JPH0187529U - - Google Patents
Info
- Publication number
- JPH0187529U JPH0187529U JP18317387U JP18317387U JPH0187529U JP H0187529 U JPH0187529 U JP H0187529U JP 18317387 U JP18317387 U JP 18317387U JP 18317387 U JP18317387 U JP 18317387U JP H0187529 U JPH0187529 U JP H0187529U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- reaction tank
- supplying
- reaction
- plasma cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 4
- 239000011888 foil Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims 2
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18317387U JPH0187529U (ko) | 1987-12-01 | 1987-12-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18317387U JPH0187529U (ko) | 1987-12-01 | 1987-12-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0187529U true JPH0187529U (ko) | 1989-06-09 |
Family
ID=31474605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18317387U Pending JPH0187529U (ko) | 1987-12-01 | 1987-12-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0187529U (ko) |
-
1987
- 1987-12-01 JP JP18317387U patent/JPH0187529U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0187529U (ko) | ||
| JPH0437267U (ko) | ||
| JPS59117138U (ja) | 半導体製造装置 | |
| JPH02114927U (ko) | ||
| JPS6346465U (ko) | ||
| JPH0170327U (ko) | ||
| JPH0437260U (ko) | ||
| JPS5910127Y2 (ja) | プラズマエッチング装置 | |
| JPH02127029U (ko) | ||
| JPH02102722U (ko) | ||
| JPH01129262U (ko) | ||
| JPS6373359U (ko) | ||
| JPH0260232U (ko) | ||
| JPS6364492U (ko) | ||
| JPH02115564U (ko) | ||
| JPS6437465U (ko) | ||
| JPS5612193A (en) | Diaphragm for loudspeaker | |
| JPS5658273A (en) | Superhigh-frequency semiconductor active element | |
| JPH0415832U (ko) | ||
| JPS62182541U (ko) | ||
| JPS63140064U (ko) | ||
| JPS6356257U (ko) | ||
| JPS6287436U (ko) | ||
| JPS6453757U (ko) | ||
| JPS6086555U (ja) | プラズマｃｖｄ装置 |