JPS58196838U - Plasma CVD equipment - Google Patents
Plasma CVD equipmentInfo
- Publication number
- JPS58196838U JPS58196838U JP9424582U JP9424582U JPS58196838U JP S58196838 U JPS58196838 U JP S58196838U JP 9424582 U JP9424582 U JP 9424582U JP 9424582 U JP9424582 U JP 9424582U JP S58196838 U JPS58196838 U JP S58196838U
- Authority
- JP
- Japan
- Prior art keywords
- plasma cvd
- cvd equipment
- equipment
- convex curved
- periphery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
、第1図は従来のプライマCVD装置を示す構成図、第
2図は本考案の一実施例であるプラズマCVD装置を示
す構成図である。
図中、21・・・・・・チャンバ、22・・・・・・上
部電極、23・・・・・・下部型・極、24・・・・・
・ウェハ、25・・・・・・凸曲面。1 is a block diagram showing a conventional primer CVD apparatus, and FIG. 2 is a block diagram showing a plasma CVD apparatus according to an embodiment of the present invention. In the figure, 21...chamber, 22...upper electrode, 23...lower mold/pole, 24...
・Wafer, 25... Convex curved surface.
Claims (1)
ラズマCVD装置であって、該装置の上部、下部電極の
対向する両端面の周辺を凸状曲面に形成してなることを
特徴とするプラズマCVD装置。A parallel plate plasma CVD apparatus for producing an insulating film or a metal film on a sample, characterized in that the periphery of both opposing end surfaces of upper and lower electrodes of the apparatus are formed into convex curved surfaces. CVD equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9424582U JPS58196838U (en) | 1982-06-23 | 1982-06-23 | Plasma CVD equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9424582U JPS58196838U (en) | 1982-06-23 | 1982-06-23 | Plasma CVD equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58196838U true JPS58196838U (en) | 1983-12-27 |
JPH029549Y2 JPH029549Y2 (en) | 1990-03-09 |
Family
ID=30225682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9424582U Granted JPS58196838U (en) | 1982-06-23 | 1982-06-23 | Plasma CVD equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58196838U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013245393A (en) * | 2012-05-29 | 2013-12-09 | Shimadzu Corp | Sample holder |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55115336A (en) * | 1979-02-26 | 1980-09-05 | Anelva Corp | Plasma cvd electrode |
-
1982
- 1982-06-23 JP JP9424582U patent/JPS58196838U/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55115336A (en) * | 1979-02-26 | 1980-09-05 | Anelva Corp | Plasma cvd electrode |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013245393A (en) * | 2012-05-29 | 2013-12-09 | Shimadzu Corp | Sample holder |
CN103451628A (en) * | 2012-05-29 | 2013-12-18 | 株式会社岛津制作所 | Sample holder |
Also Published As
Publication number | Publication date |
---|---|
JPH029549Y2 (en) | 1990-03-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS58196838U (en) | Plasma CVD equipment | |
JPS592132U (en) | Plasma CVD equipment | |
JPS5982999U (en) | Discharge electrode for plasma equipment | |
JPS5989256U (en) | oxygen sensor | |
JPS58123566U (en) | battery | |
JPS58177888U (en) | Electrochromic display element dial | |
JPS6059530U (en) | plasma processing equipment | |
JPS59129872U (en) | plasma etching equipment | |
JPS607610U (en) | gas insulated equipment | |
JPS60109290U (en) | High voltage protection device for electronic equipment | |
JPS606224U (en) | dry etching equipment | |
JPS6022758U (en) | flat alkaline battery | |
JPS60169257U (en) | Plasma CVD equipment | |
JPS5861461U (en) | sputtering equipment | |
JPS60122362U (en) | plasma etching equipment | |
JPS58132422U (en) | Airtight terminal for piezoelectric vibrator | |
JPS58160263U (en) | GD-CVD equipment | |
JPS5916056U (en) | plasma display panel | |
JPS60123875U (en) | airtight terminal | |
JPS6055189U (en) | Diaphragm for speaker | |
JPS5811859U (en) | thin alkaline battery | |
JPS6041038U (en) | Feedthrough capacitor | |
JPS58150829U (en) | Feedthrough capacitor | |
JPS60181367U (en) | plasma processing equipment | |
JPS60172342U (en) | Shield type electrode for plasma processing equipment |