JPS6455820A - Charging method for organic metallic compound in gas cylinder - Google Patents

Charging method for organic metallic compound in gas cylinder

Info

Publication number
JPS6455820A
JPS6455820A JP21134187A JP21134187A JPS6455820A JP S6455820 A JPS6455820 A JP S6455820A JP 21134187 A JP21134187 A JP 21134187A JP 21134187 A JP21134187 A JP 21134187A JP S6455820 A JPS6455820 A JP S6455820A
Authority
JP
Japan
Prior art keywords
filler
compound
laminarly
gas cylinder
cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21134187A
Other languages
Japanese (ja)
Other versions
JPH0620051B2 (en
Inventor
Riyouji Sugise
Satoru Fujizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP21134187A priority Critical patent/JPH0620051B2/en
Publication of JPS6455820A publication Critical patent/JPS6455820A/en
Publication of JPH0620051B2 publication Critical patent/JPH0620051B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

PURPOSE:To normally supply to the outside a system by filling metallic filler in a gas cylinder, and laminarly charging organic metallic compound solid at ambient temperature on the surface of the filler by utilizing a sublimation phenomenon. CONSTITUTION:Metallic filler 2 is filled in a gas cylinder 1, and organic metallic compound 3 solid at ambient temperature is laminarly charged on the surface by utilizing a sublimation phenomenon. The material of the filler 2 is generally preferably stainless steel. The state is preferably a fractionation tower filler normally used for a precise fractionation apparatus. Since many small air gaps are formed between the filler 2 and the compound 3, a contacting area is increased, and since the compound 3 is laminarly filled, the incorporating gas always passes the layer. Since the filler employs metal, the thermal transfer between the exterior and the interior of the cylinder 1 is improved, and the temperature drop of the surface of the compound 3 due to the dispersion heat is small. Thus, the compound 3 can be normally supplied from the cylinder 1 to the outside of a system.
JP21134187A 1987-08-27 1987-08-27 Method of filling cylinder of organometallic compound Expired - Lifetime JPH0620051B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21134187A JPH0620051B2 (en) 1987-08-27 1987-08-27 Method of filling cylinder of organometallic compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21134187A JPH0620051B2 (en) 1987-08-27 1987-08-27 Method of filling cylinder of organometallic compound

Publications (2)

Publication Number Publication Date
JPS6455820A true JPS6455820A (en) 1989-03-02
JPH0620051B2 JPH0620051B2 (en) 1994-03-16

Family

ID=16604359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21134187A Expired - Lifetime JPH0620051B2 (en) 1987-08-27 1987-08-27 Method of filling cylinder of organometallic compound

Country Status (1)

Country Link
JP (1) JPH0620051B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01265511A (en) * 1988-04-15 1989-10-23 Sumitomo Chem Co Ltd Supported organic metal compound for vapor growth and device for supplying same
JPH0269389A (en) * 1988-08-31 1990-03-08 Toyo Stauffer Chem Co Formation of saturated vapor of solid organometallic compound in vapor growth method
JP2004504364A (en) * 2000-07-22 2004-02-12 エピケム　リミテッド Method and apparatus for isolating pure or substantially pure organometallic compounds
JP2004134741A (en) * 2002-06-17 2004-04-30 Asm Internatl Nv Control system for sublimation of reactant
JP2006161162A (en) * 2004-12-08 2006-06-22 Rohm & Haas Electronic Materials Llc Delivery device
EP1860208A1 (en) * 2006-05-22 2007-11-28 Rohm and Haas Electronic Materials LLC Delivery device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01265511A (en) * 1988-04-15 1989-10-23 Sumitomo Chem Co Ltd Supported organic metal compound for vapor growth and device for supplying same
JPH0269389A (en) * 1988-08-31 1990-03-08 Toyo Stauffer Chem Co Formation of saturated vapor of solid organometallic compound in vapor growth method
JP2004504364A (en) * 2000-07-22 2004-02-12 エピケム　リミテッド Method and apparatus for isolating pure or substantially pure organometallic compounds
JP2004134741A (en) * 2002-06-17 2004-04-30 Asm Internatl Nv Control system for sublimation of reactant
JP2006161162A (en) * 2004-12-08 2006-06-22 Rohm & Haas Electronic Materials Llc Delivery device
US7722720B2 (en) 2004-12-08 2010-05-25 Rohm And Haas Electronic Materials Llc Delivery device
EP1860208A1 (en) * 2006-05-22 2007-11-28 Rohm and Haas Electronic Materials LLC Delivery device
US8277887B2 (en) 2006-05-22 2012-10-02 Rohm And Haas Electronic Materials Llc Delivery device
US8277886B2 (en) 2006-05-22 2012-10-02 Rohm And Haas Electronic Materials Llc Delivery device

Also Published As

Publication number Publication date
JPH0620051B2 (en) 1994-03-16

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