JPS6479375A - Plasma cvd device - Google Patents

Plasma cvd device

Info

Publication number
JPS6479375A
JPS6479375A JP23462287A JP23462287A JPS6479375A JP S6479375 A JPS6479375 A JP S6479375A JP 23462287 A JP23462287 A JP 23462287A JP 23462287 A JP23462287 A JP 23462287A JP S6479375 A JPS6479375 A JP S6479375A
Authority
JP
Japan
Prior art keywords
cathode
metallic
base bodies
gas
downstream
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23462287A
Other languages
English (en)
Inventor
Takanori Minamitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP23462287A priority Critical patent/JPS6479375A/ja
Publication of JPS6479375A publication Critical patent/JPS6479375A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP23462287A 1987-09-18 1987-09-18 Plasma cvd device Pending JPS6479375A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23462287A JPS6479375A (en) 1987-09-18 1987-09-18 Plasma cvd device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23462287A JPS6479375A (en) 1987-09-18 1987-09-18 Plasma cvd device

Publications (1)

Publication Number Publication Date
JPS6479375A true JPS6479375A (en) 1989-03-24

Family

ID=16973927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23462287A Pending JPS6479375A (en) 1987-09-18 1987-09-18 Plasma cvd device

Country Status (1)

Country Link
JP (1) JPS6479375A (ja)

Similar Documents

Publication Publication Date Title
EP0761415A3 (de) Verfahren und Vorrichtung zur Oberflächen-Vorbehandlung von Werkstücken
DE69740178D1 (de) Plasmaätzreaktor und verfahren zu seinem betrieb
DE50015635D1 (en) Bstraten
CA2196894A1 (en) Apparatus for and method of manufacturing plastic container coated with carbon film
TW344936B (en) Plasma apparatus
ATE181116T1 (de) Verfahren und vorrichtung zur behandlung von substratoberflächen
EP0375338A3 (en) High intensity radiation apparatus
MY142898A (en) Electrode member used in a plasma treating apparatus
CA2085497A1 (en) Continuous powder catalyst supply apparatus and catalyst supply system
EP0641150A4 (en) TREATMENT DEVICE.
EP0431190A4 (en) Fluid treater and method of stopping the same
JPS6479375A (en) Plasma cvd device
JPS5723634A (en) Discharge treating apparatus of plastic film
JPS56138921A (en) Method of formation for impurity introduction layer
US3958587A (en) Manifold for fluid distribution and removal
JPS6459919A (en) Coating device
JPS56129049A (en) Plasma flame spraying torch
JPS56166377A (en) Plasma treating method of hollow body
EP0834593A3 (en) Plasma thin-film forming apparatus and method
EP0695622A3 (de) Verfahren und Vorrichtung zur Plasmamodifizierung von flächigen porösen Gegenständen
JPS5776844A (en) Method and apparatus for processing microwave plasma
JPS60123033A (ja) プラズマ処理装置
JPS6447875A (en) Plasma cvd device
JPS57182302A (en) Apparatus for forming polymer film by plasma polymerization
JPH0477229U (ja)