JPS6427225A - Vapor growth system - Google Patents
Vapor growth systemInfo
- Publication number
- JPS6427225A JPS6427225A JP18431687A JP18431687A JPS6427225A JP S6427225 A JPS6427225 A JP S6427225A JP 18431687 A JP18431687 A JP 18431687A JP 18431687 A JP18431687 A JP 18431687A JP S6427225 A JPS6427225 A JP S6427225A
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- section
- flowing
- tube
- flowing direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To uniformize the thickness distribution of a grown layer with a construction of easy manufacture by regulating the sectional areas of a guide and a susceptor to control the flowing velocity distribution of material gas. CONSTITUTION:The combination section of a liner tube 22 and a susceptor 24 perpendicular to a material gas flowing direction is gradually reduced in the section of the tube for passing the gas by gradually increasing the section of the susceptor 24 in the flowing direction, triangular guides are provided at both sides of the susceptor, and the section of the guide is gradually increased. The section of the guide is provided to uniformize the flowing speed distribution of the surface perpendicular to the flowing direction by approximately correcting the wall of the liner tube opposite to a wafer since the wall of the tube opposite to the wafer is curved in a predetermined curvature. The sectional area of the gas in the flowing direction is adjusted by altering the sectional shape of the susceptor 24 without varying the sectional shape of the tube to control the flowing speed distribution. Thus, the thickness distribution of a grown layer is uniformized with a structure of an easy manufacture.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18431687A JPS6427225A (en) | 1987-07-22 | 1987-07-22 | Vapor growth system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18431687A JPS6427225A (en) | 1987-07-22 | 1987-07-22 | Vapor growth system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6427225A true JPS6427225A (en) | 1989-01-30 |
Family
ID=16151202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18431687A Pending JPS6427225A (en) | 1987-07-22 | 1987-07-22 | Vapor growth system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6427225A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7390367B1 (en) * | 2001-10-30 | 2008-06-24 | Cree, Inc. | Housing assembly for an induction heating device including liner or susceptor coating |
-
1987
- 1987-07-22 JP JP18431687A patent/JPS6427225A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7390367B1 (en) * | 2001-10-30 | 2008-06-24 | Cree, Inc. | Housing assembly for an induction heating device including liner or susceptor coating |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0521842A3 (en) | ||
ZA897659B (en) | Process and apparatus for coating glass | |
DE69423481T2 (en) | Nozzle with cross-section and jet vector adjustment for a jet engine | |
JPS6427225A (en) | Vapor growth system | |
FR2697620B1 (en) | Process and installation for the production of nitrogen gas with variable flow. | |
NO871573L (en) | PROCEDURE FOR PREPARATION OF PEPTIDES. | |
JPS5795618A (en) | Low pressure epitaxial growing device | |
JPS6481311A (en) | Vapor phase growth device | |
JPS60173143A (en) | Auxiliary nozzle apparatus in fluid jet type loom | |
JPS54147783A (en) | Cvd device | |
JPS6449218A (en) | Manufacture of semiconductor | |
JPS6454723A (en) | Vapor growth device | |
JPH0330269U (en) | ||
JPS6475680A (en) | Plasma cvd device | |
FR2564571B3 (en) | CONTINUOUS ADJUSTMENT OF THE AIR-FUEL RATIO OF A HEAT SOURCE HEATED BY A FUEL | |
JPS57123909A (en) | Blasting device for blast furnace | |
JP2003282456A (en) | Vapor phase deposition apparatus | |
SU587109A1 (en) | Fibre setting chamber | |
JPS5659634A (en) | Manufacture of optical fiber base material | |
SU1675232A1 (en) | Device for producing continuous glass sheet by downhill pulling | |
JPS55149659A (en) | Coating method for blank with coating material | |
JPS56109834A (en) | Manufacture of base material for optical fiber | |
ATE114333T1 (en) | MONOCLONAL ANTIBODY TO ENDOTHELLIN, HYBRIDOME CAPABLE OF PRODUCTION AND RADIOIMMUNASSAY FOR ENDOTHELLIN USING THE SAME. | |
JPS6490520A (en) | Method for growing semiconductor thin film | |
JPS5667980A (en) | Semiconductor laser system and preparation method thereof |