JPS648620A - Coating method - Google Patents
Coating methodInfo
- Publication number
- JPS648620A JPS648620A JP16234087A JP16234087A JPS648620A JP S648620 A JPS648620 A JP S648620A JP 16234087 A JP16234087 A JP 16234087A JP 16234087 A JP16234087 A JP 16234087A JP S648620 A JPS648620 A JP S648620A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- resist
- humidity
- air
- controlled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To make small change of resist coating film thickness of each substrate by supplying clean air, for which temperature and humidity are controlled with high accuracy, to the coating area at the time of coating a substrate with resist and to equalize the thickness of a resist the substrate surface by setting temperature and humidity at optimum values. CONSTITUTION:The resist is sent to a substrate 10 from a nozzle 9 under the well-controlled condition of temperature and humidity within a processor 13 in which the resist is coated. The resist is then coated through rotation of a motor 12. The air, of which the temperature and humidity are controlled, is supplied as follows: First, the air sucked by a fan 4 is cooled and dehumidified by a cooling and dehumidifier 2 and humidity control is carried out by a humidity sensor 7 and a humidifier 1. Moreover, temperature of the air is controlled by a temperature sensor 7, temperature controller 3 and a heater 5 connected thereto. The air is then cleaned by a filter 6 and is sent to a coating processor 13.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16234087A JPS648620A (en) | 1987-07-01 | 1987-07-01 | Coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16234087A JPS648620A (en) | 1987-07-01 | 1987-07-01 | Coating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS648620A true JPS648620A (en) | 1989-01-12 |
Family
ID=15752695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16234087A Pending JPS648620A (en) | 1987-07-01 | 1987-07-01 | Coating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS648620A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100244171B1 (en) * | 1995-07-27 | 2000-03-02 | 이시다 아키라 | Coating apparatus of substrate |
| EP1143296A2 (en) * | 1995-03-08 | 2001-10-10 | Matsushita Electric Industrial Co., Ltd | Method for forming pattern |
| CN102513260A (en) * | 2011-12-16 | 2012-06-27 | 佛山市锦德机械设备有限公司 | Digital coating system |
-
1987
- 1987-07-01 JP JP16234087A patent/JPS648620A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1143296A2 (en) * | 1995-03-08 | 2001-10-10 | Matsushita Electric Industrial Co., Ltd | Method for forming pattern |
| EP1143297A2 (en) * | 1995-03-08 | 2001-10-10 | Matsushita Electric Industrial Co., Ltd. | Method for forming pattern |
| KR100244171B1 (en) * | 1995-07-27 | 2000-03-02 | 이시다 아키라 | Coating apparatus of substrate |
| CN102513260A (en) * | 2011-12-16 | 2012-06-27 | 佛山市锦德机械设备有限公司 | Digital coating system |
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