JPS6442546A - Shadow mask and its production - Google Patents

Shadow mask and its production

Info

Publication number
JPS6442546A
JPS6442546A JP19624187A JP19624187A JPS6442546A JP S6442546 A JPS6442546 A JP S6442546A JP 19624187 A JP19624187 A JP 19624187A JP 19624187 A JP19624187 A JP 19624187A JP S6442546 A JPS6442546 A JP S6442546A
Authority
JP
Japan
Prior art keywords
sheet
shadow mask
etching
strength
magnetism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19624187A
Other languages
Japanese (ja)
Inventor
Morinori Kamio
Norio Yuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP19624187A priority Critical patent/JPS6442546A/en
Publication of JPS6442546A publication Critical patent/JPS6442546A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes For Cathode-Ray Tubes (AREA)

Abstract

PURPOSE:To produce the title high-precision shadow mask having high strength by cold-rolling an alloy having a specified composition consisting of Ni, Mo, C, Mn, Si, and Fe into an ultrathin sheet, pitting the sheet by etching, imparting a tension to the sheet, and fixing the sheet. CONSTITUTION:An Ni-Fe based alloy consisting, by weight, of 60-90% Ni, 1-8% Mo, <=0.1% C, 0.1-3.0% Mn, 0.01-1.0% Si, and the balance Fe and inevitable impurities is used as the material for the shadow mask. The material is cold-rolled into a sheet having <=50mum thickness. The ultrathin sheet is annealed, and then slitted to a prescribed width. A resist is applied on the obtained shadow mask material to pit the sheet by etching. The obtained flat mask is subjected to prescribed heat treatment to improve the strength and magnetism, a tension is imparted to the sheet, and the sheet is fixed to a frame. The shadow mask is graphitized under such conditions, and then incorporated into a cathode-ray tube. By this method, high precision can be imparted to the shadow mask by using the material having excellent yield strength, magnetism, etching property, and workability.
JP19624187A 1987-08-07 1987-08-07 Shadow mask and its production Pending JPS6442546A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19624187A JPS6442546A (en) 1987-08-07 1987-08-07 Shadow mask and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19624187A JPS6442546A (en) 1987-08-07 1987-08-07 Shadow mask and its production

Publications (1)

Publication Number Publication Date
JPS6442546A true JPS6442546A (en) 1989-02-14

Family

ID=16354541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19624187A Pending JPS6442546A (en) 1987-08-07 1987-08-07 Shadow mask and its production

Country Status (1)

Country Link
JP (1) JPS6442546A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010101158A (en) * 1998-12-15 2001-11-14 사카모토 다까시 Fe-Ni ALLOY FOR TENSION MASK AND TENSION MASK USING IT AND COLOR CRT
KR20180100458A (en) * 2013-01-31 2018-09-10 애플 인크. Vertically stacked image sensor
KR101939133B1 (en) * 2017-08-04 2019-01-16 주식회사 웨이브일렉트로닉스 Method for Manufacturing Shadow Mask Using Heat Treatment Process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010101158A (en) * 1998-12-15 2001-11-14 사카모토 다까시 Fe-Ni ALLOY FOR TENSION MASK AND TENSION MASK USING IT AND COLOR CRT
KR20180100458A (en) * 2013-01-31 2018-09-10 애플 인크. Vertically stacked image sensor
KR101939133B1 (en) * 2017-08-04 2019-01-16 주식회사 웨이브일렉트로닉스 Method for Manufacturing Shadow Mask Using Heat Treatment Process

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