置、ノズル洗浄方法、ノズル洗浄プログラム、及びそのプログラムを記録したコンピュータ読み取り可能な記録媒体 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5632724A (en) * | 1979-08-24 | 1981-04-02 | Hitachi Ltd | Photoresist applying apparatus |
JPS60136777U (ja) * | 1984-12-29 | 1985-09-11 | タツモ株式会社 | 回転塗布装置 |
JPS60212269A (ja) * | 1984-04-06 | 1985-10-24 | Nec Corp | フオト・レジスト塗布装置 |
JPS6246521A (ja) * | 1985-08-23 | 1987-02-28 | Mitsubishi Electric Corp | レジスト塗布装置 |
JPS6279577U (ja) * | 1985-11-05 | 1987-05-21 |
-
1987
- 1987-06-30 JP JP62163548A patent/JPH0795514B2/ja not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5632724A (en) * | 1979-08-24 | 1981-04-02 | Hitachi Ltd | Photoresist applying apparatus |
JPS60212269A (ja) * | 1984-04-06 | 1985-10-24 | Nec Corp | フオト・レジスト塗布装置 |
JPS60136777U (ja) * | 1984-12-29 | 1985-09-11 | タツモ株式会社 | 回転塗布装置 |
JPS6246521A (ja) * | 1985-08-23 | 1987-02-28 | Mitsubishi Electric Corp | レジスト塗布装置 |
JPS6279577U (ja) * | 1985-11-05 | 1987-05-21 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5134962A (en) * | 1989-09-29 | 1992-08-04 | Hitachi, Ltd. | Spin coating apparatus |
US6210481B1 (en) * | 1998-05-19 | 2001-04-03 | Tokyo Electron Limited | Apparatus and method of cleaning nozzle and apparatus of processing substrate |
US6287390B2 (en) * | 1998-05-19 | 2001-09-11 | Tokyo Electron Limited | Apparatus and method of cleaning nozzle and apparatus of processing substrate |
JP2007317706A (ja) * | 2006-05-23 | 2007-12-06 | Tokyo Electron Ltd | ノズル洗浄装置、ノズル洗浄方法、ノズル洗浄プログラム、及びそのプログラムを記録したコンピュータ読み取り可能な記録媒体 |
Also Published As
Publication number | Publication date |
---|---|
JPH0795514B2 (ja) | 1995-10-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071011 Year of fee payment: 12 |