JPS6442167A - Semiconductor memory device - Google Patents
Semiconductor memory deviceInfo
- Publication number
- JPS6442167A JPS6442167A JP62198566A JP19856687A JPS6442167A JP S6442167 A JPS6442167 A JP S6442167A JP 62198566 A JP62198566 A JP 62198566A JP 19856687 A JP19856687 A JP 19856687A JP S6442167 A JPS6442167 A JP S6442167A
- Authority
- JP
- Japan
- Prior art keywords
- bit line
- word line
- line
- bit
- groove part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/37—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor being at least partially in a trench in the substrate
Landscapes
- Semiconductor Memories (AREA)
Abstract
PURPOSE:To facilitate the pattern transfer and processing for a bit line and a word line without requiring any complicated manufacture process by electrically connecting the bit wire to the other electrode of a transfer gate transistor through a groove part and forming the word line on a storage node and on the bit line via an insulating film. CONSTITUTION:A bit line 12b is electrically connected with the other electrode 15 of a transfer gate transistor through a groove part 2. Hereby, there is required no separate electrical connector means such as a contact part, and there are produced no steps on the groove part due to the bit line. Additionally, a word line 10 is formed via an insulating film 17 formed on a storage node 12a and the bit line 12b. Hereby, the device can be manufactured without consideration of electrical contact of the word line with the surface node 12a and the bit line 12b upon formation of the word line 18. Thus, pattern transfer and processing of the bit line and word line is facilitated, assuring high density and larger integration of the device.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62198566A JPS6442167A (en) | 1987-08-08 | 1987-08-08 | Semiconductor memory device |
US07/232,641 US4912535A (en) | 1987-08-08 | 1988-08-08 | Trench type semiconductor memory device having side wall contact |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62198566A JPS6442167A (en) | 1987-08-08 | 1987-08-08 | Semiconductor memory device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6442167A true JPS6442167A (en) | 1989-02-14 |
Family
ID=16393310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62198566A Pending JPS6442167A (en) | 1987-08-08 | 1987-08-08 | Semiconductor memory device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6442167A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5410169A (en) * | 1990-02-26 | 1995-04-25 | Kabushiki Kaisha Toshiba | Dynamic random access memory having bit lines buried in semiconductor substrate |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS561560A (en) * | 1979-06-19 | 1981-01-09 | Sanyo Electric Co Ltd | Semiconductor memory cell |
-
1987
- 1987-08-08 JP JP62198566A patent/JPS6442167A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS561560A (en) * | 1979-06-19 | 1981-01-09 | Sanyo Electric Co Ltd | Semiconductor memory cell |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5410169A (en) * | 1990-02-26 | 1995-04-25 | Kabushiki Kaisha Toshiba | Dynamic random access memory having bit lines buried in semiconductor substrate |
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