JPS6449220A - Heat treatment furnace - Google Patents
Heat treatment furnaceInfo
- Publication number
- JPS6449220A JPS6449220A JP20596887A JP20596887A JPS6449220A JP S6449220 A JPS6449220 A JP S6449220A JP 20596887 A JP20596887 A JP 20596887A JP 20596887 A JP20596887 A JP 20596887A JP S6449220 A JPS6449220 A JP S6449220A
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- temperature
- heat treatment
- outside
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To detect the temperature inside a reaction tube and the temperature outside the reaction tube simultaneously and control the temperature inside the reaction tube at a required temperature in a short time by providing a 1st temperature sensor protected by a protective tube inside the reaction tube and 2nd temperature sensors outside the reaction tube. CONSTITUTION:A first thermocouple 27 protected by a protective tube 28 is provided inside a reaction tube 20. Second thermocouples 34 are provided outside the reaction tube 20. The thermocouples 27 and 34 are respectively connected to a controller. With this constitution, when a boat on which wafers are placed is provided in the reaction tube 20 for a heat treatment, both the temperature inside the reaction tube 20 and the temperature outside the reaction tube 20 can be detected simultaneously and both the temperature data can be compared with each other regardless to that the temperatures are detected before, at the time of or after the heat treatment. Therefore, the temperature inside the reaction tube 20 can be predetermined at a required temperature with a high accuracy and in a short time without a delay time accompanying taking the wafers into and out of the reaction tube like a conventional constitution.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20596887A JPS6449220A (en) | 1987-08-19 | 1987-08-19 | Heat treatment furnace |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20596887A JPS6449220A (en) | 1987-08-19 | 1987-08-19 | Heat treatment furnace |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6449220A true JPS6449220A (en) | 1989-02-23 |
Family
ID=16515697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20596887A Pending JPS6449220A (en) | 1987-08-19 | 1987-08-19 | Heat treatment furnace |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6449220A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0311623A (en) * | 1989-06-09 | 1991-01-18 | Toshiba Ceramics Co Ltd | Furnace tube for heat treatment of semiconductor |
JPH1019687A (en) * | 1996-06-07 | 1998-01-23 | Samsung Electron Co Ltd | Method and device for detecting process temperature of diffusion furnace for manufacturing semiconductor device |
JP2006245202A (en) * | 2005-03-02 | 2006-09-14 | Denso Corp | Heat treatment apparatus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS538056A (en) * | 1976-07-12 | 1978-01-25 | Hitachi Ltd | Heat treatment apparatus |
JPS60124819A (en) * | 1983-12-09 | 1985-07-03 | Nec Corp | Universal controller for manufacture of semiconductor |
-
1987
- 1987-08-19 JP JP20596887A patent/JPS6449220A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS538056A (en) * | 1976-07-12 | 1978-01-25 | Hitachi Ltd | Heat treatment apparatus |
JPS60124819A (en) * | 1983-12-09 | 1985-07-03 | Nec Corp | Universal controller for manufacture of semiconductor |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0311623A (en) * | 1989-06-09 | 1991-01-18 | Toshiba Ceramics Co Ltd | Furnace tube for heat treatment of semiconductor |
JPH1019687A (en) * | 1996-06-07 | 1998-01-23 | Samsung Electron Co Ltd | Method and device for detecting process temperature of diffusion furnace for manufacturing semiconductor device |
JP2006245202A (en) * | 2005-03-02 | 2006-09-14 | Denso Corp | Heat treatment apparatus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS57131027A (en) | Black body furnace | |
JPS6449220A (en) | Heat treatment furnace | |
JPS53122239A (en) | Dew condensation preventive control apparatus for articles stored in storage warehouse | |
SE8105482L (en) | ELECTRONIC THERMOMETER | |
JPS547386A (en) | Electronic clinical thermometer | |
JPS53144786A (en) | Measuring method of temperature in furnace | |
JPS5742119A (en) | Decompression cvd device | |
JPS51127742A (en) | Temperature control device | |
JPS569335A (en) | Measurement of sintering speed | |
JPS5378877A (en) | Cleaning control system for temperature sensor | |
AU5734380A (en) | Temperature detecting device with heat sensitive semiconductor | |
JPS5230495A (en) | Thermal analysis apparatus | |
JPS55149816A (en) | Collection/memorization/retrieval system for industrial temperature data | |
JPS5378793A (en) | Temperature-variation-speed detection element and temperature control metho d | |
JPS5289850A (en) | Controlling device for defrosting | |
JPS5381898A (en) | Piping device | |
JPS5589464A (en) | Diffusion furnace temperature controller | |
JPS5244666A (en) | Liquid level detecting device | |
JPS5280191A (en) | Clinical thermometer | |
JPS55162547A (en) | Dehumidifier | |
JPS6458801A (en) | Gas filling up pressure checking device | |
JPS52120880A (en) | Electronic thermometer | |
Weissohn | Control of nitriding processes by use of sensors | |
JPS53149644A (en) | Temperature control system for electronic circuit | |
JPS53110790A (en) | Thermistor sensor for warm water feeder |