JPS6467916A - Resist discharge nozzle - Google Patents
Resist discharge nozzleInfo
- Publication number
- JPS6467916A JPS6467916A JP22487187A JP22487187A JPS6467916A JP S6467916 A JPS6467916 A JP S6467916A JP 22487187 A JP22487187 A JP 22487187A JP 22487187 A JP22487187 A JP 22487187A JP S6467916 A JPS6467916 A JP S6467916A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- nozzle tip
- outside diameter
- nozzle
- droplets
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To reduce the remainder of a resist at the surface of a nozzle tip so as to decrease the coating unevenness of the resist and further, improve a yield rate, by making the thickness of the nozzle tip surface thin. CONSTITUTION:The mainframe 7 of a nozzle is a stepped cylindrical tubing where the outside diameter of its tip is made small and is composed of a large tube part 7a having its outside diameter 3mm, a small tube part 7b having its outside diameter 2.5mm, having each inner diameter 1.5mm. Further, a resist discharge port, that is, the surface 7c of a nozzle tip is formed into a smooth plane. As a result, the amount of a resist remaining at the surface 7c of the nozzle tip after discharging the resist decreases and then, mixing of its resist into droplets of the resist having high viscosity in the next operation decreases. Accordingly, this arrangement allows viscosity distribution in the droplets of the resist to be kept constant and makes dispersion of the resist uniform on a semiconductor wafer, resulting in the reduced coating unevenness of the resist. Further, this approach prevents lowering of a yield rate due to dust that adheres to the residual resist.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62224871A JPH081886B2 (en) | 1987-09-08 | 1987-09-08 | Resist discharge nozzle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62224871A JPH081886B2 (en) | 1987-09-08 | 1987-09-08 | Resist discharge nozzle |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6467916A true JPS6467916A (en) | 1989-03-14 |
JPH081886B2 JPH081886B2 (en) | 1996-01-10 |
Family
ID=16820475
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62224871A Expired - Lifetime JPH081886B2 (en) | 1987-09-08 | 1987-09-08 | Resist discharge nozzle |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH081886B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009078023A (en) * | 2007-09-27 | 2009-04-16 | Nipro Corp | Syringe |
JP2013155442A (en) * | 2012-01-26 | 2013-08-15 | Gunze Ltd | Resin agent coating device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4482290B2 (en) * | 2003-06-11 | 2010-06-16 | 矢崎総業株式会社 | Coloring nozzle for electric wires |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56155444U (en) * | 1980-04-21 | 1981-11-20 | ||
JPS5988828A (en) * | 1982-11-12 | 1984-05-22 | Matsushita Electric Ind Co Ltd | Cleaning device |
JPS5978631U (en) * | 1982-11-19 | 1984-05-28 | 株式会社東芝 | Photoresist coating equipment |
JPS59171336U (en) * | 1983-04-30 | 1984-11-16 | 株式会社東芝 | resist dripping nozzle |
JPS61180439A (en) * | 1985-02-06 | 1986-08-13 | Toshiba Corp | Discharge nozzle for photo resist |
-
1987
- 1987-09-08 JP JP62224871A patent/JPH081886B2/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56155444U (en) * | 1980-04-21 | 1981-11-20 | ||
JPS5988828A (en) * | 1982-11-12 | 1984-05-22 | Matsushita Electric Ind Co Ltd | Cleaning device |
JPS5978631U (en) * | 1982-11-19 | 1984-05-28 | 株式会社東芝 | Photoresist coating equipment |
JPS59171336U (en) * | 1983-04-30 | 1984-11-16 | 株式会社東芝 | resist dripping nozzle |
JPS61180439A (en) * | 1985-02-06 | 1986-08-13 | Toshiba Corp | Discharge nozzle for photo resist |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009078023A (en) * | 2007-09-27 | 2009-04-16 | Nipro Corp | Syringe |
JP2013155442A (en) * | 2012-01-26 | 2013-08-15 | Gunze Ltd | Resin agent coating device |
Also Published As
Publication number | Publication date |
---|---|
JPH081886B2 (en) | 1996-01-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 12 Free format text: PAYMENT UNTIL: 20080110 |