JPS6476662A - Electron shower adjustment for ion beam correcting device - Google Patents

Electron shower adjustment for ion beam correcting device

Info

Publication number
JPS6476662A
JPS6476662A JP23145987A JP23145987A JPS6476662A JP S6476662 A JPS6476662 A JP S6476662A JP 23145987 A JP23145987 A JP 23145987A JP 23145987 A JP23145987 A JP 23145987A JP S6476662 A JPS6476662 A JP S6476662A
Authority
JP
Japan
Prior art keywords
ion beam
electron shower
sample
observation portion
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23145987A
Other languages
Japanese (ja)
Inventor
Yasuyuki Kawai
Shigeru Noguchi
Chihiro Tabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP23145987A priority Critical patent/JPS6476662A/en
Publication of JPS6476662A publication Critical patent/JPS6476662A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To adjust the electron shower quantitatively by concurrently radiating an ion beam and the electron shower to the observation portion of a nonconducting sample, comparing the observation image with the observation image of a conducting sample, and adjusting the quantity of the electron shower to obtain the same resolution. CONSTITUTION:When the surface of a conducting sample 5 is to be observed, only an ion beam 1 is radiated to the observation portion. No charge-up by the ion beam is generated on the surface of the conducting sample 5, thus a clear image is obtained. When the surface of a nonconducting sample 6 is to be observed, the ion beam 1 and electron shower 7 are concurrently radiated to the observation portion. The charge-up by the ion beam 1 is generated on the surface of the nonconducting sample 6. The radiation current quantity and radiation position range or the like of the electron shower 7 are quantitatively adjusted to obtain the same resolution for both images while the image of the observation portion is compared with the clear image with no charge-up of the observation portion of the conducting sample 5.
JP23145987A 1987-09-14 1987-09-14 Electron shower adjustment for ion beam correcting device Pending JPS6476662A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23145987A JPS6476662A (en) 1987-09-14 1987-09-14 Electron shower adjustment for ion beam correcting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23145987A JPS6476662A (en) 1987-09-14 1987-09-14 Electron shower adjustment for ion beam correcting device

Publications (1)

Publication Number Publication Date
JPS6476662A true JPS6476662A (en) 1989-03-22

Family

ID=16923840

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23145987A Pending JPS6476662A (en) 1987-09-14 1987-09-14 Electron shower adjustment for ion beam correcting device

Country Status (1)

Country Link
JP (1) JPS6476662A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7210666B2 (en) 1999-06-30 2007-05-01 Silverbrook Research Pty Ltd Fluid ejection device with inner and outer arms

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7210666B2 (en) 1999-06-30 2007-05-01 Silverbrook Research Pty Ltd Fluid ejection device with inner and outer arms

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