JPS6448426A - High-pressure oxidizing furnace - Google Patents

Abstract

PURPOSE:To control temperatures received by wafers disposed into a reaction pipe at a desired temperature in a short time by installing a controller having a plurality of thermocouples and controlling a temperature in the reaction pipe on the basis of temperature distribution from these thermocouples, the reaction pipe and a pressure-proof vessel. CONSTITUTION:A reaction pipe 21, a soaking tube 22, heaters 32, etc. are housed into a pressure-proof vessel 36, thermocouples 25a-25c protected by a protective tube 26 are arranged onto the inwall of the reaction pipe 21 while a plurality of thermocouples 33 are disposed outside the reaction pipe 21, and these thermocouples 25a-25c, 33 are connected respectively to a controller. Consequently, temperatures from the inside and outside of the reaction pipe 21 can be detected simultaneously without putting the case, when the unbalanced oxidation of a temperature effect by inserting a boat, on which wafers are set, into the reaction pipe 21 is treated, or the case before and after oxidation treatment in question, and both temperature data can be compared. Accordingly, a temperature in the reaction pipe can be controlled at a desired temperature in a short time while improving safety.