JPS6424832U - - Google Patents

Info

Publication number
JPS6424832U
JPS6424832U JP11942787U JP11942787U JPS6424832U JP S6424832 U JPS6424832 U JP S6424832U JP 11942787 U JP11942787 U JP 11942787U JP 11942787 U JP11942787 U JP 11942787U JP S6424832 U JPS6424832 U JP S6424832U
Authority
JP
Japan
Prior art keywords
passage
top plate
immersed
wafer
cleaning liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11942787U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11942787U priority Critical patent/JPS6424832U/ja
Publication of JPS6424832U publication Critical patent/JPS6424832U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Solid Materials (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

図は本考案乾燥装置の一実施例を示し、第1図
は一部破断した正面図、第2図は第1図の側断面
図である。 1……液槽、2……清浄液、3……ウエハ、4
……キヤリア、5……天板、6……通過口、7…
…押上げ部材、9……吐出ノズル。
The drawings show an embodiment of the drying apparatus of the present invention, in which FIG. 1 is a partially cutaway front view, and FIG. 2 is a side sectional view of FIG. 1. 1...Liquid tank, 2...Cleaning liquid, 3...Wafer, 4
...Carrier, 5...Top plate, 6...Passing port, 7...
...Push-up member, 9...Discharge nozzle.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] キヤリアに保持された複数のウエハを清浄液中
に浸漬した状態で収納する液槽と、該液槽の上部
を覆う天板と、該天板に開設され上記ウエハが通
過可能な通過口と、該通過口から上記清浄液中に
浸漬したウエハを通過せしめる通過手段と、上記
通過口の出口近傍に乾燥気体を吐出する吐出手段
と、からなるウエハ乾燥装置。
a liquid tank that stores a plurality of wafers held in a carrier while immersed in a cleaning liquid; a top plate that covers the top of the liquid tank; and a passage opening provided in the top plate through which the wafers can pass; A wafer drying apparatus comprising: a passage means for passing a wafer immersed in the cleaning liquid through the passage port; and a discharge means for discharging drying gas near the exit of the passage port.
JP11942787U 1987-08-04 1987-08-04 Pending JPS6424832U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11942787U JPS6424832U (en) 1987-08-04 1987-08-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11942787U JPS6424832U (en) 1987-08-04 1987-08-04

Publications (1)

Publication Number Publication Date
JPS6424832U true JPS6424832U (en) 1989-02-10

Family

ID=31364647

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11942787U Pending JPS6424832U (en) 1987-08-04 1987-08-04

Country Status (1)

Country Link
JP (1) JPS6424832U (en)

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