JPS6432657A - High heat-dissipating semiconductor element loader - Google Patents
High heat-dissipating semiconductor element loaderInfo
- Publication number
- JPS6432657A JPS6432657A JP62189132A JP18913287A JPS6432657A JP S6432657 A JPS6432657 A JP S6432657A JP 62189132 A JP62189132 A JP 62189132A JP 18913287 A JP18913287 A JP 18913287A JP S6432657 A JPS6432657 A JP S6432657A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor element
- metallic plate
- high heat
- loader
- dissipating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/14—Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
- H01L2224/1401—Structure
- H01L2224/1403—Bump connectors having different sizes, e.g. different diameters, heights or widths
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
PURPOSE:To obtain a high heat-dissipating semiconductor element loader at low cost by connecting a semiconductor element and a metallic plate by solder for heat dissipation and efficiently transmitting heat generated from the semiconductor element over the metallic plate. CONSTITUTION:An insulating layer 2 and a conductor circuit 3 are laminated onto a metallic plate 1. The downside of a semiconductor element 6 loaded onto a hole section bored so that the metallic plate 1 is exposed to one part of the insulating layer 2 and an exposed metallic surface are joined partially by solder 5 for heat dissipation. Consequently, heat generated from the semiconductor element 6 is transmitted over the metallic plate 1 extremely efficiently. Accordingly, a high heat-dissipating semiconductor element loader is acquired at low cost.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62189132A JPS6432657A (en) | 1987-07-29 | 1987-07-29 | High heat-dissipating semiconductor element loader |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62189132A JPS6432657A (en) | 1987-07-29 | 1987-07-29 | High heat-dissipating semiconductor element loader |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6432657A true JPS6432657A (en) | 1989-02-02 |
Family
ID=16235941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62189132A Pending JPS6432657A (en) | 1987-07-29 | 1987-07-29 | High heat-dissipating semiconductor element loader |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6432657A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008517459A (en) * | 2004-10-14 | 2008-05-22 | アギア システムズ インコーポレーテッド | Printed circuit board assembly with improved thermal energy dissipation |
JP2010532100A (en) * | 2007-06-28 | 2010-09-30 | インテル・コーポレーション | Method for forming a multilayer substrate core structure using continuous microvia laser drilling and substrate core structure formed according to the method |
US8440916B2 (en) | 2007-06-28 | 2013-05-14 | Intel Corporation | Method of forming a substrate core structure using microvia laser drilling and conductive layer pre-patterning and substrate core structure formed according to the method |
-
1987
- 1987-07-29 JP JP62189132A patent/JPS6432657A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008517459A (en) * | 2004-10-14 | 2008-05-22 | アギア システムズ インコーポレーテッド | Printed circuit board assembly with improved thermal energy dissipation |
JP2010532100A (en) * | 2007-06-28 | 2010-09-30 | インテル・コーポレーション | Method for forming a multilayer substrate core structure using continuous microvia laser drilling and substrate core structure formed according to the method |
US8440916B2 (en) | 2007-06-28 | 2013-05-14 | Intel Corporation | Method of forming a substrate core structure using microvia laser drilling and conductive layer pre-patterning and substrate core structure formed according to the method |
US8877565B2 (en) | 2007-06-28 | 2014-11-04 | Intel Corporation | Method of forming a multilayer substrate core structure using sequential microvia laser drilling and substrate core structure formed according to the method |
US9648733B2 (en) | 2007-06-28 | 2017-05-09 | Intel Corporation | Method of forming a substrate core structure using microvia laser drilling and conductive layer pre-patterning and substrate core structure formed according to the method |
US10306760B2 (en) | 2007-06-28 | 2019-05-28 | Intel Corporation | Method of forming a substrate core structure using microvia laser drilling and conductive layer pre-patterning and substrate core structure formed according to the method |
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