JPS6453757U - - Google Patents
Info
- Publication number
- JPS6453757U JPS6453757U JP14845387U JP14845387U JPS6453757U JP S6453757 U JPS6453757 U JP S6453757U JP 14845387 U JP14845387 U JP 14845387U JP 14845387 U JP14845387 U JP 14845387U JP S6453757 U JPS6453757 U JP S6453757U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- plasma cvd
- cvd apparatus
- workpiece
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
- 230000000052 comparative effect Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14845387U JPS6453757U (ko) | 1987-09-30 | 1987-09-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14845387U JPS6453757U (ko) | 1987-09-30 | 1987-09-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6453757U true JPS6453757U (ko) | 1989-04-03 |
Family
ID=31419793
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14845387U Pending JPS6453757U (ko) | 1987-09-30 | 1987-09-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6453757U (ko) |
-
1987
- 1987-09-30 JP JP14845387U patent/JPS6453757U/ja active Pending