JPS6476662A - Electron shower adjustment for ion beam correcting device - Google Patents
Electron shower adjustment for ion beam correcting deviceInfo
- Publication number
- JPS6476662A JPS6476662A JP23145987A JP23145987A JPS6476662A JP S6476662 A JPS6476662 A JP S6476662A JP 23145987 A JP23145987 A JP 23145987A JP 23145987 A JP23145987 A JP 23145987A JP S6476662 A JPS6476662 A JP S6476662A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- electron shower
- sample
- observation portion
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To adjust the electron shower quantitatively by concurrently radiating an ion beam and the electron shower to the observation portion of a nonconducting sample, comparing the observation image with the observation image of a conducting sample, and adjusting the quantity of the electron shower to obtain the same resolution. CONSTITUTION:When the surface of a conducting sample 5 is to be observed, only an ion beam 1 is radiated to the observation portion. No charge-up by the ion beam is generated on the surface of the conducting sample 5, thus a clear image is obtained. When the surface of a nonconducting sample 6 is to be observed, the ion beam 1 and electron shower 7 are concurrently radiated to the observation portion. The charge-up by the ion beam 1 is generated on the surface of the nonconducting sample 6. The radiation current quantity and radiation position range or the like of the electron shower 7 are quantitatively adjusted to obtain the same resolution for both images while the image of the observation portion is compared with the clear image with no charge-up of the observation portion of the conducting sample 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23145987A JPS6476662A (en) | 1987-09-14 | 1987-09-14 | Electron shower adjustment for ion beam correcting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23145987A JPS6476662A (en) | 1987-09-14 | 1987-09-14 | Electron shower adjustment for ion beam correcting device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6476662A true JPS6476662A (en) | 1989-03-22 |
Family
ID=16923840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23145987A Pending JPS6476662A (en) | 1987-09-14 | 1987-09-14 | Electron shower adjustment for ion beam correcting device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6476662A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7210666B2 (en) | 1999-06-30 | 2007-05-01 | Silverbrook Research Pty Ltd | Fluid ejection device with inner and outer arms |
-
1987
- 1987-09-14 JP JP23145987A patent/JPS6476662A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7210666B2 (en) | 1999-06-30 | 2007-05-01 | Silverbrook Research Pty Ltd | Fluid ejection device with inner and outer arms |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES8703679A1 (en) | Electron-beam device and semiconducteur device for use in such an electron-beam device. | |
DE59400046D1 (en) | Magnetron sputtering source and its use. | |
SE7711561L (en) | TOMOMETRIC SYSTEM WITH BODY FOR SELECTIVE SETTING OF THE FORMAT FOR A SHOWN IMAGE | |
JPS6476662A (en) | Electron shower adjustment for ion beam correcting device | |
US4465935A (en) | Electrically conductive sample support-mounting for secondary ion mass spectrometer analysis | |
EP0381189A3 (en) | Image pick-up tube | |
JPS54111296A (en) | X ray generating device | |
JPS5234690A (en) | Method to obatain x-ray body axis tomogramic image | |
JPS5640244A (en) | Beam scanning correction at electron beam exposure | |
FR2335036A1 (en) | Generation of radiation pattern on specimen - converts beam from source into parallel beams displaying pattern of masker | |
JPS5457862A (en) | Ion-beam irradiation device | |
JPS5678052A (en) | Electron beam device | |
JPS6415604A (en) | Measuring apparatus for length by electron beam | |
SE9201381L (en) | Screen device | |
JPS5636058A (en) | Measuring system for surface electric potential | |
JPS5262496A (en) | Element analyzer | |
JPS5230996A (en) | Electron beam processing device | |
JPS54128288A (en) | Electron beam exposure device | |
JPS6431008A (en) | Measuring apparatus for length by electron beam | |
JPS5515206A (en) | Electronic beam exposure apparatus | |
JPS6427151A (en) | Measuring device | |
JPS5414115A (en) | Color picture tube unit | |
JPS5362978A (en) | Electron microscope | |
JPS529487A (en) | Sample analyzer | |
JPS5532383A (en) | Projection braun tube |