JPS6464370A - Manufacture of cadmium telluride thin film - Google Patents
Manufacture of cadmium telluride thin filmInfo
- Publication number
- JPS6464370A JPS6464370A JP62222317A JP22231787A JPS6464370A JP S6464370 A JPS6464370 A JP S6464370A JP 62222317 A JP62222317 A JP 62222317A JP 22231787 A JP22231787 A JP 22231787A JP S6464370 A JPS6464370 A JP S6464370A
- Authority
- JP
- Japan
- Prior art keywords
- film
- powder
- mixture
- cdte
- porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title abstract 2
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010408 film Substances 0.000 abstract 8
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 abstract 6
- 239000000203 mixture Substances 0.000 abstract 6
- 239000000843 powder Substances 0.000 abstract 6
- 229910004613 CdTe Inorganic materials 0.000 abstract 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 2
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 abstract 2
- 235000011837 pasties Nutrition 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000010981 drying operation Methods 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1828—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Light Receiving Elements (AREA)
- Photovoltaic Devices (AREA)
Abstract
PURPOSE:To form a large-area thin film at a low cost by a method wherein, out of two films formed by coating and sintering a pasty mixture which has been formed by crushing a Cd powder and a Te powder in the water, a porous film is removed and a thickness is made within a specific range. CONSTITUTION:Water is added to a mixture of a Cd powder and a Te powder and these powders are crushed; an obtained mixture containing a CdTe compound is dried; propylene glycol is added to the dried powder in order to obtain a pasty mixture; this mixture is screen-printed. In succession, the printed mixture is dried in order to evaporate the propylene glycol. After this drying operation, a substrate is put in a baking boat composed of alumina; a lid 17 composed of alumina and having an opening 15 is placed on the boat; this baking boat is baked. By this baking operation, a dense CdTe film 9 with an average film thickness of 0.5-3.0mum is formed by CdCl2 remaining in CdS near the surface of CdS coming into contact with a CdS sintered film 8; a porous CdTe film 10 is formed by evaporation of Cd and Te, Then, if ultrasonic waves are impressed on this film in pure water, the porous CdTe film 10 is removed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62222317A JPS6464370A (en) | 1987-09-04 | 1987-09-04 | Manufacture of cadmium telluride thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62222317A JPS6464370A (en) | 1987-09-04 | 1987-09-04 | Manufacture of cadmium telluride thin film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6464370A true JPS6464370A (en) | 1989-03-10 |
JPH054826B2 JPH054826B2 (en) | 1993-01-20 |
Family
ID=16780464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62222317A Granted JPS6464370A (en) | 1987-09-04 | 1987-09-04 | Manufacture of cadmium telluride thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6464370A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5139814A (en) * | 1987-07-11 | 1992-08-18 | Usui Kokusai Sangyo Kaisha | Method of manufacturing metal pipes coated with tin or tin based alloys |
CN102392282A (en) * | 2011-11-26 | 2012-03-28 | 济南大学 | Method for electrochemical preparation of cadmium telluride semiconductor film under alkaline water phase condition |
-
1987
- 1987-09-04 JP JP62222317A patent/JPS6464370A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5139814A (en) * | 1987-07-11 | 1992-08-18 | Usui Kokusai Sangyo Kaisha | Method of manufacturing metal pipes coated with tin or tin based alloys |
CN102392282A (en) * | 2011-11-26 | 2012-03-28 | 济南大学 | Method for electrochemical preparation of cadmium telluride semiconductor film under alkaline water phase condition |
Also Published As
Publication number | Publication date |
---|---|
JPH054826B2 (en) | 1993-01-20 |
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