JPS55115336A - Plasma cvd electrode - Google Patents

Plasma cvd electrode

Info

Publication number
JPS55115336A
JPS55115336A JP2169579A JP2169579A JPS55115336A JP S55115336 A JPS55115336 A JP S55115336A JP 2169579 A JP2169579 A JP 2169579A JP 2169579 A JP2169579 A JP 2169579A JP S55115336 A JPS55115336 A JP S55115336A
Authority
JP
Japan
Prior art keywords
electrode
distance
plasma cvd
central part
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2169579A
Other languages
Japanese (ja)
Inventor
Hideo Mito
Yoshiaki Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP2169579A priority Critical patent/JPS55115336A/en
Publication of JPS55115336A publication Critical patent/JPS55115336A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)

Abstract

PURPOSE:To obtain a distribution of a uniform film thickness on the substrate by increasing the distance between the electrode and the substrate from the central part to the end part of the electrode gradually. CONSTITUTION:The distance D between the electrode 3 and the substrate holder 4 (actually, distance between the electrode and the material to be coated) at the circumferential part is made greater than that at the central part. When the diameter of the central part of the electrode, outside diameter of the electrode and distance D are properly selected, a distribution of a uniform film thickness can be obtaned at a greater attaching speed.
JP2169579A 1979-02-26 1979-02-26 Plasma cvd electrode Pending JPS55115336A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2169579A JPS55115336A (en) 1979-02-26 1979-02-26 Plasma cvd electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2169579A JPS55115336A (en) 1979-02-26 1979-02-26 Plasma cvd electrode

Publications (1)

Publication Number Publication Date
JPS55115336A true JPS55115336A (en) 1980-09-05

Family

ID=12062193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2169579A Pending JPS55115336A (en) 1979-02-26 1979-02-26 Plasma cvd electrode

Country Status (1)

Country Link
JP (1) JPS55115336A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58196838U (en) * 1982-06-23 1983-12-27 富士通株式会社 Plasma CVD equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58196838U (en) * 1982-06-23 1983-12-27 富士通株式会社 Plasma CVD equipment
JPH029549Y2 (en) * 1982-06-23 1990-03-09

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