JPS6445122A - Beam size measuring apparatus - Google Patents

Beam size measuring apparatus

Info

Publication number
JPS6445122A
JPS6445122A JP20268987A JP20268987A JPS6445122A JP S6445122 A JPS6445122 A JP S6445122A JP 20268987 A JP20268987 A JP 20268987A JP 20268987 A JP20268987 A JP 20268987A JP S6445122 A JPS6445122 A JP S6445122A
Authority
JP
Japan
Prior art keywords
circuit
self
correlation
absolute value
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20268987A
Other languages
Japanese (ja)
Other versions
JPH0724256B2 (en
Inventor
Nobuo Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP62202689A priority Critical patent/JPH0724256B2/en
Publication of JPS6445122A publication Critical patent/JPS6445122A/en
Publication of JPH0724256B2 publication Critical patent/JPH0724256B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To make it possible to measure the size of a beam without the effect of noises, by detecting a reflected signal, which is generated when the beam is projected on a mark, differentiating the detected signal, and thereafter obtaining self-correlation. CONSTITUTION:The output of a detector is differentiated twice in a secondary differential circuit 4. Thereafter, the absolute value is obtained in an absolute value circuit 5, and the absolute value signal is outputted. The output of the absolute value circuit 5 is sampled in an A/D converter 7 for a specified period. The value is converted into digital data. The converted digital data are sequentially stored in a memory part 8. A self-correlation circuit 9 reads the data D (I) and D (I+J) (I: memory address, J: difference in addresses) out of the memory part 8 and performs self-correlation operation. A peak detecting circuit 10 searches the peak in the self-correlation functions R (J), which are computed in the self-correlation circuit 9, obtains the address of the peak point and computes the size of a beam. Thus the size of the beam can be accurately measured without the effect of noises.
JP62202689A 1987-08-13 1987-08-13 Size measuring device Expired - Fee Related JPH0724256B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62202689A JPH0724256B2 (en) 1987-08-13 1987-08-13 Size measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62202689A JPH0724256B2 (en) 1987-08-13 1987-08-13 Size measuring device

Publications (2)

Publication Number Publication Date
JPS6445122A true JPS6445122A (en) 1989-02-17
JPH0724256B2 JPH0724256B2 (en) 1995-03-15

Family

ID=16461525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62202689A Expired - Fee Related JPH0724256B2 (en) 1987-08-13 1987-08-13 Size measuring device

Country Status (1)

Country Link
JP (1) JPH0724256B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07302741A (en) * 1994-04-28 1995-11-14 Nec Corp Mark position detecting method in electron beam exposure and its equipment
CN100374622C (en) * 2002-11-13 2008-03-12 Asml荷兰有限公司 Lithographic apparatus and method to determine beam size and divergence
TWI833112B (en) * 2020-08-28 2024-02-21 荷蘭商Ａｓｍｌ荷蘭公司 Readout circuit for pixelized electron detector

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023782A (en) * 1973-06-08 1975-03-14

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023782A (en) * 1973-06-08 1975-03-14

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07302741A (en) * 1994-04-28 1995-11-14 Nec Corp Mark position detecting method in electron beam exposure and its equipment
CN100374622C (en) * 2002-11-13 2008-03-12 Asml荷兰有限公司 Lithographic apparatus and method to determine beam size and divergence
TWI833112B (en) * 2020-08-28 2024-02-21 荷蘭商Ａｓｍｌ荷蘭公司 Readout circuit for pixelized electron detector

Also Published As

Publication number Publication date
JPH0724256B2 (en) 1995-03-15

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees