JPS6455827A - Device for removal of resist film - Google Patents

Device for removal of resist film

Info

Publication number
JPS6455827A
JPS6455827A JP21133387A JP21133387A JPS6455827A JP S6455827 A JPS6455827 A JP S6455827A JP 21133387 A JP21133387 A JP 21133387A JP 21133387 A JP21133387 A JP 21133387A JP S6455827 A JPS6455827 A JP S6455827A
Authority
JP
Japan
Prior art keywords
substrate
chamber
shaft
arm
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21133387A
Other languages
Japanese (ja)
Other versions
JP2588899B2 (en
Inventor
Koichi Ohira
Bunya Shimada
Kazuo Tomiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ThyssenKrupp Uhde Chlorine Engineers Japan Ltd
Original Assignee
Chlorine Engineers Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chlorine Engineers Corp Ltd filed Critical Chlorine Engineers Corp Ltd
Priority to JP62211333A priority Critical patent/JP2588899B2/en
Publication of JPS6455827A publication Critical patent/JPS6455827A/en
Application granted granted Critical
Publication of JP2588899B2 publication Critical patent/JP2588899B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To shorten a conveying time and to reduce the size of a device by providing a conveying arm having a placing unit of a substrate movable in a direction perpendicular to an shaft on the rotatable and elevationally movable shaft, and providing a treating chamber with a plurality of ozones around the shaft, and at least one cassette for containing a plurality of substrates. CONSTITUTION:The shaft of a conveyor is rotated so that a conveying arm is directed toward the central direction of a cassette 9 on a base, the arm is elevationally moved to the position of a substrate to be removed, and the substrate is transferred to a substrate holder. The arm is rotated and elevationally moved to move the substrate to a substrate placing unit of a treating chamber for raising a chamber 18. When the substrate is placed on the unit, a chamber 17 drops, it starts rotating the unit, heating the substrate, sucking to remove gas in the chamber, and preheating and pretreating to remove organic solvent and low polymer substance from resist. A small amount of zone may be supplied at the time of pretreating, or it may be preheated while merely supplying nitrogen gas instead of sucking to remove the gas in the chamber.
JP62211333A 1987-08-27 1987-08-27 Resist film removal equipment Expired - Lifetime JP2588899B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62211333A JP2588899B2 (en) 1987-08-27 1987-08-27 Resist film removal equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62211333A JP2588899B2 (en) 1987-08-27 1987-08-27 Resist film removal equipment

Publications (2)

Publication Number Publication Date
JPS6455827A true JPS6455827A (en) 1989-03-02
JP2588899B2 JP2588899B2 (en) 1997-03-12

Family

ID=16604216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62211333A Expired - Lifetime JP2588899B2 (en) 1987-08-27 1987-08-27 Resist film removal equipment

Country Status (1)

Country Link
JP (1) JP2588899B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0244722A (en) * 1988-08-05 1990-02-14 Teru Kyushu Kk Ashing system
US5830279A (en) * 1995-09-29 1998-11-03 Harris Corporation Device and method for improving corrosion resistance and etch tool integrity in dry metal etching

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60175411A (en) * 1984-02-22 1985-09-09 Hitachi Ltd Manufacture of thin semiconductor film and apparatus thereof
JPS61150321A (en) * 1984-12-25 1986-07-09 Toshiba Mach Co Ltd Method of treatments such as vapor growth or the like
JPS61196537A (en) * 1985-02-27 1986-08-30 Hitachi Ltd Vacuum processor
JPS6218032A (en) * 1985-07-17 1987-01-27 Fujitsu Ltd Manufacture of semiconductor device
JPS6332931A (en) * 1986-04-18 1988-02-12 ジエネラル・シグナル・コ−ポレ−シヨン Plasma etching system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60175411A (en) * 1984-02-22 1985-09-09 Hitachi Ltd Manufacture of thin semiconductor film and apparatus thereof
JPS61150321A (en) * 1984-12-25 1986-07-09 Toshiba Mach Co Ltd Method of treatments such as vapor growth or the like
JPS61196537A (en) * 1985-02-27 1986-08-30 Hitachi Ltd Vacuum processor
JPS6218032A (en) * 1985-07-17 1987-01-27 Fujitsu Ltd Manufacture of semiconductor device
JPS6332931A (en) * 1986-04-18 1988-02-12 ジエネラル・シグナル・コ−ポレ−シヨン Plasma etching system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0244722A (en) * 1988-08-05 1990-02-14 Teru Kyushu Kk Ashing system
US5830279A (en) * 1995-09-29 1998-11-03 Harris Corporation Device and method for improving corrosion resistance and etch tool integrity in dry metal etching

Also Published As

Publication number Publication date
JP2588899B2 (en) 1997-03-12

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