JPS64285A - Dry etching method - Google Patents
Dry etching methodInfo
- Publication number
- JPS64285A JPS64285A JP15587187A JP15587187A JPS64285A JP S64285 A JPS64285 A JP S64285A JP 15587187 A JP15587187 A JP 15587187A JP 15587187 A JP15587187 A JP 15587187A JP S64285 A JPS64285 A JP S64285A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- gas
- alcohol
- dry etching
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE: To perform dry etching free from resticking of a resist and formation of an organic polymerized film by using the gas of alcohol and carboxylic acids in case of etching a layer contg. In2O3 and lowly controlling pressure of gas at a time of non-discharge.
CONSTITUTION: In the case of etching a layer contg. In2O3 with reactive ionic etching, the gas of at least one kind of alcohol and carboxylic acids is used and then gas obtained by incorporating at least one kind of N2, Ar and He thereinto at a rate of 0W20% of total amount of the gasses is used. Furthermore the pressure of the gas used for etching is regulated to low pressure lower than 5Pa at a time of non-discharge. Thereby the flow rate of alcohol is made little and formation of an organic polymerized film is reduced and also vapor pressure of volatile ITO compd. is lowered and dry etching is easily performed.
COPYRIGHT: (C)1989,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15587187A JPS64285A (en) | 1987-06-23 | 1987-06-23 | Dry etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15587187A JPS64285A (en) | 1987-06-23 | 1987-06-23 | Dry etching method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01285A JPH01285A (en) | 1989-01-05 |
JPS64285A true JPS64285A (en) | 1989-01-05 |
Family
ID=15615325
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15587187A Pending JPS64285A (en) | 1987-06-23 | 1987-06-23 | Dry etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS64285A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52119246A (en) * | 1976-03-30 | 1977-10-06 | Seiko Epson Corp | Production of electrode substrate for display elements |
JPS5647572A (en) * | 1979-09-27 | 1981-04-30 | Mitsubishi Electric Corp | Etching method of indium oxide film |
-
1987
- 1987-06-23 JP JP15587187A patent/JPS64285A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52119246A (en) * | 1976-03-30 | 1977-10-06 | Seiko Epson Corp | Production of electrode substrate for display elements |
JPS5647572A (en) * | 1979-09-27 | 1981-04-30 | Mitsubishi Electric Corp | Etching method of indium oxide film |
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