JPS6447853A - Etching of indium metallized under vacuum - Google Patents

Etching of indium metallized under vacuum

Info

Publication number
JPS6447853A
JPS6447853A JP63091887A JP9188788A JPS6447853A JP S6447853 A JPS6447853 A JP S6447853A JP 63091887 A JP63091887 A JP 63091887A JP 9188788 A JP9188788 A JP 9188788A JP S6447853 A JPS6447853 A JP S6447853A
Authority
JP
Japan
Prior art keywords
indium
etching
under vacuum
metallized under
metallized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63091887A
Other languages
English (en)
Other versions
JPH0668148B2 (ja
Inventor
Shii Aisufueraa Richiyaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Davidson Textron Inc
Original Assignee
Davidson Textron Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Davidson Textron Inc filed Critical Davidson Textron Inc
Publication of JPS6447853A publication Critical patent/JPS6447853A/ja
Publication of JPH0668148B2 publication Critical patent/JPH0668148B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • B05D5/067Metallic effect
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/20Metallic material, boron or silicon on organic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP63091887A 1987-04-16 1988-04-15 真空メタライジングされたインジウムのエッチング Expired - Lifetime JPH0668148B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39064 1987-04-16
US07/039,064 US4713143A (en) 1987-04-16 1987-04-16 Etching of vacuum metallized indium

Publications (2)

Publication Number Publication Date
JPS6447853A true JPS6447853A (en) 1989-02-22
JPH0668148B2 JPH0668148B2 (ja) 1994-08-31

Family

ID=21903472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63091887A Expired - Lifetime JPH0668148B2 (ja) 1987-04-16 1988-04-15 真空メタライジングされたインジウムのエッチング

Country Status (8)

Country Link
US (1) US4713143A (ja)
EP (1) EP0287208B1 (ja)
JP (1) JPH0668148B2 (ja)
KR (1) KR920010774B1 (ja)
AU (1) AU603407B2 (ja)
CA (1) CA1286548C (ja)
DE (1) DE3873960T2 (ja)
MX (1) MX167079B (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH083731A (ja) * 1994-05-25 1996-01-09 Davidson Textron Inc 溶媒が削減されたアイランド被覆方法
JP2002212324A (ja) * 2001-01-11 2002-07-31 Hashimoto Forming Ind Co Ltd 金属光輝色を呈する成形品の製造方法
JP2008069375A (ja) * 2006-09-12 2008-03-27 Shin Meiwa Ind Co Ltd 真空成膜方法および真空成膜装置

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5217794A (en) * 1991-01-22 1993-06-08 The Dow Chemical Company Lamellar polymeric body
US5290625A (en) * 1992-05-22 1994-03-01 Davidson Textron Inc. System for making bright aluminum parts
US5284679A (en) * 1992-11-16 1994-02-08 Davidson Textron Inc. Method for making bright trim articles
US5320869A (en) * 1992-12-04 1994-06-14 Davidson Textron Inc. Method for producing high gloss bright colored plastic articles
US5985418A (en) 1994-05-25 1999-11-16 Textron Automotive Interiors, Inc. Radiation cured island coating system
US5468518A (en) * 1994-05-25 1995-11-21 Davidson Textron Inc. Combined primer/basecoat island coating system
US5482336A (en) * 1994-10-25 1996-01-09 Davidson Textron Inc. Impact resistent flexible grille arrangement
EP1088597B1 (en) * 1995-04-21 2003-09-24 Textron Automotive Interiors Inc. Radiation cured island coating system
US5699188A (en) * 1995-06-26 1997-12-16 Minnesota Mining And Manufacturing Co. Metal-coated multilayer mirror
CN1106937C (zh) 1995-06-26 2003-04-30 美国3M公司 带有附加涂层或附加层的多层聚合物薄膜
US6737154B2 (en) 1995-06-26 2004-05-18 3M Innovative Properties Company Multilayer polymer film with additional coatings or layers
JPH09202963A (ja) 1995-08-25 1997-08-05 Abcor Inc エッチングを行わずに金属化アイランド被覆製品を製造する方法
JP3395588B2 (ja) 1997-04-25 2003-04-14 豊田合成株式会社 軟質光輝化製品
FR2763277B1 (fr) * 1997-05-19 2003-02-14 Toyoda Gosei Kk Objets brillants souples avec un materiau de base constitue de resine flexible et une surface presentant un brillant metallise
JP3462047B2 (ja) * 1997-08-07 2003-11-05 株式会社槌屋 立体表示用構造体
KR20010033813A (ko) 1997-12-31 2001-04-25 스코트 에이. 맥닐 금속화된 시이트와 복합물 및 이들의 제조방법
US6287670B1 (en) 1999-01-11 2001-09-11 3M Innovative Properties Company Cube corner cavity based retroreflectors and methods for making same
US6287672B1 (en) 1999-03-12 2001-09-11 Rexam, Inc. Bright metallized film laminate
DE10023862B4 (de) * 2000-05-16 2005-06-16 König, Klaus-Peter Beschichtetes Substrat mit metallischem Oberflächeneindruck, Verfahren zur haftfesten Beschichtung von Substraten mit korrodierbaren Metallschichten sowie Verwendung der beschichteten Substrate und der Produkte aus Verfahren zur haftfesten Beschichtung mit korrodierbaren Metallschichten
US20080311357A1 (en) * 2006-12-29 2008-12-18 Collins & Aikman Corporation Laminate construction containing discontinuous metal layer
DE102007037069A1 (de) 2007-08-06 2009-02-19 Leonhard Kurz Gmbh & Co. Kg Elektronisches Bauteil und Verfahren zu seiner Herstellung

