JPS644435U - - Google Patents

Info

Publication number
JPS644435U
JPS644435U JP1987100562U JP10056287U JPS644435U JP S644435 U JPS644435 U JP S644435U JP 1987100562 U JP1987100562 U JP 1987100562U JP 10056287 U JP10056287 U JP 10056287U JP S644435 U JPS644435 U JP S644435U
Authority
JP
Japan
Prior art keywords
pattern
reticle
line
featuring
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987100562U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987100562U priority Critical patent/JPS644435U/ja
Publication of JPS644435U publication Critical patent/JPS644435U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図は本考案のレテイクルの一実施例を示す
平面図であり、第２図は本考案のレテイクルの他
の実施例を示す平面図である。第３図は従来のレ
テイクルを示す平面図であり、同図ａはマスター
用レテイクルを示し、同図ｂはサブマスター用レ
テイクルを示す。第４図ａ及びｂはそれぞれ、マ
スターマスク及びサブマスターマスクを示す平面
図である。第５図は縮小投影露光装置を示す斜視
図である。 ２０，３０……レテイクル、２１，３１……Ｆ
字状パターン、２２，３２……線対称Ｆ字状パタ
ーン。

Claims (1)

    【実用新案登録請求の範囲】
  1. 所望のパターンを有し、該パターンが被転写基
    板へ縮小投影露光されるレテイクルにおいて、前
    記パターンが二個設けられており、一方のパター
    ンに対してもう一方のパターンが線対称の形状で
    あることを特徴とするレテイクル。
JP1987100562U 1987-06-29 1987-06-29 Pending JPS644435U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987100562U JPS644435U (ja) 1987-06-29 1987-06-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987100562U JPS644435U (ja) 1987-06-29 1987-06-29

Publications (1)

Publication Number Publication Date
JPS644435U true JPS644435U (ja) 1989-01-11

Family

ID=31328748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987100562U Pending JPS644435U (ja) 1987-06-29 1987-06-29

Country Status (1)

Country Link
JP (1) JPS644435U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100389567B1 (ko) * 1999-08-19 2003-06-27 엔이씨 일렉트로닉스 코포레이션 전자선노광마스크, 전자선노광방법, 반도체장치 제조방법및 전자선노광장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55132039A (en) * 1979-04-02 1980-10-14 Mitsubishi Electric Corp Forming method for repeated figure
JPS5843513A (ja) * 1981-09-08 1983-03-14 Nec Corp フオトマスクパタ−ン投影露光方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55132039A (en) * 1979-04-02 1980-10-14 Mitsubishi Electric Corp Forming method for repeated figure
JPS5843513A (ja) * 1981-09-08 1983-03-14 Nec Corp フオトマスクパタ−ン投影露光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100389567B1 (ko) * 1999-08-19 2003-06-27 엔이씨 일렉트로닉스 코포레이션 전자선노광마스크, 전자선노광방법, 반도체장치 제조방법및 전자선노광장치

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