JPS60181027U - Reactive ion etching equipment - Google Patents
Reactive ion etching equipmentInfo
- Publication number
- JPS60181027U JPS60181027U JP6920284U JP6920284U JPS60181027U JP S60181027 U JPS60181027 U JP S60181027U JP 6920284 U JP6920284 U JP 6920284U JP 6920284 U JP6920284 U JP 6920284U JP S60181027 U JPS60181027 U JP S60181027U
- Authority
- JP
- Japan
- Prior art keywords
- etched
- ion etching
- reactive ion
- lower electrode
- convex portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の反応性イオンエツチング装置の第１の例
の構成を示す断面図、第２図は従来の反応性イオンエツ
チング装置の第２の例の電極構造のみを示す断面図、第
３図はこの考案の一実施例になる反応性イオンエツチン
グ装置の電極構造のみを示す断面図である。
図において、１は反応室、２は上部電極、３ａは下部電
極、５は高周波電源、６は反応性ガス導入口、７は反応
性ガス排出口、８は被エツチング部材、９は絶縁物、１
０は凸部である。なお、図中同一符号は同一または相当
部分を示す。FIG. 1 is a cross-sectional view showing the configuration of a first example of a conventional reactive ion etching device, FIG. 2 is a cross-sectional view showing only the electrode structure of a second example of a conventional reactive ion etching device, and FIG. The figure is a sectional view showing only the electrode structure of a reactive ion etching apparatus which is an embodiment of the invention. In the figure, 1 is a reaction chamber, 2 is an upper electrode, 3a is a lower electrode, 5 is a high frequency power source, 6 is a reactive gas inlet, 7 is a reactive gas outlet, 8 is a member to be etched, 9 is an insulator, 1
0 is a convex portion. Note that the same reference numerals in the figures indicate the same or corresponding parts.
Claims (2)
下部電極との間に印加される高周波電界によって生じる
上記反応性ガスのイオンによって上記下部電極上に載置
された被エツチング部材をエツチングするものものにお
いて、上記下部電極の上面の上記被エツチング部材の載
置部に上記被エツチング部材の下面の大きさを越えない
大きさを有し上記被エツチング部材の下面に接触する接
触面をもつ凸部を設けたことを特徴とする反応性イオン
エツチング装置。(1) The member to be etched placed on the lower electrode is etched by ions of the reactive gas generated by a high-frequency electric field applied between an upper electrode and a lower electrode facing each other in a reactive gas atmosphere. In the device, a convex portion on the upper surface of the lower electrode on which the member to be etched is placed has a convex portion having a size not exceeding the size of the lower surface of the member to be etched and a contact surface that comes into contact with the lower surface of the member to be etched. 1. A reactive ion etching device characterized by having a section.
たことを特徴とする実用新案登録請求の範囲第１項記載
の反応性イオンエツチング装置。(2) The reactive ion etching apparatus according to claim 1, wherein a portion of the upper surface of the lower electrode other than the convex portion is covered with an insulating material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6920284U JPS60181027U (en) | 1984-05-10 | 1984-05-10 | Reactive ion etching equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6920284U JPS60181027U (en) | 1984-05-10 | 1984-05-10 | Reactive ion etching equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60181027U true JPS60181027U (en) | 1985-12-02 |
Family
ID=30604651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6920284U Pending JPS60181027U (en) | 1984-05-10 | 1984-05-10 | Reactive ion etching equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60181027U (en) |
-
1984
- 1984-05-10 JP JP6920284U patent/JPS60181027U/en active Pending
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