JPS6443707A - Microphotometric device - Google Patents
Microphotometric deviceInfo
- Publication number
- JPS6443707A JPS6443707A JP19980487A JP19980487A JPS6443707A JP S6443707 A JPS6443707 A JP S6443707A JP 19980487 A JP19980487 A JP 19980487A JP 19980487 A JP19980487 A JP 19980487A JP S6443707 A JPS6443707 A JP S6443707A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- plane mirror
- light source
- base
- top surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To accurately perform reference photometry with high reliability through easy operation by providing a metallic plane mirror to part of the periphery of a sample moving base. CONSTITUTION:A sample 11 is mounted in the center of the top surface of the moving base 3b, and the metallic plane mirror 12 is embedded in part of the periphery of the top surface almost in level with the surface of the sample 11. Light source light from an irradiation light source is image-formed as a small spot on the surface of the sample 11 through a half-mirror 13, etc., and the sample moving base 3 is moved to form the image on the surface of the plane mirror 12. The plane mirror 12 is provided to the peripheral part of the base 3, so reference photometry is performed by moving the base 3 while the sample 11 is mounted at the center part. Further, the top surface of the plane mirror 12 and the surface of the mounted sample are set almost in level with each other, so the focus hardly moves. Further, the plane mirror 12 reflects the downward light source back to a microscope with a reflection factor which is spectrally uniform and constant, so the intensity variation of the light source can be corrected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19980487A JPS6443707A (en) | 1987-08-12 | 1987-08-12 | Microphotometric device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19980487A JPS6443707A (en) | 1987-08-12 | 1987-08-12 | Microphotometric device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6443707A true JPS6443707A (en) | 1989-02-16 |
Family
ID=16413905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19980487A Pending JPS6443707A (en) | 1987-08-12 | 1987-08-12 | Microphotometric device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6443707A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001179617A (en) * | 1999-12-27 | 2001-07-03 | Nikon Corp | Polishing status monitoring method and device, polishing device, processed wafer, semiconductor device manufacturing method and semiconductor device |
| US6804867B2 (en) | 2001-10-25 | 2004-10-19 | Ykk Corporation | Pull of slider for slide fastener |
| JP2017037042A (en) * | 2015-08-13 | 2017-02-16 | 富士ゼロックス株式会社 | Measuring device and program |
-
1987
- 1987-08-12 JP JP19980487A patent/JPS6443707A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001179617A (en) * | 1999-12-27 | 2001-07-03 | Nikon Corp | Polishing status monitoring method and device, polishing device, processed wafer, semiconductor device manufacturing method and semiconductor device |
| WO2001048801A1 (en) * | 1999-12-27 | 2001-07-05 | Nikon Corporation | Method and apparatus for monitoring polishing state, polishing device, process wafer, semiconductor device, and method of manufacturing semiconductor device |
| US6679756B2 (en) | 1999-12-27 | 2004-01-20 | Nikon Corporation | Method and apparatus for monitoring polishing state, polishing device, process wafer, semiconductor device, and method of manufacturing semiconductor device |
| US6804867B2 (en) | 2001-10-25 | 2004-10-19 | Ykk Corporation | Pull of slider for slide fastener |
| JP2017037042A (en) * | 2015-08-13 | 2017-02-16 | 富士ゼロックス株式会社 | Measuring device and program |
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