JPS52107897A - Ion microanalyzer equipped with primary ion beam separator - Google Patents

Ion microanalyzer equipped with primary ion beam separator

Info

Publication number
JPS52107897A
JPS52107897A JP2322776A JP2322776A JPS52107897A JP S52107897 A JPS52107897 A JP S52107897A JP 2322776 A JP2322776 A JP 2322776A JP 2322776 A JP2322776 A JP 2322776A JP S52107897 A JPS52107897 A JP S52107897A
Authority
JP
Japan
Prior art keywords
ion
beam separator
primary
ion beam
microanalyzer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2322776A
Other languages
Japanese (ja)
Inventor
Atsushi Shibata
Hiroshi Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2322776A priority Critical patent/JPS52107897A/en
Publication of JPS52107897A publication Critical patent/JPS52107897A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:A magnetic field is established between the primary ion generator and the sample and a specified number of mass-separated ion beams are focused and irradiate the sample, thereby miniaturizing the ion microanalyzer.
JP2322776A 1976-03-05 1976-03-05 Ion microanalyzer equipped with primary ion beam separator Pending JPS52107897A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2322776A JPS52107897A (en) 1976-03-05 1976-03-05 Ion microanalyzer equipped with primary ion beam separator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2322776A JPS52107897A (en) 1976-03-05 1976-03-05 Ion microanalyzer equipped with primary ion beam separator

Publications (1)

Publication Number Publication Date
JPS52107897A true JPS52107897A (en) 1977-09-09

Family

ID=12104733

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2322776A Pending JPS52107897A (en) 1976-03-05 1976-03-05 Ion microanalyzer equipped with primary ion beam separator

Country Status (1)

Country Link
JP (1) JPS52107897A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985001389A1 (en) * 1983-09-14 1985-03-28 Hitachi, Ltd. Ion microbeam implanting apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985001389A1 (en) * 1983-09-14 1985-03-28 Hitachi, Ltd. Ion microbeam implanting apparatus

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