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE317656C (ja) * 1919-07-08
US2993806A (en) * 1956-12-17 1961-07-25 Gen Tire & Rubber Co Metal coating of plastics
US2937940A (en) * 1957-07-01 1960-05-24 Eltex Chemical Corp Selective stripping of electroplated metals
FR1301253A (fr) * 1958-01-09 1962-08-17 Bocuze & Cie J Matière plastique en feuilles à aspect décoratif
US3118781A (en) * 1960-08-15 1964-01-21 Minnesota Mining & Mfg Laminate and method of making
US3620804A (en) * 1969-01-22 1971-11-16 Borg Warner Metal plating of thermoplastics
JPS5051172A (ja) * 1973-09-07 1975-05-07
US4101698A (en) * 1975-07-14 1978-07-18 Avery International Corp. Elastomeric reflective metal surfaces
US4211822A (en) * 1977-01-07 1980-07-08 The Dow Chemical Company Highly reflective multilayer metal/polymer composites
GB1588475A (en) * 1977-05-14 1981-04-23 Hitachi Chemical Co Ltd Method of adhesion between insulating substrates and metal deposits electrolessly plated thereon and method of making additive printed circuit boards
US4131530A (en) * 1977-07-05 1978-12-26 Airco, Inc. Sputtered chromium-alloy coating for plastic
US4215170A (en) * 1978-02-28 1980-07-29 Eurographics Holding, N. V. Metallization process
AU526865B2 (en) * 1980-03-25 1983-02-03 Ex-Cell-O Corporation Vacuum metalized articles
US4431711A (en) * 1980-03-25 1984-02-14 Ex-Cell-O Corporation Vacuum metallizing a dielectric substrate with indium and products thereof
US4407871A (en) * 1980-03-25 1983-10-04 Ex-Cell-O Corporation Vacuum metallized dielectric substrates and method of making same
JPS6024368A (ja) * 1983-07-21 1985-02-07 Toyota Motor Corp 樹脂材料の光輝処理法
US4610755A (en) * 1985-04-16 1986-09-09 Beckett Donald E Demetallizing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH083731A (ja) * 1994-05-25 1996-01-09 Davidson Textron Inc 溶媒が削減されたアイランド被覆方法
JP2002212324A (ja) * 2001-01-11 2002-07-31 Hashimoto Forming Ind Co Ltd 金属光輝色を呈する成形品の製造方法
JP2008069375A (ja) * 2006-09-12 2008-03-27 Shin Meiwa Ind Co Ltd 真空成膜方法および真空成膜装置

Also Published As

Publication number Publication date
JPH0668148B2 (ja) 1994-08-31
DE3873960T2 (de) 1993-02-04
AU1014288A (en) 1988-10-20
AU603407B2 (en) 1990-11-15
US4713143A (en) 1987-12-15
KR920010774B1 (ko) 1992-12-17
DE3873960D1 (de) 1992-10-01
EP0287208A2 (en) 1988-10-19
EP0287208A3 (en) 1989-09-20
CA1286548C (en) 1991-07-23
MX167079B (es) 1993-03-02
KR880012792A (ko) 1988-11-29
EP0287208B1 (en) 1992-08-26

Similar Documents

Publication Publication Date Title
JPS6447853A (en) Etching of indium metallized under vacuum
GB8720792D0 (en) Vacuum devices
GB2195046B (en) Vacuum devices
GB2212053B (en) Vacuum system
GB2204214B (en) High frequency signal booster
GB2204991B (en) Vacuum electronic devices
AU1548288A (en) Vacuum cleaner
EP0301335A3 (en) Method of dry etching
AU2061888A (en) Improved silicone surfactant
GB2208234B (en) Vacuum interrupter contacts
AU591444B2 (en) Vacuum deadplate
EP0241814A3 (en) Vacuum interrupter
AU2351788A (en) Vacuum cleaner
EP0279188A3 (en) Enhanced plasma etching
EP0314522A3 (en) Trench etching process
GB2214870B (en) Plasma etching process
GB8717006D0 (en) Vacuum pumps
JPS6445434A (en) Manufacture of electroconductive polymer-metal compound
AU583209B2 (en) Pair of snappingly engageable members
AU6414190A (en) Treatment of carbohydrates
GB8708008D0 (en) Vacuum interrupter contacts
EP0264814A3 (en) Vacuum circuit interrupter
GB2211905B (en) Tandem-type vacuum booster
GB8618547D0 (en) Plasma etching
EP0256780A3 (en) Vacuum circuit interrupter