JPS6444018A - Device for developing photoresist - Google Patents

Device for developing photoresist

Info

Publication number
JPS6444018A
JPS6444018A JP20113287A JP20113287A JPS6444018A JP S6444018 A JPS6444018 A JP S6444018A JP 20113287 A JP20113287 A JP 20113287A JP 20113287 A JP20113287 A JP 20113287A JP S6444018 A JPS6444018 A JP S6444018A
Authority
JP
Japan
Prior art keywords
temperature
developer
wafer
solution
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20113287A
Other languages
English (en)
Inventor
Norio Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP20113287A priority Critical patent/JPS6444018A/ja
Publication of JPS6444018A publication Critical patent/JPS6444018A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP20113287A 1987-08-12 1987-08-12 Device for developing photoresist Pending JPS6444018A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20113287A JPS6444018A (en) 1987-08-12 1987-08-12 Device for developing photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20113287A JPS6444018A (en) 1987-08-12 1987-08-12 Device for developing photoresist

Publications (1)

Publication Number Publication Date
JPS6444018A true JPS6444018A (en) 1989-02-16

Family

ID=16435937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20113287A Pending JPS6444018A (en) 1987-08-12 1987-08-12 Device for developing photoresist

Country Status (1)

Country Link
JP (1) JPS6444018A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725728A (en) * 1995-09-18 1998-03-10 Kabushiki Kaisha Shinkawa Pellet pick-up device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725728A (en) * 1995-09-18 1998-03-10 Kabushiki Kaisha Shinkawa Pellet pick-up device

Similar Documents

Publication Publication Date Title
TW325575B (en) Developing device for semiconductor device fabrication and its controlling method
EP0321281A3 (en) Immersion development and rinse machine and process
JPS6444018A (en) Device for developing photoresist
JPS5687320A (en) Photoresist coating device on both sides
JPS57166032A (en) Spray type developing device for positive resist
JPS5655047A (en) Developing method and device therefor
JPH0225501B2 (ja)
JPS5318969A (en) Wafer fixing method
JPS61104621A (ja) ポジレジスト現像装置
JPS5211868A (en) Photoresist coating method
JPS52119174A (en) Controlling method of semiconductor
JPS569742A (en) Developing method of photosensitive resin
JPS58128441U (ja) 現像装置
JPS536034A (en) Process and device for magnetic brush developing
JPS63310117A (ja) 半導体製造用現像装置
JPS5377530A (en) Magnetic brush developing method
JPS5752132A (en) Manufacturing apparatus for semiconductor
JPS56110933A (en) Developing method
JPS5732445A (en) Developing method for photoresist
JPS6029749A (ja) フォトレジスト現像装置
JPS5424038A (en) Developer replenishing device
JPS5226837A (en) Process for supplying an electrophotographic developer and device ther efor
JPS57208137A (en) Semiconductor exposure apparatus
JPS5666031A (en) Pattern formation of positive resist
JPS63104331A (ja) 現像処理方法