JPH0437260U - - Google Patents
Info
- Publication number
- JPH0437260U JPH0437260U JP7904990U JP7904990U JPH0437260U JP H0437260 U JPH0437260 U JP H0437260U JP 7904990 U JP7904990 U JP 7904990U JP 7904990 U JP7904990 U JP 7904990U JP H0437260 U JPH0437260 U JP H0437260U
- Authority
- JP
- Japan
- Prior art keywords
- pressure chamber
- film forming
- high pressure
- gas
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7904990U JPH0437260U (ko) | 1990-07-24 | 1990-07-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7904990U JPH0437260U (ko) | 1990-07-24 | 1990-07-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0437260U true JPH0437260U (ko) | 1992-03-30 |
Family
ID=31622866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7904990U Pending JPH0437260U (ko) | 1990-07-24 | 1990-07-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0437260U (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018141195A (ja) * | 2017-02-27 | 2018-09-13 | Tdk株式会社 | 積層膜の製造装置と製造方法、および薄膜インダクタの製造方法 |
-
1990
- 1990-07-24 JP JP7904990U patent/JPH0437260U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018141195A (ja) * | 2017-02-27 | 2018-09-13 | Tdk株式会社 | 積層膜の製造装置と製造方法、および薄膜インダクタの製造方法 |
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