JPS643950A - Ion implantation device - Google Patents

Ion implantation device

Info

Publication number
JPS643950A
JPS643950A JP15862987A JP15862987A JPS643950A JP S643950 A JPS643950 A JP S643950A JP 15862987 A JP15862987 A JP 15862987A JP 15862987 A JP15862987 A JP 15862987A JP S643950 A JPS643950 A JP S643950A
Authority
JP
Japan
Prior art keywords
electrode
mass
electrodes
ion beam
decelerating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15862987A
Other languages
English (en)
Other versions
JPH0693352B2 (ja
Inventor
Yoichi Ose
Toshiyuki Takagi
Hiroki Sano
Kazuyoshi Miki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15862987A priority Critical patent/JPH0693352B2/ja
Publication of JPS643950A publication Critical patent/JPS643950A/ja
Publication of JPH0693352B2 publication Critical patent/JPH0693352B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP15862987A 1987-06-25 1987-06-25 イオン打込装置 Expired - Fee Related JPH0693352B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15862987A JPH0693352B2 (ja) 1987-06-25 1987-06-25 イオン打込装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15862987A JPH0693352B2 (ja) 1987-06-25 1987-06-25 イオン打込装置

Publications (2)

Publication Number Publication Date
JPS643950A true JPS643950A (en) 1989-01-09
JPH0693352B2 JPH0693352B2 (ja) 1994-11-16

Family

ID=15675885

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15862987A Expired - Fee Related JPH0693352B2 (ja) 1987-06-25 1987-06-25 イオン打込装置

Country Status (1)

Country Link
JP (1) JPH0693352B2 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03219544A (ja) * 1989-06-06 1991-09-26 Mitsubishi Electric Corp 荷電粒子注入装置
DE19655205C2 (de) * 1995-11-08 2003-02-20 Applied Materials Inc Ionenimplantationsanlage mit verbesserter Strahlschärfe
DE19655209C2 (de) * 1995-11-08 2003-02-20 Applied Materials Inc Ionenimplantationsanlage mit einer Substrat-Neutralisierungsvorrichtung
WO2006014633A2 (en) * 2004-07-19 2006-02-09 Axcelis Technologies, Inc. Electrostatic lens for ion beams
WO2006090787A1 (ja) * 2005-02-24 2006-08-31 Ulvac, Inc. イオン注入装置の制御方法、その制御システム、その制御プログラムおよびイオン注入装置
JP2018110088A (ja) * 2017-01-06 2018-07-12 住友重機械イオンテクノロジー株式会社 イオン注入方法およびイオン注入装置
CN109997210A (zh) * 2016-11-29 2019-07-09 艾克塞利斯科技公司 快动遮蔽运动式双轴可变宽度的质量解析孔径

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03219544A (ja) * 1989-06-06 1991-09-26 Mitsubishi Electric Corp 荷電粒子注入装置
DE19655205C2 (de) * 1995-11-08 2003-02-20 Applied Materials Inc Ionenimplantationsanlage mit verbesserter Strahlschärfe
DE19655209C2 (de) * 1995-11-08 2003-02-20 Applied Materials Inc Ionenimplantationsanlage mit einer Substrat-Neutralisierungsvorrichtung
DE19655206C2 (de) * 1995-11-08 2003-02-20 Applied Materials Inc Ionenimplantationsanlage mit verbesserter Feldkontrolle
DE19655208C2 (de) * 1995-11-08 2003-02-20 Applied Materials Inc Ionenimplantationsanlage mit einer Drei-Elektroden-Abbremsstruktur und einer vorgeschalteten Massenselektion
US7112809B2 (en) 2003-06-26 2006-09-26 Axcelis Technologies, Inc. Electrostatic lens for ion beams
WO2006014633A3 (en) * 2004-07-19 2006-08-17 Axcelis Tech Inc Electrostatic lens for ion beams
WO2006014633A2 (en) * 2004-07-19 2006-02-09 Axcelis Technologies, Inc. Electrostatic lens for ion beams
WO2006090787A1 (ja) * 2005-02-24 2006-08-31 Ulvac, Inc. イオン注入装置の制御方法、その制御システム、その制御プログラムおよびイオン注入装置
JPWO2006090787A1 (ja) * 2005-02-24 2008-07-24 株式会社アルバック イオン注入装置の制御方法、その制御システム、その制御プログラムおよびイオン注入装置
CN109997210A (zh) * 2016-11-29 2019-07-09 艾克塞利斯科技公司 快动遮蔽运动式双轴可变宽度的质量解析孔径
KR20190087479A (ko) * 2016-11-29 2019-07-24 액셀리스 테크놀러지스, 인크. 고속 작동 셔터 모션을 갖는 2축 가변 폭 질량 분해 애퍼처
JP2019536226A (ja) * 2016-11-29 2019-12-12 アクセリス テクノロジーズ， インコーポレイテッド 高速作動するシャッター動作を伴う２軸可変幅質量分解開口
JP2018110088A (ja) * 2017-01-06 2018-07-12 住友重機械イオンテクノロジー株式会社 イオン注入方法およびイオン注入装置

Also Published As

Publication number Publication date
JPH0693352B2 (ja) 1994-11-16

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees