JPS60181367U - plasma processing equipment - Google Patents

plasma processing equipment

Info

Publication number
JPS60181367U
JPS60181367U JP6654584U JP6654584U JPS60181367U JP S60181367 U JPS60181367 U JP S60181367U JP 6654584 U JP6654584 U JP 6654584U JP 6654584 U JP6654584 U JP 6654584U JP S60181367 U JPS60181367 U JP S60181367U
Authority
JP
Japan
Prior art keywords
plasma processing
processing equipment
plasma
electrode
sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6654584U
Other languages
Japanese (ja)
Inventor
勝義 工藤
西田 勝安
小浜 敦
勝次 亦野
管 祥次
Original Assignee
株式会社日立製作所
日立産機エンジニアリング株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社日立製作所, 日立産機エンジニアリング株式会社 filed Critical 株式会社日立製作所
Priority to JP6654584U priority Critical patent/JPS60181367U/en
Publication of JPS60181367U publication Critical patent/JPS60181367U/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本考案によるプラズマ処理装置の一1実施例
を示す電極部の部分平面図、第2図は、第1図のA−A
視測面図である。 1・・・・・・電極、2・・・・・・試料の設置位置、
3・・・・・・シート。
FIG. 1 is a partial plan view of an electrode section showing an eleventh embodiment of a plasma processing apparatus according to the present invention, and FIG.
FIG. 1... Electrode, 2... Sample installation position,
3...Sheet.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 減圧排気される処理室に内設された電極に複数枚設置し
た試料をプラズマを利用して同時に処理する装置におい
て、シートを前記電極の前記試料の設置位置を除く面に
熱膨張による伸びを吸収可能に設けたことを特徴とする
プラズマ処理装置。
In a device that uses plasma to simultaneously process multiple samples placed on electrodes installed inside a processing chamber that is evacuated to a reduced pressure, the sheet is placed on the surface of the electrode other than where the sample is placed to absorb elongation due to thermal expansion. A plasma processing apparatus characterized in that it is capable of being installed.
JP6654584U 1984-05-09 1984-05-09 plasma processing equipment Pending JPS60181367U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6654584U JPS60181367U (en) 1984-05-09 1984-05-09 plasma processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6654584U JPS60181367U (en) 1984-05-09 1984-05-09 plasma processing equipment

Publications (1)

Publication Number Publication Date
JPS60181367U true JPS60181367U (en) 1985-12-02

Family

ID=30599554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6654584U Pending JPS60181367U (en) 1984-05-09 1984-05-09 plasma processing equipment

Country Status (1)

Country Link
JP (1) JPS60181367U (en)

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