JPS645013A - Vapor growth equipment - Google Patents

Vapor growth equipment

Info

Publication number
JPS645013A
JPS645013A JP16036787A JP16036787A JPS645013A JP S645013 A JPS645013 A JP S645013A JP 16036787 A JP16036787 A JP 16036787A JP 16036787 A JP16036787 A JP 16036787A JP S645013 A JPS645013 A JP S645013A
Authority
JP
Japan
Prior art keywords
reaction gas
maniford
pipe
gas feeding
pipes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16036787A
Other languages
Japanese (ja)
Inventor
Shuichi Ohashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16036787A priority Critical patent/JPS645013A/en
Publication of JPS645013A publication Critical patent/JPS645013A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enable the uniform thermal decomposition of all reaction gas, by installing reaction gas feeding pipes capable of transferring in the longitudinal direction in a furnace core pipe, and providing said reaction gas feeding pipes with a ring type gas-jetting part having a plurality of gas-nozzles. CONSTITUTION:A reaction gas feeding pipe 5 is installed so as to be connected to an upper pipe arranged on a rear maniford 3. A reaction gas feeding pipe 6 is installed so as to be connected to a lower pipe arranged on the rear maniford 3. Each of the reaction gas feeding pipes 5, 6 are provided in the inner peripheral side with a plurality of gas-jetting holes 5a, 6a, from which reaction gas is fed uniformly toward the center of a furnace core pipe 1. Each of the reaction gas feeding pipes 5, 6 are arranged in the furnace core tube 1 closed by a front maniford 2, the rear maniford 3 and a cap 4. Through the pipes, several kinds of gas are introduced and heated by a heater 7, which are thermally decomposed to form vapor growth films on the surfaces of mounted semiconductor wafers 8.
JP16036787A 1987-06-26 1987-06-26 Vapor growth equipment Pending JPS645013A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16036787A JPS645013A (en) 1987-06-26 1987-06-26 Vapor growth equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16036787A JPS645013A (en) 1987-06-26 1987-06-26 Vapor growth equipment

Publications (1)

Publication Number Publication Date
JPS645013A true JPS645013A (en) 1989-01-10

Family

ID=15713444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16036787A Pending JPS645013A (en) 1987-06-26 1987-06-26 Vapor growth equipment

Country Status (1)

Country Link
JP (1) JPS645013A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07130662A (en) * 1993-11-04 1995-05-19 Nec Corp Vertical low pressure cvd apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07130662A (en) * 1993-11-04 1995-05-19 Nec Corp Vertical low pressure cvd apparatus

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