JPS6420617A - X-ray aligner - Google Patents
X-ray alignerInfo
- Publication number
- JPS6420617A JPS6420617A JP62177664A JP17766487A JPS6420617A JP S6420617 A JPS6420617 A JP S6420617A JP 62177664 A JP62177664 A JP 62177664A JP 17766487 A JP17766487 A JP 17766487A JP S6420617 A JPS6420617 A JP S6420617A
- Authority
- JP
- Japan
- Prior art keywords
- window
- ray
- mask
- chamber
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62177664A JPS6420617A (en) | 1987-07-15 | 1987-07-15 | X-ray aligner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62177664A JPS6420617A (en) | 1987-07-15 | 1987-07-15 | X-ray aligner |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6420617A true JPS6420617A (en) | 1989-01-24 |
Family
ID=16034948
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62177664A Pending JPS6420617A (en) | 1987-07-15 | 1987-07-15 | X-ray aligner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6420617A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002015989A (ja) * | 1993-07-21 | 2002-01-18 | Canon Inc | 処理システム及びこれを用いた露光装置およびデバイス製造方法 |
JP2003068609A (ja) * | 2001-08-24 | 2003-03-07 | Nikon Corp | 減圧雰囲気下処理装置、エネルギビーム照射装置及び露光装置 |
US8246633B2 (en) | 2008-02-01 | 2012-08-21 | Terumo Kabushiki Kaisha | Medical manipulator and medical robot system |
-
1987
- 1987-07-15 JP JP62177664A patent/JPS6420617A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002015989A (ja) * | 1993-07-21 | 2002-01-18 | Canon Inc | 処理システム及びこれを用いた露光装置およびデバイス製造方法 |
JP2003068609A (ja) * | 2001-08-24 | 2003-03-07 | Nikon Corp | 減圧雰囲気下処理装置、エネルギビーム照射装置及び露光装置 |
US8246633B2 (en) | 2008-02-01 | 2012-08-21 | Terumo Kabushiki Kaisha | Medical manipulator and medical robot system |
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